Patent Assignment
Reel/Frame 032311/0909
Merger
Recorded: 2014-02-27
Pages: 24
Assignor
CYMER, INC.
Executed: 2013-05-30
Assignee
CYMER, LLC
17075 THORNMINT COURT, INTELLECTUAL PROPERTY DEPT MS/4-2D, SAN DIEGO, CALIFORNIA, 92127
Covered Properties
(25)
Electric Discharge Laser with Active Wavelength Chirp Correction
Patent:
6,621,846 →
Application:
09/501,160 →
Method and device for spectral measurements of laser beam
Patent:
6,320,663 →
Application:
09/513,324 →
Fast Wavelength Correction Technique for a Laser
Patent:
6,529,531 →
Application:
09/597,812 →
Gas discharge laser electrode with reduced sensitivity to adverse boundary layer effects
Patent:
6,363,094 →
Application:
09/703,697 →
High Power Gas Discharge Laser with Helium Purged Line Narrowing Unit
Patent:
6,778,584 →
Application:
09/716,041 →
Protective Overcoat for Replicated Diffraction Gratings
Process Monitoring System for Lithography Lasers
Double pass double etalon spectrometer
Line Narrowed Laser with Bidirection Beam Expansion
Annealed Copper Alloy Electrodes for Fluorine Containing Gas Discharge Lasers
Flow Shaping Electrode with Erosion Pad for Gas Discharge Laser
Gas Discharge Laser with Blade-Dielectric Electrode
Ultra Pure Component Purge System for Gas Discharge Laser
High Resolution Etalon-Grating Monochromator
Spinodal Copper Alloy Electrodes
Laser Wavelength Control Unit with Piezoelectric Driver
Beam Seal for Line Narrowed Production Laser
High Repetition Rate Gas Discharge Laser with Precise Pulse Timing Control
Purge Monitoring System for Gas Discharge Laser
Injection Seeded Laser with Precise Timing Control
Four Khz Gas Discharge Laser
Injection Seeded F2 Laser with Centerline Wavelength Control
Plasma Focus Light Source with Tandem Ellipsoidal Mirror Units
Line Narrowing Unit with Flexural Grating Mount
Process Monitoring System for Lithography Lasers