Patent Assignment
Reel/Frame 018160/0189
Assignment of Assignor's Interest
Recorded: 2006-08-23
Received: 2006-08-23
Pages: 3
Assignor
ALL POINTS EQUIPMENT CO., L.P.
Executed: 2006-08-21
Assignee
CENTURY CORROSION TECHNOLOGIES, INC.
9710 TELGE ROAD, HOUSTON, TX, 77095, UNITED STATES
Covered Properties
(37)
Apparatus for Megasonic Processing of an Article
Application:
11/386,634 →
Transducer Assembly for Magasonic Processing of an Article and Apparatus Utilizing the Same
Application:
11/375,907 →
Footwear Cleat with Vertical Traction Elements
Application:
29/225,805 →
Membrane Dryer
Application:
10/951,009 →
Process Sequence for Photoresist Stripping and/or Cleaning of Photomasks for Integrated Circuit Manufacturing
Application:
10/909,764 →
System and Method for Point-of-Use Filtration and Purification of Fluids Used in Substrate Processing
Application:
10/895,511 →
Megasonic Cleaning Using Supersaturated Cleaning Solution
Application:
10/864,929 →
Megasonic Cleaner and Dryer
Application:
10/864,927 →
Apparatus and Methods for Reducing Damage to Substrates During Megasonic Cleaning Processes
Application:
10/760,596 →
Sonic-Energy Cleaner System with Gasified Fluid
Application:
10/742,214 →
Method of Cleaning a Side of a Thin Flat Substrate by Applying Sonic Energy to the Opposite Side of the Substrate
Application:
10/726,774 →
Substrate Process Tank with Acoustical Source Transmission and Method of Processing Substrates
Application:
10/699,042 →
Method for Removal of Photoresist Using Sparger
Application:
10/634,440 →
Process and Apparatus for Removal of Photoresist from Semiconductor Wafers Using Spray Nozzles
Application:
10/366,054 →
Capillary Drying of Substrates
Application:
10/358,636 →
Megasonic Cleaning System with Buffered Cavitation Method
Application:
10/341,425 →
Method of Processing Substrates Using Pressurized Mist Generation
Application:
10/304,583 →
Wafer Cleaning
Application:
10/243,463 →
Wafer Cleaning
Application:
10/243,486 →
Stackable Process Chambers
Application:
10/171,429 →
Megasonic Cleaner and Dryer System
Application:
10/171,430 →
Megasonic Cleaner and Dryer
Application:
10/171,426 →
Reciprocating Megasonic Probe
Application:
10/140,029 →
Chemical Concentration Control Device
Application:
10/117,725 →
Process Tank with Pressurized Mist Generation
Application:
10/117,768 →
Nextgen Wet Process Tank
Application:
10/117,778 →
Membrane Dryer
Application:
10/117,739 →
Drying Vapor Generation
Application:
10/098,847 →
Cleaning and Drying Method and Apparatus
Application:
10/091,011 →
Cable Clamp
Application:
10/073,551 →
Megasonic Probe Energy Director
Application:
10/059,682 →
Method and System for Chemical Injection in Silicon Wafer Processing
Application:
10/053,364 →
Low Profile Wafer Carrier
Application:
10/053,449 →
System for Removal of Photoresist Using Sparger
Application:
10/052,823 →
Wafer Cleaning Method
Application:
09/953,504 →
Megasonic Probe Energy Attenuator
Application:
09/922,509 →
Megasonic Cleaner Probe System with Gasified Fluid
Application:
09/906,384 →