Patent Assignment
Reel/Frame 025227/0551
Change of Name
Recorded: 2010-11-01
Received: 2010-11-01
Pages: 4
Assignor
MALLINCKRODT BAKER, INC.
Executed: 2010-09-28
Assignee
AVANTOR PERFORMANCE MATERIALS, INC.
222 RED SCHOOL LANE, PHILLIPSBURG, NJ, 08865, UNITED STATES
Covered Properties
(37)
Driectly Compressible High Functionality Granular Microcrystalline Cellulose Based Excipient, Manufacturing Process and Use Thereof
Application:
12/600,369 →
Post Plasma Etch/Ash Residue and Silicon-Based Anti-Reflective Coating Remover Compositions Containing Tetrafluoroborate Ion
Application:
12/811,257 →
Directly Compressible Granular Microcrystalline Cellulose Based Excipient, Manufacturing Process and Use Thereof
Application:
12/619,259 →
Polysilicon Planarization Solution for Planarizing Low Temperature Poly-Silicon Thin Film Panels
Application:
12/596,921 →
High Efficiency Chromatography Column with Re-usable End Cap
Application:
12/565,172 →
Peroxide Activated Oxometalate Based Formulations for Removal of Etch Residue
Application:
12/522,716 →
Chromatographic Media and Chromatographic Equipment Storage Solutions and Use Thereof
Application:
12/522,605 →
Stabilized, Non-Aqueous Cleaning Compositions for Microelectronics Substrates
Application:
12/161,886 →
Vegetarian Protein A Preparation and Methods Thereof
Application:
12/046,582 →
Compositions for the Removal of Post-Etch and Ashed Photoresist Residues and Bulk Photoresist
Application:
11/911,346 →
Non-Aqueous Photoresist Stripper That Inhibits Galvanic Corrosion
Application:
11/910,281 →
Compositions for Cleaning Ion Implanted Photoresist in Front End of Line Applications
Application:
11/817,874 →
Chromatographic Media
Application:
11/813,434 →
Microelectronic Cleaning Compositions Containing Ammonia-Free Fluoride Salts for Selective Photoresist Stripping and Plasma Ash Residue Cleaning
Application:
11/762,087 →
Non-Aqueous, Non-Corrosive Microelectronic Cleaning Compositions
Application:
11/720,084 →
Non-Aqueous, Non-Corrosive Microelectronic Cleaning Compositions Containing Polymeric Corrosion Inhibitors
Application:
11/719,690 →
Preparation of Ultrapure Polymeric Articles
Application:
11/631,586 →
Non-Aqueous Microelectronic Cleaning Compositions Containing Fructose
Application:
11/630,602 →
Cleaning Compositions for Microelectronic Substrates
Application:
11/630,603 →
Purified vegetarian protein A and process for production thereof
Application:
11/521,246 →
Nanoelectronic and Microelectronic Cleaning Compositions
Application:
10/584,827 →
Alkaline, Post Plasma Etch/Ash Residue Removers and Photoresist Stripping Compositions Containing Metal-Halide Corrosion Inhibitors
Application:
10/572,860 →
Stripping and Cleaning Compositions for Microelectronics
Application:
11/349,635 →
Vegetarian Protein a Preparation and Methods Thereof
Application:
11/194,093 →
Microelectronic Cleaning Compositions Containing Oxidizers and Organic Solvents
Application:
10/515,392 →
Microelectronic cleaning and arc remover compositions
Application:
10/515,372 →
Microelectronic Cleaning Composition Containing Halogen Oxygen Acids, Salts and Derivatives Thereof
Application:
10/982,330 →
Methods and Systems for the Rapid Detection of Concealed Objects
Application:
10/952,665 →
Microelectronic Cleaning Compositions Containing Ammonia-Free Fluoride Salts
Application:
10/483,036 →
Ammonia-Free Alkaline Microelectronic Cleaning Compositions with Improved Substrate Compatibility
Application:
10/483,037 →
Mounting Medium
Application:
10/628,456 →
Functionalized Polymeric Media for Separation of Analytes
Application:
10/250,570 →
Method and Composition for Removing Sodium-Containing Material from Microcircuit Substrates
Application:
10/220,720 →
Karl Fischer Reagent
Application:
09/979,313 →
Mounting Medium
Application:
09/968,043 →
Photoresist Strippers Containing Reducing Agents to Reduce Metal Corrosion
Application:
09/968,665 →
Stabilized Alkaline Compositions for Cleaning Microlelectronic Substrates
Application:
09/859,142 →