Patent Assignment
Reel/Frame 040069/0705
Merger
Recorded: 2016-09-19
Pages: 7
Assignor
CARL ZEISS SMS GMBH
Executed: 2015-05-12
Assignee
CARL ZEISS SMT GMBH
RUDOLF-EBER-STRASSE 2, OBERKOCHEN, 73447, GERMANY
Covered Properties
(75)
Method for Determining the Image Quality of an Optical Imaging System
Arrangement for Inspecting Objects, Especially Masks in Microlithography
Microscope Imaging System and Method for Emulating a High Aperture Imaging System, Particularly for Mask Inspection
Imaging System for Emulation of a High Aperture Scanning System
Reflective X-Ray Microscope and Inspection System for Examining Objects with Wavelengths Less Than or Equal to 100 Nm
Advanced Pattern Definition for Particle-Beam Exposure
Method for Mask Inspection for Mask Design and Mask Production
Method and Arrangement for Repairing Photolithography Masks
Charged Particle Beam Exposure System and Beam Manipulating Arrangement
Particle-Optical System
Device and Method for the Interferometric Measurement of Phase Masks
Method for Determining Intensity Distribution in the Image Plane of a Projection Exposure Arrangement
Charged Particle Beam Exposure System
Charged Particle System
Method and Device for Analysing the Imaging Behavior of an Optical Imaging Element
Method for Determination of Residual Errors
Microscope and Microscopy Method for Space-Resolved Measurement of a Predetermined Structure, in Particular a Structure of a Lithographic Mask
Method and Apparatus for Determining the Position of a Structure on a Carrier Relative to a Reference Point of the Carrier
Device and Method for Measuring Lithography Masks
Method and Apparatus for Analyzing a Group of Photolithographic Masks
Method and Apparatus for Determining the Relative Overlay Shift of Stacked Layers
Microscope Imaging System and Method for Emulating a High Aperture Imaging System, Particularly for Mask Inspection
Patent:
44,216 →
Application:
12/604,821 →
Determining a Repairing Form of a Defect at or Close to an Edge of a Substrate of a Photo Mask
Microscope Illumination
Method for Calibrating a Specimen Stage of a Metrology System and Metrology System Comprising a Specimen Stage
Method for Repairing Phase Shift Masks
Methods and Systems for Removing a Material from a Sample
Apparatus and Method for Investigating and/or Modifying a Sample
Method and Device for Determining the Position of an Edge of a Marker Structure with Subpixel Accuracy in an Image, Having a Plurality of Pixels, of the Marker Structure
Verification Method for Repairs on Photolithography Masks
Method for Emulation of a Photolithographic Process and Mask Inspection Microscope for Performing the Method
Autofocus Device and Autofocusing Method for an Imaging Device
Method and Apparatus for Measuring of Masks for the Photo-Lithography
Method for Analyzing Masks for Photolithography
Method for Electron Beam Induced Deposition of Conductive Material
A Method for Electron Beam Induced Etching
Method for Electron Beam Induced Etching of Layers Contaminated with Gallium
Method and Apparatus for Measuring Structures on Photolithography Masks
Microscope for Reticle Inspection with Variable Illumination Settings
Method and Apparatus for Modifying a Substrate Surface of a Photolithographic Mask
Method and Apparatus for Processing a Substrate with a Focused Particle Beam
Method and Device for Measuring the Relative Local Position Error of One of the Sections of an Object That Is Exposed Section by Section
Method for Determining the Registration of a Structure on a Photomask and Apparatus to Perform the Method
Method for Characterizing a Feature on a Mask and Device for Carrying Out the Method
Method for Determining the Position of a Structure Within an Image and Position Measuring Device for Carrying Out the Method
