IP Library › Granted Patent US 12,683,123
Granted Patent B2
US 12,683,123 · App. 18/535,724 · Granted Jul 14, 2026

Pulsed voltage waveform biasing of plasma

Inventors: Shreeram Jyoti Dash (San Jose, CA); Michael T. Nichols (Sunnyvale, CA)
Assignee: Applied Materials, Inc.
H01J37/32174H01J37/32935H01J2237/3341
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Quick Facts
Patent No.
US 12,683,123
App. No.
18/535,724
Filed
Dec 11, 2023
Granted
Jul 14, 2026
Kind
B2
Art Unit
2845
USPC
315/111.21
Abstract

Embodiments of the disclosure include apparatus (e.g., plasma processing systems) and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a method for waveform generation, which generally includes delivering a radio frequency (RF) waveform at a frequency for a first period of time using a RF generator and then halting the delivery of the RF waveform for a second period of time, and delivering a pulsed voltage waveform at a first voltage for at least a portion of a third period of time using a pulser, wherein the delivery of the pulsed voltage waveform overlaps with the delivery of the RF waveform during a portion of the second period of time.

Claims (29)

1 . A method for waveform generation, comprising:

delivering a radio frequency (RF) waveform at a frequency for a first period of time using a RF generator and then halting the delivery of the RF waveform for a second period of time to reduce electron temperature and electron density in plasma and produce a near-afterglow plasma state; and

delivering a pulsed voltage waveform at a first voltage for at least a portion of a third period of time using a pulser, wherein the delivery of the pulsed voltage waveform occurs during at least a portion of the near-afterglow plasma state and overlaps with the halting of the delivery of the RF waveform during a portion of the second period of time.

2 . The method of claim 1 , wherein at least one process parameter of the pulsed voltage waveform is adjusted during the near-afterglow plasma state to control ion energy or sheath potential, the process parameter comprising one or more of a pulse duty cycle, voltage setpoint, pulse frequency, or pulse burst length.

3 . The method of claim 1 , further comprising generating a synchronization signal between the RF generator and a pulsed voltage waveform generator to coordinate timing of the RF waveform and the pulsed voltage waveform.

4 . The method of claim 1 , wherein the pulsed voltage waveform comprises a pulse with a positive voltage swing and a negative voltage swing.

5 . The method of claim 1 , wherein the first period of time includes a first sub-period of time and a second sub-period of time, wherein the second period of time includes a third sub-period of time and a fourth sub-period of time, wherein the portion of the second period of time includes the third sub-period of time, and wherein the second sub-period of time begins at an end of the first sub-period of time, the third sub-period of time begins at an end of the second sub-period of time, and the fourth sub-period of time begins at an end of the third sub-period of time.

6 . The method of claim 5 , wherein the first sub-period of time is 20% of a cycle of the RF waveform and the pulsed voltage waveform.

7 . The method of claim 5 , wherein the second sub-period of time is 40% of a cycle of the RF waveform and the pulsed voltage waveform, the third sub-period of time is 20% of a cycle of the RF waveform and the pulsed voltage waveform, and wherein the fourth sub-period of time is 20% of a cycle of the RF waveform and the pulsed voltage waveform.

8 . The method of claim 1 , wherein the pulsed voltage waveform does not overlap with the RF waveform during the portion of the second period of time.

9 . The method of claim 1 , wherein the pulsed voltage waveform overlaps with the RF waveform during the portion of the second period of time.

10 . The method of claim 1 , further comprising:

delivering the RF waveform at the first frequency for a fourth period of time using the RF generator and then halting the delivery of the RF waveform for a fifth period of time; and

delivering the pulsed voltage waveform at the first voltage for at least a portion of a sixth period of time using the pulser, wherein the delivery of the pulsed voltage waveform overlaps with the halting of the delivery of the RF waveform during a portion of the fifth period of time.

11 . A waveform generator, comprising:

a system controller coupled to the waveform generator, the system controller comprising memory that includes computer-executable instructions and one or more processors configured to execute the computer-executable instructions and cause the waveform generator to:

deliver a radio frequency (RF) waveform at a frequency for a first period of time using a RF generator and then halt the delivery of the RF waveform for a second period of time to reduce electron temperature and electron density in plasma and produce a near-afterglow plasma state; and

deliver a pulsed voltage waveform at a first voltage for at least a portion of a third period of time using a pulser, wherein the delivery of the pulsed voltage waveform occurs during at least a portion of the near-afterglow plasma state and overlaps with the halting of the delivery of the RF waveform during a portion of the second period of time.

12 . The waveform generator of claim 11 , wherein at least one process parameter of the pulsed voltage waveform is adjusted during the near-afterglow plasma state to control ion energy or sheath potential, the process parameter comprising one or more of a pulse duty cycle, voltage setpoint, pulse frequency, or pulse burst length.

13 . The waveform generator of claim 11 , wherein a synchronization signal is generated between the RF generator and the waveform generator to coordinate timing of the RF waveform and the pulsed voltage waveform.

14 . The waveform generator of claim 11 , wherein the pulsed voltage waveform comprises a pulse with a positive voltage swing and a negative voltage swing.

15 . The waveform generator of claim 11 , wherein the first period of time includes a first sub-period of time and a second sub-period of time, wherein the second period of time includes a third sub-period of time and a fourth sub-period of time, wherein the portion of the second period of time includes the third sub-period of time, and wherein the second sub-period of time begins at an end of the first sub-period of time, the third sub-period of time begins at an end of the second sub-period of time, and the fourth sub-period of time begins at an end of the third sub-period of time.

16 . The waveform generator of claim 15 , wherein the first sub-period of time is 20% of a cycle of the RF waveform and the pulsed voltage waveform, and wherein the second sub-period of time is 40% of a cycle of the RF waveform and the pulsed voltage waveform.

17 . The waveform generator of claim 15 , wherein the third sub-period of time is 20% of a cycle of the RF waveform and the pulsed voltage waveform, and wherein the fourth sub-period of time is 20% of a cycle of the RF waveform and the pulsed voltage waveform.

18 . The waveform generator of claim 11 , wherein the one or more processors are configured to execute the computer-executable instructions and cause the waveform generator to deliver the pulsed voltage waveform at the first voltage for at least the portion of the third period of time such that the pulsed voltage waveform does not overlap with the RF waveform during the portion of the second period of time.

19 . The waveform generator of claim 11 , wherein the one or more processors are configured to execute the computer-executable instructions and cause the waveform generator to deliver the pulsed voltage waveform at the first voltage for at least the portion of the third period of time such that the pulsed voltage waveform overlaps with the RF waveform during the portion of the second period of time.

20 . The waveform generator of claim 11 , wherein the memory includes further computer-executable instructions which when executed by the one or more processors causes the waveform generator to:

deliver the RF waveform at the first frequency for a fourth period of time using the RF generator and then halting the delivery of the RF waveform for a fifth period of time; and

deliver the pulsed voltage waveform at the first voltage for at least a portion of a sixth period of time using the pulser, wherein the delivery of the pulsed voltage waveform overlaps with the halting of the delivery of the RF waveform during a portion of the fifth period of time.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 12, 2024
From: DASH, SHREERAM JYOTI; NICHOLS, MICHAEL T.
To: APPLIED MATERIALS, INC.
Reel/Frame 067087/0669 →
Continuity (1)
Related Publication 20250191884A1 · Jun 12, 2025
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