IP Library › Assignment 005630/0516
Patent Assignment
Reel/Frame 005630/0516

Change of Name Effective Date: Dec. 12, 1990

Recorded: 1991-03-14 Pages: 7
Assignor
OLIN HUNT SPECIALTY PRODUCTS INC.
Executed: 1990-12-28
Assignee
Covered Properties (34)
Positive Novolak Photoresist Compositions
Patent: 4,377,631 →
Application: 06/275,883 →
Positive Photoresist Composition with Cresol-Formaldehyde Novolak Resins
Patent: 4,529,682 →
Application: 06/403,935 →
Positive Photoresist with Cresol-Formaldehyde Novolak Resin and Photosensitive Naphthoquinone Diazide
Patent: 4,587,196 →
Application: 06/666,743 →
Stripping Composition and Method of Using the Same
Patent: 4,617,251 →
Application: 06/721,965 →
Positive-Working Resist O-Quinone Diazide Photoresist Composition Containing a Dye and a Trihydroxybenzophenone Compound
Patent: 4,626,492 →
Application: 06/741,070 →
Method of Forming a Resist Pattern by Radiation Exposure of Positie- Working Resist Coating Comprising Dye and a Trihydroxybenzophenone Comound and Subsequent Aqueous Alkaline Development
Patent: 4,650,745 →
Application: 06/878,736 →
Development of Positive-Working Photoresist Compositions
Patent: 4,711,836 →
Application: 06/895,628 →
Light-Sensitive 1,2-Naphthoquinone-2-Diazide-4- Sulfonic Acid Monoesters of Cycloalkyl Sustituted Phenol and Their Use in Light- Sensitive Mixtures
Patent: 4,797,345 →
Application: 07/068,397 →
Thermally Stable Light-Sensitive Compositions with O-Quinone Diazide and Phenolic Resin
Patent: 4,837,121 →
Application: 07/124,227 →
Use of Particular Mixtures of Ethyl Lactate and Methyl Ethyl Ketone to Remove Undesirable Peripheral Material (E.G. Edge Beads) from Photoresist-Coated Substrates
Patent: 4,886,728 →
Application: 07/141,128 →
Aqueous Developing Solution and Its Use in Developing Positive-Working Photoresist Composition
Patent: 4,828,965 →
Application: 07/141,136 →
Light Sensitive Composition with O-Quinone Diazide and Phenolic Novolak Resin Made Using Methylol Substituted Trihydroxy Benzophenone as Reactant
Patent: 5,002,851 →
Application: 07/200,676 →
Light-Sensitive O-Quinone Diazide Composition and Product with Phenolic Novolak Prepared by Condensation with Haloacetoaldehyde
Patent: 4,959,292 →
Application: 07/217,512 →
Positive-Working Photoresists Employing a Selected Mixture of Ethyl Lactate and Ethyl 3-Ethoxy Propionate as Casting Solvent
Patent: 4,965,167 →
Application: 07/269,521 →
Selected Trinuclear Novolak Oligomers and Their Use in Photoactive Compounds and Radiation Sensitive Mixtures
Patent: 4,957,846 →
Application: 07/290,009 →
Thermally Stable Phenolic Resin Compositions with Ortho, Ortho Methylene Linkage
Patent: 4,970,287 →
Application: 07/325,399 →
Process for Coating a Photoresist Composition Onto a Substrate
Patent: 4,996,080 →
Application: 07/333,519 →
Use of Particular Mixtures of Ethyl Lactate and Methyl Ethyl Ketone to Remove Undesirable Peripheral Material (E.G. Edge Beads) from Photoresist-Coated Substrates
Patent: 5,151,219 →
Application: 07/386,659 →
Selected Block Phenolic Oligomers and Their Use in Phenolic Resin Compositions and in Radiation-Sensitive Resist Compositions
Application: 07/404,138 →
Selected Block Copolymer Novolak Binder Resins and Their Use in Radiation Sensitive Compositions
Application: 07/404,139 →
Process for Selective Removal of Dimeric Species from Phenolic Polymers
