Patent Assignment
Reel/Frame 039111/0908
Release of Security Interest
Recorded: 2016-06-21
Pages: 14
Assignor
CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
Executed: 2016-06-21
Assignee
AVANTOR PERFORMANCE MATERIALS, INC.
222 RED SCHOOL LANE, PHILLIPSBURG, NEW JERSEY, 08865
Covered Properties
(56)
Liquid-Solid Extraction Apparatus and Method of Using Same
Patent:
5,217,619 →
Application:
07/846,895 →
Alkaline-Containing Photoresist Stripping Compositions Producing Reduced Metal Corrosion with Cross-Linked or Hardened Resist Resins
Patent:
5,308,745 →
Application:
07/972,511 →
Photoresist Strippers Containing Reducing Agents to Reduce Metal Corrosion
Patent:
6,326,130 →
Application:
08/133,680 →
Ph Adjusted Nonionic Surfactant-Containing Alkaline Cleaner Composition for Cleaning Microelectronics Substrates
Patent:
5,466,389 →
Application:
08/230,132 →
Cleaning Wafer Substrates of Metal Contamination While Maintaining Wafer Smoothness
Patent:
5,498,293 →
Application:
08/264,858 →
Solid Phase Microextraction of Trace Amounts of Organic Analytes
Patent:
5,576,217 →
Application:
08/396,124 →
Cleaning Wafer Substrates of Metal Contamination While Maintaining Wafer Smoothness
Patent:
5,989,353 →
Application:
08/729,565 →
Process and Apparatus for Comparing Chemical Products
Patent:
6,311,134 →
Application:
09/247,058 →
Electrophoresis Gel Container Apparatus and Method of Use Thereof
Patent:
6,203,679 →
Application:
09/251,129 →
Stabilized Alkaline Compositions for Cleaning Microelectronic Substrates
Patent:
6,585,825 →
Application:
09/688,559 →
Silicate-Containing Alkaline Compositions for Cleaning Microelectronic Substrates
Patent:
6,465,403 →
Application:
09/701,114 →
Stabilized Alkaline Compositions for Cleaning Microlelectronic Substrates
Photoresist Strippers Containing Reducing Agents to Reduce Metal Corrosion
Method and Composition for Removing Sodium-Containing Material from Microcircuit Substrates
Functionalized Polymeric Media for Separation of Analytes
Microelectronic Cleaning Compositions Containing Ammonia-Free Fluoride Salts
Ammonia-Free Alkaline Microelectronic Cleaning Compositions with Improved Substrate Compatibility
Microelectronic cleaning and arc remover compositions
Microelectronic Cleaning Compositions Containing Oxidizers and Organic Solvents
Alkaline, Post Plasma Etch/Ash Residue Removers and Photoresist Stripping Compositions Containing Metal-Halide Corrosion Inhibitors
Nanoelectronic and Microelectronic Cleaning Compositions
Microelectronic Cleaning Composition Containing Halogen Oxygen Acids, Salts and Derivatives Thereof
Vegetarian Protein a Preparation and Methods Thereof
Stripping and Cleaning Compositions for Microelectronics
Purified vegetarian protein A and process for production thereof
Application:
11/521,246 →
Publication:
US 2010/0261842
Non-Aqueous Microelectronic Cleaning Compositions Containing Fructose
Cleaning Compositions for Microelectronic Substrates
Preparation of Ultrapure Polymeric Articles
Non-Aqueous, Non-Corrosive Microelectronic Cleaning Compositions Containing Polymeric Corrosion Inhibitors
Non-Aqueous, Non-Corrosive Microelectronic Cleaning Compositions
Microelectronic Cleaning Compositions Containing Ammonia-Free Fluoride Salts for Selective Photoresist Stripping and Plasma Ash Residue Cleaning
Chromatographic Media
Application:
11/813,434 →
Publication:
US 2008/0203029
Compositions for Cleaning Ion Implanted Photoresist in Front End of Line Applications
Non-Aqueous Photoresist Stripper That Inhibits Galvanic Corrosion
Application:
11/910,281 →
Publication:
US 2008/0280235
Compositions for the Removal of Post-Etch and Ashed Photoresist Residues and Bulk Photoresist
Vegetarian Protein A Preparation and Methods Thereof
Application:
12/046,582 →
Publication:
US 2009/0060904
Stabilized, Non-Aqueous Cleaning Compositions for Microelectronics Substrates
Chromatographic Media and Chromatographic Equipment Storage Solutions and Use Thereof
Application:
12/522,605 →
Publication:
US 2010/0056645
Peroxide Activated Oxometalate Based Formulations for Removal of Etch Residue
High Efficiency Chromatography Column with Re-usable End Cap
Application:
12/565,172 →
Publication:
US 2010/0012565
Polysilicon Planarization Solution for Planarizing Low Temperature Poly-Silicon Thin Film Panels
Application:
12/596,921 →
Publication:
US 2010/0126961
Driectly Compressible High Functionality Granular Microcrystalline Cellulose Based Excipient, Manufacturing Process and Use Thereof
Application:
12/600,369 →
Publication:
US 2011/0092598
Directly Compressible Granular Microcrystalline Cellulose Based Excipient, Manufacturing Process and Use Thereof
Application:
12/619,259 →
Publication:
US 2010/0055180
Sustained Release Composition
Application:
12/737,663 →
Publication:
US 2011/0136921
