Patent Assignment
Reel/Frame 039924/0311
Merger
Recorded: 2016-10-03
Pages: 11
Assignor
AVANTOR PERFORMANCE MATERIALS, INC.
Executed: 2016-09-27
Assignee
AVANTOR PERFORMANCE MATERIALS, LLC
3477 CORPORATE PARKWAY, SUITE 200, CENTER VALLEY, PENNSYLVANIA, 18034
Covered Properties
(39)
Cleaning Wafer Substrates of Metal Contamination While Maintaining Wafer Smoothness
Patent:
5,989,353 →
Application:
08/729,565 →
Process and Apparatus for Comparing Chemical Products
Patent:
6,311,134 →
Application:
09/247,058 →
Stabilized Alkaline Compositions for Cleaning Microelectronic Substrates
Patent:
6,585,825 →
Application:
09/688,559 →
Silicate-Containing Alkaline Compositions for Cleaning Microelectronic Substrates
Patent:
6,465,403 →
Application:
09/701,114 →
Stabilized Alkaline Compositions for Cleaning Microlelectronic Substrates
Method and Composition for Removing Sodium-Containing Material from Microcircuit Substrates
Functionalized Polymeric Media for Separation of Analytes
Microelectronic Cleaning Compositions Containing Ammonia-Free Fluoride Salts
Ammonia-Free Alkaline Microelectronic Cleaning Compositions with Improved Substrate Compatibility
Microelectronic cleaning and arc remover compositions
Microelectronic Cleaning Compositions Containing Oxidizers and Organic Solvents
Nanoelectronic and Microelectronic Cleaning Compositions
Microelectronic Cleaning Composition Containing Halogen Oxygen Acids, Salts and Derivatives Thereof
Vegetarian Protein a Preparation and Methods Thereof
Stripping and Cleaning Compositions for Microelectronics
Cleaning Compositions for Microelectronic Substrates
Preparation of Ultrapure Polymeric Articles
Non-Aqueous, Non-Corrosive Microelectronic Cleaning Compositions Containing Polymeric Corrosion Inhibitors
Non-Aqueous, Non-Corrosive Microelectronic Cleaning Compositions
Microelectronic Cleaning Compositions Containing Ammonia-Free Fluoride Salts for Selective Photoresist Stripping and Plasma Ash Residue Cleaning
Compositions for the Removal of Post-Etch and Ashed Photoresist Residues and Bulk Photoresist
Gas Sterilizable Two-Part Polymer Delivery System
Stabilized, Non-Aqueous Cleaning Compositions for Microelectronics Substrates
Peroxide Activated Oxometalate Based Formulations for Removal of Etch Residue
Directly Compressible Granular Microcrystalline Cellulose Based Excipient, Manufacturing Process and Use Thereof
Application:
12/619,259 →
Publication:
US 2010/0055180
Post Plasma Etch/Ash Residue and Silicon-Based Anti-Reflective Coating Remover Compositions Containing Tetrafluoroborate Ion
Aqueous Acidic Formulations for Copper Oxide Etch Residue Removal and Prevention of Copper Electrodeposition
Gluconic Acid Containing Photoresist Cleaning Composition for Multi-Metal Device Processing
Multipurpose Acidic, Organic Solvent Based Microelectronic Cleaning Composition
Stripping Compositions for Cleaning Ion Implanted Photoresist from Semiconductor Device Wafers
Compositions and Methods for Texturing Polycrystalline Silicon Wafers
Novel Chromatographic Media Based on Allylamine and Its Derivative for Protein Purification
Application:
14/115,238 →
Publication:
US 2014/0263011
Semi-Aqueous Polymer Removal Compositions with Enhanced Compatibility to Copper, Tungsten, and Porous Low-K Dielectrics
Rinsing Solution to Prevent Tin Pattern Collapse
Dispersions Containing Encapsulated Materials and Compositions Using Same
Package System and Method for Inhibiting Moisture Entry
Application:
15/133,690 →
Publication:
US 2017/0113864
Non-Aqueous Tungsten Compatible Metal Nitride Selective Etchants and Cleaners
Application:
62/312,689 →
Packaging System for Storage and Shipment of Solids
Application:
62/329,568 →
Cleaning Compositions for Microelectronic Substrates Containing Aluminum
Application:
62/349,333 →
Related Assignments
(18)
Other recorded transfers of the patents in this record — the chain of ownership.
Security Interest
Oct 3, 2014
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
Reel/Frame 033882/0488 →
Release of Security Interest
Jun 21, 2016
From: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, INC.
Reel/Frame 038975/0807 →
Release of Security Interest
Jun 21, 2016
From: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, INC.
Reel/Frame 039111/0908 →
Release of Security Interest
Jun 21, 2016
From: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, INC.
Reel/Frame 038976/0233 →
Security Interest
Jun 21, 2016
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
Reel/Frame 038976/0478 →
Security Interest
Jun 21, 2016
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
Reel/Frame 038976/0610 →
Security Interest
Sep 30, 2016
From: NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.)
To: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
Reel/Frame 040192/0613 →
Release of Security Interest
Sep 30, 2016
From: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.)
Reel/Frame 039915/0035 →
Change of Name
Mar 2, 2017
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: AVANTOR PERFORMANCE MATERIALS, LLC
Reel/Frame 041442/0976 →
Security Interest
Mar 10, 2017
From: NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.)
To: JEFFERIES FINANCE LLC
Reel/Frame 041966/0247 →
Security Interest
Mar 10, 2017
From: NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.)
To: JEFFERIES FINANCE LLC
Reel/Frame 041966/0211 →
Release of Security Interest
Mar 10, 2017
From: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.); NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC
Reel/Frame 041966/0313 →
Release (Reel 041966 / Frame 0211)
Nov 27, 2017
From: JEFFERIES FINANCE LLC
To: NUSIL TECHNOLOGY, LLC; APPLIED SILICONE COMPANY, LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY AVANTOR PERFORMANCE MATERIALS, INC.)
Reel/Frame 044810/0207 →
Release (Reel 041966 / Frame 0247)
Nov 27, 2017
From: JEFFERIES FINANCE LLC
To: NUSIL TECHNOLOGY, LLC; APPLIED SILICONE COMPANY LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY AVANTOR PERFORMANCE MATERIALS, INC.)
Reel/Frame 044810/0154 →
Security Agreement
Nov 28, 2017
From: AVANTOR PERFORMANCE MATERIALS, LLC; NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; RELIABLE BIOPHARMACEUTICAL, LLC
To: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
Reel/Frame 044811/0400 →
Security Agreement
Nov 29, 2017
From: AVANTOR PERFORMANCE MATERIALS, LLC; NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; RELIABLE BIOPHARMACEUTICAL, LLC
To: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 044528/0960 →
Security Agreement (Notes)
Nov 6, 2020
From: AVANTOR FLUID HANDLING, LLC; AVANTOR PERFORMANCE MATERIALS, LLC; NUSIL TECHNOLOGY LLC; RELIABLE BIOPHARMACEUTICAL, LLC
To: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 054343/0414 →
Termination and Release of Security Interest in Patents
Nov 16, 2020
From: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A.
To: AVANTOR PERFORMANCE MATERIALS, LLC; NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; RELIABLE BIOPHARMACEUTICAL, LLC
Reel/Frame 054440/0877 →