IP Library › Granted Patent US 12,278,192
Granted Patent B2
US 12,278,192 · App. 18/375,547 · Granted Apr 15, 2025

Logic drive based on multichip package comprising standard commodity FPGA IC chip with cooperating or supporting circuits

Inventors: Mou-Shiung Lin (Hsinchu, TW); Jin-Yuan Lee (Hsinchu, TW)
Assignee: iCometrue Company Ltd.
H01L23/5389H01L23/3128H01L23/5383H01L23/5386H01L24/20H01L2224/214H01L2924/143H01L2924/1431H01L2924/14335H01L2924/1443
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,278,192
App. No.
18/375,547
Granted
Apr 15, 2025
Kind
B2
Abstract

A multichip package includes: a chip package comprising a first IC chip, a polymer layer in a space beyond and extending from a sidewall of the first IC chip, a through package via in the polymer layer, an interconnection scheme under the first IC chip, polymer layer and through package via, and a metal bump under the interconnection scheme and at a bottom of the chip package, wherein the first IC chip comprises memory cells for storing data therein associated with resulting values for a look-up table (LUT) and a selection circuit comprising a first input data set for a logic operation and a second input data set associated with the data stored in the memory cells, wherein the selection circuit selects, in accordance with the first input data set, data from the second input data set as an output data for the logic operation; and a second IC chip over the chip package, wherein the second IC chip couples to the first IC chip through, in sequence, the through package via and interconnection scheme, wherein the second IC chip comprises a hard macro having an input data associated with the output data for the logic operation.

Claims (32)

1. A multichip package comprising:

a first chip package comprising a semiconductor integrated-circuit (IC) chip, a first sealing layer in a space at a same horizontal level as the semiconductor integrated-circuit (IC) chip and beyond a sidewall of the semiconductor integrated-circuit (IC) chip, a first metal interconnect vertically in the first sealing layer, a first interconnection scheme under the semiconductor integrated-circuit (IC) chip, first sealing layer and first metal interconnect and coupling the semiconductor integrated-circuit (IC) chip to the first metal interconnect, and a first metal bump under and coupling to the first interconnection scheme and at a bottom of the first chip package, wherein the semiconductor integrated-circuit (IC) chip comprises a plurality of first volatile memory cells configured for storing first data therein, a second and a third metal interconnect and a switch coupling to the second and third metal interconnects, wherein the switch is configured, in accordance with the first data, to control coupling between the second and third metal interconnects through the switch; and

a second chip package over and coupling to the first chip package, wherein the second chip package comprises a non-volatile memory (NVM) integrated-circuit (IC) chip configured for storing second data therein associated with the first data and a second interconnection scheme under and coupling to the non-volatile memory (NVM) integrated-circuit (IC) chip, wherein the non-volatile memory (NVM) integrated-circuit (IC) chip couples to the semiconductor integrated-circuit (IC) chip through, in sequence, the second interconnection scheme, first metal interconnect and first interconnection scheme.

2. The multichip package of claim 1 , wherein the semiconductor integrated-circuit (IC) chip comprises a plurality of second volatile memory cells for storing third data therein associated with a plurality of resulting values for a look-up table (LUT) and a selection circuit comprising a first set of input points for a first input data set for a logic operation and a second set of input points for a second input data set associated with the third data, wherein the selection circuit is configured to select, in accordance with the first input data set, input data from the second input data set as output data for the logic operation, wherein the non-volatile memory (NVM) integrated-circuit (IC) chip is configured for storing fourth data therein associated with the third data.

3. The multichip package of claim 1 , wherein the semiconductor integrated-circuit (IC) chip comprises a metal layer at a bottom thereof joining and in contact with the first interconnection scheme and a polymer layer at a bottom thereof covering a sidewall of the metal layer and joining and in contact with the first interconnection scheme.

4. The multichip package of claim 3 , wherein the metal layer comprises a copper layer.

5. The multichip package of claim 1 , wherein the first metal interconnect comprises a copper layer vertically in the first sealing layer and having a thickness between 30 and 200 micrometers.

