IP Library › Granted Patent US 12,588,500
Granted Patent B2
US 12,588,500 · App. 18/069,957 · Granted Mar 24, 2026

Semiconductor package

Inventors: Kyungdon Mun (Asan-si, KR); Donghwa Kwak (Suwon-si, KR); Inho Roh (Seoul, KR)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
H01L23/367H01L23/3128H01L23/528H01L24/08H01L24/09H01L24/16H01L24/17H01L24/32H01L24/33H01L25/0657H01L2224/08112H01L2224/08113H01L2224/09181H01L2224/16148H01L2224/16227H01L2224/17181H01L2224/32059H01L2224/32113H01L2224/32145H01L2224/32227H01L2224/33051H01L2924/10161H01L2924/141H01L2924/1431H01L2924/14335H01L2924/1436H01L2924/1437H01L2924/1441H01L2924/182
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,588,500
App. No.
18/069,957
Granted
Mar 24, 2026
Kind
B2
Abstract

A semiconductor package includes a package substrate, a first semiconductor chip mounted on the package substrate and that includes a first semiconductor substrate that includes through electrodes, and a second semiconductor chip disposed on the first semiconductor chip and that includes a second semiconductor substrate that includes an active surface and an inactive surface. The second semiconductor chip further includes a plurality of isolated heat dissipation fins that extend in a vertical direction from the inactive surface.

Claims (19)

1 . A semiconductor package, comprising:

a package substrate;

a first semiconductor chip mourned on the package substrate, wherein the first semiconductor chip includes a first semiconductor substrate that includes through electrodes; and

a second semiconductor chip disposed on the first semiconductor chip, wherein the second semiconductor chip includes a second semiconductor substrate that includes an active surface and an inactive surface, and the second semiconductor substrate includes a plurality of isolated heat dissipation fins that extend from the inactive surface in a vertical direction,

wherein the second semiconductor chip comprises an active area in which active transistors are arranged and a dummy area in which dummy transistors are arranged, and

wherein a first distribution density of the plurality of heat dissipation fins in the active area is less than a second distribution density of the plurality of heat dissipation fins in the dummy area.

2 . The semiconductor package of claim 1 , wherein a first length in the vertical direction of each of the plurality of heat dissipation fins in the active area is greater than a second length in the vertical direction of each of the plurality of heat dissipation fins in the dummy area.

3 . The semiconductor package of claim 2 , wherein a first vertical distance between each of the plurality of heat dissipation fins in the active area and each of the active transistors is less than a second vertical distance between each of the plurality of heat dissipation fins in the dummy area and each of the dummy transistors.

4 . The semiconductor package of claim 1 , wherein upper portions of the plurality of heat dissipation fins are connected in horizontal directions to a heat dissipation bridge in a form of a net, and

wherein a level of a top surface of the heat dissipation bridge is substantially coplanar with the inactive surface of the second semiconductor substrate.

5 . The semiconductor package of claim 4 , wherein heat generated by the active area is emitted from the second semiconductor chip through the plurality of heat dissipation fins in the dummy area.

6 . The semiconductor package of claim 1 , wherein upper portions of the plurality of heat dissipation fins are connected to a heat dissipation bridge in a form of a straight line that extends in one of horizontal directions, and

wherein a level of a top surface of the heat dissipation bridge is substantially coplanar with the inactive surface of the second semiconductor substrate.

7 . The semiconductor package of claim 1 , wherein the first semiconductor chip comprises through electrodes that penetrate through the first semiconductor substrate.

8 . The semiconductor package of claim 7 , wherein the plurality of heat dissipation fins include substantially a same material as the through electrodes,

wherein each of the plurality of heat dissipation fins electrically floats, and

wherein the through electrodes electrically connect the first semiconductor chip to the second semiconductor chip.

9 . The semiconductor package of claim 1 , wherein a first transistor in the first semiconductor chip is a fin-shaped field effect transistor (FET), and

