Logic drive based on standardized commodity programmable logic semiconductor IC chips
A chip package includes an interposer comprising a silicon substrate, multiple metal vias passing through the silicon substrate, a first interconnection metal layer over the silicon substrate, a second interconnection metal layer over the silicon substrate, and an insulating dielectric layer over the silicon substrate and between the first and second interconnection metal layers; a field-programmable-gate-array (FPGA) integrated-circuit (IC) chip over the interposer; multiple first metal bumps between the interposer and the FPGA IC chip; a first underfill between the interposer and the FPGA IC chip, wherein the first underfill encloses the first metal bumps; a non-volatile memory (NVM) IC chip over the interposer; multiple second metal bumps between the interposer and the NVM IC chip; and a second underfill between the interposer and the NVM IC chip, wherein the second underfill encloses the second metal bumps.
1. A chip package comprising:
a first silicon substrate;
a first insulating dielectric layer on a top surface of the first silicon substrate;
a first interconnection scheme on a top surface of the first insulating dielectric layer, wherein the first interconnection scheme comprises a first interconnection metal layer over the first insulating dielectric layer, a second insulating dielectric layer over the first interconnection metal layer, a first metal pad at a top of the first interconnection scheme, vertically over and in a first opening in the second insulating layer and on a top surface of the second insulating dielectric layer, and a second metal pad at the top of the first interconnection scheme, vertically over and in a second opening in the second insulating layer and on the top surface of the second insulating dielectric layer;
a polymer layer over a top surface of the first interconnection scheme, wherein a third opening in the polymer layer is vertically over a top surface of the first metal pad and a fourth opening in the polymer layer is vertically over a top surface of the second metal pad;
a first copper layer having a first portion in the third opening and over a top surface of the polymer layer and a second portion in the fourth opening and over the top surface of the polymer layer;
a first adhesion metal layer at a bottom of the first copper layer, between the first portion of the first copper layer and the top surface of the first metal pad and between the second portion of the first copper layer and the top surface of the second metal pad, wherein the first and second portions of the first copper layer couple to the first and second metal pads, respectively, through the first adhesion metal layer;
a metal via comprising a second copper layer on and in contact with the second portion of first copper layer, wherein the metal via has a first sidewall recessed in a horizontal direction from a second sidewall of the second portion of the first copper layer, wherein the metal via provides connection in a vertical direction perpendicular to the horizontal direction;
a first element over the top surface of the polymer layer and at a same horizontal level as the metal via, wherein the first element comprises a second silicon substrate and a first metal bump under the second silicon substrate, at a bottom of the first element and bonded to the first portion of the first copper layer, wherein the first metal bump comprises a first tin-containing layer; and
a sealing layer on the top surface of the polymer layer and at the same horizontal level as the first element and metal via, wherein the metal via vertically extends in the sealing layer and the first sidewall of the metal via is covered by the sealing layer.
2. The chip package of claim 1 , wherein the first interconnection scheme further comprises a second interconnection metal layer on the top surface of the second insulating dielectric layer and in the first and second openings, wherein the first and second metal pads are provided by the second interconnection metal layer.
3. The chip package of claim 1 , wherein the first interconnection scheme further comprises a third insulating dielectric layer on the top surface of the second insulating dielectric layer, wherein the first metal pad has a sidewall vertically over the top surface of the second insulating dielectric layer and covered by the third insulating dielectric layer and the second metal pad has a sidewall vertically over the top surface of the second insulating dielectric layer and covered by the third insulating dielectric layer.
4. The chip package of claim 1 , wherein the first copper layer has a thickness between 1 and 15 micrometers.
5. The chip package of claim 1 , wherein the second copper layer has a thickness between 10 and 100 micrometers.
6. The chip package of claim 1 further comprising an underfill between the polymer layer and first element and covering a sidewall of the first metal bump.
7. The chip package of claim 1 , wherein the sealing layer has a top surface coplanar with a top surface of the first element.