Post Plasma Etch/Ash Residue and Silicon-Based Anti-Reflective Coating Remover Compositions Containing Tetrafluoroborate Ion
Aqueous Acidic Formulations for Copper Oxide Etch Residue Removal and Prevention of Copper Electrodeposition
Gluconic Acid Containing Photoresist Cleaning Composition for Multi-Metal Device Processing
Directly Compressible High Functionality Granular Dibasic Calcium Phosphate Based Co-Processed Excipient
Application:
12/998,655 →
Publication:
US 2011/0229527
New Chromatographic Media Based on Phenoxy Alkyl and Alkoxy-or Phenoxy-Phenyl Alkyl Ligands
Application:
12/998,656 →
Publication:
US 2011/0220575
Directly Compressible Granular Microcrystalline Cellulose Based, Excipient, Manufacturing Process and Use Thereof
Application:
12/998,659 →
Publication:
US 2011/0288146
Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors
Application:
13/066,889 →
Publication:
US 2011/0207645
Multipurpose Acidic, Organic Solvent Based Microelectronic Cleaning Composition
Application:
61/155,309 →
Metal Sulfide Deposition Using Alkylated Thioureas
Application:
61/357,146 →
Novel chromatographic media based on allylamine and its derivative for protein purification
Application:
61/518,258 →
Separation of protein monomers from aggregates by solid weak anion exchange support functionalized with amine moieties
Application:
61/518,305 →
Semi-aqueous polymer removal compositions with enhanced compatibility to copper, tungsten, and porous low-k dielectrics
Application:
61/519,902 →
Related Assignments
(18)
Other recorded transfers of the patents in this record — the chain of ownership.
Security Interest
Oct 3, 2014
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
Reel/Frame 033882/0488 →
Release of Security Interest
Jun 21, 2016
From: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, INC.
Reel/Frame 038975/0807 →
Security Interest
Jun 21, 2016
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
Reel/Frame 038976/0610 →
Release of Security Interest
Jun 21, 2016
From: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, INC.
Reel/Frame 038976/0233 →
Security Interest
Jun 21, 2016
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: CREDIT SUISSE, AG, CAYMAN ISLANDS BRANCH
Reel/Frame 038976/0478 →
Security Interest
Sep 30, 2016
From: NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.)
To: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
Reel/Frame 040192/0613 →
Release of Security Interest
Sep 30, 2016
From: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.)
Reel/Frame 039915/0035 →
Merger
Oct 3, 2016
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: AVANTOR PERFORMANCE MATERIALS, LLC
Reel/Frame 039924/0311 →
Change of Name
Mar 2, 2017
From: AVANTOR PERFORMANCE MATERIALS, INC.
To: AVANTOR PERFORMANCE MATERIALS, LLC
Reel/Frame 041442/0976 →
Security Interest
Mar 10, 2017
From: NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.)
To: JEFFERIES FINANCE LLC
Reel/Frame 041966/0247 →
Security Interest
Mar 10, 2017
From: NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.)
To: JEFFERIES FINANCE LLC
Reel/Frame 041966/0211 →
Release of Security Interest
Mar 10, 2017
From: CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH
To: AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY KNOWN AS AVANTOR PERFORMANCE MATERIALS, INC.); NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC
Reel/Frame 041966/0313 →
Release (Reel 041966 / Frame 0211)
Nov 27, 2017
From: JEFFERIES FINANCE LLC
To: NUSIL TECHNOLOGY, LLC; APPLIED SILICONE COMPANY, LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY AVANTOR PERFORMANCE MATERIALS, INC.)
Reel/Frame 044810/0207 →
Release (Reel 041966 / Frame 0247)
Nov 27, 2017
From: JEFFERIES FINANCE LLC
To: NUSIL TECHNOLOGY, LLC; APPLIED SILICONE COMPANY LLC; AVANTOR PERFORMANCE MATERIALS, LLC (FORMERLY AVANTOR PERFORMANCE MATERIALS, INC.)
Reel/Frame 044810/0154 →
Security Agreement
Nov 28, 2017
From: AVANTOR PERFORMANCE MATERIALS, LLC; NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; RELIABLE BIOPHARMACEUTICAL, LLC
To: GOLDMAN SACHS BANK USA, AS COLLATERAL AGENT
Reel/Frame 044811/0400 →
Security Agreement
Nov 29, 2017
From: AVANTOR PERFORMANCE MATERIALS, LLC; NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; RELIABLE BIOPHARMACEUTICAL, LLC
To: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 044528/0960 →
Security Agreement (Notes)
Nov 6, 2020
From: AVANTOR FLUID HANDLING, LLC; AVANTOR PERFORMANCE MATERIALS, LLC; NUSIL TECHNOLOGY LLC; RELIABLE BIOPHARMACEUTICAL, LLC
To: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 054343/0414 →
Termination and Release of Security Interest in Patents
Nov 16, 2020
From: THE BANK OF NEW YORK MELLON TRUST COMPANY, N.A.
To: AVANTOR PERFORMANCE MATERIALS, LLC; NUSIL TECHNOLOGY LLC; APPLIED SILICONE COMPANY LLC; RELIABLE BIOPHARMACEUTICAL, LLC
Reel/Frame 054440/0877 →