IP Library › Granted Patent US 12,591,005
Granted Patent B2
US 12,591,005 · App. 18/321,314 · Granted Mar 31, 2026

Testing elements for bonded structures

Inventors: Belgacem Haba (Saratoga, CA); Christopher Aubuchon (San Jose, CA)
Assignee: Adeia Semiconductor Bonding Technologies Inc.
G01R31/2884
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,591,005
App. No.
18/321,314
Filed
May 22, 2023
Granted
Mar 31, 2026
Kind
B2
Art Unit
2858
USPC
324/762.01
Abstract

A bonded structure for testing a semiconductor device and a method for testing semiconductor devices is disclosed. The bonded structure may comprise a testing element and one or more semiconductor element. The testing element may comprise a testing circuitry. The testing element may be bonded to a semiconductor device or embedded within a semiconductor device. The testing element may be configured to test the semiconductor device. The testing element may be configured to test a first semiconductor device to which it is bonded as well as other semiconductor devices bonded to the first semiconductor device.

Claims (39)

1 . A bonded structure comprising;

a first semiconductor element comprising a first active circuitry; and

a testing element comprising a testing circuitry, the testing element directly bonded to the first semiconductor element without an adhesive along a bonding interface;

wherein the testing circuitry is configured to test functionality of at least a portion of the first active circuitry of the first semiconductor element during operation of the bonded structure by transmitting one or more signals to the first active circuitry and receiving a return signal emitted by the tested active circuitry, wherein the one or more signals probe the one or more portions of the first active circuitry; and

wherein the testing circuitry processes the received return signal during operation of the bonded structure to determine whether the tested active circuitry of the first semiconductor element is functional or non-functional.

2 . The bonded structure of claim 1 , wherein the testing element further comprises a memory configured to store a result of the test.

3 . The bonded structure of claim 1 , wherein the testing element is smaller than the first semiconductor element.

4 . The bonded structure of claim 1 , wherein a first nonconductive bonding layer of the first semiconductor element is directly bonded to a second nonconductive bonding layer of the testing element without an intervening adhesive; and

wherein a first contact feature of the first semiconductor element is directly bonded to a second contact feature of the testing element without an intervening adhesive.

5 . The bonded structure of claim 1 , wherein the testing element further comprises a plurality of signal contact pads.

6 . The bonded structure of claim 5 , wherein a majority of the plurality of signal contact pads are configured to test at least the portion of the first active circuitry of the first semiconductor element.

7 . A bonded structure comprising;

a first semiconductor element comprising a testing circuitry; and

a second semiconductor element directly bonded to the first semiconductor element without an adhesive along a bonding interface, the second semiconductor element comprising a first active circuitry;

wherein the testing circuitry is configured to test functionality of at least a portion of the first active circuitry of the second semiconductor element.

8 . The bonded structure of claim 7 , wherein the testing circuitry is further configured to store a result of the functionality of at least the portion of the first active circuitry.

9 . The bonded structure of claim 7 , wherein a first nonconductive bonding layer of the first semiconductor element is directly bonded to a second nonconductive layer of the second semiconductor element without an intervening adhesive; and

wherein a first contact feature of the first semiconductor element is directly bonded to a second contact feature of the second semiconductor element without an intervening adhesive.

10 . The bonded structure of claim 7 , further comprising a third semiconductor element comprising a second active circuitry, the third semiconductor element directly bonded to the second semiconductor element, the testing circuitry configured to test functionality of at least a portion of the second active circuitry.

11 . The bonded structure of claim 10 , further comprising a fourth semiconductor element comprising a third active circuitry, the fourth semiconductor element directly bonded to the third semiconductor element.

12 . The bonded structure of claim 11 , wherein the first semiconductor element further comprises a fourth active circuitry.

13 . The bonded structure of claim 12 , wherein the testing circuitry of the first semiconductor element is configured to test at least a portion of the functionality of the first active circuitry, the second active circuitry, the third active circuitry, and/or the fourth active circuitry.

