3D NAND memory device devices and related electronic systems
A microelectronic device comprises a memory array region, a control logic region, and an additional control logic region. The memory array region comprises a stack structure comprising vertically alternating conductive structures and insulating structures, and vertically extending strings of memory cells within the stack structure. The control logic region underlies the stack structure and comprises control logic devices configured to effectuate a portion of control operations for the vertically extending strings of memory cells. The additional control logic region overlies the stack structure and comprises additional control logic devices configured to effectuate an additional portion of the control operations for the vertically extending strings of memory cells. Methods of forming a microelectronic device, and additional microelectronic devices and electronic systems are also described.
1. A 3D NAND memory device, comprising:
a first die comprising:
a stack structure comprising conductive material and insulative material vertically alternating with the conductive material;
strings of memory cells vertically extending through the stack structure; and
digit line structures electrically coupled to the strings of memory cells;
a second die vertically overlying and bonded to the first die,
the second die comprising complementary metal-oxide-semiconductor (CMOS) circuitry configured to operate at applied voltages within a range of from about 0.7 V to about 1.4 V and to effectuate a portion of control operations for the strings of memory cells of the first die,
the digit line structures of the first die vertically interposed between the stack structure of the first die and the CMOS circuitry of the second die; and
a third die vertically underlying and bonded to the first die, the third die comprising additional CMOS circuitry configured to operate at additional applied voltages above upper operational voltages of the CMOS circuitry of the second die and to effectuate an additional portion of the control operations for the strings of memory cells of the first die.
2. The 3D NAND memory device of claim 1 , wherein:
the first die further comprises first conductive bond pads vertically overlying and electrically coupled to the digit line structures; and
the second die further comprises second conductive bond pads vertically underlying and electrically coupled to the CMOS circuitry, the second conductive bond pads of the second die bonded to the first conductive bond pads of the first die.
3. The 3D NAND memory device of claim 2 , wherein the first conductive bond pads and the second conductive bond pads respectively comprise copper.
4. A 3D NAND memory device, comprising:
a first die comprising:
a stack structure comprising conductive material and insulative material vertically alternating with the conductive material;
strings of memory cells vertically extending through the stack structure; and
a conductive contact structure horizontally offset from the strings of memory cells and vertically extending through the stack structure;
a second die vertically overlying and bonded to the first die, the second die comprising complementary metal-oxide-semiconductor (CMOS) circuitry configured to operate at applied voltages within a range of from about 0.7 V to about 1.4 V and to effectuate a portion of control operations for the strings of memory cells of the first die; and
a third die vertically underlying and bonded to the first die,
the third die comprising additional CMOS circuitry configured to operate at additional applied voltages above upper operational voltages of the CMOS circuitry of the second die and to effectuate an additional portion of the control operations for the strings of memory cells of the first die,
the conductive contact structure of the first die electrically coupling features of the second die to additional features of the third die.
5. The 3D NAND memory device of claim 1 , wherein transistors of the CMOS circuitry of the second die are vertically inverted relative to additional transistors of the additional CMOS circuitry of the third die.
6. The 3D NAND memory device of claim 1 , wherein:
the first die further comprises conductive bond pad structures vertically underlying the stack structure; and
the third die further comprises additional conductive bond pad structures vertically overlying and electrically coupled to the additional CMOS circuitry, each of the additional conductive bond pad structures of the third die horizontally overlapping and electrically coupled to a respective one of the conductive bond pad structures of the first die.
7. A 3D NAND memory device, comprising:
a first die comprising:
a stack structure comprising conductive material and insulative material vertically alternating with the conductive material; and
strings of memory cells vertically extending through the stack structure;
a second die vertically overlying and bonded to the first die, the second die comprising complementary metal-oxide-semiconductor (CMOS) circuitry configured to operate at applied voltages within a range of from about 0.7 V to about 1.4 V and to effectuate a portion of control operations for the strings of memory cells of the first die; and
a third die vertically underlying and bonded to the first die, the third die comprising:
additional CMOS circuitry configured to operate at additional applied voltages above upper operational voltages of the CMOS circuitry of the second die and to effectuate an additional portion of the control operations for the strings of memory cells of the first die;
a semiconductive structure vertically overlying the additional CMOS circuitry and having a conductively doped region therein, the strings of memory cells of the first die horizontally overlapping and electrically coupled to the conductively doped region of the semiconductive structure; and
a semiconductive pillar structure vertically extending from the semiconductive structure to the additional CMOS circuitry.
