IP Library › Granted Patent US 12,593,511
Granted Patent B2
US 12,593,511 · App. 18/197,622 · Granted Mar 31, 2026

Radio frequency interference mitigation for silicon-on-insulator devices

Inventors: Ambarish Roy (Arlington, MA); Richard Peter Gulezian, II (Atkinson, NH); Lakshminarayanan Alampoondi Venkatesan (Woburn, MA); Nuttapong Srirattana (Lexington, MA)
Assignee: Skyworks Solutions, Inc.
H10D87/00H01L23/481H01L23/5286H01L23/66H10D86/201H01L2223/6677
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Quick Facts
Patent No.
US 12,593,511
App. No.
18/197,622
Granted
Mar 31, 2026
Kind
B2
Abstract

Disclosed is a silicon on insulator (SOI) radio frequency (RF) module with noise reduction shielding to mitigate radio frequency interference (RFI) between active circuit devices within the module. The RF module includes various semiconductor active devices disposed upon an insulating substrate. The RF module can be a front-end module (FEM) with one or more charge pumps as active devices. A polysilicon web extends between and underneath the devices to create a network of ground paths across a surface of the insulating substrate. The ground paths effectively conduct RF noise to a circuit ground, causing the polysilicon ground web to eliminate or substantially attenuate RFI produced by the active devices without altering signal characteristics of the RF module. The disclosed solution also reduces RF noise leakage into the substrate, and can reduce RFI between neighboring RF modules.

Claims (28)

1 . A radio frequency module comprising:

a semiconductor die including a silicon substrate, a polysilicon layer, and a plurality of metal layers above the polysilicon layer;

a first active device formed in the semiconductor die and a second active device formed in the semiconductor die; and

a polysilicon ground web formed within the polysilicon layer and connected from the polysilicon layer to a circuit ground via a path formed from the polysilicon layer through silicon substrate, the polysilicon ground web extending around at least a portion of a periphery of the first active device, at least a portion of a periphery of the second active device, and between the first active device and the second active device.

2 . The radio frequency module of claim 1 wherein the first active device includes a transistor and the second active device does not include a transistor.

3 . The radio frequency module of claim 2 wherein the first active device includes a metal oxide semiconductor silicon-on-insulator transistor.

4 . The radio frequency module of claim 2 wherein the second active device is a metal-insulator-metal (MIM) capacitor.

5 . The radio frequency module of claim 2 wherein the polysilicon ground web extends beneath the second active device and does not extend beneath the first active device.

6 . The radio frequency module of claim 2 wherein the radio frequency module is a radio frequency front-end module including one or more power amplifiers and one or more charge pumps.

7 . The radio frequency module of claim 1 further comprising a through wafer via extending from the polysilicon layer through the silicon substrate to form the path to the circuit ground.

8 . A semiconductor die comprising:

a silicon substrate, a polysilicon layer, and a plurality of metal layers above the polysilicon layer;

a first active device and a second active device; and

a polysilicon ground web formed within the polysilicon layer and connected from the polysilicon layer to a circuit ground via a path formed from the polysilicon layer through silicon substrate, the polysilicon ground web extending around at least a portion of a periphery of the first active device, at least a portion of a periphery of the second active device, and between the first active device and the second active device.

9 . The semiconductor die of claim 8 wherein the first active device includes a transistor and the second active device does not include a transistor.

10 . The semiconductor die of claim 9 wherein the first active device includes a metal oxide semiconductor silicon-on-insulator transistor.

11 . The semiconductor die of claim 9 wherein the second active device is a metal-insulator-metal (MIM) capacitor.

12 . The semiconductor die of claim 9 wherein the polysilicon ground web extends beneath the second active device and does not extend beneath the first active device.

13 . The semiconductor die of claim 9 wherein the semiconductor die is a component of a radio frequency front-end module including one or more power amplifiers and one or more charge pumps.

14 . The semiconductor die of claim 8 further comprising a through wafer via extending from the polysilicon layer through the silicon substrate to form the path to the circuit ground.

15 . A mobile device comprising:

a radio frequency module including a semiconductor die including a silicon substrate, a polysilicon layer, and a plurality of metal layers above the polysilicon layer; a first active device formed in the semiconductor die and a second active device formed in the semiconductor die; and a polysilicon ground web formed within the polysilicon layer and connected from the polysilicon layer to a circuit ground via a path formed from the polysilicon layer through silicon substrate, the polysilicon ground web extending around at least a portion of a periphery of the first active device, at least a portion of a periphery of the second active device, and between the first active device and the second active device; and

an antenna coupled to the radio frequency module.

16 . The mobile device of claim 15 wherein the first active device includes a transistor and the second active device does not include a transistor.

17 . The mobile device of claim 16 wherein the second active device is a metal-insulator-metal (MIM) capacitor.

18 . The mobile device of claim 16 wherein the polysilicon ground web extends beneath the second active device and does not extend beneath the first active device.

19 . The mobile device of claim 16 wherein the radio frequency module is a radio frequency front-end module including one or more power amplifiers and one or more charge pumps.

