IP Library Assignment 041966/0211
Patent Assignment
Reel/Frame 041966/0211

Security Interest

Recorded: 2017-03-10 Pages: 16
Assignors
NUSIL TECHNOLOGY LLC
Executed: 2017-03-10
APPLIED SILICONE COMPANY LLC
Executed: 2017-03-10
Assignee
JEFFERIES FINANCE LLC
520 MADISON AVENUE, NEW YORK, NEW YORK, 10022
Covered Properties (47)
System and Method for Curing, Sterilization and Aseptic Packaging of Medical Devices
High Strength Silicone Elastomers and Compositions Therefor
Photoresist Strippers Containing Reducing Agents to Reduce Metal Corrosion
Patent: 6,326,130 →
Application: 08/133,680 →
Process and Apparatus for Comparing Chemical Products
Patent: 6,311,134 →
Application: 09/247,058 →
Stabilized Alkaline Compositions for Cleaning Microelectronic Substrates
Patent: 6,585,825 →
Application: 09/688,559 →
Silicate-Containing Alkaline Compositions for Cleaning Microelectronic Substrates
Patent: 6,465,403 →
Application: 09/701,114 →
Stabilized Alkaline Compositions for Cleaning Microlelectronic Substrates
Patent: 6,599,370 →
Application: 09/859,142 →
Publication: US 2002/0077259
Method and Composition for Removing Sodium-Containing Material from Microcircuit Substrates
Patent: 6,899,818 →
Application: 10/220,720 →
Publication: US 2003/0071010
Functionalized Polymeric Media for Separation of Analytes
Patent: 6,875,817 →
Application: 10/250,570 →
Publication: US 2005/0032922
Microelectronic Cleaning Compositions Containing Ammonia-Free Fluoride Salts
Patent: 7,247,208 →
Application: 10/483,036 →
Publication: US 2004/0149309
Ammonia-Free Alkaline Microelectronic Cleaning Compositions with Improved Substrate Compatibility
Patent: 7,393,819 →
Application: 10/483,037 →
Publication: US 2004/0152608
Microelectronic cleaning and arc remover compositions
Patent: 8,906,838 →
Application: 10/515,372 →
Publication: US 2005/0176602
Microelectronic Cleaning Compositions Containing Oxidizers and Organic Solvents
Patent: 7,419,945 →
Application: 10/515,392 →
Publication: US 2005/0239673
Nanoelectronic and Microelectronic Cleaning Compositions
Patent: 7,767,636 →
Application: 10/584,827 →
Publication: US 2009/0163396
Microelectronic Cleaning Composition Containing Halogen Oxygen Acids, Salts and Derivatives Thereof
Patent: 7,521,406 →
Application: 10/982,330 →
Publication: US 2005/0176603
Vegetarian Protein a Preparation and Methods Thereof
Patent: 7,375,188 →
Application: 11/194,093 →
Publication: US 2007/0026489
Stripping and Cleaning Compositions for Microelectronics
Patent: 7,928,046 →
Application: 11/349,635 →
Publication: US 2006/0154839
Cleaning Compositions for Microelectronic Substrates
Patent: 8,178,482 →
Application: 11/630,603 →
Publication: US 2008/0051308
Preparation of Ultrapure Polymeric Articles
Patent: 7,470,767 →
Application: 11/631,586 →
Publication: US 2007/0249804
Non-Aqueous, Non-Corrosive Microelectronic Cleaning Compositions Containing Polymeric Corrosion Inhibitors
Patent: 7,947,639 →
Application: 11/719,690 →
Publication: US 2009/0156453
Non-Aqueous, Non-Corrosive Microelectronic Cleaning Compositions
Patent: 7,951,764 →
Application: 11/720,084 →
Publication: US 2008/0103078
Microelectronic Cleaning Compositions Containing Ammonia-Free Fluoride Salts for Selective Photoresist Stripping and Plasma Ash Residue Cleaning
Patent: 7,718,591 →
Application: 11/762,087 →
Publication: US 2007/0232513
Compositions for the Removal of Post-Etch and Ashed Photoresist Residues and Bulk Photoresist
Patent: 7,754,668 →
Application: 11/911,346 →
Publication: US 2008/0261846
Stabilized, Non-Aqueous Cleaning Compositions for Microelectronics Substrates
Patent: 7,799,749 →
Application: 12/161,886 →
Publication: US 2009/0005283
Orally Disintegrating Tablets
Patent: 8,545,890 →
Application: 12/270,905 →
Publication: US 2009/0087485
Peroxide Activated Oxometalate Based Formulations for Removal of Etch Residue
Patent: 8,183,195 →
Application: 12/522,716 →
Publication: US 2010/0035786
Post Plasma Etch/Ash Residue and Silicon-Based Anti-Reflective Coating Remover Compositions Containing Tetrafluoroborate Ion
Patent: 8,168,577 →
Application: 12/811,257 →
Publication: US 2011/0046036
Aqueous Acidic Formulations for Copper Oxide Etch Residue Removal and Prevention of Copper Electrodeposition
Patent: 8,481,472 →
Application: 12/998,296 →
Publication: US 2011/0195887
Gluconic Acid Containing Photoresist Cleaning Composition for Multi-Metal Device Processing
Patent: 8,338,350 →
Application: 12/998,499 →
Publication: US 2011/0212865
Solution for Increasing Wafer Sheet Resistance and/or Photovoltaic Cell Power Density Level
Patent: 8,366,954 →
Application: 13/138,144 →
Publication: US 2011/0275223
Multipurpose Acidic, Organic Solvent Based Microelectronic Cleaning Composition
Patent: 8,557,757 →
Application: 13/138,467 →
Publication: US 2011/0306534
Stripping Compositions for Cleaning Ion Implanted Photoresist from Semiconductor Device Wafers
Patent: 8,497,233 →
Application: 13/138,468 →
Publication: US 2012/0028871
Compositions and Methods for Texturing Polycrystalline Silicon Wafers
Patent: 8,986,559 →
Application: 13/778,856 →
Publication: US 2013/0224898