6. The multichip package of claim 1 , wherein the first interconnection scheme comprises a first interconnection metal layer under the semiconductor integrated-circuit (IC) chip, a second interconnection metal layer under the first interconnection metal layer and an insulating dielectric layer between the first and second interconnection metal layers, wherein the second interconnection metal layer couples to the first interconnection metal layer through an opening in the insulating dielectric layer, and wherein the second interconnection metal layer comprises a copper layer having a thickness between 0.3 and 20 micrometers.

7. The multichip package of claim 1 , wherein the first metal bump comprises tin.

8. The multichip package of claim 1 , wherein the second chip package further comprises a second metal bump under and coupling to the second interconnection scheme, at a bottom of the second chip package and bonded to the first chip package, wherein the second metal bump comprises tin.

9. The multichip package of claim 8 , wherein the second metal bump is bonded on the first metal interconnect.

10. The multichip package of claim 1 , wherein the second chip package further comprises a second sealing layer over the second interconnection scheme and in a space at a same horizontal level as the non-volatile memory (NVM) integrated-circuit (IC) chip and beyond a sidewall of the non-volatile memory (NVM) integrated-circuit (IC) chip.

11. The multichip package of claim 1 , wherein the semiconductor integrated-circuit (IC) chip is a field-programmable-gate-array (FPGA) integrated-circuit (IC) chip.

12. The multichip package of claim 1 , wherein the non-volatile memory (NVM) integrated-circuit (IC) chip is a NOR flash chip.

13. The multichip package of claim 1 , wherein each of the plurality of first volatile memory cells is a static-random-access-memory (SRAM) cell.

14. A multichip package comprising:

a ball-grid-array (BGA) substrate;

a plurality of solder balls under and coupling to the ball-grid-array (BGA) substrate and at a bottom of the multichip package;

a semiconductor integrated-circuit (IC) chip over the ball-grid-array (BGA) substrate, wherein the semiconductor integrated-circuit (IC) chip comprises a plurality of first volatile memory cells configured for storing first data therein, a first and a second metal interconnect and a switch coupling to the first and second metal interconnects, wherein the switch is configured, in accordance with the first data, to control coupling between the first and second metal interconnects through the switch;

a plurality of first metal bumps each between the semiconductor integrated-circuit (IC) chip and ball-grid-array (BGA) substrate and coupling the semiconductor integrated-circuit (IC) chip to the ball-grid-array (BGA) substrate;

an underfill between the semiconductor integrated-circuit (IC) chip and ball-grid-array (BGA) substrate and covering a sidewall of each of the plurality of first metal bumps;

a first sealing layer over the ball-grid-array (BGA) substrate, in a space at a same horizontal level as the semiconductor integrated-circuit (IC) chip and beyond a sidewall of the semiconductor integrated-circuit (IC) chip;

a third metal interconnect vertically in the first sealing layer and coupling to the ball-grid-array (BGA) substrate; and

a non-volatile memory (NVM) chip package over and coupling to the ball-grid-array (BGA) substrate and semiconductor integrated-circuit (IC) chip, wherein the non-volatile memory (NVM) chip package comprises a non-volatile memory (NVM) integrated-circuit (IC) chip configured for storing second data therein associated with the first data and an interconnection scheme under the non-volatile memory (NVM) integrated-circuit (IC) chip and coupling the non-volatile memory (NVM) integrated-circuit (IC) chip to the third metal interconnect, wherein the non-volatile memory (NVM) integrated-circuit (IC) chip couples to the semiconductor integrated-circuit (IC) chip through, in sequence, the interconnection scheme and third metal interconnect.

15. The multichip package of claim 14 , wherein the semiconductor integrated-circuit (IC) chip comprises a plurality of second volatile memory cells for storing third data therein associated with a plurality of resulting values for a look-up table (LUT) and a selection circuit comprising a first set of input points for a first input data set for a logic operation and a second set of input points for a second input data set associated with the third data, wherein the selection circuit is configured to select, in accordance with the first input data set, input data from the second input data set as output data for the logic operation, wherein the non-volatile memory (NVM) integrated-circuit (IC) chip is configured for storing fourth data therein associated with the third data.