Method and Calibration Mask for Calibrating a Position Measuring Apparatus
Magnifying Imaging Optical Unit and Metrology System Including Same
Determination of the Relative Position of Two Structures
Mask Inspection Microscope with Variable Illumination Setting
Method for Simulating an Aerial Image
Method and Apparatus for the Position Determination of Structures on a Mask for Microlithography
Grating-assisted autofocus device and autofocusing method for an imaging device
Method for Determining the Performance of a Photolithographic Mask
Method and Apparatus for Analyzing and/or Repairing of an Euv Mask Defect
Controllable Transmission and Phase Compensation of Transparent Material
Temperature Sensor and Method for Measuring a Temperature Change
Irradiation Module for a Measuring Apparatus
Microscope and Method for Characterizing Structures on an Object
Apparatus and Method for Analyzing and Modifying a Specimen Surface
Method and Apparatus for Correcting Errors on a Wafer Processed by a Photolithographic Mask
Method for Characterizing a Structure on a Mask and Device for Carrying Out Said Method
Apparatus and Method for Investigating an Object
Method and Apparatus for Analyzing and for Removing a Defect of an Euv Photomask
Method for Analyzing a Photomask
Method and Apparatus for Protecting a Substrate During Processing by a Particle Beam
Application:
14/200,264 →
Publication:
US 2014/0255831
Method for Establishing Distortion Properties of an Optical System in a Microlithographic Measurement System
Illumination Optical Unit for a Metrology System and Metrology System Comprising Such an Illumination Optical Unit
Method for Calibrating a Position-Measuring System and Position-Measuring System
Optically Transparent and Electrically Conductive Coatings and Method for Their Deposition on a Substrate
Magnifying Imaging Optical Unit and Metrology System Including Same
Method and device for examining a mask
Apparatus and Method for Correlating Images of a Photolithographic Mask
Emulation of Reproduction of Masks Corrected by Local Density Variations
Method for Measuring a Lithography Mask or a Mask Blank
Method and System for EUV Mask Blank Buried Defect Analysis
Related Assignments
(24)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Dec 17, 2004
From: TOTZECK, MICHAEL; FELDMANN, HEIKO; GRUNER, TORALF; SCHUSTER, KARL-HEINZ
To: CARL ZEISS SMS GMBH
Reel/Frame 015474/0175 →
Assignment of Assignor's Interest
Dec 21, 2004
From: TOTZECK, MICHAEL; STROESSNER, ULRICH; GREIF-WUESTENBECKER, JOERN
To: CARL ZEISS SMS GMBH
Reel/Frame 015483/0640 →
Assignment of Assignor's Interest
Apr 29, 2005
From: ENGEL, THOMAS; GROSS, HERBERT
To: CARL ZEISS SMS GMBH
Reel/Frame 017362/0779 →
Assignment of Assignor's Interest
May 31, 2005
From: MANN, HANS-JURGEN; DINGER, UDO; ULRICH, WILHEIM; REINECKE, WOLFGANG
To: CARL ZEISS SMT AG; CARL ZEISS MICROELECTRONIC SYSTEMS GMBH
Reel/Frame 016631/0362 →
Assignment of Assignor's Interest
Jun 27, 2005
From: PLATZGUMMER, ELMAR
To: IMS NANOFABRICATION GMBH
Reel/Frame 016716/0509 →
Assignment of Assignor's Interest
Oct 24, 2005
From: DOBSCHAL, HANS-JUERGEN; HARNISCH, WOLFGANG; SCHERUEBL, THOMAS; ROSENKRANZ, NORBERT
To: CARL ZEISS SMS GMBH
Reel/Frame 017903/0227 →
Assignment of Assignor's Interest
Dec 8, 2005
From: IMS NANOFABRICATION GMBH
To: CARL ZEISS SMS GMBH
Reel/Frame 017339/0059 →
Assignment of Assignor's Interest
Nov 9, 2007
From: ZIBOLD, AXEL; HARNISCH, WOLFGANG; KIENZLE, OLIVER
To: CARL ZEISS SMS GMBH
Reel/Frame 020093/0024 →
Corrective Assignment to Correct the Name of Inventor from Hans-Jurgen Mann to Hans-Juergen Mann and Correct Title Previously Recorded on Reel 016631 Frame 0362. Assignor(S) Hereby Confirms the Assignment of Assignor's Interest.
