Durable anti-reflective articles
Embodiments of durable, anti-reflective articles are described. In one or more embodiments, the article includes a substrate and an anti-reflective coating disposed on the major surface. The article exhibits an average light transmittance of about 94% or greater over an optical wavelength regime and/or an average light reflectance of about 2% or less over the optical wavelength regime, as measured from an anti-reflective surface. In some embodiments, the article exhibits a maximum hardness of about 8 GPa or greater as measured by a Berkovich Indenter Hardness Test along an indentation depth of about 50 nm or greater and a b* value, in reflectance, in the range from about −5 to about 1 as measured on the anti-reflective surface only at all incidence illumination angles in the range from about 0 degrees to about 60 degrees under an International Commission on Illumination illuminant.
1. An anti-reflective article comprising:
a substrate having a major surface; and
an anti-reflective coating having a thickness of about 0.2 μm to about 1 μm disposed on the major surface, the anti-reflective coating comprising an anti-reflective surface, wherein the anti-reflective coating comprises a plurality of layers, the plurality of layers comprising at least one low refractive index (RI) layer and at least one high RI layer, and wherein a total physical thickness of the high RI layers is greater than 28% of the total physical thickness of the anti-reflective coating,
wherein each low RI layer is oxide-containing and has a refractive index from about 1.3 to about 1.7 and each high RI layer has a refractive index of greater than about 1.7,
wherein the at least one low RI layer includes one low RI layer of SiO 2 disposed on and in direct contact with the major surface of the substrate, the one low RI layer has a physical thickness of greater than 10 nm to less than 150 nm,
wherein the anti-reflective coating exhibits an average reflectance of about 2% or less over an optical wavelength regime from about 400 nm to about 800 nm,
wherein the anti-reflective surface exhibits an average light transmission of about 90% or greater over the optical wavelength regime,
wherein the anti-reflective coating exhibits an average hardness of about 5 GPa or greater as measured by a Berkovich Indenter Hardness Test along an indentation depth of about 50 nm to about 1000 nm, and
wherein each high RI layer consists of SiO x N y or Si u Al y O x N y .
2. The article of claim 1 , wherein the substrate comprises a glass selected from the group consisting of soda lime glass, alkali aluminosilicate glass, alkali containing borosilicate glass and alkali aluminoborosilicate glass.
3. The article of claim 1 , wherein the substrate is a crystalline substrate or a glass ceramic substrate.
4. The article of claim 1 , wherein the article exhibits either one or both:
article transmittance color coordinates in the (L*, a*, b*) colorimetry system at normal incidence under a D65 or F2 illuminant exhibiting a reference point color shift of less than about 2 from a reference point as measured at the anti-reflective surface, the reference point comprising at least one of the color coordinates (a*=0, b*=0) and the transmittance color coordinates of the substrate, and
article reflectance color coordinates in the (L*, a*, b*) colorimetry system at normal incidence under a D65 or F2 illuminant exhibiting a color shift of less than about 5 from a reference point as measured at the anti-reflective surface, the reference point comprising at least one of the color coordinates (a*=0, b*=0), the coordinates (a*=−2, b*=−2), and the reflectance color coordinates of the substrate,
wherein, when the reference point is the color coordinates (a*=0, b*=0), the color shift is defined by √((a* article ) 2 +(b* article ) 2 ),
wherein, when the reference point is the color coordinates (a*=−2, b*=−2), the color shift is defined by √((a* article +2) 2+ (b* article +2) 2 ), and
wherein, when the reference point is the color coordinates of the substrate, the color shift is defined by √((a* article −a* substrate ) 2 + (b*, article−b* substrate) 2 ).
5. The article of claim 1 , wherein the article exhibits an abrasion resistance comprising any one of:
about 1% haze or less, as measured using a hazemeter having an aperture, wherein the aperture has a diameter of about 8 mm,
an average roughness Ra, as measured by atomic force microscopy, of about 12 nm or less,
a scattered light intensity of about 0.05 (in units of 1/steradian) or less, at a polar scattering angle of about 40 degrees or less, as measured at normal incidence in transmission using an imaging sphere for scatter measurements, with a 2 mm aperture at 600 nm wavelength,
a scattered light intensity of about 0.1 (in units of 1/steradian) or less, at a polar scattering angle of about 20 degrees or less, as measured at normal incidence in transmission using an imaging sphere for scatter measurements, with a 2 mm aperture at 600 nm wavelength,
wherein the abrasion resistance is measured after a 500-cycle abrasion using a Taber Test.
6. An electronic product incorporating the article according to claim 1 , wherein the article is a cover article configured to: (a) protect devices within the product, (b) provide a user interface for input, and/or (c) provide a display.
