Diffusion barrier for interconnects
Representative implementations of techniques and devices are used to reduce or prevent conductive material diffusion into insulating or dielectric material of bonded substrates. Misaligned conductive structures can come into direct contact with a dielectric portion of the substrates due to overlap, especially while employing direct bonding techniques. A barrier interface that can inhibit the diffusion is disposed generally between the conductive material and the dielectric at the overlap.
1. A bonded structure comprising:
a first substrate having a first bonding surface, the first substrate comprising:
a first insulating layer having an upper surface extending parallel to a the first bonding surface;
an embedded barrier layer disposed on and extending parallel to the first insulating layer without extending below the upper surface of the first insulating layer;
a second insulating layer disposed on and extending parallel to the embedded barrier layer, an upper surface of the second insulating layer forming part of the first bonding surface; and
a first contact pad extending through the second insulating layer, through the embedded barrier layer, and at least partially through the first insulating layer, and
a second substrate having a second bonding surface, the second substrate including an insulating material and a second contact pad,
wherein the first bonding surface is directly bonded to the second bonding surface, and the first contact pad is directly bonded to the second contact pad, at a bonding interface without an intervening adhesive.
2. The bonded structure of claim 1 , wherein the second insulating layer comprises silicon and oxygen.
3. The bonded structure of claim 2 , wherein the embedded barrier layer comprises one or more of silicon nitride, silicon oxynitride, silicon carbide, or silicon carbonitride.
4. The bonded structure of claim 2 , wherein the embedded barrier layer comprises silicon carbonitride.
5. The bonded structure of claim 2 , wherein the embedded barrier layer comprises silicon nitride.
6. The bonded structure of claim 1 , further comprising a via extending from a lower surface of the first contact pad opposite the upper surface of the first contact pad.
7. The bonded structure of claim 1 , wherein a width of the first contact pad is narrower than a width of the second contact pad at the bonding interface.
8. The bonded structure of claim 1 , wherein the embedded barrier layer does not extend below the upper surface of the first insulating layer.
9. The bonded structure of claim 1 , wherein the second insulating layer substantially covers the embedded barrier layer.
10. The bonded structure of claim 1 , wherein the embedded barrier layer contacts a sidewall of the first contact pad.
11. The bonded structure of claim 10 , wherein the first contact pad includes at least one sidewall lining layer surrounding copper.
12. The bonded structure of claim 11 , wherein the at least one sidewall lining layer includes a layer comprising tantalum.
13. The bonded structure of claim 1 , wherein:
the first substrate further comprises an additional contact pad extending through the second insulating layer, through the embedded barrier layer, and at least partially through the first insulating layer;
an upper surface of the additional contact pad forms part of the first bonding surface; and
the embedded barrier layer extends from the first contact pad to the additional contact pad.
14. A microelectronic assembly comprising:
a first substrate having a first bonding surface, the first substrate comprising:
a first insulating layer,
an embedded barrier layer disposed on the first insulating layer,
a bonding layer over the embedded barrier layer and partially defining the first bonding surface,
a first contact pad at least partially embedded in the bonding layer, the embedded barrier layer, and the first insulating layer, and
a second contact pad at least partially embedded in the bonding layer, the embedded barrier layer, and the first insulating layer,
wherein the bonding layer and the embedded barrier layer extend from the first contact pad to the second contact pad; and
a second substrate having a second bonding surface directly bonded to the first bonding surface without an intervening adhesive, the second substrate comprising:
a second insulating layer, and
a third contact pad at least partially embedded in the second insulating layer, the third contact pad directly bonded to the first contact pad without an intervening adhesive.
15. The microelectronic assembly of claim 14 , wherein the embedded barrier layer extends across a width of the first substrate.
16. The microelectronic assembly of claim 14 , wherein the embedded barrier layer surrounds and abuts perimeters of a group of contact pads including the first and second contact pads.
17. The microelectronic assembly of claim 14 , wherein the embedded barrier layer extends across a contact pad region of the first substrate, and is surrounded by a zone free from the embedded barrier layer.
18. The microelectronic assembly of claim 14 , wherein the embedded barrier layer surrounds and abuts perimeters of the first and second contact pads.
19. The microelectronic assembly of claim 14 , wherein the first bonding surface and/or the second bonding surface comprises a nitrogen plasma treated surface.
20. The microelectronic assembly of claim 14 , wherein the embedded barrier layer comprises a dielectric material different from the first insulating layer and from the bonding layer.
21. The microelectronic assembly of claim 14 , wherein the first insulating layer and the second insulating layer comprise silicon oxide.
22. The microelectronic assembly of claim 14 , wherein a width of the first contact pad is narrower than a width of the third contact pad.
23. The microelectronic assembly of claim 14 , wherein the first insulating layer comprises silicon oxide material and a material of the third contact pad comprises copper or a copper alloy.
24. The microelectronic assembly of claim 14 , wherein the first contact pad includes a barrier layer comprising tantalum surrounding a material comprising copper.
25. The microelectronic assembly of claim 14 , wherein the second substrate further comprises a fourth contact pad laterally spaced from the third contact pad, and the fourth contact pad is directly bonded to the second contact pad without an intervening adhesive.
26. The microelectronic assembly of claim 14 , wherein an upper surface of the embedded barrier layer is positioned closer to the first bonding surface than to a back side of the first contact pad.
27. The microelectronic assembly of claim 14 , wherein the bonding layer comprises silicon and oxygen.
28. The microelectronic assembly of claim 14 , wherein the embedded barrier layer comprises one or more of silicon nitride, silicon oxynitride, silicon carbide, or silicon carbonitride.
29. The microelectronic assembly of claim 28 , wherein the embedded barrier layer comprises silicon nitride.
30. The microelectronic assembly of claim 28 , wherein the embedded barrier layer comprises silicon carbonitride.