16. The multichip package of claim 14 , wherein the third metal interconnect comprises a copper layer vertically in the first sealing layer and having a thickness between 30 and 200 micrometers.

17. The multichip package of claim 14 , wherein each of the plurality of first metal bumps comprises tin.

18. The multichip package of claim 14 , wherein the non-volatile memory (NVM) chip package further comprises a second metal bump under and coupling to the interconnection scheme, at a bottom of the non-volatile memory (NVM) chip package and bonded over the third metal interconnect, wherein the second metal bump comprises tin.

19. The multichip package of claim 14 , wherein the non-volatile memory (NVM) chip package further comprises a second sealing layer over the interconnection scheme and in a space at a same horizontal level as the non-volatile memory (NVM) integrated-circuit (IC) chip and beyond a sidewall of the non-volatile memory (NVM) integrated-circuit (IC) chip.

20. The multichip package of claim 14 , wherein the semiconductor integrated-circuit (IC) chip is a field-programmable-gate-array (FPGA) integrated-circuit (IC) chip.

21. The multichip package of claim 14 , wherein the non-volatile memory (NVM) integrated-circuit (IC) chip is a NOR flash chip.

22. The multichip package of claim 14 , wherein each of the plurality of first volatile memory cells is a static-random-access-memory (SRAM) cell.