Apr 2, 2008
From: MANN, HANS-JUERGEN; DINGER, UDO; ULRICH, WILHEIM; REINECKE, WOLFGANG
To: CARL ZEISS SMT AG; CARL ZEISS SMS GMBH
Reel/Frame 020740/0812 →
Assignment of Assignor's Interest
Apr 15, 2008
From: BOEHM, KLAUS; KALUS, CHRISTIAN; SCHMOELLER, THOMAS; HARNISCH, WOLFGANG
To: CARL ZEISS SMS GMBH; SYNOPSYS GMBH
Reel/Frame 020806/0426 →
Assignment of Assignor's Interest
Jul 3, 2008
From: GREIF-WUESTENBECKER, JOERN; BOEHME, BEATE; STROESSNER, ULRICH; TOTZECK, MICHAEL
To: CARL ZEISS SMS GMBH
Reel/Frame 021196/0233 →
Assignment of Assignor's Interest
Jul 15, 2008
From: PLATZGUMMER, ELMAR; STENGL,GERHARD
To: CARL ZEISS SMS GMBH
Reel/Frame 021276/0541 →
Assignment of Assignor's Interest
Jul 31, 2008
From: HAIDNER, HELMUT; WEGMANN, ULRICH
To: CARL ZEISS SMS GMBH
Reel/Frame 021324/0591 →
Assignment of Assignor's Interest
Sep 16, 2008
From: STROESSNER, ULRICH; GREIF-WUESTENBECKER, JOERN
To: CARL ZEISS SMS GMBH
Reel/Frame 021535/0257 →
Assignment of Assignor's Interest
Apr 24, 2009
From: KNIPPELMEYER, RAINER
To: CARL ZEISS SMS GMBH
Reel/Frame 022591/0456 →
Assignment of Assignor's Interest
Sep 17, 2009
From: SCHELLHORN, UWE; MANGER, MATTHIAS
To: CARL ZEISS SMS GMBH
Reel/Frame 023248/0369 →
Assignment of Assignor's Interest
Jan 11, 2010
From: BUSCHBECK, HERBERT; PLATZGUMMER, ELMAR; VONACH, HERBERT
To: CARL ZEISS SMS GMBH
Reel/Frame 023760/0343 →
Assignment of Assignor's Interest
Jan 22, 2010
From: MANN, HANS-JUERGEN; TOTZECK, MICHAEL; KERWIEN, NORBERT
To: CARL ZEISS SMS GMBH
Reel/Frame 023833/0673 →
Assignment of Assignor's Interest
Jan 28, 2010
From: SYNOPSYS GMBH
To: SYNOPSYS, INC.
Reel/Frame 023866/0349 →
Assignment of Assignor's Interest
Apr 30, 2010
From: STENGL, GERHARD
To: CARL ZEISS SMS GMBH
Reel/Frame 024314/0986 →
Assignment of Assignor's Interest
May 12, 2010
From: PLATZGUMMER, ELMAR
To: CARL ZEISS SMS GMBH
Reel/Frame 024373/0158 →
Assignment of Assignor's Interest
May 12, 2010
From: STENGL, GERHARD; FALKNER, HELMUT
To: CARL ZEISS SMS GMBH
Reel/Frame 024372/0780 →
A Modifying Conversion
Jan 18, 2011
From: CARL ZEISS SMT AG
To: CARL ZEISS SMT GMBH
Reel/Frame 025763/0367 →
Assignment of Assignor's Interest
Apr 11, 2012
From: STROESSNER, ULRICH; SEITZ, HOLGER; ROSENKRANZ, NORBERT; LAENGLE, MARIO
To: CARL ZEISS SMS GMBH
Reel/Frame 028025/0923 →