8. The chip package of claim 1 further comprising a second element over the top surface of the polymer layer, surrounded by the sealing layer and at the same horizontal level as the first element, metal via and sealing layer, wherein the first copper layer further comprises a third portion in a fifth opening in the polymer layer and over the top surface of the polymer layer, wherein the second element comprises a third silicon substrate and a second metal bump under the third silicon substrate, at a bottom of the second element and bonded to the third portion of the first copper layer, wherein the second metal bump comprises a second tin-containing layer.
9. The chip package of claim 1 further comprising a second interconnection scheme over a top surface of the first element and a top surface of the sealing layer, wherein the second interconnection scheme comprises a second interconnection metal layer over the top surface of the first element, across an edge of the first element and coupling to the metal via.
10. The chip package of claim 1 , wherein the metal via couples to the first element through the first interconnection scheme.
11. The chip package of claim 1 further comprising a through silicon via (TSV) vertically in the first silicon substrate and coupling to the first interconnection scheme.
12. The chip package of claim 11 further comprising a second metal bump on a bottom surface of the through silicon via (TSV).
13. The chip package of claim 9 further comprising a second metal bump on the second interconnection scheme, wherein the second metal bump couples to the metal via through the second interconnection scheme, wherein the second metal bump comprises a second tin-containing layer.
14. The chip package of claim 9 further comprising a second metal bump on the second interconnection scheme, wherein the second metal bump couples to the metal via through the second interconnection scheme, wherein the second metal bump comprises a third copper layer having a thickness between 10 and 100 micrometers.
15. The chip package of claim 9 , wherein the second interconnection metal layer comprises a third copper layer and a second adhesion metal layer at a bottom of the third copper layer but not at a sidewall of the third copper layer.
16. The chip package of claim 9 , wherein the second interconnection scheme further comprises a third interconnection metal layer over the top surface of the first element and the top surface of the sealing layer and under the second interconnection metal layer and a third insulating dielectric layer between the second and third interconnection metal layers.
17. The chip package of claim 1 , wherein the first portion of the first copper layer is a copper bump.
18. The chip package of claim 2 , wherein the second interconnection metal layer comprises a third copper layer and a second adhesion metal layer having a portion at a bottom of the third copper layer.
19. The chip package of claim 1 , wherein the first interconnection metal layer comprises a third copper layer and a second adhesion metal layer at a bottom and sidewall of the third copper layer.
20. The chip package of claim 1 , wherein the first element further comprises a third metal pad under the second silicon substrate and a passivation layer under the second silicon substrate and a bottom surface of the third metal pad, wherein a fifth opening in the passivation layer is vertically under the bottom surface of the third metal pad, wherein the first metal bump is on the bottom surface of the third metal pad and under a bottom surface of the passivation layer, wherein the first metal bump further comprises a third copper layer between the third metal pad and first tin-containing layer.
21. The chip package of claim 1 , wherein the first element further comprises a second interconnection scheme under the second silicon substrate, wherein the second interconnection scheme comprises a second interconnection metal layer under the second silicon substrate and a third interconnection metal layer under the second interconnection metal layer and a third insulating dielectric layer between the second and third interconnection metal layers, wherein the second interconnection metal layer comprises a third copper layer and a second adhesion metal layer at a top and sidewall of the third copper layer, wherein the first metal bump is under and coupling to the second interconnection scheme.
22. The chip package of claim 21 , wherein the first element further comprises a fourth insulating dielectric layer under and on the third interconnection metal layer and a fourth interconnection metal layer under and on the fourth insulating dielectric layer, wherein the fourth interconnection metal layer comprises a bulk metal layer and a third adhesion metal layer at a top of the bulk metal layer but not at a sidewall, vertically under the fourth insulating dielectric layer, of the bulk metal layer, wherein the first metal bump is on a bottom surface of the fourth interconnection metal layer.
23. The chip package of claim 21 , wherein the first element further comprises a transistor at a bottom of the second silicon substrate.
24. The chip package of claim 1 , wherein the sealing layer has a sidewall at an edge of the sealing layer, wherein the sidewall of the sealing layer extends in a vertical direction.
25. The chip package of claim 1 , wherein the sealing layer is a molding compound.