Polishing pad with alignment feature
View Patent ↗Polishing pads with alignment marks are described. Methods of fabricating polishing pads with alignment marks are also described.
1. A method of fabricating a polishing pad for polishing a substrate, the method comprising:
mixing a pre-polymer and a curative to form a mixture in the base of a formation mold;
moving the lid of the formation mold into the mixture, the lid having disposed thereon a pattern of protrusions and an alignment forming feature; and, with the lid placed in the mixture,
at least partially curing the mixture to form a molded homogeneous polishing body comprising a polishing surface having a pattern of grooves comprising a polishing region with an alignment feature disposed therein, corresponding to the pattern of protrusions and the alignment forming feature of the lid, wherein the alignment feature creates a singular asymmetry within the pattern of grooves.
2. The method of claim 1 , wherein the alignment forming feature is an alignment protrusion having a height of approximately 80% or greater of the height of the protrusions of the pattern of protrusions.
3. The method of claim 2 , wherein the alignment protrusion has a height at least the height of the protrusions of the pattern of protrusions.
4. The method of claim 1 , wherein forming the molded homogeneous polishing body comprises forming a thermoset polyurethane material.
5. The method of claim 1 , wherein the mixing further comprises adding a plurality of porogens to the pre-polymer and the curative to form a plurality of closed cell pores in the molded homogeneous polishing body, each closed cell pore having a physical shell.
6. The method of claim 1 , wherein the mixing further comprises injecting a gas into the pre-polymer and the curative, or into a product formed there from, to form a plurality of closed cell pores in the molded homogeneous polishing body, each closed cell pore having no physical shell.
7. The method of claim 1 , wherein mixing the pre-polymer and the curative comprises mixing an isocyanate and an aromatic diamine compound, respectively.
8. The method of claim 1 , wherein the mixing further comprises adding an opacifying lubricant to the pre-polymer and the curative to form an opaque molded homogeneous polishing body.
9. The method of claim 1 , wherein curing the mixture comprises first partially curing in the formation mold and then further curing in an oven.
10. A method of fabricating a polishing pad for polishing a substrate, the method comprising:
mixing a pre-polymer and a curative to form a mixture in the base of a formation mold;
moving the lid of the formation mold into the mixture, the lid having disposed thereon a pattern of protrusions and an alignment forming feature, wherein the alignment forming feature is an alignment protrusion having a height of approximately 80% or greater of the height of the protrusions of the pattern of protrusions; and, with the lid placed in the mixture,
at least partially curing the mixture to form a molded homogeneous polishing body comprising a polishing surface having a pattern of grooves comprising a polishing region with an alignment feature disposed therein, corresponding to the pattern of protrusions and the alignment forming feature of the lid.
11. The method of claim 10 , wherein the alignment protrusion has a height at least the height of the protrusions of the pattern of protrusions.
12. The method of claim 10 , wherein forming the molded homogeneous polishing body comprises forming a thermoset polyurethane material.
13. The method of claim 10 , wherein the mixing further comprises adding a plurality of porogens to the pre-polymer and the curative to form a plurality of closed cell pores in the molded homogeneous polishing body, each closed cell pore having a physical shell.
14. The method of claim 10 , wherein the mixing further comprises injecting a gas into the pre-polymer and the curative, or into a product formed there from, to form a plurality of closed cell pores in the molded homogeneous polishing body, each closed cell pore having no physical shell.
15. The method of claim 10 , wherein mixing the pre-polymer and the curative comprises mixing an isocyanate and an aromatic diamine compound, respectively.
16. The method of claim 10 , wherein the mixing further comprises adding an opacifying lubricant to the pre-polymer and the curative to form an opaque molded homogeneous polishing body.
17. The method of claim 10 , wherein curing the mixture comprises first partially curing in the formation mold and then further curing in an oven.