IP Library Assignment 027064/0622
Patent Assignment
Reel/Frame 027064/0622

Change of Name

Recorded: 2011-10-14 Pages: 5
Assignor
DALSA SEMICONDUCTOR INC.
Executed: 2011-02-14
Assignee
TELEDYNE DALSA SEMICONDUCTOR INC.
605 MCMURRAY ROAD, WATERLOO, ONTARIO, N2V 2E9, CANADA
Covered Properties (50)
Spin-On Glass Processing Technique for the Fabrication of Semiconductor Devices
Patent: 5,320,983 →
Application: 07/930,615 →
Sog with Moisture Resistant Protective Capping Layer
Patent: 5,364,818 →
Application: 07/962,214 →
Moisture-Free Sog Process
Patent: 5,470,798 →
Application: 07/965,264 →
Multi-Level Interconnection Cmos Devices with Sog
Patent: 5,457,073 →
Application: 08/039,485 →
Preventing of via Poisoning by Glow Discharge Induced Desorption
Patent: 5,447,613 →
Application: 08/078,166 →
High Performance Passivation for Semiconductor Devices
Patent: 5,541,445 →
Application: 08/196,078 →
Method of Preparing Antimony Doped Semiconductor with Intrinsic Gettering
Patent: 5,587,325 →
Application: 08/313,091 →
Stabilization of the Interface Between Aluminum and Titanium Nitride
Patent: 5,747,361 →
Application: 08/543,497 →
Substrtae Processing Apparatus with Non-Evaporable Getter Pump
Patent: 5,935,395 →
Application: 08/666,256 →
Integrated Processing for an Etch Module Using a Hard Mask Technique
Patent: 6,074,946 →
Application: 08/794,441 →
Stabilization of the Interface Between Tin and A1 Alloys
Patent: 6,127,266 →
Application: 08/979,956 →
Method of Protecting Light Sensitive Regions of Integrated Circuits
Patent: 6,133,060 →
Application: 09/010,191 →
Method of Forming Capacitors on Integrated Circuit
Patent: 6,268,620 →
Application: 09/236,101 →
Method of Forming Capacitors in a Semiconductor Device
Patent: 6,083,805 →
Application: 09/314,105 →
Surface Stabilization of Silicon Rich Silica Glass Using Increased Post Deposition Delay
Patent: 6,372,671 →
Application: 09/652,796 →
Method of Depositing a Thick Dielectric Film
Patent: 6,598,610 →
Application: 09/775,465 →
Publication: US 2002/0106459
Method of Making a Functional Device with Deposited Layers Subject to High Temperature Anneal
Patent: 6,724,967 →
Application: 09/799,491 →
Publication: US 2002/0064359
Method of Inspecting an Anisotropic Etch in a Microstructure
Patent: 6,770,213 →
Application: 09/799,495 →
Publication: US 2002/0088769
Manufacture of Silica Waveguides with Minimal Absorption
Patent: 6,537,623 →
Application: 09/799,496 →
Publication: US 2002/0071914
Manufacture of Integrated Fluidic Devices
Patent: 6,602,791 →
Application: 09/842,836 →
Publication: US 2002/0160561
Method of Forming Spacers in Cmos Devices
Patent: 6,573,133 →
Application: 09/848,278 →
Publication: US 2002/0020884
Micro-Fluidic Devices
Patent: 6,825,127 →
Application: 09/910,795 →
Publication: US 2003/0022505
Method of Aligning Structures on Opposite Sides of a Wafer
Patent: 6,555,441 →
Application: 09/923,367 →
Publication: US 2003/0032299
Method of Depositing an Optical Quality Silica Film by Pecvd
Patent: 6,716,476 →
Application: 09/956,916 →
Publication: US 2003/0059556
Method of Making High-Voltage Bipolar/Cmos/Dmos (Bcd) Devices
Patent: 6,849,491 →
Application: 09/964,472 →
Publication: US 2003/0068844
Method of Making Specular Infrared Mirrors for Use in Optical Devices
Patent: 6,656,528 →
Application: 09/987,829 →
Publication: US 2003/0094433
Method of Preventing Cracking in Optical Quality Silica Layers
Patent: 6,749,893 →
Application: 10/059,117 →
Publication: US 2003/0143334
Method of Making Photonic Devices with Sog Interlayer