14 . The bonded structure of claim 7 , further comprising a third semiconductor element comprising a second active circuitry, the third semiconductor element directly bonded to the first semiconductor element, wherein the testing circuitry is configured to test functionality of at least a portion of the second active circuitry.

15 . The bonded structure of claim 7 , wherein the first semiconductor element comprises a testing chip.

16 . The bonded structure of claim 15 , wherein the testing chip is configured to only test the active circuitry of one or more other semiconductor elements and is devoid of other active circuitry.

17 . The bonded structure of claim 16 , further comprising a third semiconductor element comprising a second active circuitry and a second bonding layer bonded to the second semiconductor element without an adhesive, wherein the testing circuitry is configured to test functionality of at least a portion of the second active circuitry.

18 . The bonded structure of claim 17 , further comprising a fourth semiconductor element comprising a third active circuitry and a third bonding layer bonded to the second semiconductor element without an adhesive, wherein the testing circuitry is configured to test functionality of at least a portion of the third active circuitry.

19 . The bonded structure of claim 18 , wherein the testing circuitry is configured to transmit one or more signals to the first active circuitry.

20 . The bonded structure of claim 19 , wherein the one or more signals probe one or more portions of the first active circuitry.

21 . The bonded structure of claim 20 , wherein:

the first active circuitry emits a return signal and the return signal is conveyed from the first active circuitry to the testing circuitry; and

the testing circuitry is configured to analyze the return signal and transmit an indication signal to a first device.

22 . A bonded structure comprising:

a first semiconductor element comprising a first active circuitry;

a first nonconductive bonding layer of the first semiconductor element at least partially defining a direct bonding surface of the bonded structure; and

one or more traces connected to the first active circuitry and extending at least partially into the first nonconductive bonding layer, wherein the one or more traces is configured to provide electrical communication between the first active circuitry and a testing element, the one or more traces terminating at or below the direct bonding surface.

23 . The bonded structure of claim 22 , further comprising a first contact feature at least partially embedded within the first nonconductive bonding layer and connected to the one or more traces, the first contact feature configured to directly bond to a corresponding second contact feature of the testing element.

24 . The bonded structure of claim 22 , further comprising a plurality of contact features at least partially embedded in the first nonconductive bonding layer, wherein the first nonconductive bonding layer and the plurality of contact features cooperate to at least partially define a bonding surface for direct hybrid bonding.

