IP Library › Granted Patent US 12,243,725
Granted Patent B2
US 12,243,725 · App. 17/823,744 · Granted Mar 4, 2025

High temperature RF connection with integral thermal choke

Inventors: Timothy S. Thomas (Wilsonville, OR); Vincent Burkhart (Cupertino, CA); Joel Hollingsworth (Portland, OR); David French (Fort Myers, FL); Damien Slevin (Salem, OR)
Assignee: Lam Research Corporation
H01J37/32577H01J37/32082C23C16/4586C23C16/505H01J37/32091H01J37/32715H01J37/32724
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Quick Facts
Patent No.
US 12,243,725
App. No.
17/823,744
Granted
Mar 4, 2025
Kind
B2
Abstract

A thermal choke rod connecting a radio frequency source to a substrate support of a plasma processing system includes a tubular member having a first connector for connecting to an RF rod coupled to the substrate support and a second connector for connecting to an RF strap that couples to the RF source. A tubular segment extends between the first and second connectors. The first connector has a conically-shaped end region that tapers away from the inner surface thereof to an outer surface in a direction toward the tubular segment, and slits that extend for a prescribed distance from a terminal end of the first connector. The outer surface of the tubular segment has a threaded region for threaded engagement with an annular cap that fits over the first connector and reduces an inner diameter of the first connector upon contact with the conically-shaped end region of the first connector.

Claims (32)

1. A thermal choke member of a plasma processing system, the thermal choke member comprising:

a first connector configured to connect to an RF input rod of the plasma processing system, wherein the RF input rod is coupled to an electrode of a substrate support of the plasma processing system, wherein the first connector has an inner surface and an outer surface to define a wall thickness, wherein the wall thickness tapers at an end region of the first connector to a terminal end of the first connector;

a second connector configured to connect to an RF strap that couples to an RF source, wherein the RF source is configured to provide an RF signal to the RF input rod via the thermal choke member; and

a segment that extends between the first connector and the second connector, wherein the first connector has the inner surface that is a continuation of an inner surface of the segment, wherein an inner diameter of the first connector is less than an inner diameter of the segment, wherein the first connector has a plurality of slits formed through the wall thickness of the first connector, the plurality of slits at the terminal end of the first connector and extending contiguously a prescribed distance from the terminal end of the first connector to define a plurality of axial fingers.

2. The thermal choke member of claim 1 , wherein the thermal choke member thermally isolates the RF input rod from the RF strap and provides electrical interconnection between the RF strap and the RF input rod.

3. The thermal choke member of claim 1 , wherein the first connector tapers away from the inner surface of the first connector at the terminal end to the outer surface of the first connector in a direction toward the segment.

4. The thermal choke member of claim 3 , wherein the first connector tapers away from the inner surface to the outer surface at an angle between 10 degrees and 30 degrees relative to a horizontal reference line.

5. The thermal choke member of claim 1 , wherein an outer surface of the segment has a threaded region proximate to the first connector, wherein the threaded region is configured for engagement with an annular cap.

6. The thermal choke member of claim 5 , wherein the annular cap is configured to fit over the first connector and is further configured to reduce the inner diameter of the first connector in response to contact between the annular cap and at least a portion of the first connector.

7. The thermal choke member of claim 5 , wherein the prescribed distance of the plurality of slits is sufficient to cause the plurality of axial fingers to be radially compressed against the RF input rod in response to contact between the annular cap and at least a portion of the first connector.

8. The thermal choke member of claim 1 , wherein a base material of the thermal choke member comprises stainless steel or nickel-chromium-based superalloy, wherein an electrically conductive material is plated on the base material, wherein the conductive material comprises gold.

9. The thermal choke member of claim 1 , wherein the RF strap is connected to the second connector by a mechanical fastener.

10. The thermal choke member of claim 1 , wherein the prescribed distance of the plurality of slits extends for 20% to 40% of a length of the first connector.

11. A plasma processing system comprising:

an RF source configured to transmit RF signals;

an RF input rod having a first end connected to a plasma processing chamber and a second end configured to receive the RF signals from the RF source;

an RF strap coupled to the RF source; and

a thermal choke member comprising:

a first connector connected to the RF input rod, wherein the first connector has an inner surface and an outer surface to define a wall thickness, wherein the wall thickness tapers at an end region of the first connector to a terminal end of the first connector;

a second connector connected to the RF strap; and

a segment that extends between the first connector and the second connector, wherein the first connector has the inner surface that is a continuation of an inner surface of the segment, wherein an inner diameter of the first connector is less than an inner diameter of the segment, wherein the first connector has a plurality of slits formed through the wall thickness of the first connector, the plurality of slits at a terminal end of the first connector and extending contiguously a prescribed distance from the terminal end of the first connector to define a plurality of axial fingers.

12. The plasma processing system of claim 11 , further comprising:

a substrate support disposed in the plasma processing chamber, wherein the RF input rod is coupled to the substrate support.

13. The plasma processing system of claim 11 , further comprising:

an annular cap over the first connector, wherein the annular cap is configured to reduce the inner diameter of the first connector in response to contact between the annular cap and at least a portion of the first connector.

14. The plasma processing system of claim 13 , wherein the annular cap has an inner threaded region for threaded engagement with a region of the segment proximate to the first connector.

15. The plasma processing system of claim 13 , wherein the prescribed distance of the plurality of slits is sufficient to cause the plurality of axial fingers to be radially compressed against the RF input rod in response to contact between the annular cap and at least a portion of the first connector.

16. The plasma processing system of claim 11 , wherein the first connector tapers away from the inner surface of the first connector at the terminal end to the outer surface of the first connector in a direction toward the segment.

17. The plasma processing system of claim 11 , wherein the thermal choke member thermally isolates the RF input rod from the RF strap and provides electrical interconnection between the RF strap and the RF input rod.

18. The plasma processing system of claim 11 , wherein a base material of the thermal choke member comprises stainless steel or nickel-chromium-based superalloy, wherein an electrically conductive material is plated on the base material, wherein the conductive material comprises gold.

19. The plasma processing system of claim 11 , wherein the RF strap is coupled to an impedance matching network of the RF source.

20. The plasma processing system of claim 11 , wherein the segment comprises a step in the inner surface of the segment, wherein the step serves as a location stop for the RF input rod.

Continuity (2)
Continuation 15696068 · Sep 5, 2017
Related Publication 20220415620A1 · Dec 29, 2022
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