IP Library Assignment 017089/0881
Patent Assignment
Reel/Frame 017089/0881

Security Agreement

Recorded: 2006-01-31 Pages: 12
Assignor
ADVANCED ENERGY INDUSTRIES, INC.
Executed: 2005-12-09
Assignee
ADVANCED PLASMA, INC.
3964 RIVERMARK PLAZA #207, SANTA CLARA, CALIFORNIA, 95054
Covered Properties (15)
Sensor Array for Measuring Plasma Characteristics in Plasma Processing Environments
Techniques for Packaging and Encapsulating Components of Diagnostic Plasma Measurement Devices
Diagnostic Plasma Measurement Device Having Patterned Sensors and Features
Electrically Floating Diagnostic Plasma Probe with Ion Property Sensors
Wafer Probe for Measuring Plasma and Surface Characteristics in Plasma Processing Enviroments
Patent: 6,830,650 →
Application: 10/194,526 →
Publication: US 2004/0007326
Vertical Mos Transistor
Patent: 6,777,288 →
Application: 10/290,138 →
Sensor Array for Measuring Plasma Characteristics in Plasma Processing Environments
Patent: 6,902,646 →
Application: 10/640,892 →
Publication: US 2005/0034811
Techniques for packaging and encapsulating components of diagnostic plasma measurement devices
Application: 10/815,124 →
Publication: US 2005/0217796
Diagnostic plasma measurement device having patterned sensors and features
Application: 10/875,954 →
Publication: US 2005/0284570
Electrically floating diagnostic plasma probe with ion property sensors
Application: 10/933,167 →
Publication: US 2006/0043063
Wafer probe for measuring plasma and surface characteristics in plasma processing enviroments
Application: 10/951,084 →
Publication: US 2005/0039852
Wafer Probe for Measuring Plasma and Surface Characteristics in Plasma Processing Environments
Patent: 7,192,505 →
Application: 10/951,162 →
Publication: US 2005/0034812
Diagnostic plasma sensors for endpoint and end-of-life detection
Application: 11/047,256 →
Publication: US 2006/0171848
Sensor Array for Measuring Plasma Characteristics in Plasma Processing Environments
Patent: 8,545,669 →
Application: 11/066,520 →
Publication: US 2005/0151544
Application of in-situ plasma measurements to performance and control of a plasma processing system
Application: 60/653,070 →
Related Assignments (8)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 31, 2005
From: FROMMER, JANE E.; UNAL, KEREM; WICKRAMASINGHE, HEMANTHA K.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 016240/0503 →
Assignment of Assignor's Interest Jan 31, 2005
From: ROCHE, GREGORY A.; CARTER, DANIEL C.; MADSEN, DAVID W.; MAHONEY, LEONARD J.
To: ADVANCED ENERGY INDUSTRIES, INC.
Reel/Frame 016238/0906 →
Corrective Assignment to Correct the Recordal of the Security Agreement Previously Recorded on Reel 017089 Frame 0881. Feb 10, 2006
From: ADVANCED PLASMA, INC.
To: ADVANCED ENERGY INDUSTRIES, INC.
Reel/Frame 017251/0365 →
Assignment of Assignor's Interest Mar 27, 2006
From: AVANCED PLASMA, INC.
To: ADVANCED ENERGY INDUSTRIES, INC.
Reel/Frame 017366/0240 →
Assignment of Assignor's Interest Mar 28, 2006
From: ADVANCED PLASMA, INC.
To: ADVANCED ENERGY INDUSTRIES, INC.
Reel/Frame 017374/0153 →
Assignment of Assignor's Interest Dec 4, 2006
From: ADVANCED ENERGY INDUSTRIES, INC.
To: ONWAFER TECHNOLOGIES, INC.
Reel/Frame 018654/0653 →
Assignment of Assignor's Interest Mar 6, 2007
From: ADVANCED ENERGY INDUSTRIES, INC.
To: ONWAFER TECHNOLOGIES, INC.
Reel/Frame 019002/0096 →
Merger Jan 28, 2008
From: ONWAFER TECHNOLOGIES INC.
To: KLA-TENCOR CORPORATION
Reel/Frame 020417/0596 →