Continuity (12)
Continuation 17543729 · Dec 6, 2021
Continuation 17089713 · Nov 4, 2020
Continuation In Part 16918909 · Jul 1, 2020
Provisional Application 63023235 · May 11, 2020
Provisional Application 63012072 · Apr 17, 2020
Provisional Application 62983634 · Feb 29, 2020
Provisional Application 62964627 · Jan 22, 2020
Provisional Application 62903655 · Sep 20, 2019
Provisional Application 62891386 · Aug 25, 2019
Provisional Application 62882941 · Aug 5, 2019
Provisional Application 62869567 · Jul 2, 2019
Related Publication 20240030152A1 · Jan 25, 2024
References Cited (304)
US 4870302A · Freeman · 1989 [cited by applicant]
US 5272368A · Turner et al. · 1993 [cited by applicant]
US 5587603A · Kowshik · 1996 [cited by applicant]
US 5592102A · Lane et al. · 1997 [cited by applicant]
US 5689195A · Cliff et al. · 1997 [cited by applicant]
US 5796662A · Kalter et al. · 1998 [cited by applicant]
US 6020633A · Erikson · 2000 [cited by applicant]
US 6034542A · Ridgeway · 2000 [cited by applicant]
US 6167558A · Trimberger · 2000 [cited by applicant]
US 6356478B1 · McCollum · 2002 [cited by applicant]
US 6388466B1 · Wittig et al. · 2002 [cited by applicant]
US 6404226B1 · Schadt · 2002 [cited by applicant]
US 6687167B2 · Guaitini et al. · 2004 [cited by applicant]
US 6798240B1 · Pedersen · 2004 [cited by applicant]
US 6812086B2 · Murthy et al. · 2004 [cited by applicant]
US 6828823B1 · Tsui · 2004 [cited by applicant]
US 6943580B2 · Lewis et al. · 2005 [cited by applicant]
US 6998872B1 · Chirania et al. · 2006 [cited by applicant]
US 7030652B1 · Lewis et al. · 2006 [cited by applicant]
US 7061271B1 · Young et al. · 2006 [cited by applicant]
US 7126214B2 · Huppenthal et al. · 2006 [cited by applicant]
US 7190190B1 · Camarota et al. · 2007 [cited by applicant]
US 7193433B1 · Young · 2007 [cited by applicant]
US 7219237B1 · Trimberger · 2007 [cited by applicant]
US 7366306B1 · Trimberger · 2008 [cited by applicant]
US 7385417B1 · Agrawal et al. · 2008 [cited by applicant]
US 7420390B1 · Hutton et al. · 2008 [cited by applicant]
US 7550994B1 · Camarota · 2009 [cited by applicant]
US 7598555B1 · Papworth Parkin · 2009 [cited by applicant]
US 7653891B1 · Anderson et al. · 2010 [cited by applicant]
US 7747025B1 · Trimberger · 2010 [cited by applicant]
US 7853799B1 · Trimberger · 2010 [cited by applicant]
US 7933140B2 · Wang et al. · 2011 [cited by applicant]
US 7944231B2 · Javerliac · 2011 [cited by applicant]
US 7948266B2 · Schmit et al. · 2011 [cited by applicant]
US 7973556B1 · Noguera Serra et al. · 2011 [cited by applicant]
US 8064224B2 · Mahajan et al. · 2011 [cited by applicant]
US 8081079B1 · Camarota · 2011 [cited by applicant]
US 8159268B1 · Madurawe · 2012 [cited by applicant]
US 8243527B2 · Hung et al. · 2012 [cited by applicant]
US 8354297B2 · Pagaila et al. · 2013 [cited by applicant]
US 8378407B2 · Audzeyeu et al. · 2013 [cited by applicant]
US 8531032B2 · Yu et al. · 2013 [cited by applicant]
US 8546955B1 · Wu · 2013 [cited by applicant]
US 8592886B2 · Hsu et al. · 2013 [cited by applicant]
US 8709865B2 · Hu et al. · 2014 [cited by applicant]
US 8742579B2 · Pagaila et al. · 2014 [cited by applicant]
US 8786060B2 · Yen et al. · 2014 [cited by applicant]
US 8796137B2 · Pagaila et al. · 2014 [cited by applicant]
US 8866292B2 · Beer et al. · 2014 [cited by applicant]
US 8872349B2 · Chiu et al. · 2014 [cited by applicant]
US 8878360B2 · Meyer et al. · 2014 [cited by applicant]
US 8883561B2 · Park et al. · 2014 [cited by applicant]
US 8885334B1 · Baxter · 2014 [cited by applicant]
US 8895440B2 · Choi et al. · 2014 [cited by applicant]
US 8912822B2 · Yasuda · 2014 [cited by applicant]
US 8916421B2 · Gong et al. · 2014 [cited by applicant]
US 8941230B2 · Kyozuka et al. · 2015 [cited by applicant]
US 8952489B2 · Elian et al. · 2015 [cited by applicant]
US 8952521B2 · Wojnowski et al. · 2015 [cited by applicant]