8. The 3D NAND memory device of claim 7 , wherein the first die further comprises conductive contact structures with a horizontal area of the conductively doped region of the semiconductive structure of the third die, the conductive contact structures vertically extending completely through the stack structure.
9. A 3D NAND memory device, comprising:
a first die comprising:
a stack structure comprising conductive material and insulative material vertically alternating with the conductive material; and
strings of memory cells vertically extending through the stack structure;
a second die vertically overlying and bonded to the first die, the second die comprising complementary metal-oxide-semiconductor (CMOS) circuitry configured to operate at applied voltages within a range of from about from about 0.9 V to about 1.2 V and to effectuate a portion of control operations for the strings of memory cells of the first die; and
a third die vertically underlying and bonded to the first die, the third die comprising additional CMOS circuitry configured to operate at additional applied voltages above upper operational voltages of the CMOS circuitry of the second die and to effectuate an additional portion of the control operations for the strings of memory cells of the first die.
10. A 3D NAND memory device, comprising:
a memory array die comprising vertically extending strings of memory cells;
a control circuitry die vertically below and attached to the memory array die, the control circuitry die comprising control logic devices configured to effectuate a portion of control operations for the vertically extending strings of memory cells of the memory array die; and
an additional control circuitry die vertically above and attached to the memory array die, the additional control circuitry die comprising additional, relatively higher performance control logic devices configured to:
effectuate an additional portion of the control operations for the vertically extending strings of memory cells of the memory array die; and
operate at one or more lower applied voltages relative to the control logic devices of the control circuitry die.
11. The 3D NAND memory device of claim 10 , wherein:
the one or more lower applied voltages for the additional, relatively higher performance control logic devices are within a range of from about 0.7 V to about 1.2 V; and
the control logic devices of the control circuitry die are configured to operate at one or more other applied voltages greater than about 1.2 V.
12. The 3D NAND memory device of claim 10 , wherein:
the memory array die further comprises conductive digit line structures vertically above and electrically coupled to the vertically extending strings of memory cells; and
the control circuitry die further comprises a conductive source structure vertically below and electrically coupled to the vertically extending strings of memory cells.
13. The 3D NAND memory device of claim 10 , wherein:
the control logic devices of the control circuitry die respectively comprise complementary metal-oxide-semiconductor (CMOS) circuitry including horizontally oriented transistors; and
the additional, relatively higher performance control logic devices of the additional control circuitry die respectively comprise relatively higher performance CMOS circuitry including additional horizontally oriented transistors.
14. The 3D NAND memory device of claim 13 , wherein the horizontally oriented transistors of the CMOS circuitry are vertically inverted as compared to the additional horizontally oriented transistors of the relatively higher performance CMOS circuitry.
15. The 3D NAND memory device of claim 10 , wherein the memory array die is bonded to each of the control circuitry die and the additional control circuitry die.
16. The 3D NAND memory device of claim 10 , wherein the memory array die further comprises conductive contact structures horizontally offset from and vertically overlapping the vertically extending strings of memory cells, the conductive contact structures vertically extending completely through a stack structure comprising conductive material vertically alternating with insulative material.
17. An electronic system, comprising:
a processor device operably coupled to an input device and an output device; and
a 3D NAND memory device operably coupled to the processor device and comprising:
a memory array die comprising:
a stack structure comprising tiers respectively including:
conductive material; and
insulative material vertically neighboring the conductive material;
strings of memory cells vertically extending through the stack structure;
conductive line structures vertically overlying and electrically coupled to the strings of memory cells; and
bond pads vertically overlying and electrically coupled to the conductive line structures;
a control circuitry die vertically overlying and bonded to the memory array die, the control circuitry die comprising:
control logic circuitry configured to operate at applied voltages less than or equal to about 1.4 V and to effectuate a portion of control operations for the strings of memory cells of the memory array die; and
additional bond pads vertically underlying and electrically coupled to the control logic circuitry, the additional bond pads of the control circuitry die bonded to the bond pads of the memory array die; and
an additional control circuitry die vertically underlying and bonded to the memory array die, the additional control circuitry die comprising additional control logic circuitry configured to operate at additional applied voltages above upper operational voltages of the control logic circuitry of the control circuitry die and to effectuate an additional portion of the control operations for the strings of memory cells of the memory array die.