IP Library › Granted Patent US 12,238,897
Granted Patent B2
US 12,238,897 · App. 18/079,375 · Granted Feb 25, 2025

Heat dissipation structure, method for manufacturing heat dissipation structure, and electronic apparatus

Inventors: Ryota Watanabe (Kanagawa, JP); Masahiro Kitamura (Kanagawa, JP); Mizuki Itoyama (Kanagawa, JP); Takuroh Kamimura (Kanagawa, JP); Junrong Zhou (Beijing, CN)
Assignee: Lenovo (Singapore) Pte. Ltd.
H05K7/2039G06F1/206
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Quick Facts
Patent No.
US 12,238,897
App. No.
18/079,375
Granted
Feb 25, 2025
Kind
B2
Abstract

A heat dissipation structure, for a heat-generating electric component, includes: a heat dissipator disposed along a surface of the electric component; and a porous material held between the electric component and the heat dissipator. The porous material of the heat dissipation structure is impregnated with heat-transfer fluid. The heat-transfer fluid may include liquid metal.

Claims (39)

1. A heat dissipation structure for a heat-generating electric component, comprising:

a heat dissipator disposed along a surface of the electric component; and

a porous material held between the electric component and the heat dissipator, wherein

the porous material being impregnated with heat-transfer fluid, and

the porous material includes a metal material, and includes nickel at least on the surface.

2. The heat dissipation structure according to claim 1 , wherein

the heat-transfer fluid includes liquid metal.

3. The heat dissipation structure according to claim 1 , wherein

the porous material includes a mesh.

4. The heat dissipation structure according to claim 1 , wherein

the porous material includes a sponge.

5. The heat dissipation structure according to claim 1 , further comprising

a board and a semiconductor chip mounted on the board, wherein

the semiconductor chip includes a substrate and a die, and

the electric component includes the die.

6. An electronic apparatus comprising the heat dissipation structure according to claim 1 .

7. A method for manufacturing a heat dissipation structure for a heat-generating electric component, comprising:

an impregnation step of impregnating a porous material with heat-transfer fluid;

a placing step of placing the porous material impregnated with the heat-transfer fluid on a surface of the electric component; and

a holding step of bringing a heat dissipator into contact with the porous material and holding the porous material between the heat dissipator and the electric component, wherein

the porous material includes a metal material, and includes nickel at least on the surface.

8. The method for manufacturing a heat dissipation structure according to claim 7 , further comprising:

prior to the placing step, a step of applying the heat-transfer fluid to the surface of the electric component.

9. The method for manufacturing a heat dissipation structure according to claim 7 , further comprising:

prior to the holding step, a step of applying the heat-transfer fluid to the surface of the heat dissipator.

10. A heat dissipation structure for a heat-generating electric component, comprising:

a board and a semiconductor chip mounted on the board;

a heat dissipator disposed along a surface of the electric component; and

a porous material held between the electric component and the heat dissipator, wherein

the porous material being impregnated with heat-transfer fluid,

the semiconductor chip includes a substrate and a die, and

the electric component includes the die.

11. A method for manufacturing a heat dissipation structure for a heat-generating electric component on a board, comprising:

an impregnation step of impregnating a porous material with heat-transfer fluid;

a placing step of placing the porous material impregnated with the heat-transfer fluid on a surface of the electric component; and

a holding step of bringing a heat dissipator into contact with the porous material and holding the porous material between the heat dissipator and the electric component, wherein

a semiconductor chip is mounted on the board,

the semiconductor chip includes a substrate and a die, and

the electric component includes the die.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 17, 2023
From: WATANABE, RYOTA; KITAMURA, MASAHIRO; ITOYAMA, MIZUKI; KAMIMURA, TAKUROH; ZHOU, JUNRONG
To: LENOVO (SINGAPORE) PTE. LTD.
Reel/Frame 062398/0488 →
Priority Claims (1)
JP 2022-001927 · Jan 7, 2022 · national
Continuity (1)
Related Publication 20230240047A1 · Jul 27, 2023
References Cited (32)
US 5561590A · Norell · 1996 [cited by examiner]
US 5658831A · Layton · 1997 [cited by examiner]
US 10514214B2 · Baldwin · 2019 [cited by examiner]
US 10741474B2 · Stegmeier · 2020 [cited by examiner]
US 11037862B2 · Baueregger · 2021 [cited by examiner]
US 11963333B2 · Kitamura · 2024 [cited by examiner]
US 20020108743A1 · Wirtz · 2002 [cited by examiner]
US 20050155752A1 · Larson et al. · 2005 [cited by applicant]
US 20060146503A1 · Kubo · 2006 [cited by examiner]
US 20060157223A1 · Gelorme et al. · 2006 [cited by applicant]
US 20170307308A1 · Baldwin · 2017 [cited by examiner]
US 20180162098A1 · Joo · 2018 [cited by applicant]
US 20180301392A1 · Stegmeier · 2018 [cited by examiner]
US 20210136956A1 · Paavola · 2021 [cited by examiner]
US 20210337696A1 · Lin · 2021 [cited by examiner]
US 20220375816A1 · Berntson · 2022 [cited by examiner]
US 20230180441A1 · Lin · 2023 [cited by examiner]
US 20230207419A1 · Kitamura · 2023 [cited by examiner]
US 20230240047A1 · Watanabe · 2023 [cited by examiner]
US 20230361071A1 · Zinn · 2023 [cited by examiner]
US 20230403823A1 · Kitamura · 2023 [cited by examiner]
US 20240014098A1 · Watanabe · 2024 [cited by examiner]
US 20240038710A1 · Hashiba · 2024 [cited by examiner]
US 20240121916A1 · Kitamura · 2024 [cited by examiner]
US 20240258198A1 · Wang · 2024 [cited by examiner]
JP S5548953A · 1980 [cited by applicant]
JP H08508611A · 1996 [cited by applicant]
JP 2003332505A · 2003 [cited by applicant]
JP 2004146819A · 2004 [cited by applicant]
JP 2008527737A · 2008 [cited by applicant]
JP 2008205383A · 2008 [cited by applicant]
Extended European Search Report issued in corresponding European Patent Application No. EP 22209077.1 dated Jun. 6, 2023 (72 pages). [cited by applicant]
Cited By (1)
US 12,721,169