Patent: 6,937,806 →
Application: 10/101,622 →
Publication: US 2003/0180021
Wafer-Level Mems Packaging
Patent: 6,635,509 →
Application: 10/120,528 →
Fabrication of Microstructures with Vacuum-Sealed Cavity
Patent: 6,902,656 →
Application: 10/153,593 →
Publication: US 2003/0217915
Fabrication of Mems Devices with Spin-on Glass
Patent: 6,896,821 →
Application: 10/226,189 →
Publication: US 2004/0035820
Wafer Level Packaging Technique for Microdevices
Patent: 7,138,293 →
Application: 10/310,814 →
Publication: US 2004/0067604
A Method of Forming an Optical Sensor Device Having a Composite Sandwich Structure of Alternating Titanium Nitride Layers
Patent: 6,833,282 →
Application: 10/435,043 →
Publication: US 2003/0197209
Method of Fabricating Silicon-Based Mems Devices
Patent: 7,144,750 →
Application: 10/459,619 →
Publication: US 2005/0233492
Method of Making Electrical Connections to Hermetically Sealed Mems Devices
Patent: 7,037,745 →
Application: 10/839,130 →
Publication: US 2005/0250238
Titanium Silicate Films with High Dielectric Constant
Patent: 7,101,754 →
Application: 10/864,472 →
Publication: US 2005/0277304
Hermetic Wafer-Level Packaging for Mems Devices with Low-Temperature Metallurgy
Patent: 7,291,513 →
Application: 11/004,973 →
Publication: US 2005/0142685
Method of Making High-Voltage Bipolar/Cmos/Dmos (Bcd) Devices
Patent: 7,341,905 →
Application: 11/020,217 →
Publication: US 2005/0136599
Fabrication of Mems Devices with Spin-on Glass
Patent: 7,579,622 →
Application: 11/054,946 →
Publication: US 2005/0145962
Method of Making a Mems Device Containing a Cavity with Isotropic Etch Followed by Anisotropic Etch
Patent: 7,439,093 →
Application: 11/227,065 →
Publication: US 2007/0065967
Fabrication of Advanced Silicon-Based Mems Devices
Patent: 7,160,752 →
Application: 11/242,960 →
Publication: US 2006/0166403
Method of Fabricating Silicon-Based Mems Devices
Patent: 7,459,329 →
Application: 11/254,774 →
Publication: US 2006/0110895
Anhydrous Hf Release of Process for Mems Devices
Patent: 7,365,016 →
Application: 11/314,535 →
Publication: US 2006/0211163
Method of Making Mems Wafers
Patent: 7,807,550 →
Application: 11/424,059 →
Publication: US 2007/0015341
Method for Removing Residues Formed During the Manufacture of Mems Devices
Patent: 8,071,486 →
Application: 11/457,911 →
Publication: US 2007/0134927
Method of Reducing Stress-Induced Mechanical Problems in Optical Components
Patent: 7,614,253 →
Application: 11/561,044 →
Publication: US 2007/0130996
Protection Capsule for Mems Devices
Patent: 7,682,860 →
Application: 11/687,287 →
Publication: US 2007/0231943
Method of Controlling Film Stress in Mems Devices
Patent: 7,799,376 →
Application: 11/829,646 →
Publication: US 2009/0029533
Microchannels for Biomems Devices
Patent: 7,799,656 →
Application: 12/045,853 →
Publication: US 2008/0299695
Method of Making Biomems Devices
Patent: 7,927,904 →
Application: 12/651,561 →
Publication: US 2010/0173436
Related Assignments (4)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 17, 2001
From: ROY, MARC; DAIGLE, MANON; LESSARD, BRUNO; COUTURE, GINETTE
To: MITEL CORPORATION
Reel/Frame 012082/0266 →
Assignment of Assignor's Interest Oct 12, 2001
From: OUELLET, LUC; TYLER, HEATHER
To: ZARLINK SEMICONDUCTOR INC.
Reel/Frame 012248/0008 →
Assignment of Assignor's Interest Oct 25, 2001
From: OUELLET, LUC; TYLER, HEATHER
To: MITEL CORPORATION
Reel/Frame 012282/0659 →
Merger Feb 26, 2021
From: TELEDYNE DALSA SEMICONDUCTOR INC.
To: TELEDYNE DIGITAL IMAGING, INC.
Reel/Frame 055434/0643 →