3D semiconductor device and structure with metal layers and memory cells
A 3D semiconductor device, the device including: a first level including a first single crystal layer and including first transistors each of which includes a single crystal channel; a first metal layer; a second metal layer overlaying the first metal layer; a second level including second transistors and overlaying the second metal layer, each of first memory cells include at least one second transistor; a third level including third transistors and overlaying the second level; a fourth level including fourth transistors and overlaying the third level, each of second memory cells include at least one fourth transistor, where at least one of the second transistors includes a metal gate, where the first level includes memory control circuits which control writing to the second memory cells, and at least one of the second transistors includes a hafnium oxide gate dielectric.
1 . A 3D semiconductor device, the device comprising:
a first level comprising a first single crystal layer, said first level comprising first transistors,
wherein each of said first transistors comprises a single crystal channel;
a first metal layer;
a second metal layer overlaying said first metal layer;
a second level comprising a plurality of second transistors, said second level overlaying said first level;
a third level comprising a plurality of third transistors, said third level overlaying said second level;
a fourth level comprising a plurality of fourth transistors, said fourth level overlaying said third level,
wherein said second level comprises a plurality of first memory cells,
wherein each of said plurality of first memory cells comprises at least one of said second transistors,
wherein said fourth level comprises a plurality of second memory cells,
wherein each of said plurality of second memory cells comprises at least one of said fourth transistors,
wherein said first level comprises memory control circuits,
wherein at least one of said second transistors comprises a metal gate,
wherein said memory control circuits control writing to said plurality of second memory cells, and
wherein at least one of said second transistors comprises a hafnium oxide gate dielectric.
2 . The device according to claim 1 , further comprising:
metal pads and metal pins for connecting said second level to said first level.
3 . The device according to claim 1 , further comprising:
at least one Phase-Lock-Loop (“PLL”) circuit or at least one Digital-Lock-Loop (“DLL”) circuit.
4 . The device according to claim 1 ,
wherein said first level comprises a plurality of Through Silicon Via (“TSV”).
5 . The device according to claim 1 ,
wherein said memory cells are DRAM type memory cells.
6 . The device according to claim 1 ,
wherein at least one of said first transistors controls power delivery for at least one of said third transistors.
7 . The device according to claim 1 , further comprising:
pads for connecting inputs and outputs of said device to an external device,
wherein said pads are disposed underneath said first single crystal layer.
8 . A 3D semiconductor device, the device comprising:
a first level comprising a first single crystal layer, said first level comprising first transistors,
wherein each of said first transistors comprises a single crystal channel;
a first metal layer;
a second metal layer overlaying said first metal layer;
a second level comprising a plurality of second transistors, said second level overlaying said first level;
a third level comprising a plurality of third transistors, said third level overlaying said second level;
a fourth level comprising a plurality of fourth transistors, said fourth level overlaying said third level,
wherein said second level comprises a plurality of first memory cells,
wherein each of said plurality of first memory cells comprises at least one of said second transistors,
wherein said fourth level comprises a plurality of second memory cells,
wherein each of said plurality of second memory cells comprises at least one of said fourth transistors,
wherein said first level comprises memory control circuits,
wherein at least one of said second transistors comprises a metal gate,
wherein said memory control circuits control writing to said plurality of second memory cells, and
wherein said first level comprises a plurality of Through Silicon Via (“TSV”).
9 . The device according to claim 8 , further comprising:
metal pads and metal pins for connecting said second level to said first level.
10 . The device according to claim 8 , further comprising:
at least one Phase-Lock-Loop (“PLL”) circuit or at least one Digital-Lock-Loop (“DLL”) circuit.
11 . The device according to claim 8 ,
wherein said third level comprises at least four independently controlled memory arrays.
12 . The device according to claim 8 ,
wherein said memory cells are DRAM type memory cells.
13 . The device according to claim 8 ,
wherein at least one of said first transistors controls power delivery for at least one of said third transistors.
14 . The device according to claim 8 , further comprising:
pads for connecting inputs and outputs of said device to an external device,
wherein said pads are disposed underneath said first single crystal layer.
15 . A 3D semiconductor device, the device comprising:
a first level comprising a first single crystal layer, said first level comprising first transistors,
wherein each of said first transistors comprises a single crystal channel;
a first metal layer;
a second metal layer overlaying said first metal layer;
a second level comprising a plurality of second transistors, said second level overlaying said first level;
a third level comprising a plurality of third transistors, said third level overlaying said second level; and
a fourth level comprising a plurality of fourth transistors, said fourth level overlaying said third level,
wherein said second level comprises a plurality of first memory cells,
wherein each of said plurality of first memory cells comprises at least one of said second transistors,
wherein said fourth level comprises a plurality of second memory cells,
wherein each of said plurality of second memory cells comprises at least one of said fourth transistors,
wherein said first level comprises memory control circuits,
wherein at least one of said second transistors comprises a metal gate,
wherein said memory control circuits control reading from said plurality of second memory cells,
wherein said memory control circuits control writing to said plurality of third memory cells, and
wherein said first level is bonded to said second level.
16 . The device according to claim 15 , further comprising:
metal pads and metal pins for connecting said second level to said first level.
17 . The device according to claim 15 , further comprising:
at least one Phase-Lock-Loop (“PLL”) circuit or at least one Digital-Lock-Loop (“DLL”) circuit.
18 . The device according to claim 15 ,
wherein said memory cells are DRAM type memory cells.
19 . The device according to claim 15 ,
wherein at least one of said first transistors controls power delivery for at least one of said third transistors.
20 . The device according to claim 15 ,
wherein said first level comprises a plurality of Through Silicon Via (“TSV”).