US 8987918B2 · Razdan et al. · 2015 [cited by applicant]
US 8993377B2 · Koo et al. · 2015 [cited by applicant]
US 9003221B1 · Abugharbieh et al. · 2015 [cited by applicant]
US 9082806B2 · Lin et al. · 2015 [cited by applicant]
US 9106229B1 · Hutton · 2015 [cited by applicant]
US 9135185B2 · Loh et al. · 2015 [cited by applicant]
US 9147638B2 · Liu et al. · 2015 [cited by applicant]
US 9224647B2 · Koo et al. · 2015 [cited by applicant]
US 9225512B1 · Trimberger · 2015 [cited by applicant]
US 9252127B1 · Shen et al. · 2016 [cited by applicant]
US 9263370B2 · Shenoy et al. · 2016 [cited by applicant]
US 9281292B2 · Hu et al. · 2016 [cited by applicant]
US 9324672B2 · Pagaila et al. · 2016 [cited by applicant]
US 9331060B2 · Otremba et al. · 2016 [cited by applicant]
US 9343442B2 · Chen et al. · 2016 [cited by applicant]
US 9349703B2 · Chiu et al. · 2016 [cited by applicant]
US 9349713B2 · Kim et al. · 2016 [cited by applicant]
US 9362187B2 · Ossimitz · 2016 [cited by applicant]
US 9368458B2 · Wu et al. · 2016 [cited by applicant]
US 9385006B2 · Lin · 2016 [cited by applicant]
US 9385009B2 · Lin et al. · 2016 [cited by applicant]
US 9385105B2 · Meyer et al. · 2016 [cited by applicant]
US 9396998B2 · Kurita et al. · 2016 [cited by applicant]
US 9397050B2 · Shin et al. · 2016 [cited by applicant]
US 9406619B2 · Pagaila et al. · 2016 [cited by applicant]
US 9406658B2 · Lee et al. · 2016 [cited by applicant]
US 9437260B2 · Prenat et al. · 2016 [cited by applicant]
US 9449930B2 · Kim et al. · 2016 [cited by applicant]
US 9455218B2 · Ooi et al. · 2016 [cited by applicant]
US 9508626B2 · Pagaila et al. · 2016 [cited by applicant]
US 9524955B2 · Huang et al. · 2016 [cited by applicant]
US 9543276B2 · Jee et al. · 2017 [cited by applicant]
US 9583431B1 · Rahman · 2017 [cited by applicant]
US 9593009B2 · Fuergut et al. · 2017 [cited by applicant]
US 9607967B1 · Shih · 2017 [cited by applicant]
US 9627365B1 · Yu et al. · 2017 [cited by applicant]
US 9640259B2 · Li et al. · 2017 [cited by applicant]
US 9679863B2 · Lin et al. · 2017 [cited by applicant]
US 9704843B2 · Kilger et al. · 2017 [cited by applicant]
US 9722584B1 · Chang et al. · 2017 [cited by applicant]
US 9735113B2 · Chi et al. · 2017 [cited by applicant]
US 9763329B1 · Mason · 2017 [cited by applicant]
US 9773757B2 · Yu et al. · 2017 [cited by applicant]
US 9806058B2 · Wei et al. · 2017 [cited by applicant]
US 9812337B2 · Chen et al. · 2017 [cited by applicant]
US 9818720B2 · Wei et al. · 2017 [cited by applicant]
US 9831148B2 · Yu et al. · 2017 [cited by applicant]
US 9859896B1 · Gaide et al. · 2018 [cited by applicant]
US 9881850B2 · Yu et al. · 2018 [cited by applicant]
US 9887206B2 · Su et al. · 2018 [cited by applicant]
US 9893732B1 · Lewis · 2018 [cited by applicant]
US 9899248B2 · Yu et al. · 2018 [cited by applicant]
US 9899355B2 · Yuan et al. · 2018 [cited by applicant]
US 9935113B2 · Wu et al. · 2018 [cited by applicant]
US 9966325B2 · Beyne · 2018 [cited by applicant]
US 9997464B2 · Hsieh et al. · 2018 [cited by applicant]
US 10015916B1 · Karp · 2018 [cited by applicant]
US 10026681B2 · Ko et al. · 2018 [cited by applicant]
US 10033383B1 · Richter et al. · 2018 [cited by applicant]
US 10037963B2 · Chen et al. · 2018 [cited by applicant]
US 10038647B1 · Lesea · 2018 [cited by applicant]
US 10043768B2 · Meyer et al. · 2018 [cited by applicant]
US 10056351B2 · Yu et al. · 2018 [cited by applicant]
US 10056907B1 · Asnaashari · 2018 [cited by applicant]
US 10062648B2 · Hsieh et al. · 2018 [cited by applicant]
US 10062651B2 · Liang et al. · 2018 [cited by applicant]
US 10079243B2 · Ramkumar · 2018 [cited by applicant]
US 10109559B2 · Lin et al. · 2018 [cited by applicant]
US 10109588B2 · Jeong et al. · 2018 [cited by applicant]
US 10109617B2 · Sugiyama et al. · 2018 [cited by applicant]