Novel Chromatographic Media Based on Allylamine and Its Derivative for Protein Purification
Application: 14/115,238 →
Publication: US 2014/0263011
Semi-Aqueous Polymer Removal Compositions with Enhanced Compatibility to Copper, Tungsten, and Porous Low-K Dielectrics
Patent: 9,327,966 →
Application: 14/122,793 →
Publication: US 2014/0248781
Microelectronic Substrate Cleaning Compositions Having Copper/Azole Polymer Inhibition
Application: 14/348,955 →
Publication: US 2014/0249065
Rinsing Solution to Prevent Tin Pattern Collapse
Patent: 9,570,343 →
Application: 14/408,431 →
Publication: US 2015/0170936
Immersion Curing Process
Application: 14/539,664 →
Publication: US 2016/0130690
Dispersions Containing Encapsulated Materials and Compositions Using Same
Patent: 9,427,393 →
Application: 14/672,063 →
Publication: US 2015/0272861
Package System and Method for Inhibiting Moisture Entry
Application: 15/133,690 →
Publication: US 2017/0113864
High Strength Silicone Elastomers and Compositions Therefor
Application: 15/185,490 →
Publication: US 2016/0369100
High Purity Low Endotoxin Carbohydrate (HPLE) Compositions, and Methods of Isolation Thereof
Application: 15/316,614 →
Publication: US 2017/0198002
Non-Aqueous Tungsten Compatible Metal Nitride Selective Etchants and Cleaners
Application: 62/312,689 →
High Shear Impeller Guard
Application: 62/315,381 →
Oil-In-Water Surfactant Free Silicone Emulsion
Application: 62/323,088 →
Packaging System for Storage and Shipment of Solids
Application: 62/329,568 →
Cleaning Compositions for Microelectronic Substrates Containing Aluminum
Application: 62/349,333 →
Related Assignments (20)
Other recorded transfers of the patents in this record — the chain of ownership.
Security Interest Oct 3, 2014
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
Reel/Frame 033882/0488 →
Security Interest Jun 21, 2016
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
Reel/Frame 038976/0478 →
Release of Security Interest Jun 21, 2016
From: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, INC.
Reel/Frame 038976/0233 →
Release of Security Interest Jun 21, 2016
From: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, INC.
Reel/Frame 039111/0908 →
Security Interest Jun 21, 2016
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
Reel/Frame 038976/0610 →
Release of Security Interest Jun 21, 2016
From: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, INC.
Reel/Frame 038975/0807 →
Security Interest Sep 30, 2016
From: NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.)
To: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
Reel/Frame 040192/0613 →
Release of Security Interest Sep 30, 2016
From: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.)
Reel/Frame 039915/0035 →
Release of Security Interest Sep 30, 2016
From: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
To: NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC
Reel/Frame 039915/0024 →
Merger Oct 3, 2016
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: AVANTOR PERFORMANCE MATERIALS, LLC
Reel/Frame 039924/0311 →
Assignment of Assignor's Interest Nov 15, 2016
From: KIHARA, MATTHEW; LAMBERT, JAMES
To: NUSIL TECHNOLOGY LLC
Reel/Frame 040328/0447 →
Change of Name Mar 2, 2017
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: AVANTOR PERFORMANCE MATERIALS, LLC
Reel/Frame 041442/0976 →
Release of Security Interest Mar 10, 2017
From: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.); NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC
Reel/Frame 041966/0313 →
Security Interest Mar 10, 2017
From: NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.)
To: JEFFERIES FINANCE LLC
Reel/Frame 041966/0247 →
Release (Reel 041966 / Frame 0211) Nov 27, 2017
From: JEFFERIES FINANCE LLC
To: NUSIL TECHNOLOGY, LLC; APPLIED SILICONE COMPANY, LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY AVANTOR PERFORMANCE MATERIALS, INC.)
Reel/Frame 044810/0207 →
Release (Reel 041966 / Frame 0247) Nov 27, 2017
From: JEFFERIES FINANCE LLC
To: NUSIL TECHNOLOGY, LLC; APPLIED SILICONE COMPANY LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY AVANTOR PERFORMANCE MATERIALS, INC.)
Reel/Frame 044810/0154 →
Security Agreement Nov 28, 2017
From: AVANTOR PERFORMANCE MATERIALS, LLC; NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; RELIABLE BIOPHARMACEUTICAL, LLC
To: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
Reel/Frame 044811/0400 →
Security Agreement Nov 29, 2017
From: AVANTOR PERFORMANCE MATERIALS, LLC; NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; RELIABLE BIOPHARMACEUTICAL, LLC
To: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 044528/0960 →
Security Agreement (Notes) Nov 6, 2020
From: AVANTOR FLUID HANDLING, LLC; AVANTOR PERFORMANCE MATERIALS, LLC; NUSIL TECHNOLOGY LLC; RELIABLE BIOPHARMACEUTICAL, LLC
To: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 054343/0414 →
Termination and Release of Security Interest in Patents Nov 16, 2020
From: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A.
To: AVANTOR PERFORMANCE MATERIALS, LLC; NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; RELIABLE BIOPHARMACEUTICAL, LLC
Reel/Frame 054440/0877 →