25 . The bonded structure of claim 22 , wherein the one or more traces are not connected to a contact pad at the direct bonding surface of the bonded structure.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 28, 2023
From: HABA, BELGACEM; AUBUCHON, CHRISTOPHER
To: ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC.
Reel/Frame 065061/0517 →
Continuity (2)
Provisional Application 63344772 · May 23, 2022
Related Publication 20230375613A1 · Nov 23, 2023
References Cited (298)
US 5753536A · Sugiyama et al. · 1998 [cited by applicant]
US 5771555A · Eda et al. · 1998 [cited by applicant]
US 6080640A · Gardner et al. · 2000 [cited by applicant]
US 6423640B1 · Lee et al. · 2002 [cited by applicant]
US 6465892B1 · Suga · 2002 [cited by applicant]
US 6675469B1 · Haba et al. · 2004 [cited by applicant]
US 6887769B2 · Kellar et al. · 2005 [cited by applicant]
US 6908027B2 · Tolchinsky et al. · 2005 [cited by applicant]
US 7045453B2 · Canaperi et al. · 2006 [cited by applicant]
US 7105980B2 · Abbott et al. · 2006 [cited by applicant]
US 7193423B1 · Dalton et al. · 2007 [cited by applicant]
US 7660776B1 · Kious · 2010 [cited by examiner]
US 7750488B2 · Patti et al. · 2010 [cited by applicant]
US 7803693B2 · Trezza · 2010 [cited by applicant]
US 8183127B2 · Patti et al. · 2012 [cited by applicant]
US 8349635B1 · Gan et al. · 2013 [cited by applicant]
US 8377798B2 · Peng et al. · 2013 [cited by applicant]
US 8441131B2 · Ryan · 2013 [cited by applicant]
US 8476165B2 · Trickett et al. · 2013 [cited by applicant]
US 8482132B2 · Yang et al. · 2013 [cited by applicant]
US 8501537B2 · Sadaka et al. · 2013 [cited by applicant]
US 8524533B2 · Tong et al. · 2013 [cited by applicant]
US 8566612B2 · Davis et al. · 2013 [cited by applicant]
US 8620164B2 · Heck et al. · 2013 [cited by applicant]
US 8647987B2 · Yang et al. · 2014 [cited by applicant]
US 8697493B2 · Sadaka · 2014 [cited by applicant]
US 8716105B2 · Sadaka et al. · 2014 [cited by applicant]
US 8802538B1 · Liu · 2014 [cited by applicant]
US 8809123B2 · Liu et al. · 2014 [cited by applicant]
US 8841002B2 · Tong · 2014 [cited by applicant]
US 9093350B2 · Endo et al. · 2015 [cited by applicant]
US 9142517B2 · Liu et al. · 2015 [cited by applicant]
US 9171756B2 · Enquist et al. · 2015 [cited by applicant]
US 9184125B2 · Enquist et al. · 2015 [cited by applicant]
US 9224704B2 · Landru · 2015 [cited by applicant]
US 9230941B2 · Chen et al. · 2016 [cited by applicant]
US 9257399B2 · Kuang et al. · 2016 [cited by applicant]
US 9299736B2 · Chen et al. · 2016 [cited by applicant]
US 9312229B2 · Chen et al. · 2016 [cited by applicant]
US 9331149B2 · Tong et al. · 2016 [cited by applicant]
US 9337235B2 · Chen et al. · 2016 [cited by applicant]
US 9385024B2 · Tong et al. · 2016 [cited by applicant]
US 9394161B2 · Cheng et al. · 2016 [cited by applicant]
US 9431368B2 · Enquist et al. · 2016 [cited by applicant]
US 9437572B2 · Chen et al. · 2016 [cited by applicant]
US 9443796B2 · Chou et al. · 2016 [cited by applicant]
US 9461007B2 · Chun et al. · 2016 [cited by applicant]
US 9496239B1 · Edelstein et al. · 2016 [cited by applicant]
US 9536848B2 · England et al. · 2017 [cited by applicant]
US 9559081B1 · Lai et al. · 2017 [cited by applicant]
US 9620481B2 · Edelstein et al. · 2017 [cited by applicant]
US 9656852B2 · Cheng et al. · 2017 [cited by applicant]