20 . The mobile device of claim 15 further comprising a through wafer via extending from the polysilicon layer through the silicon substrate to form the path to the circuit ground.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 18, 2024
From: ROY, AMBARISH; GULEZIAN, RICHARD PETER, II; VENKATESAN, LAKSHMINARAYANAN ALAMPOONDI; SRIRATTANA, NUTTAPONG
To: SKYWORKS SOLUTIONS, INC.
Reel/Frame 066810/0237 →
Continuity (3)
Provisional Application 63342545 · May 16, 2022
Provisional Application 63342549 · May 16, 2022
Related Publication 20230369338A1 · Nov 16, 2023
References Cited (130)
US 6777774B2 · Beng et al. · 2004 [cited by applicant]
US 7368760B2 · Levin et al. · 2008 [cited by applicant]
US 7732866B2 · Cote et al. · 2010 [cited by applicant]
US 9160328B2 · Altunkilic et al. · 2015 [cited by applicant]
US 9456490B2 · Roy et al. · 2016 [cited by applicant]
US 9467124B2 · Crandall et al. · 2016 [cited by applicant]
US 9548522B2 · Whitefield et al. · 2017 [cited by applicant]
US 9577626B2 · Crandall et al. · 2017 [cited by applicant]
US 9721936B2 · Zhu et al. · 2017 [cited by applicant]
US 9729048B2 · Crandall et al. · 2017 [cited by applicant]
US 9741653B2 · Roy et al. · 2017 [cited by applicant]
US 9837993B2 · Crandall et al. · 2017 [cited by applicant]
US 9847774B2 · Crandall et al. · 2017 [cited by applicant]
US 9852978B2 · Roy et al. · 2017 [cited by applicant]
US 9871512B2 · Ho · 2018 [cited by applicant]
US 9888564B2 · Roy et al. · 2018 [cited by applicant]
US 9935627B2 · Cebi et al. · 2018 [cited by applicant]
US 9948313B1 · Rafi · 2018 [cited by applicant]
US 9953938B2 · Srirattana et al. · 2018 [cited by applicant]
US 9954564B2 · Little et al. · 2018 [cited by applicant]
US 9979068B2 · Whitefield et al. · 2018 [cited by applicant]
US 10056901B2 · Roy et al. · 2018 [cited by applicant]
US 10069492B2 · Ho · 2018 [cited by applicant]
US 10103726B2 · Wilz et al. · 2018 [cited by applicant]
US 10164681B2 · Roy et al. · 2018 [cited by applicant]
US 10229902B2 · Zhu et al. · 2019 [cited by applicant]
US 10256794B2 · Srirattana et al. · 2019 [cited by applicant]
US 10284200B2 · Roy et al. · 2019 [cited by applicant]
US 10326443B2 · Ho · 2019 [cited by applicant]
US 10483843B2 · Crandall et al. · 2019 [cited by applicant]
US 10541682B2 · Popplewell et al. · 2020 [cited by applicant]
US 10547305B2 · Wilz et al. · 2020 [cited by applicant]
US 10680516B2 · Crandall et al. · 2020 [cited by applicant]
US 10700063B2 · Blin et al. · 2020 [cited by applicant]
US 10749512B2 · Balteanu et al. · 2020 [cited by applicant]
US 10840233B2 · Zhu et al. · 2020 [cited by applicant]
US 10985733B2 · Srirattana et al. · 2021 [cited by applicant]
US 11159158B2 · Popplewell et al. · 2021 [cited by applicant]
US 11177802B2 · Yang et al. · 2021 [cited by applicant]
US 11190182B2 · Balteanu et al. · 2021 [cited by applicant]
US 11196159B2 · Liu et al. · 2021 [cited by applicant]
US 11217581B2 · Blin et al. · 2022 [cited by applicant]
US 11374491B2 · Lam · 2022 [cited by applicant]
US 11431327B2 · Balteanu et al. · 2022 [cited by applicant]
US 11502678B2 · Yang et al. · 2022 [cited by applicant]
US 11595008B2 · Jain et al. · 2023 [cited by applicant]
US 11658568B2 · Lam · 2023 [cited by applicant]
US 11682699B2 · Roy et al. · 2023 [cited by applicant]
US 11689202B2 · Balteanu et al. · 2023 [cited by applicant]
US 11817456B2 · Blin et al. · 2023 [cited by applicant]
US 11817829B2 · Padyana et al. · 2023 [cited by applicant]
US 11855361B2 · Liu et al. · 2023 [cited by applicant]
US 11923808B2 · Jain et al. · 2024 [cited by applicant]
US 11973115B2 · Roy et al. · 2024 [cited by applicant]
US 12028072B2 · Balteanu et al. · 2024 [cited by applicant]
US 12057611B2 · Srirattana et al. · 2024 [cited by applicant]
US 12074573B2 · Padyana et al. · 2024 [cited by applicant]
US 12142809B2 · Yang et al. · 2024 [cited by applicant]
US 12184240B2 · Jain et al. · 2024 [cited by applicant]
US 20030197243A1 · Beng et al. · 2003 [cited by applicant]
US 20050273732A1 · Xu et al. · 2005 [cited by applicant]
