Sealed bonded structures and methods for forming the same
A bonded structure is disclosed. The bonded structure includes a first element that has a front side and a back side that is opposite the front side. The first element has a first conductive pad and a first nonconductive field region at the front side of the first element. The bonded structure also includes a second element that has a second conductive pad and a second nonconductive field region at a front side of the second element. The second conductive pad is bonded to the first conductive pad along an interface structure. The bonded structure also includes an integrated device that is coupled to or formed with the first element or the second element. The bonded structure further includes an elongate conductive structure that extends from the back side of the first element to the interface structure. The elongate conductive structure provides an effectively closed profile around the integrated device.
1. A bonded structure comprising:
a first element having a front side and a back side opposite the front side, the first element having a first plurality of conductive contact pads and a first nonconductive field region at the front side of the first element, the first nonconductive field region and the first plurality of conductive contact pads disposed on a semiconductor region of the first element;
a second element having a second plurality of conductive contact pads and a second nonconductive field region at a front side of the second element, the second plurality of contact pads directly bonded to the first plurality of contact pads along a bonding interface without an intervening adhesive, at least some of the directly bonded contact pads providing electrical communication between the first and second elements;
an integrated device coupled to or formed in the first element or the second element; and
a laterally elongated conductive structure disposed in a trench having a sidewall extending from the back side of the first element, through the semiconductor region and the first nonconductive field region, and across the bonding interface, the laterally elongated conductive structure extending continuously around multiple sides of the integrated device.
2. The bonded structure of claim 1 , wherein the first nonconductive field region and the second nonconductive field region are directly bonded without an intervening adhesive.
3. The bonded structure of claim 1 , further comprising a cavity in the bonded structure, the laterally elongated conductive structure extending at least partially around the cavity.
4. The bonded structure of claim 1 , wherein the laterally elongated conductive structure defines a completely closed profile.
5. The bonded structure of claim 1 , wherein the laterally elongated conductive structure contacts a first contact pad of the first plurality of contact pads.
6. The bonded structure of claim 1 , wherein the second element further comprises a second contact pad of the second plurality of contact pads at the front side of the second element, and wherein the laterally elongated conductive structure extends through a bonding interface of the interface structure to contact the second contact pad.
7. The bonded structure of claim 6 , wherein the first element further comprises a third contact pad of the first plurality of contact pads at the front side of the first element, and wherein the second element further comprises a fourth contact pad of the second plurality of contact pads at the front side of the second element, the third contact pad directly bonded to the fourth contact pad.
8. The bonded structure of claim 7 , further comprising a via extending at least partially through the first element from the back side of the first element, the via being in contact with the third contact pad.
9. The bonded structure of claim 8 , wherein the laterally elongated conductive structure extends at least partially through the second nonconductive field region.
10. The bonded structure of claim 9 , wherein the laterally elongated conductive structure extends through an entire thickness of the bonded structure.
11. The bonded structure of claim 8 , wherein the laterally elongated conductive structure contacts a first contact pad of the first plurality of contact pads or the second contact pad of the second plurality of contact pads.
12. The bonded structure of claim 1 , wherein the second element further comprises a lateral feature at least partially embedded in the second nonconductive field region, the laterally elongated conductive structure extending through at least a portion of the second nonconductive field region to contact the lateral feature.
13. The bonded structure of claim 12 , wherein the lateral feature comprises a ring disposed around the integrated device.
14. The bonded structure of claim 1 , wherein the laterally elongated conductive structure is exposed on an outermost surface of the bonded structure.
15. The bonded structure of claim 14 , wherein the exposed laterally elongated conductive structure is closer to a side edge of the first element than to the integrated device.
16. The bonded structure of claim 1 , wherein the first plurality of conductive contact pads includes a first conductive contact pad and a second conductive contact pad electrically connected to one another through an interconnect, the first conductive contact pad and second conductive contact pad are electrical signal pads.
17. The bonded structure of claim 16 , wherein the interconnect is routed around the laterally elongated conductive structure.
18. The bonded structure of claim 1 , wherein the laterally elongated conductive structure has a continuous sidewall extending from the back side of the first element and across the bonding interface.
19. The bonded structure of claim 1 , wherein the laterally elongated conductive structure provides an effectively closed profile around the integrated device.
20. A bonded structure comprising:
a first element having a front side and a back side opposite the front side, the first element having a first plurality of conductive contact pads and a first nonconductive field region at the front side of the first element;
a second element having a second plurality of conductive contact pads and a second nonconductive field region at a front side of the second element, the second plurality of conductive contact pads directly bonded to the first plurality of conductive contact pads along an interface structure without an intervening adhesive, at least some of the directly bonded contact pads providing electrical communication between the first and second elements;
an integrated device coupled to or formed in the first element or the second element; and
a laterally elongated conductive structure extending from the back side of the first element, through a semiconductor region of the first element, and to and at least partially through the interface structure, the laterally elongated conductive structure extending continuously around multiple sides of the integrated device and providing an effectively closed profile around the integrated device,
wherein one of the first plurality of conductive contact pads and one of the second plurality of conductive contact pads define a first bonded pair of pads and another one of the first plurality of conductive contact pads and another one of the second plurality of conductive contact pads define a second pair of bonded pads, and wherein at least a portion of the laterally elongated conductive structure is positioned between the first pair of bonded pads and the second pair of bonded pads from a plan view.
21. The bonded structure of claim 20 , wherein the first bonded pair of pads and the second bonded pair of pads are electrically connected through an interconnect.
22. The bonded structure of claim 21 , wherein the interconnect is routed around the laterally elongated conductive structure.
23. The bonded structure of claim 21 , wherein the interconnect comprises a conductive trace that extends laterally through the second nonconductive field region.