US 9723716B2 · Meinhold · 2017 [cited by applicant]
US 9728521B2 · Tsai et al. · 2017 [cited by applicant]
US 9741620B2 · Uzoh et al. · 2017 [cited by applicant]
US 9799587B2 · Fujii et al. · 2017 [cited by applicant]
US 9852988B2 · Enquist et al. · 2017 [cited by applicant]
US 9893004B2 · Yazdani · 2018 [cited by applicant]
US 9899442B2 · Katkar · 2018 [cited by applicant]
US 9929050B2 · Lin · 2018 [cited by applicant]
US 9941241B2 · Edelstein et al. · 2018 [cited by applicant]
US 9941243B2 · Kim et al. · 2018 [cited by applicant]
US 9953941B2 · Enquist · 2018 [cited by applicant]
US 9960142B2 · Chen et al. · 2018 [cited by applicant]
US 10002844B1 · Wang et al. · 2018 [cited by applicant]
US 10026605B2 · Doub et al. · 2018 [cited by applicant]
US 10075657B2 · Fahim et al. · 2018 [cited by applicant]
US 10204893B2 · Uzoh et al. · 2019 [cited by applicant]
US 10269756B2 · Uzoh · 2019 [cited by applicant]
US 10276619B2 · Kao et al. · 2019 [cited by applicant]
US 10276909B2 · Huang et al. · 2019 [cited by applicant]
US 10418277B2 · Cheng et al. · 2019 [cited by applicant]
US 10446456B2 · Shen et al. · 2019 [cited by applicant]
US 10446487B2 · Huang et al. · 2019 [cited by applicant]
US 10446532B2 · Uzoh et al. · 2019 [cited by applicant]
US 10508030B2 · Katkar et al. · 2019 [cited by applicant]
US 10522499B2 · Enquist et al. · 2019 [cited by applicant]
US 10637233B2 · Hao · 2020 [cited by examiner]
US 10707087B2 · Uzoh et al. · 2020 [cited by applicant]
US 10784191B2 · Huang et al. · 2020 [cited by applicant]
US 10790262B2 · Uzoh et al. · 2020 [cited by applicant]
US 10840135B2 · Uzoh · 2020 [cited by applicant]
US 10840205B2 · Fountain, Jr. et al. · 2020 [cited by applicant]
US 10854578B2 · Morein · 2020 [cited by applicant]
US 10879212B2 · Uzoh et al. · 2020 [cited by applicant]
US 10886177B2 · DeLaCruz et al. · 2021 [cited by applicant]
US 10892246B2 · Uzoh · 2021 [cited by applicant]
US 10923408B2 · Huang et al. · 2021 [cited by applicant]
US 10923413B2 · DeLaCruz · 2021 [cited by applicant]
US 10950547B2 · Mohammed et al. · 2021 [cited by applicant]
US 10964664B2 · Mandalapu et al. · 2021 [cited by applicant]
US 10985133B2 · Uzoh · 2021 [cited by applicant]
US 10991804B2 · DeLaCruz et al. · 2021 [cited by applicant]
US 10998292B2 · Lee et al. · 2021 [cited by applicant]
US 11004757B2 · Katkar et al. · 2021 [cited by applicant]
US 11011494B2 · Gao et al. · 2021 [cited by applicant]
US 11011503B2 · Wang et al. · 2021 [cited by applicant]
US 11031285B2 · Katkar et al. · 2021 [cited by applicant]
US 11037919B2 · Uzoh et al. · 2021 [cited by applicant]
US 11056348B2 · Theil · 2021 [cited by applicant]
US 11069734B2 · Katkar · 2021 [cited by applicant]
US 11088099B2 · Katkar et al. · 2021 [cited by applicant]
US 11127738B2 · DeLaCruz et al. · 2021 [cited by applicant]
US 11158573B2 · Uzoh et al. · 2021 [cited by applicant]
US 11158606B2 · Gao et al. · 2021 [cited by applicant]
US 11169326B2 · Huang et al. · 2021 [cited by applicant]
US 11171117B2 · Gao et al. · 2021 [cited by applicant]
US 11176450B2 · Teig et al. · 2021 [cited by applicant]
US 11195748B2 · Uzoh et al. · 2021 [cited by applicant]
US 11205625B2 · DeLaCruz et al. · 2021 [cited by applicant]
US 11244920B2 · Uzoh · 2022 [cited by applicant]
US 11256004B2 · Haba et al. · 2022 [cited by applicant]
US 11264357B1 · DeLaCruz et al. · 2022 [cited by applicant]
