Patent Assignment
Reel/Frame 057993/0178
Release of Security Interest
Recorded: 2021-11-02
Pages: 10
Assignor
GLAS TRUST CORPORATION LIMITED
Executed: 2021-11-01
Assignee
H.C. STARCK INC.
NYMPHENBURGER STRABE 84, MUNICH, 80636, GERMANY
Covered Properties
(45)
Methods of Forming Alpha and Beta Tantalum Films with Controlled and New Microstructures
PCT:
PCT/US2005/009763 ↗
Method of Preparing Primary Refractory Metal
PCT:
PCT/US2006/009174 ↗
Capacitor Grade Tantalum Powder
Patent:
4,957,541 →
Application:
07/265,498 →
Tantalum Production via a Reduction of K2TAF7, with Diluent Salt, with Reducing Agent Provided in a Fast Series of Slug Additions
Patent:
5,442,978 →
Application:
08/245,895 →
Removal of Binder from Ta Products
Patent:
5,470,525 →
Application:
08/269,580 →
Wire-Drawing Lubricant and Method of Use
Patent:
5,743,120 →
Application:
08/439,525 →
Method of Making Vacuum-Packaged, Capacitor-Grade Tantalum Powder.
Patent:
6,079,186 →
Application:
08/472,596 →
Wire-Drawing Lubricant and Method of Use
Patent:
5,676,005 →
Application:
08/622,848 →
Method for Producing Tantalum/Niobium Metal Powders by the Reduction of Their Oxides with Gaseous Magnesium
Patent:
6,171,363 →
Application:
09/073,488 →
Refining of Tantalum and Tantalum Scrap with Carbon
Patent:
6,197,082 →
Application:
09/251,567 →
Low Oxygen Refractory Metal Powder for Powder Metallurgy
Patent:
6,261,337 →
Application:
09/377,077 →
Metal Powders Produced by the Reduction of the Oxides with Gaseous Magnesium
Patent:
6,558,447 →
Application:
09/445,331 →
Capacitor Substrates Made of Refractory Metal Nitrides
Patent:
6,515,846 →
Application:
09/499,857 →
Tantalum and Tantalum Nitride Powder Mixtures for Electrolytic Capacitors Substrates
Patent:
6,554,884 →
Application:
09/695,512 →
Metalothermic Reduction of Refractory Metal Oxides
Low Oxygen Refractory Metal Powder for Powder Metallurgy
Refractory metal plates with uniform texture and methods of making the same
Application:
10/079,286 →
Publication:
US 2002/0112789
Thin Film Capacitor Using Conductive Polymers
Capacitor Substrates Made of Refractory Metal Nitrides
Capacitor-Grade Lead Wires with Increased Tensile Strength and Hardness
Refractory Metal and Alloy Refining by Laser Forming and Melting
Pre-Plating Surface Treatments for Enhanced Galvanic-Corrosion Resistance
Refractory metal annealing bands
Application:
10/543,579 →
Publication:
US 2006/0115372
Molybdenum alloy x-ray targets having uniform grain structure
Application:
10/553,841 →
Publication:
US 2006/0151072
Refractory Metal Pots
Thin Film Capacitor Using Conductive Polymers
Metalothermic Reduction of Refractory Metal Oxides
Molybdenum sputtering targets
Application:
10/931,203 →
Publication:
US 2006/0042728
Magnesium Removal from Magnesium Reduced Metal Powders
Fine Grain Niobium Sheet via Ingot Metallurgy
Refractory Metal Substrate with Improved Thermal Conductivity
Rejuvenation of Refractory Metal Products
Method of Preparing Primary Refractory Metal
Fine grain niobium sheet via ingot metallurgy
Application:
11/216,498 →
Publication:
US 2007/0044873
Sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein
Application:
11/238,366 →
Publication:
US 2007/0071985
Methods of Making Molybdenum Titanium Sputtering Plates and Targets
Method of Making MOO2 Powders, Products Made from MOO2 Powders, Deposition of MOO2 Thin Films, and Methods of Using Such Materials
Capacitor-grade lead wires with increased tensile strength and hardness
Application:
11/388,107 →
Publication:
US 2006/0162822
Process for producing a rotary anode and the anode produced by such process
Application:
11/542,268 →
Publication:
US 2008/0081122
Molybdenum Tubular Sputtering Targets with Uniform Grain Size and Texture
Magnesium Removal From Magnesium Reduced Metal Powders
Application:
11/576,320 →
Publication:
US 2008/0105082
Production of valve metal powders with improved physical and electrical properties
Method of joining tantalum clad steel structures
Application:
11/638,625 →
Publication:
US 2008/0145688
Refractory Metal Substrate with Improved Thermal Conductivity
Application:
11/742,607 →
Publication:
US 2008/0102304
Fine Grained, Non Banded, Refractory Metal Sputtering Targets with a Uniformly Random Crystallographic Orientation, Method for Making Such Film,and Thin Film Based Devices and Products Made Therefrom
Application:
60/915,967 →
Related Assignments
(11)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jun 20, 2018
From: H.C. STARCK GMBH
To: H.C. STARCK TANTALUM AND NIOBIUM GMBH
Reel/Frame 046140/0859 →
Assignment of Assignor's Interest
Aug 14, 2018
From: H.C. STARCK GMBH
To: H.C. STARCK TANTALUM AND NIOBIUM GMBH
Reel/Frame 046798/0094 →
Change of Name
Jul 15, 2020
From: H.C. STARCK TANTALUM AND NIOBIUM GMBH
To: TANIOBIS GMBH
Reel/Frame 053221/0805 →
Security Interest
Nov 1, 2021
From: H.C. STARCK INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 057978/0970 →
Release of Security Interest
Nov 2, 2021
From: GLAS TRUST CORPORATION LIMITED
To: H.C. STARCK INC.
Reel/Frame 058768/0827 →
Release of Security Interest
Nov 2, 2021
From: GLAS TRUST CORPORATION LIMITED
To: H.C. STARCK INC.
Reel/Frame 058769/0242 →
Release of Security Interest
Nov 2, 2021
From: GLAS TRUST CORPORATION LIMITED
To: H.C. STARCK INC.
Reel/Frame 057993/0198 →
Release of Security Interest
Nov 2, 2021
From: GLAS TRUST CORPORATION LIMITED
To: H.C. STARCK INC.
Reel/Frame 057993/0069 →
Release of Security Interest
Nov 2, 2021
From: GLAS TRUST CORPORATION LIMITED
To: H.C. STARCK INC.
Reel/Frame 057993/0103 →
Release of Security Interest
Nov 2, 2021
From: GLAS TRUST CORPORATION LIMITED
To: H.C. STARCK INC.
Reel/Frame 057993/0188 →
Change of Name
Apr 5, 2022
From: H.C. STARCK INC.
To: MATERION NEWTON INC.
Reel/Frame 059596/0925 →