Granted Patent B2

US 12,482,857 · App. 18/671,767 · Granted Nov 25, 2025

Inventors: Steven J. Visco (Berkeley, CA); Vitaliy Nimon (Berkeley, CA); Valentina Loginova (Berkeley, CA); Yevgeniy S. Nimon (Berkeley, CA); Bruce D. Katz (Berkeley, CA)

Assignee: PolyPlus Battery Company

H01M10/0562C03C15/00H01M10/0525H01M2300/0068

Abstract

Claims (18)

1 . A method of making a unitary Li ion conducting glass structure, the method comprising:

i) providing a substantially dense and flat Li ion conducting sulfide glass substrate, the substrate having first and second opposing major surfaces;

ii) etching a hole pattern into one or both major surfaces to produce a plurality of discrete spaced-apart closed end holes and/or trenches, wherein the etching involves contacting the substrate surface with an etching media; and

wherein the etching involves exposing the first major substrate surface to a liquid etching solution comprising water as etchant and acetonitrile as carrier solvent that is inert in direct contact with the glass substrate.

2 . A method of making a unitary Li ion conducting glass structure, the method comprising:

i) providing a substantially dense and flat Li ion conducting sulfide glass substrate, the substrate having first and second opposing major surfaces;

ii) etching a hole pattern into one or both major surfaces to produce a plurality of discrete spaced-apart closed end holes and/or trenches, wherein the etching involves contacting the substrate surface with an etching media; and

wherein the etching involves exposing the first substrate surface to a liquid etching solution comprising an organic carbonic acid as the etchant and a carrier solvent that is inert in direct contact with the glass substrate.

3 . The method of claim 2 wherein the carrier solvent is an aprotic solvent selected from the group consisting of glymes and organic carbonates.

4 . A method of making a unitary Li ion conducting glass structure, the method comprising:

i) providing a substantially dense and flat Li ion conducting sulfide glass substrate, the substrate having first and second opposing major surfaces;

ii) etching a hole pattern into one or both major surfaces to produce a plurality of discrete spaced-apart closed end holes and/or trenches, wherein the etching involves contacting the substrate surface with an etching media; and

wherein the etching media is a gaseous/vapor etching mixture comprising an organic carbonic acid as etchant and a carrier gas that is inert in direct contact with the glass substrate.

5 . A method of making a unitary Li ion conducting glass structure, the method comprising:

i) providing a substantially dense and flat Li ion conducting sulfide glass substrate, the substrate having first and second opposing major surfaces;

ii) etching a hole pattern into one or both major surfaces to produce a plurality of discrete spaced-apart closed end holes and/or trenches, wherein the etching involves contacting the substrate surface with an etching media; and

wherein the etching media is a gaseous/vapor etching mixture comprising water as the etchant and a carrier gas that is inert in direct contact with the glass substrate.

6 . The method of claim 5 wherein the carrier gas is one or more of argon gas and nitrogen gas.

Continuity (5)

References Cited (400)

Cited By (1)

US 12,744,239