US 11276676B2 · Enquist et al. · 2022 [cited by applicant]
US 11296044B2 · Gao et al. · 2022 [cited by applicant]
US 11296053B2 · Uzoh et al. · 2022 [cited by applicant]
US 11329034B2 · Tao et al. · 2022 [cited by applicant]
US 11348898B2 · DeLaCruz et al. · 2022 [cited by applicant]
US 11355404B2 · Gao et al. · 2022 [cited by applicant]
US 11355443B2 · Huang et al. · 2022 [cited by applicant]
US 11367652B2 · Uzoh et al. · 2022 [cited by applicant]
US 11373963B2 · DeLaCruz et al. · 2022 [cited by applicant]
US 11380597B2 · Katkar et al. · 2022 [cited by applicant]
US 11385278B2 · DeLaCruz et al. · 2022 [cited by applicant]
US 11387202B2 · Haba et al. · 2022 [cited by applicant]
US 11387214B2 · Wang et al. · 2022 [cited by applicant]
US 11393779B2 · Gao et al. · 2022 [cited by applicant]
US 11462419B2 · Haba · 2022 [cited by applicant]
US 11476213B2 · Haba et al. · 2022 [cited by applicant]
US 11500010B2 · Rowling · 2022 [cited by examiner]
US 11515291B2 · DeLaCruz et al. · 2022 [cited by applicant]
US 11610846B2 · Haba et al. · 2023 [cited by applicant]
US 11728287B2 · DeLaCruz et al. · 2023 [cited by applicant]
US 11848284B2 · DeLaCruz et al. · 2023 [cited by applicant]
US 20030221152A1 · Volkerink · 2003 [cited by examiner]
US 20040084414A1 · Sakai et al. · 2004 [cited by applicant]
US 20040175850A1 · Shimizu et al. · 2004 [cited by applicant]
US 20060057945A1 · Hsu et al. · 2006 [cited by applicant]
US 20070111386A1 · Kim et al. · 2007 [cited by applicant]
US 20080088996A1 · Bonvalot et al. · 2008 [cited by applicant]
US 20140175655A1 · Chen et al. · 2014 [cited by applicant]
US 20140264739A1 · Morrow et al. · 2014 [cited by applicant]
US 20150046612A1 · Gupta · 2015 [cited by applicant]
US 20150064498A1 · Tong · 2015 [cited by applicant]
US 20160343682A1 · Kawasaki · 2016 [cited by applicant]
US 20170047260A1 · Huang et al. · 2017 [cited by applicant]
US 20180106851A1 · Schweitzer, III · 2018 [cited by examiner]
US 20180151247A1 · Sato · 2018 [cited by applicant]
US 20180175012A1 · Wu et al. · 2018 [cited by applicant]
US 20180182639A1 · Uzoh et al. · 2018 [cited by applicant]
US 20180182666A1 · Uzoh et al. · 2018 [cited by applicant]
US 20180190580A1 · Haba et al. · 2018 [cited by applicant]
US 20180190583A1 · DeLaCruz et al. · 2018 [cited by applicant]
US 20180219038A1 · Gambino et al. · 2018 [cited by applicant]
US 20180323177A1 · Yu et al. · 2018 [cited by applicant]
US 20180323227A1 · Zhang et al. · 2018 [cited by applicant]
US 20180331066A1 · Uzoh et al. · 2018 [cited by applicant]
US 20190115277A1 · Yu et al. · 2019 [cited by applicant]
US 20190131277A1 · Yang et al. · 2019 [cited by applicant]
US 20190170814A1 · Yun · 2019 [cited by examiner]
US 20190179785A1 · Keeth et al. · 2019 [cited by applicant]
US 20190333550A1 · Fisch · 2019 [cited by applicant]
US 20190385935A1 · Gao et al. · 2019 [cited by applicant]
US 20200013765A1 · Fountain, Jr. et al. · 2020 [cited by applicant]
US 20200035641A1 · Fountain, Jr. et al. · 2020 [cited by applicant]
US 20200091115A1 · Wu et al. · 2020 [cited by applicant]
US 20200133902A1 · Tang et al. · 2020 [cited by applicant]
US 20200294908A1 · Haba et al. · 2020 [cited by applicant]
US 20200328162A1 · Haba et al. · 2020 [cited by applicant]
US 20200395321A1 · Katkar et al. · 2020 [cited by applicant]
US 20210098412A1 · Haba et al. · 2021 [cited by applicant]