7. An article comprising:
a substrate having a major surface; and
an anti-reflective coating having a physical thickness of from about 0.2 μm to about 1 μm disposed on the major surface, the anti-reflective coating comprising an anti-reflective surface, wherein the anti-reflective coating comprises a plurality of layers, the plurality of layers comprising at least one low refractive index (RI) layer and at least one high RI layer, and wherein a total physical thickness of the high RI layers is greater than 30% of the total physical thickness of the anti-reflective coating,
wherein each high RI layer consists of SiO x N y or Si u Al y O x N y ,
wherein the at least one low RI layer includes one low RI layer of SiO 2 disposed on and in direct contact with the major surface of the substrate and a physical thickness of greater than 10 nm and less than 150 nm,
wherein each low RI layer is oxide-containing and has a refractive index from about 1.3 to about 1.7 and each high RI layer has a refractive index of greater than about 1.7,
wherein the anti-reflective coating exhibits an average reflectance of about 2% or less over an optical wavelength regime from about 400 nm to about 800 nm,
wherein the anti-reflective surface exhibits an average light transmission of about 90% or greater over the optical wavelength regime, and
wherein the anti-reflective coating exhibits an average hardness of about 8 GPa or greater as measured by a Berkovich Indenter Hardness Test along an indentation depth of about 50 nm to about 1000 nm.
8. The article of claim 7 , wherein the anti-reflective coating comprises five (5) layers to seven (7) layers.
9. The article of claim 7 , wherein the substrate is a crystalline substrate or a glass ceramic substrate.
10. An electronic product incorporating the article according to claim 7 , wherein the article is a cover article configured to: (a) protect devices within the product, (b) provide a user interface for input, and/or (c) provide a display.
11. An article comprising:
a substrate having a major surface; and
an anti-reflective coating having a physical thickness of from about 0.2 μm to about 1 μm disposed on the major surface, the anti-reflective coating comprising an anti-reflective surface, wherein the anti-reflective coating comprises a plurality of alternating low and high refractive index layers that ranges from five (5) layers to seven (7) layers and comprises a first low refractive index (RI) layer of SiO 2 disposed on and in direct contact with the major surface, at least one additional low RI layer of SiO 2 , and wherein a total physical thickness of the high RI layers is greater than about 30% of the total physical thickness of the anti-reflective coating,
wherein each high RI layer consists of SiO x N y or Si u Al y O x N y ,
wherein the first low RI layer of SiO 2 disposed on and in direct contact with the major surface of the substrate has an optical thickness from about 15 nm to about 200 nm,
wherein each low RI layer is oxide-containing and has a refractive index from about 1.3 to about 1.7 and each high RI layer has a refractive index of greater than about 1.9,
wherein the anti-reflective coating exhibits an average reflectance of about 2% or less over an optical wavelength regime from about 400 nm to about 800 nm, and
wherein the anti-reflective surface exhibits an average light transmission of about 90% or greater over the optical wavelength regime.
12. The article of claim 11 , wherein a total physical thickness of the high RI layers is ≥200 nm.
13. The article of claim 11 , wherein the anti-reflective coating has a physical thickness of from about 350 nm to about 1 μm.
14. The article of claim 11 , wherein the anti-reflective coating has a physical thickness from about 0.2 μm to about 325 nm.
15. The article of claim 11 , wherein the substrate comprises a glass-ceramic substrate.
16. The article of claim 11 , wherein the article exhibits either one or both:
article transmittance color coordinates in the (L*, a*, b*) colorimetry system at normal incidence under a D65 or F2 illuminant exhibiting a reference point color shift of less than about 2 from a reference point as measured at the anti-reflective surface, the reference point comprising at least one of the color coordinates (a*−0, b*=0) and the transmittance color coordinates of the substrate, and
article reflectance color coordinates in the (L*, a*, b*) colorimetry system at normal incidence under a D65 or F2 illuminant exhibiting a color shift of less than about 5 from a reference point as measured at the anti-reflective surface, the reference point comprising at least one of the color coordinates (a*=0, b*=0), the coordinates (a*=−2, b*=−2), and the reflectance color coordinates of the substrate,
wherein, when the reference point is the color coordinates (a*=0, b*=0), the color shift is defined by √((a* article ) 2+ (b* article ) 2 ),
wherein, when the reference point is the color coordinates (a*=−2, b*=−2), the color shift is defined by √((a* article +2) 2 + (b* article +2) 2 ), and
wherein, when the reference point is the color coordinates of the substrate, the color shift is defined by √((a* article −a* substrate ) 2 + (b* article −b* substrate ) 2 ).
17. The article of claim 11 , wherein the article exhibits an abrasion resistance comprising any one of:
about 1% haze or less, as measured using a hazemeter having an aperture, wherein the aperture has a diameter of about 8 mm,
an average roughness Ra, as measured by atomic force microscopy, of about 12 nm or less,
a scattered light intensity of about 0.05 (in units of 1/steradian) or less, at a polar scattering angle of about 40 degrees or less, as measured at normal incidence in transmission using an imaging sphere for scatter measurements, with a 2 mm aperture at 600 nm wavelength,
a scattered light intensity of about 0.1 (in units of 1/steradian) or less, at a polar scattering angle of about 20 degrees or less, as measured at normal incidence in transmission using an imaging sphere for scatter measurements, with a 2 mm aperture at 600 nm wavelength,
wherein the abrasion resistance is measured after a 500-cycle abrasion using a Taber Test.
18. An electronic product incorporating the article according to claim 11 , wherein the article is a cover article configured to: (a) protect devices within the product, (b) provide a user interface for input, and/or (c) provide a display.
19. The article of claim 11 , wherein the anti-reflective coating exhibits an average hardness of about 5 GPa or greater as measured by a Berkovich Indenter Hardness Test along an indentation depth of about 50 nm to about 1000 nm.