Multi-layer line structure
A multi-layer line structure including a substrate, a lower layer Cu line located on the substrate, an upper layer Cu line located on an insulating layer including an inorganic film located on the lower layer Cu line and an organic resin film located on the inorganic film, and a via connection part located in a via connection hole running in an up-down direction through the insulating layer in an area where the lower layer Cu line and the upper layer Cu line overlap each other is provided. The via connection part includes a barrier conductive layer located on a part of the lower layer Cu line exposed to a bottom part of the via connection hole and on an inner wall of the via connection hole.
1. A multi-layer line structure comprising:
a first line layer;
a first organic resin film located on the first line layer, the first organic resin film covering and being in contact with a side surface of the first line layer and at least a part of the top surface of the first line layer;
a second line layer located on the first organic resin film;
an insulating layer located on the second line layer, the insulating layer including an inorganic layer and a second organic resin film, the inorganic layer covering and being in contact with a side surface of the second line layer and at least a part of the top surface of the second line layer, and the second organic resin film being located on the inorganic layer;
a third line layer located on the second organic resin film; and
a third organic resin film located on the third line layer, the third organic resin film covering and being in contact with a side surface of the third line layer and at least a part of the top surface of the third line layer.
2. The multi-layer line structure according to claim 1 , wherein the inorganic layer includes a first inorganic film located on the second line layer and a second inorganic film located on the first inorganic film.
3. The multi-layer line structure according to claim 1 , further comprising a via connection part located in a via connection hole running in an up-down direction through the insulating layer in an area where the second line layer and the third line layer overlap each other.
4. The multi-layer line structure according to claim 1 , further comprising:
a fourth line layer located under the first line layer; and
a fourth organic resin film located between the fourth line layer and the first line layer, the fourth organic resin film covering and being in contact with a side surface of the fourth line layer and at least a part of the top surface of the fourth line layer.
5. The multi-layer line structure according to claim 1 , further comprising:
a fourth line layer located on the third organic resin film; and
a fourth organic resin film located on the fourth line layer, the fourth organic resin film covering and being in contact with a side surface of the fourth line layer and at least a part of the top surface of the fourth line layer.
6. A multi-layer line structure comprising:
a first line layer;
a first organic resin film located on the first line layer, the first organic resin film covering and being in contact with a side surface of the first line layer and at least a part of the top surface of the first line layer;
a second line layer located on the first organic resin film;
a second organic resin film located on the second line layer, the second organic resin film covering and being in contact with a side surface of the second line layer and at least a part of the top surface of the second line layer;
a third line layer located on the second organic resin film; and
an insulating layer located on the third line layer, the insulating layer including an inorganic layer and a third organic resin film, the inorganic layer covering and being in contact with a side surface of the third line layer and at least a part of the top surface of the third line layer, and the third organic resin film being located on the inorganic layer.
7. The multi-layer line structure according to claim 6 , wherein
the inorganic layer includes a first inorganic film located on the third line layer and a second inorganic film located on the first inorganic film.
8. The multi-layer line structure according to claim 6 , further comprising a via connection part located in a via connection hole running in an up-down direction through the second organic resin film in an area where the second line layer and the third line layer overlap each other.
9. The multi-layer line structure according to claim 6 , further comprising:
a fourth line layer located under the first line layer; and
a fourth organic resin film located between the fourth line layer and the first line layer, the fourth organic resin film covering and being in contact with a side surface of the fourth line layer and at least a part of the top surface of the fourth line layer.
10. The multi-layer line structure according to claim 6 , further comprising:
a fourth line layer located on the third organic resin film; and
a fourth organic resin film located on the fourth line layer, the fourth organic resin film covering and being in contact with a side surface of the fourth line layer and at least a part of the top surface of the fourth line layer.