US 20210118864A1 · DeLaCruz et al. · 2021 [cited by applicant]
US 20210143125A1 · DeLaCruz et al. · 2021 [cited by applicant]
US 20210181510A1 · Katkar et al. · 2021 [cited by applicant]
US 20210193603A1 · DeLaCruz et al. · 2021 [cited by applicant]
US 20210193624A1 · DeLaCruz et al. · 2021 [cited by applicant]
US 20210193625A1 · Katkar et al. · 2021 [cited by applicant]
US 20210242152A1 · Fountain, Jr. et al. · 2021 [cited by applicant]
US 20210265313A1 · Chen et al. · 2021 [cited by applicant]
US 20210296282A1 · Gao et al. · 2021 [cited by applicant]
US 20210305202A1 · Uzoh et al. · 2021 [cited by applicant]
US 20210366820A1 · Uzoh · 2021 [cited by applicant]
US 20210407941A1 · Haba · 2021 [cited by applicant]
US 20220077063A1 · Haba · 2022 [cited by applicant]
US 20220077087A1 · Haba · 2022 [cited by applicant]
US 20220102224A1 · An et al. · 2022 [cited by applicant]
US 20220139867A1 · Uzoh · 2022 [cited by applicant]
US 20220139869A1 · Gao et al. · 2022 [cited by applicant]
US 20220208650A1 · Gao et al. · 2022 [cited by applicant]
US 20220208702A1 · Uzoh · 2022 [cited by applicant]
US 20220208723A1 · Katkar et al. · 2022 [cited by applicant]
US 20220237138A1 · Lanka et al. · 2022 [cited by applicant]
US 20220246497A1 · Fountain, Jr. et al. · 2022 [cited by applicant]
US 20220285303A1 · Mirkarimi et al. · 2022 [cited by applicant]
US 20220318111A1 · Choudhary et al. · 2022 [cited by applicant]
US 20220319901A1 · Suwito et al. · 2022 [cited by applicant]
US 20220320035A1 · Uzoh et al. · 2022 [cited by applicant]
US 20220320036A1 · Gao et al. · 2022 [cited by applicant]
US 20230005850A1 · Fountain, Jr. · 2023 [cited by applicant]
US 20230019869A1 · Mirkarimi et al. · 2023 [cited by applicant]
US 20230036441A1 · Haba et al. · 2023 [cited by applicant]
US 20230067677A1 · Lee et al. · 2023 [cited by applicant]
US 20230069183A1 · Haba · 2023 [cited by applicant]
US 20230100032A1 · Haba et al. · 2023 [cited by applicant]
US 20230115122A1 · Uzoh et al. · 2023 [cited by applicant]
US 20230122531A1 · Uzoh · 2023 [cited by applicant]
US 20230123423A1 · Gao et al. · 2023 [cited by applicant]
US 20230125395A1 · Gao et al. · 2023 [cited by applicant]
US 20230130259A1 · Haba et al. · 2023 [cited by applicant]
US 20230132632A1 · Katkar et al. · 2023 [cited by applicant]
US 20230140107A1 · Uzoh et al. · 2023 [cited by applicant]
US 20230142680A1 · Guevara et al. · 2023 [cited by applicant]
US 20230154816A1 · Haba et al. · 2023 [cited by applicant]
US 20230154828A1 · Haba et al. · 2023 [cited by applicant]
US 20230187264A1 · Uzoh et al. · 2023 [cited by applicant]
US 20230187317A1 · Uzoh · 2023 [cited by applicant]
US 20230187412A1 · Gao et al. · 2023 [cited by applicant]
US 20230197453A1 · Fountain, Jr. et al. · 2023 [cited by applicant]
US 20230197496A1 · Theil · 2023 [cited by applicant]
US 20230197559A1 · Haba et al. · 2023 [cited by applicant]
US 20230197560A1 · Katkar et al. · 2023 [cited by applicant]
US 20230197655A1 · Theil et al. · 2023 [cited by applicant]
US 20230207402A1 · Fountain, Jr. et al. · 2023 [cited by applicant]
US 20230207437A1 · Haba · 2023 [cited by applicant]
US 20230207474A1 · Uzoh et al. · 2023 [cited by applicant]
US 20230207514A1 · Gao et al. · 2023 [cited by applicant]
US 20230215836A1 · Haba et al. · 2023 [cited by applicant]
US 20230245950A1 · Haba et al. · 2023 [cited by applicant]
