Lamp heating module for an epitaxy process chamber
The present disclosure generally relates to an epitaxial chamber for processing of semiconductor substrates. In one example, the epitaxial chamber has a chamber body assembly. The chamber body assembly includes a lower window and an upper window, wherein chamber body assembly, the lower window and the upper window enclose an internal volume. A susceptor assembly is disposed in the internal volume. The epitaxial chamber also has a plurality of temperature control elements. The plurality of temperature control elements include one or more of an upper lamp module, a lower lamp module, an upper heater, a lower heater, or a heated gas passage.
1 . An epitaxial chamber comprising:
a chamber body assembly;
a lower window;
an upper window, wherein chamber body assembly, wherein the lower window and the upper window enclose an internal volume;
a susceptor assembly disposed in the internal volume; and
a plurality of temperature control elements comprising:
an upper lamp module comprising:
an upper module body with a top surface and a bottom surface;
a central axis;
a plurality of lamp apertures disposed from the bottom surface of the upper lamp module towards the top surface of the upper lamp module, the plurality of lamp apertures arranged in a first zone and a second zone, said first zone and said second zone are concentric, said second zone circumscribing the first zone and said second zone located further from the central axis than the first zone, the plurality of lamp apertures comprising:
a lamp base support;
a bulb opening at the bottom surface of the upper lamp module; and an axis of each lamp aperture defined by a centerline through the lamp base support and the bulb opening of each lamp aperture and disposed at an angle to the central axis, wherein a first angle to the central axis of a first axis of a first lamp aperture is not equal to a second angle to the central axis of a second axis of a second lamp aperture, and wherein the axis of each lamp aperture is configured to orient a bulb of each lamp aperture of the upper lamp module at an angle greater than 0 degrees and less than about 45 degrees with respect to the central axis, and that the axis of each lamp aperture in the second zone further from the central axis is at an angle greater than the axis of each lamp aperture in the first zone closer to the central axis;
wherein the top surface of the upper lamp module comprises:
a raised portion of the top surface of the upper lamp module disposed radially outward of the central axis and raised relative to an outer portion of the top surface in a vertical direction;
said outer portion located further from the central axis than the raised portion in a horizontal direction;
wherein the lamp apertures are disposed through the outer portion of the top surface of the upper lamp module and a heated gas passage extending from the top surface to the bottom surface of the upper module body in the vertical direction; said heated gas passage is disposed through the center of the upper module body; and the plurality of temperature control elements further comprising:
a lower lamp module comprising:
a lower module body with a top surface and a bottom surface;
the central axis;
a plurality of lamp apertures disposed from the bottom surface of the lower lamp module towards the top surface of the lower lamp module;
a plurality of lamp apertures comprising:
a lamp base support; and
a bulb opening at the bottom surface of the lower lamp module, wherein each lamp aperture is configured to orient a bulb of each lamp aperture of the lower lamp module at an angle between greater than 0 degrees with respect to the central axis and 45 degrees from the center axis.
2 . The epitaxial chamber of claim 1 , further comprising:
an upper liner disposed inside of the internal volume and adjacent to an inject ring; and
a lower liner disposed inside of the internal volume and adjacent to a base ring.
3 . The epitaxial chamber of claims 2 , wherein the plurality of temperature control elements further comprises:
a lower heater is disposed between the lower liner and the base ring.
4 . The epitaxial chamber of claim 1 , wherein the plurality of lamp apertures are disposed in three distinct zones, each zone comprising 5 to 10 lamp apertures.
5 . The epitaxial chamber of claim 1 further comprising:
a dome heater coupled to the heated gas passage and configured to supply hot air into a plenum bounded in between the upper lamp module and the upper window.
6 . The epitaxial chamber of claim 5 wherein the chamber body assembly further comprises:
a base ring;
an inject ring disposed on top of the base ring;
an upper heater disposed between an inner periphery of the inject ring and an outer periphery of an upper liner; and
a lower heater disposed between a lower liner and the base ring.
7 . The epitaxial chamber of claim 1 , wherein the top surface of the upper lamp module comprises:
the lamp apertures of the upper lamp module disposed through the outer portion of the top surface of the upper lamp module.