Conformal transfer doping method for Fin-like field effect transistor
Doping techniques for fin-like field effect transistors (FinFETs) are disclosed herein. An exemplary method includes forming a fin structure, forming a doped amorphous layer over a portion of the fin structure, and performing a knock-on implantation process to drive a dopant from the doped amorphous layer into the portion of the fin structure, thereby forming a doped feature. The doped amorphous layer includes a non-crystalline form of a material. In some implementations, the knock-on implantation process crystallizes at least a portion of the doped amorphous layer, such that the portion of the doped amorphous layer becomes a part of the fin structure. In some implementations, the doped amorphous layer includes amorphous silicon, and the knock-on implantation process crystallizes a portion of the doped amorphous silicon layer.
1. A device comprising:
a fin structure disposed over a substrate, the fin structure having a source/drain region and a channel region, the source/drain region of the fin structure including:
a first portion formed of a first semiconductor material;
a second portion formed of the first semiconductor material, the second portion of the fin structure positioned over and around the first portion of the fin structure; and
a silicon-containing layer disposed over and around the second portion of the fin structure, the silicon-containing layer formed of a second semiconductor material that is different than the first semiconductor material, wherein the second portion of the fin structure and the silicon-containing layer both include a dopant at a first concentration that is substantially uniform at any point of the second portion and the silicon-containing layer of the fin structure, wherein the first concentration of the dopant is considered substantially uniform when doping concentrations at any defined number of points of the second portion and the silicon-containing layer are within ±5% of each other;
a gate dielectric layer disposed over the channel region of the fin structure; and
a gate electrode disposed over the gate dielectric layer.
2. The device of claim 1 , wherein the first portion of the fin structure is undoped.
3. The device of claim 1 , wherein the first portion of the fin structure includes the dopant.
4. The device of claim 1 , wherein the first semiconductor material includes SiGe.
5. The device of claim 1 , wherein the channel region of the fin structure is free of the silicon-containing layer.
6. The device of claim 1 , further comprising a dielectric isolation structure disposed on the substrate, and
wherein the first portion of the fin structure interfaces with the dielectric isolation structure.
7. The device of claim 6 , wherein the silicon-containing layer interfaces with the dielectric isolation structure.
8. The device of claim 1 , wherein the silicon-containing layer interfaces with the second portion of the fin structure.
9. A device comprising:
a fin structure disposed on a substrate, the fin structure including:
a first portion including a first semiconductor material, the first portion having a first width;
a second portion disposed along a sidewall of the first portion of the fin structure and having a second width that is different than the first width, the second portion including the first semiconductor material; and
a doped layer disposed along a sidewall of the second portion of the fin structure and having a third width that is different than the second width, the doped layer including a second semiconductor material that is different than the first semiconductor material, wherein the second portion of the fin structure and the doped layer both include a dopant at a first concentration that is substantially uniform at any point of the second portion and the doped layer of the fin structure, wherein the first concentration of the dopant is considered substantially uniform when doping concentrations at any defined number of points of the second portion and the doped layer are within ±5% of each other.
10. The device of claim 9 , wherein the first width of the first portion is greater than the second width of the second portion disposed along the sidewall of the first portion of the fin structure, and
wherein the second width of the second portion is greater than the third width of the doped layer disposed along the sidewall of the second portion of the fin structure.
11. The device of claim 9 , further comprising:
a gate dielectric layer disposed over a portion of the fin structure; and
a gate electrode disposed over the gate dielectric layer.
12. The device of claim 11 , wherein the portion of the fin structure is free of the doped layer.
13. The device of claim 9 , wherein the dopant is a p-type dopant.
14. The device of claim 9 , wherein the dopant is an n-type dopant.
15. The device of claim 9 , wherein the doped layer is part of a source/drain feature.
16. A device comprising:
a fin structure disposed on a substrate, the fin structure including:
a first SiGe portion extending from the substrate, the first SiGe portion including a dopant at a first concentration;
a second SiGe portion disposed directly on the first SiGe portion; and
a doped layer disposed directly on a top surface and opposing sidewall surfaces of the second SiGe portion, the doped layer having a different material composition than the second SiGe portion, wherein the second SiGe portion of the fin structure and the doped layer both include the dopant at a second concentration that is substantially uniform at any point of the second SiGe portion and the doped layer of the fin structure, wherein the second concentration of the dopant is considered substantially uniform when doping concentrations at any defined number of points of the second SiGe portion and the doped layer are within ±5% of each other.
17. The device of claim 16 , further comprising:
a gate dielectric layer disposed over a portion of the fin structure, wherein the gate dielectric layer interfacing with the doped layer; and
a gate electrode disposed over the gate dielectric layer.
18. The device of claim 16 , wherein the dopant is selected from the group consisting of boron, germanium, and indium.
19. The device of claim 16 , wherein the dopant is selected from the group consisting of arsenic and phosphorus.
20. The device of claim 16 , wherein the second concentration of the dopant is greater than the first concentration of the dopant.