US 20230268300A1 · Uzoh et al. · 2023 [cited by applicant]
US 20230343734A1 · Uzoh et al. · 2023 [cited by applicant]
US 20230360950A1 · Gao · 2023 [cited by applicant]
US 20230361074A1 · Uzoh et al. · 2023 [cited by applicant]
US 20230369136A1 · Uzoh et al. · 2023 [cited by applicant]
US 20240038702A1 · Uzoh · 2024 [cited by applicant]
US 20240055407A1 · Workman · 2024 [cited by applicant]
US 20240079376A1 · Suwito et al. · 2024 [cited by applicant]
US 20240105674A1 · Uzoh et al. · 2024 [cited by applicant]
US 20240170411A1 · Chang et al. · 2024 [cited by applicant]
US 20240186248A1 · Haba et al. · 2024 [cited by applicant]
US 20240186268A1 · Uzoh et al. · 2024 [cited by applicant]
US 20240186269A1 · Haba · 2024 [cited by applicant]
US 20240203917A1 · Katkar et al. · 2024 [cited by applicant]
US 20240213191A1 · Theil et al. · 2024 [cited by applicant]
US 20240213210A1 · Haba et al. · 2024 [cited by applicant]
US 20240217210A1 · Zhao et al. · 2024 [cited by applicant]
US 20240222239A1 · Gao et al. · 2024 [cited by applicant]
US 20240222315A1 · Uzoh · 2024 [cited by applicant]
US 20240222319A1 · Gao et al. · 2024 [cited by applicant]
US 20240266255A1 · Haba et al. · 2024 [cited by applicant]
US 20240298454A1 · Haba · 2024 [cited by applicant]
US 20240304593A1 · Uzoh · 2024 [cited by applicant]
US 20240312951A1 · Theil et al. · 2024 [cited by applicant]
US 20240332184A1 · Katkar et al. · 2024 [cited by applicant]
US 20240332227A1 · Uzoh et al. · 2024 [cited by applicant]
US 20240332231A1 · Uzoh · 2024 [cited by applicant]
US 20240332267A1 · Haba et al. · 2024 [cited by applicant]
US 20240387419A1 · Mrozek et al. · 2024 [cited by applicant]
US 20250004197A1 · Haba et al. · 2025 [cited by applicant]
US 20250006632A1 · Chang et al. · 2025 [cited by applicant]
US 20250006642A1 · Haba et al. · 2025 [cited by applicant]
US 20250006674A1 · Uzoh et al. · 2025 [cited by applicant]
US 20250006679A1 · Theil et al. · 2025 [cited by applicant]
US 20250006689A1 · Uzoh et al. · 2025 [cited by applicant]
US 20250054854A1 · Katkar et al. · 2025 [cited by applicant]
US 20250079364A1 · Uzoh et al. · 2025 [cited by applicant]
US 20250096191A1 · Gao et al. · 2025 [cited by applicant]
US 20250112123A1 · Katkar et al. · 2025 [cited by applicant]
US 20250185163A1 · Zhao et al. · 2025 [cited by applicant]
US 20250210585A1 · Fountain, Jr. et al. · 2025 [cited by applicant]
US 20250212554A1 · Katkar et al. · 2025 [cited by applicant]
US 20250218903A1 · Uzoh et al. · 2025 [cited by applicant]
US 20250273517A1 · Lee et al. · 2025 [cited by applicant]
CN 111477612A · 2020 [cited by applicant]
CN 211929489U · 2020 [cited by applicant]
JP 2013033786A · 2013 [cited by applicant]
JP 2018160519 · 2018 [cited by applicant]
KR 1020200002557 · 2020 [cited by applicant]
WO WO2005043584A2 · 2005 [cited by applicant]
WO WO2021198009A1 · 2021 [cited by applicant]
International Search Report and Written Opinion mailed Sep. 13, 2023, International Application No. PCT/US2023/023067, 13 pages. [cited by applicant]
Bush, Steve, “Electronica: Automotive power modules from On Semi,” ElectronicsWeekly.com, indicating an ONSEMI AR0820 product was to be demonstrated at a Nov. 2018 trade show, https://www.electronicsweekly.com/news/prod… [cited by applicant]
Ker, Ming-Dou et al., “Fully process-compatible layout design on bond pad to improve wire bond reliability in CMOS Ics,” IEEE Transactions on Components and Packaging Technologies, Jun. 2002, vol. 25, No. 2, pp. 309-316. [cited by applicant]
