IP Library › Assignment 015035/0270
Patent Assignment
Reel/Frame 015035/0270

Confirmatory Assignment

Recorded: 2004-08-03 Pages: 6
Assignor
CARL-ZEISS-STIFTUNG
Executed: 2004-06-30
Assignee
CARL ZEISS SMT AG
CARL-ZEISS-STRASSE, OBERKOCHEN, 73447, GERMANY
Covered Properties (26)
Reticular Objective for Microlithography-Projection Exposure Installations
Patent: 6,366,410 →
Application: 09/125,621 →
Optical System with Polarization Compensator
Patent: 6,252,712 →
Application: 09/252,636 →
Optical Arrangement and Projection Illumination Equipment for Microlithography with Passive Thermal Compensation
Application: 09/255,137 →
Reticle with Crystal Support Material and Pellicle
Patent: 6,825,913 →
Application: 09/261,080 →
Active Mirror
Patent: 6,193,381 →
Application: 09/272,850 →
Catadioptric Projection Objective with Adaptive Mirror and Projection Exposure Method
Application: 09/321,908 →
Assembly of Optical Element and Mount
Patent: 6,229,657 →
Application: 09/328,938 →
Process for the Correction of Non-Rotationally-Symmetrical Image Errors
Patent: 6,198,579 →
Application: 09/336,341 →
Positioning Device
Patent: 6,276,066 →
Application: 09/354,532 →
Catadioptric Optical System and Exposure Apparatus Having the Same
Patent: 6,496,306 →
Application: 09/364,382 →
Microlithographic Reduction Objective, Projection Exposure Equipment and Process
Patent: 6,349,005 →
Application: 09/416,105 →
Catadioptric Objective Comprising Two Intermediate Images
Patent: 6,600,608 →
Application: 09/434,702 →
Projection Objective
Patent: 6,522,484 →
Application: 09/444,063 →
Objective with Crystal Lenses and Projection Exposure Equipment for Microlithography
Patent: 6,683,729 →
Application: 09/451,505 →
Optical imaging device, particularly an objective, with at least one optical element
Patent: 6,191,898 →
Application: 09/483,320 →
Optical projection system
Application: 09/746,728 →
Publication: US 2002/0001141
Process for the Decontamination of Microlithographic Projection Exposure Devices
Patent: 6,936,825 →
Application: 09/754,841 →
Publication: US 2001/0026402
Optical Projection System
Patent: 6,590,715 →
Application: 09/754,939 →
Publication: US 2001/0050820
SIO2-Coated Mirror Substrate for Euv
Patent: 6,453,005 →
Application: 09/756,018 →
Publication: US 2001/0028518
Microlithographic Illumiation System with Depolarizer
Patent: 6,535,273 →
Application: 09/756,028 →
Beamsplitter
Application: 09/759,956 →
Publication: US 2001/0024329
Microlithographic Illuminating System and Microlithographic Projection Exposure Arrangement Incorporating Said System
Patent: 6,597,511 →
Application: 09/820,625 →
Publication: US 2001/0043408
Optical Arrangement and Projection Exposure System for Microlithography with Passive Thermal Compensation
Patent: 7,274,430 →
Application: 09/934,817 →
Publication: US 2002/0008858
Catadioptric Optical System and Exposure Apparatus Having the Same
Patent: 6,717,722 →
Application: 10/079,964 →
Publication: US 2002/0196533
Catadioptric Projection Objective with Adaptive Mirror and Projection Exposure Method
Patent: 7,112,772 →
Application: 10/759,964 →
Publication: US 2004/0144915
Optical Arrangement and Projection Exposure System for Microlithography with Passive Thermal Compensation
Application: 10/826,823 →
Publication: US 2004/0207825
Related Assignments (3)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Jun 7, 2004
From: CARL-ZEISS -STIFTUNG, HEIDENHEIM-BRENZ
To: CARL ZEISS SMT AG
Reel/Frame 015428/0524 →
Assignment of Assignor's Interest Sep 24, 2007
From: WAGNER, CHRISTIAN; TRUNZ, MICHAEL; HILGERS, RALF
To: CARL ZEISS SMT AG
Reel/Frame 019865/0234 →
A Modifying Conversion Jan 18, 2011
From: CARL ZEISS SMT AG
To: CARL ZEISS SMT GMBH
Reel/Frame 025763/0367 →