Ceramic heater and esc with enhanced wafer edge performance
Embodiments of the present disclosure provide an improved electrostatic chuck for supporting a substrate. The electrostatic chuck comprises a chuck body coupled to a support stem, the chuck body having a substrate supporting surface, a plurality of tabs projecting from the substrate supporting surface of the chuck body, wherein the tabs are disposed around the circumference of the chuck body, an electrode embedded within the chuck body, the electrode extending radially from a center of the chuck body to a region beyond the plurality of tabs, and an RF power source coupled to the electrode through a first electrical connection.
1. An electrostatic chuck for supporting a substrate, comprising:
a chuck body coupled to a support stem, the chuck body comprising:
a planar substrate supporting surface having an outer circumference, wherein the planar substrate supporting surface forms a continuous planar surface from a center of the chuck body to the outer circumference; and
a plurality of tabs projecting above the planar substrate supporting surface of the chuck body, the plurality of tabs each having an outer edge positioned a radial distance from a center of the planar substrate supporting surface, the radial distance less than the outer circumference;
an electrode embedded within the chuck body, the electrode extending radially from a center of the chuck body to a region beyond the plurality of tabs; and
a first electrical connection for coupling an RF power source to the electrode.
2. The electrostatic chuck of claim 1 , further comprising:
a chucking power source coupling to the electrode via a second electrical connection.
3. The electrostatic chuck of claim 1 , wherein the electrode comprises an inner electrode and an outer electrode surrounding the inner electrode.
4. The electrostatic chuck of claim 3 , wherein the inner electrode and the outer electrode are non-coplanar.
5. The electrostatic chuck of claim 4 , wherein the inner electrode is disposed below the outer electrode.
6. The electrostatic chuck of claim 1 , wherein the chuck body comprises aluminum nitride or aluminum oxide.
7. An electrostatic chuck for supporting a substrate, comprising:
a body coupled to a support stem, the body having a substrate supporting surface;
an annular shoulder projecting from the substrate supporting surface, the annular shoulder being disposed at a periphery of the body;
an inner electrode having an outer edge, the inner electrode embedded within the body, the inner electrode extending radially from a center of the body to a region adjacent to the annular shoulder;
an outer electrode having an inner edge and an external edge, the outer electrode embedded within the body, wherein the outer electrode is disposed radially external to the inner electrode, the outer electrode extends radially beneath the annular shoulder, and the outer electrode is disposed below the inner electrode;
a conductive connection disposed between the inner electrode and the outer electrode, the conductive connection physically connecting the outer edge of the inner electrode to the inner edge of the outer electrode, the conductive connection electrically connecting the inner electrode and the outer electrode; and
a first electrical connection for coupling an RF power source to the inner electrode.
8. The electrostatic chuck of claim 7 , further comprising:
a second electrical connection for coupling a chucking power source to the inner electrode.
9. The electrostatic chuck of claim 7 , further comprising:
one or more heating elements embedded in the body, wherein the heating elements are disposed beneath the inner electrode.