Moriceau, H. et al., “Overview of recent direct wafer bonding advances and applications,” Advances in Natural Sciences-Nanoscience and Nanotechnology, 2010, 11 pages. [cited by applicant]
Morrison, Jim et al., “Samsung Galaxy S7 Edge Teardown,” Tech Insights (posted Apr. 24, 2016), includes description of hybrid bonded Sony IMX260 dual-pixel sensor, https://www.techinsights.com/blog/samsung-galaxy-s7-edg… [cited by applicant]
Nakanishi, H. et al., “Studies on SiO2—SiO2 bonding with hydrofluoric acid. Room temperature and low stress bonding technique for MEMS,” Sensors and Actuators, 2000, vol. 79, pp. 237-244. [cited by applicant]
Oberhammer, J. et al., “Sealing of adhesive bonded devices on wafer level,” Sensors and Actuators A, 2004, vol. 110, No. 1-3, pp. 407-412, see pp. 407-412, and Figures 1 (a)-1 (I), 6 pages. [cited by applicant]
ONSEMI AR0820 image, cross section of a CMOS image sensor product. The part in the image was shipped on Sep. 16, 2021. Applicant makes no representation that the part in the image is identical to the part identified in … [cited by applicant]
Plobi, A. et al., “Wafer direct bonding: tailoring adhesion between brittle materials,” Materials Science and Engineering Review Journal, 1999, R25, 88 pages. [cited by applicant]
Sony IMX260 image, cross section of Sony dual-pixel sensor product labeled IMX260, showing peripheral probe and wire bond pads in a bonded structure. The part in the image was shipped in Apr. 2016. Applicant makes no re… [cited by applicant]
Campbell, Richard, “What Is Built-In Self Test And Why Do We Need It?,” Evaluation Engineering, Mar. 1, 1996, 20 pages. [cited by applicant]
“Companies Review Costs to Update Working Capital Plans amid COVID-19 Crisis,” Chiplets Market, Chiplets Market (Application: Microprocessors [MPUs], System-on-Chip [SOC] Device, Graphic Processing Units [GPUs], Program… [cited by applicant]
Feige, C. et al., “Logic BIST technology evaluation: an industrial case study,” European Test Workshop-Informal Digest, 2001, pp. 333-340. [cited by applicant]
Nan, Li et al., “Logic BIST: State-of-the-Art and Open Problems,” arXiv preprint arXiv: 1503.04628, 2015, 6 pages. [cited by applicant]
Vranken, Harald et al., “Impact of test point insertion on silicon area and timing during layout,” Proceedings of the conference on Design, automation and test in Europe, Feb. 2004, vol. 2, ** pages. [cited by applicant]
AEHR Test Systems, “FOX™ WaferPak Contactor—Single Touchdown Full-Wafer Test & Burn-in”, Publication 4083047601RevC, (2028) downloaded from https://www.aehr.com/wp-content/uploads/2023/09/FOX-WaferPak-3.2.18.pdf in 1 pa… [cited by applicant]
Formfactor® Case Study “Radar IC Manufacturer Cuts Testing Time in Half, Regardless of Elevated Temperatures, Using InfinityQuad Probes,” Danube Integrated Circuit Engineering (DICE); (2022) in 4 pages. [cited by applicant]
Kim B.H. et al., “A Robust MEMS Probe Card with Vertical Guide for a Fine Pitch Test,” J. Micromech. Microeng. Jun. 11, 2007;17(7): 1350-1359. [cited by applicant]
Rayming Technologies., “Top Aviation Engineering Services Companies in the World and What they Offer,” downloaded from https://www.raypcb.com/aviation-engineering-services/; (2023) in 10 pages. [cited by applicant]