Application: 07/404,829 →
Polymers for High Resolution and High Thermal Resistant Positive Photoresists
Application: 07/405,802 →
Process for Developing Selected Positive Photoresists
Patent: 5,069,996 →
Application: 07/408,849 →
Tris-(Hydroxyphenyl) Lower Alkane Compounds as Sensitivity Enhancers for O-Quinonediazide Containing Radiation - Sensitive Compositions and Elements
Patent: 5,215,856 →
Application: 07/409,221 →
Selected Trihydroxybenzophenone Compounds and Their Use in Photoactive Compounds and Radiation Sensitive Mixtures
Patent: 5,019,478 →
Application: 07/429,298 →
Positive-Working Photoresist Process Employing a Selected Mixture of Ethyl Lactate and Ethyl 3-Ethoxy Propionate as Casting Solvent During Photoresist Coating
Patent: 5,063,138 →
Application: 07/533,258 →
Selected Trinuclear Novolak Oligomers and Their Use in Photoactive Compounds and Radiation Sensitive Mixtures
Patent: 4,992,596 →
Application: 07/534,908 →
Process of Developing a Radiation Imaged Product with Trinuclear Novolak Oligomer Having O-Naphthoquinone Diazide Sulfonyl Group
Patent: 4,992,356 →
Application: 07/534,909 →
Thermally Stable Phenolic Resin Compositions and Their Use in Light- Sensitive Compositions
Patent: 5,053,479 →
Application: 07/540,054 →
Process of Forming Resist Image in Positive Photoresist with Thermally Stable Phenolic Resin
Patent: 5,001,040 →
Application: 07/540,249 →
Selected Photoactive Methylolated Cyclohexanol Compounds and Their Use in Radiation-Sensitive Mixtures
Patent: 5,151,340 →
Application: 07/546,988 →
Thermally Stable Light-Sensitive Composition with O-Quinone Diazide and Phenolic Resin Used in a Method of Forming a Positive Photoresist Image
Patent: 5,024,921 →
Application: 07/552,394 →
Radiation-Sensitive Compositions Containing Fully Substituted Novolak Polymers
Application: 07/553,483 →
Selected Methylol-Substituted Trihydroxybenzophenones and Their Use in Phenolic Resin Compositions
Patent: 5,177,172 →
Application: 07/654,841 →
Related Assignments (25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest. Jun 22, 1981
From: TOUKHY, MEDHAT A.; KLAWANSKY, LEO
To: PHILIP A HUNT CHEMICAL CORPORATION
Reel/Frame 003896/0915 →
Assignment of Assignors Interest. Jan 14, 1985
From: TOUKHY, MEDHAT A.
To: PHILIP A. HUNT CHEMICAL CORPORATION
Reel/Frame 004349/0054 →
Assignment of Assignors Interest. Jan 14, 1985
From: TOUKHY, MEDHAT A.
To: PHILIP A. HUNT CHEMCAL CORPORATION
Reel/Frame 004349/0632 →
Assignment of Assignors Interest. Apr 11, 1985
From: SIZENSKY, JOSEPH J.
To: PHILIP A. HUNT CHEMICAL CORPORALTION
Reel/Frame 004398/0001 →
Assignment of Assignors Interest. Jun 4, 1985
From: EILBECK, JAMES N.
To: PHILIP A. HUNT CHEMICAL CORPORATION
Reel/Frame 004414/0753 →
Assignment of Assignors Interest. Nov 23, 1987
From: BLAKENEY, ANDREW J.; JEFFRIES, ALFRED T. III; SARUBBI, THOMAS R.
To: OLIN HUNT SPECIALTY PRODUCTS, INC., A CORP. OF DE.
Reel/Frame 004811/0536 →
Assignment of Assignors Interest. Jan 6, 1988
From: WEST, RICHARD J.; MARCOTTE, STEPHEN F. JR.; MODAWAR, FARIS A.
To: OLIN HUNT SPECIALTY PRODUCTS INC., A CORP. OF DE.
Reel/Frame 004843/0744 →
Assignment of Assignors Interest. Jan 6, 1988
From: SALAMY, THOMAS E.; LOVE, MARVIN L. JR.; TOWNER, MARK E.
To: OLIN HUNT SPECIALTY PRODUCTS INC., A CORP. OF DE
Reel/Frame 004820/0795 →
Assignment of Assignors Interest. May 31, 1988
From: TOUKHY, MEDHAT A.