24. The bonded structure of claim 23 , wherein the interface structure comprises the first plurality of conductive contact pads, the first nonconductive field region, the second plurality of conductive contact pads, the second nonconductive field region, and the conductive trace.
25. The bonded structure of claim 20 , wherein the laterally elongated conductive structure is exposed on an outermost surface of the bonded structure.
26. The bonded structure of claim 25 , wherein the exposed laterally elongated conductive structure is closer to a side edge of the first element than to the integrated device.
27. A bonded structure comprising:
a first element having a semiconductor region;
a second element bonded to the first element along an interface structure, the interface structure comprising a conductive interface feature and a nonconductive interface feature disposed about the conductive interface feature, the conductive interface feature providing mechanical and electrical connection between the first and second elements;
an integrated device coupled to or formed in the first element or the second element; and
a laterally elongated conductive structure disposed in a trench extending from a back side of the first element, through the semiconductor region, and to and at least partially through the interface structure, the laterally elongated conductive structure extending continuously around multiple sides of the integrated device.
28. The bonded structure of claim 27 , wherein the conductive interface feature comprises a plurality of directly bonded conductive pads disposed around the integrated device.
29. The bonded structure of claim 27 , wherein the first element and the second element are directly bonded without an intervening adhesive.
30. The bonded structure of claim 27 , further comprising a via extending at least partially through the first element from the back side of the first element, the via being in contact with the conductive interface feature.
31. The bonded structure of claim 27 , wherein the laterally elongated conductive structure extends through the interface structure.
32. The bonded structure of claim 27 , wherein the laterally elongated conductive structure provides an effectively closed profile around the integrated device.
33. The bonded structure of claim 27 , wherein the first element includes a first semiconductor region, a first nonconductive field region on the first semiconductor region, and a first plurality of conductive contact pads at least partially embedded in the first nonconductive field region, the interface structure including the first nonconductive field region and the first plurality of conductive contact pads.
34. The bonded structure of claim 33 , wherein the second element includes a second semiconductor region, a second nonconductive field region on the second semiconductor region, and a second plurality of conductive contact pads at least partially embedded in the second nonconductive field region, the interface structure including the second nonconductive field region and the second plurality of conductive contact pads, the first nonconductive field region directly bonded to the second nonconductive field region and the first plurality of conductive contact pads directly bonded to the second plurality of conductive contact pads.
35. The bonded structure of claim 34 , wherein the interface structure comprises a trace embedded in the second nonconductive field region between the second plurality of conductive contact pads and the second semiconductor region.
36. The bonded structure of claim 35 , wherein the trace connects a first conductive contact pad of the second plurality of conductive contact pads to a second conductive contact pad of the second plurality of conductive contact pads.
37. The bonded structure of claim 27 , wherein the laterally elongated conductive structure is exposed on an outermost surface of the bonded structure.
38. The bonded structure of claim 37 , wherein the exposed laterally elongated conductive structure is closer to a side edge of the first element than to the integrated device.
39. A method of forming a bonded structure comprising:
providing a first element comprising a first contact pad at a bonding surface of the first element;
providing a second element comprising a second contact pad at a bonding surface of the second element;
directly bonding the first contact pad of the first element to the second contact pad of the second element along an interface structure without an intervening adhesive, the interface structure providing mechanical and electrical connection between the first and second elements;
forming, after said directly bonding, a laterally elongated channel from a back side of the first element, through a semiconductor region of the first element, to at least the interface structure; and
after forming the laterally elongated channel, providing a laterally elongated conductive structure within the channel, the laterally elongated conductive structure extending continuously around multiple sides of an integrated device coupled to or formed in the first element or the second element.
40. The method of claim 39 , wherein bonding comprises directly bonding a first nonconductive field region of the first element to a second nonconductive field region of the second element along the interface structure without an intervening adhesive.
41. The method of claim 39 , wherein forming the elongated channel comprises forming the elongated channel from the back side of the first element to at least the bonding surface of the second element.
42. The method of claim 39 , wherein providing the laterally elongated conductive structure comprises coating a bottom surface and a side surface of the channel with a conductive material.
43. A bonded structure comprising:
a first element having a front side and a back side opposite the front side, the first element having a first nonconductive field region and a first plurality of conductive contact pads at least partially embedded in the first nonconductive field region, the first nonconductive field region and the first plurality of conductive contact pads disposed on a semiconductor region of the first element;
a second element having a second nonconductive field region and a second plurality of conductive contact pads at least partially embedded in the second nonconductive field region, the second plurality of contact pads directly bonded to the first plurality of contact pads and the second nonconductive field region directly bonded to the first nonconductive field region along a bonding interface without an intervening adhesive, at least some of the directly bonded contact pads providing electrical communication between the first and second elements;
an integrated device coupled to or formed with the first element or the second element; and
a laterally elongated conductive structure comprising a trench extending from the back side of the first element through the semiconductor region and at least a portion of the first nonconductive field region, the laterally elongated conductive structure comprising a conformally-filled via including a conductive layer conformally coating an interior of the trench, the laterally elongated conductive structure extending continuously around at least two sides of the integrated device.
44. The bonded structure of claim 43 , wherein the trench terminates within the first nonconductive field region.
45. The bonded structure of claim 43 , wherein the trench terminates over a pad of the first plurality of conductive contact pads.
46. The bonded structure of claim 44 , wherein the trench terminates at and contacts the pad of the first plurality of conductive contact pads.
47. The bonded structure of claim 43 , wherein the trench extends across the bonding interface.
48. The bonded structure of claim 43 , wherein the laterally elongated conductive structure is exposed on an outermost surface of the bonded structure.
49. The bonded structure of claim 48 , wherein the exposed laterally elongated conductive structure is closer to a side edge of the first element than to the integrated device.