wherein a second transistor in the second semiconductor chip is a gate all around (GAA)-shaped FET.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 21, 2022
From: MUN, KYUNGDON; KWAK, DONGHWA; ROH, INHO
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 062177/0881 →
Priority Claims (1)
KR 10-2021-0185403 · Dec 22, 2021 · national
Continuity (1)
Related Publication 20230197553A1 · Jun 22, 2023
References Cited (82)
US 4561011A · Kohara · 1985 [cited by examiner]
US 4716498A · Ellis · 1987 [cited by examiner]
US 4771365A · Cichocki · 1988 [cited by examiner]
US 5097318A · Tanaka · 1992 [cited by examiner]
US 5157588A · Kim · 1992 [cited by examiner]
US 5199164A · Kim · 1993 [cited by examiner]
US 5297001A · Sterling · 1994 [cited by examiner]
US 5533256A · Call · 1996 [cited by examiner]
US 5552637A · Yamagata · 1996 [cited by examiner]
US 5633783A · Yamamoto · 1997 [cited by examiner]
US 5931222A · Toy · 1999 [cited by examiner]
US 6009938A · Smith · 2000 [cited by examiner]
US 6085833A · Kimura · 2000 [cited by examiner]
US 6223970B1 · Chen · 2001 [cited by examiner]
US 7391614B2 · Artman · 2008 [cited by examiner]
US 7919845B2 · Karp · 2011 [cited by examiner]
US 8526186B2 · Yokoya · 2013 [cited by examiner]
US 8692282B2 · Kim · 2014 [cited by examiner]
US 8823041B2 · Kim · 2014 [cited by examiner]
US 8941233B1 · Ngai · 2015 [cited by examiner]
US 9172020B2 · Kim · 2015 [cited by examiner]
US 9613881B2 · Ahn · 2017 [cited by examiner]
US 9721868B2 · Lin · 2017 [cited by examiner]
US 9735082B2 · Hung · 2017 [cited by examiner]
US 10062665B2 · Chen · 2018 [cited by examiner]
US 10090236B2 · Jayasena · 2018 [cited by examiner]
US 10276544B2 · Matsumoto · 2019 [cited by examiner]
US 10943869B2 · Zhai · 2021 [cited by examiner]
US 10963022B2 · Steely, Jr. · 2021 [cited by examiner]
US 11031394B1 · Or-Bach · 2021 [cited by examiner]
US 11081426B2 · Mohamed · 2021 [cited by examiner]
US 11107767B2 · Kao · 2021 [cited by examiner]
US 20060027934A1 · Edelstein · 2006 [cited by examiner]
US 20060187642A1 · Jeong · 2006 [cited by examiner]
US 20060215367A1 · Artman · 2006 [cited by examiner]
US 20110272692A1 · Han · 2011 [cited by examiner]
US 20130105851A1 · Kim · 2013 [cited by examiner]
US 20130107548A1 · Kim · 2013 [cited by examiner]
US 20130314877A1 · Watanabe · 2013 [cited by examiner]
US 20140299910A1 · Kim · 2014 [cited by examiner]
US 20150179617A1 · Lin · 2015 [cited by examiner]
US 20170200716A1 · Or-Bach · 2017 [cited by examiner]
US 20170213821A1 · Or-Bach · 2017 [cited by examiner]
US 20180197812A1 · Or-Bach · 2018 [cited by examiner]
US 20180226317A1 · Shrivastava · 2018 [cited by examiner]
US 20180277530A1 · Or-Bach · 2018 [cited by examiner]
US 20190006192A1 · Or-Bach · 2019 [cited by examiner]
US 20190013213A1 · Or-Bach · 2019 [cited by examiner]
US 20190019693A1 · Or-Bach · 2019 [cited by examiner]
US 20190385918A1 · Choi · 2019 [cited by examiner]
US 20200373219A1 · Hsu · 2020 [cited by examiner]
US 20210020457A1 · Or-Bach · 2021 [cited by examiner]
US 20210043573A1 · Eid · 2021 [cited by examiner]
US 20210118699A1 · Or-Bach · 2021 [cited by examiner]
US 20210159139A1 · Yu · 2021 [cited by examiner]
US 20210193655A1 · Or-Bach · 2021 [cited by examiner]
US 20210225663A1 · Or-Bach · 2021 [cited by examiner]
US 20210225790A1 · Chen · 2021 [cited by examiner]
US 20210242122A1 · Jeng · 2021 [cited by examiner]
US 20230197553A1 · Mun · 2023 [cited by examiner]
US 20240014283A1 · Wang · 2024 [cited by examiner]
US 20240096731A1 · Wang · 2024 [cited by examiner]
US 20240162107A1 · Huang · 2024 [cited by examiner]
US 20240274523A1 · Or-Bach · 2024 [cited by examiner]
US 20250029886A1 · Kang · 2025 [cited by examiner]
CN 1299993A · 2001 [cited by examiner]
CN 104025320A · 2014 [cited by examiner]
CN 104025320B · 2016 [cited by examiner]
CN 106169532A · 2016 [cited by examiner]
CN 106169532B · 2018 [cited by examiner]
CN 111446218B · 2022 [cited by examiner]
CN 116344468A · 2023 [cited by examiner]
CN 116978864A · 2023 [cited by examiner]
JP 3726318B2 · 2005 [cited by examiner]
JP 5444484B1 · 2014 [cited by examiner]
KR 20130046335A · 2013 [cited by examiner]
KR 1020190087718A · 2019 [cited by applicant]
KR 1020210100256A · 2021 [cited by applicant]
KR 20230095685A · 2023 [cited by examiner]
WO WO2013062289A1 · 2013 [cited by examiner]
WO WO2023286966A1 · 2023 [cited by examiner]
Office Action issued Oct. 16, 2025 in corresponding Korean Patent Application No. 10-2021-0185403 with English machine translation. [cited by applicant]