US 20060125039A1 · Levin et al. · 2006 [cited by applicant]
US 20070221990A1 · Cote et al. · 2007 [cited by applicant]
US 20080217727A1 · Kjar · 2008 [cited by applicant]
US 20090020856A1 · Collins et al. · 2009 [cited by applicant]
US 20090106713A1 · Collins et al. · 2009 [cited by applicant]
US 20090146211A1 · Cote et al. · 2009 [cited by applicant]
US 20090250262A1 · Jin · 2009 [cited by applicant]
US 20140009207A1 · Cebi et al. · 2014 [cited by applicant]
US 20140009214A1 · Altunkillic et al. · 2014 [cited by applicant]
US 20140042637A1 · Shinh et al. · 2014 [cited by applicant]
US 20150041917A1 · Zhu et al. · 2015 [cited by applicant]
US 20150129965A1 · Roy et al. · 2015 [cited by applicant]
US 20150145614A1 · Whitefield et al. · 2015 [cited by applicant]
US 20160066416A1 · Roy et al. · 2016 [cited by applicant]
US 20160225709A1 · Roy et al. · 2016 [cited by applicant]
US 20170013708A1 · Roy et al. · 2017 [cited by applicant]
US 20170125874A1 · Whitefield et al. · 2017 [cited by applicant]
US 20170141759A1 · Srirattana et al. · 2017 [cited by applicant]
US 20170230066A1 · Little et al. · 2017 [cited by applicant]
US 20170237432A1 · Roy et al. · 2017 [cited by applicant]
US 20170287854A1 · Srirattana et al. · 2017 [cited by applicant]
US 20170287935A1 · Mason et al. · 2017 [cited by applicant]
US 20170346482A1 · Cebi et al. · 2017 [cited by applicant]
US 20170353211A1 · Roy et al. · 2017 [cited by applicant]
US 20180047715A1 · Zhu et al. · 2018 [cited by applicant]
US 20180108988A1 · Liu et al. · 2018 [cited by applicant]
US 20180131369A1 · Popplewell · 2018 [cited by examiner]
US 20180331713A1 · Liu et al. · 2018 [cited by applicant]
US 20180351554A1 · Roy et al. · 2018 [cited by applicant]
US 20190206863A1 · Blin et al. · 2019 [cited by applicant]
US 20190207586A1 · Srirattana et al. · 2019 [cited by applicant]
US 20190253054A1 · Roy et al. · 2019 [cited by applicant]
US 20190273076A1 · Zhu et al. · 2019 [cited by applicant]
US 20190386104A1 · Roy · 2019 [cited by examiner]
US 20200153428A1 · Popplewell et al. · 2020 [cited by applicant]
US 20200235730A1 · Yang et al. · 2020 [cited by applicant]
US 20210013198A1 · Blin et al. · 2021 [cited by applicant]
US 20210257458A1 · Roy et al. · 2021 [cited by applicant]
US 20220149832A1 · Yang et al. · 2022 [cited by applicant]
US 20220254777A1 · Blin et al. · 2022 [cited by applicant]
US 20220255218A1 · Liu et al. · 2022 [cited by applicant]
US 20220271409A1 · Yang et al. · 2022 [cited by applicant]
US 20220285152A1 · Takeuchi et al. · 2022 [cited by applicant]
US 20220359970A1 · Srinivasan et al. · 2022 [cited by applicant]
US 20220359971A1 · Srinivasan et al. · 2022 [cited by applicant]
US 20220393326A1 · Srirattana et al. · 2022 [cited by applicant]
US 20230006549A1 · Liu et al. · 2023 [cited by applicant]
US 20230074393A1 · Balteanu et al. · 2023 [cited by applicant]
US 20230114964A1 · Blin et al. · 2023 [cited by applicant]
US 20230275127A1 · Roy et al. · 2023 [cited by applicant]
US 20230283178A1 · Lam · 2023 [cited by applicant]
US 20230369337A1 · Roy et al. · 2023 [cited by applicant]
US 20230369338A1 · Roy et al. · 2023 [cited by applicant]
US 20240030909A1 · Obkircher et al. · 2024 [cited by applicant]
US 20240153946A1 · Blin et al. · 2024 [cited by applicant]
US 20240204401A1 · Liu et al. · 2024 [cited by applicant]
US 20240243705A1 · Srirattana et al. · 2024 [cited by applicant]
US 20240347600A1 · Roy et al. · 2024 [cited by applicant]
US 20250007499A1 · Balteanu et al. · 2025 [cited by applicant]
CN 100413078C · 2008 [cited by applicant]
CN 106449593A · 2017 [cited by applicant]
CN 106449593B · 2018 [cited by applicant]
CN 110310941A · 2019 [cited by applicant]
CN 110310941B · 2021 [cited by applicant]
CN 114787993A · 2022 [cited by applicant]
EP 3823014 · 2021 [cited by applicant]
KR 20210101321A · 2021 [cited by applicant]
WO WO2005104814 · 2005 [cited by applicant]
U.S. Appl. No. 18/197,616, filed May 15, 2023, Noise Reduction In Silicon-On-Insulator Devices. [cited by applicant]