To: OLIN HUNT SPECIALITY PRODUCT INC., A CORP. OF DE
Reel/Frame 004892/0296 →
Assignment of Assignors Interest. Jul 11, 1988
From: BLAKENEY, ANDREW J.; SARUBBI, THOMAS; SIZENSKY, JOSEPH J.
To: OLIN HUNT SPECIALITY PRODUCTS, INC.
Reel/Frame 004907/0513 →
Assignment of Assignors Interest. Nov 10, 1988
From: SALAMY, THOMAS E.
To: OLIN HUNT SPECIALTY PRODUCTS INC., A CORP. OF DE
Reel/Frame 004995/0450 →
Assignment of Assignors Interest. Dec 27, 1988
From: JEFFRIES, ALFRED T. III; BLAKENEY, ANDREW J.; TOUKHY, MEDHAT A.
To: OLIN HUNT SPECIALTY PRODUCTS INC., A CORP. OF DE.
Reel/Frame 005011/0410 →
Assignment of Assignors Interest. Apr 24, 1989
From: DARAKTCHIEV, IVAN S.
To: OLIN HUNT SPECIALTY PRODUCTS, INC.
Reel/Frame 005091/0658 →
Assignment of Assignors Interest. Sep 7, 1989
From: JEFFRIES, ALFRED T. III; HONDA, KENJI; BLAKENEY, ANDREW J.; TADROS, SOBHY
To: OLIN HUNT SPECIALTY PRODUCTS INC., A CORP. OF DE
Reel/Frame 005119/0769 →
Assignment of Assignors Interest. Sep 7, 1989
From: JEFFRIES, ALFRED T. III; HONDA, KENJI; BLAKENEY, ANDREW J.; TADROS, SOBHY
To: OLIN HUNT SPECIALTY PRODUCTS INC., A CORP. OF DE
Reel/Frame 005131/0683 →
Assignment of Assignors Interest. Sep 8, 1989
From: EBERSOLE, CHARLES E.
To: OLIN HUNT SPECIALTY PRODUCTS INC., A CORP OF DE
Reel/Frame 005131/0796 →
Assignment of Assignors Interest. Sep 8, 1989
From: SARUBBI, THOMAS R.
To: OLIN HUNT SPECIALTY PRODUCTS, INC.
Reel/Frame 005119/0929 →
Assignment of Assignors Interest. Sep 18, 1989
From: ROGER, ROBERT F.
To: OLIN HUNT SPECIALTY PRODUCTS, INC., A CORP. OF DE.
Reel/Frame 005141/0903 →
Assignment of Assignors Interest. Sep 19, 1989
From: JAYARAMAN, TRIPUNITHURA V.
To: OLIN HUNT SPECIALTY PRODUCTS INC., A CORP. OF DE
Reel/Frame 005153/0340 →
Assignment of Assignors Interest. Oct 30, 1989
From: TOUKHY, MEDHAT A.; JEFFRIES, ALFRED T. III
To: OLIN HUNT SPECIALTY PRODUCTS INC., A CORP. OF DE
Reel/Frame 005170/0044 →
Change of Name Sep 17, 1990
From: PHILIP A. HUNT CHEMICAL CORPORATION
To: OLIN HUNT SPECIALTY PRODUCTS INC.
Reel/Frame 005435/0649 →
Change of Name Apr 18, 1997
From: OCG MICROELECTRONIC MATERIALS, INC.
To: OLIN MICROELECTRONIC CHEMICALS, INC.
Reel/Frame 008495/0994 →
Change of Name Apr 29, 2008
From: OLIN MICROELECTRONIC CHEMICALS, INC.
To: ARCH SPECIALTY CHEMICALS, INC.
Reel/Frame 020866/0445 →
Assignment of Assignor's Interest Apr 29, 2008
From: SALAMY, THOMAS E.; LOVE, MARVIN L., JR.; TOWNER, MARK E.
To: OLIN HUNT SPECIALTY PRODUCTS INC.
Reel/Frame 020866/0424 →
Merger Apr 29, 2008
From: ARCH SPECIALTY CHEMICALS, INC.
To: FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
Reel/Frame 020866/0493 →