US 10153222B2 · Yu et al. · 2018 [cited by applicant]
US 10153239B2 · Wang et al. · 2018 [cited by applicant]
US 10157828B2 · Hsu et al. · 2018 [cited by applicant]
US 10157849B2 · Huang et al. · 2018 [cited by applicant]
US 10162139B1 · Wang et al. · 2018 [cited by applicant]
US 10163798B1 · Alur et al. · 2018 [cited by applicant]
US 10163802B2 · Lin et al. · 2018 [cited by applicant]
US 10177188B2 · Kang et al. · 2019 [cited by applicant]
US 10204684B2 · Widjaja · 2019 [cited by applicant]
US 10211070B2 · Lee et al. · 2019 [cited by applicant]
US 10211182B2 · Meyer et al. · 2019 [cited by applicant]
US 10256219B2 · Chew · 2019 [cited by applicant]
US 10290611B2 · Yu et al. · 2019 [cited by applicant]
US 10325882B2 · Kang et al. · 2019 [cited by applicant]
US 10333623B1 · Liao et al. · 2019 [cited by applicant]
US 10340249B1 · Yu et al. · 2019 [cited by applicant]
US 10373885B2 · Yu et al. · 2019 [cited by applicant]
US 10419001B2 · Jo et al. · 2019 [cited by applicant]
US 10431536B2 · Kim et al. · 2019 [cited by applicant]
US 10447274B2 · Lee et al. · 2019 [cited by applicant]
US 10476505B2 · Ngai · 2019 [cited by applicant]
US 10490521B2 · Hu et al. · 2019 [cited by applicant]
US 10490540B2 · Yu et al. · 2019 [cited by applicant]
US 10504835B1 · Wang et al. · 2019 [cited by applicant]
US 10510634B2 · Lin et al. · 2019 [cited by applicant]
US 10510650B2 · Yu et al. · 2019 [cited by applicant]
US 10522449B2 · Chen et al. · 2019 [cited by applicant]
US 10541227B2 · Yeh et al. · 2020 [cited by applicant]
US 10541228B2 · Chen et al. · 2020 [cited by applicant]
US 10622321B2 · Yu et al. · 2020 [cited by applicant]
US 10741537B2 · Lu et al. · 2020 [cited by applicant]
US 10784248B2 · Yu et al. · 2020 [cited by applicant]
US 10797031B2 · Liao et al. · 2020 [cited by applicant]
US 10892011B2 · Lin et al. · 2021 [cited by applicant]
US 10892291B2 · Chhun et al. · 2021 [cited by applicant]
US 11056463B2 · Takahashi et al. · 2021 [cited by applicant]
US 11114408B2 · Shen et al. · 2021 [cited by applicant]
US 11211334B2 · Lin et al. · 2021 [cited by applicant]
US 11217368B2 · Choa et al. · 2022 [cited by applicant]
US 20010045844A1 · New et al. · 2001 [cited by applicant]
US 20020092307A1 · Ghoshal · 2002 [cited by applicant]
US 20030122578A1 · Masui et al. · 2003 [cited by applicant]
US 20040041584A1 · Sunaga et al. · 2004 [cited by applicant]
US 20040145850A1 · Fukumoto et al. · 2004 [cited by applicant]
US 20040222817A1 · Madurawe · 2004 [cited by applicant]
US 20050185457A1 · Kim et al. · 2005 [cited by applicant]
US 20050218929A1 · Wang et al. · 2005 [cited by applicant]
US 20060138509A1 · Lee et al. · 2006 [cited by applicant]
US 20070037379A1 · Enquist et al. · 2007 [cited by applicant]
US 20070164279A1 · Lin et al. · 2007 [cited by applicant]
US 20070166912A1 · Fenigstein et al. · 2007 [cited by applicant]
US 20070279987A1 · Fang et al. · 2007 [cited by applicant]
US 20090114971A1 · Cai et al. · 2009 [cited by applicant]
US 20090243650A1 · Madurawe · 2009 [cited by applicant]
US 20090243652A1 · Dorairaj et al. · 2009 [cited by applicant]
US 20090267238A1 · Joseph · 2009 [cited by applicant]
US 20100039136A1 · Chua-Eoan et al. · 2010 [cited by applicant]
US 20100133704A1 · Marimuthu et al. · 2010 [cited by applicant]
US 20100157669A1 · Audzeyeu · 2010 [cited by applicant]
US 20100283085A1 · Bemanian · 2010 [cited by applicant]
US 20110026232A1 · Lin · 2011 [cited by examiner]
US 20110221470A1 · Javerliac et al. · 2011 [cited by applicant]
US 20120193785A1 · Lin et al. · 2012 [cited by applicant]
US 20120217549A1 · Widjaja · 2012 [cited by applicant]
US 20130082399A1 · Kim et al. · 2013 [cited by applicant]
US 20130257477A1 · Yasuda et al. · 2013 [cited by applicant]
US 20130285253A1 · Aoki et al. · 2013 [cited by applicant]
US 20140017882A1 · Lei · 2014 [cited by applicant]
US 20140070380A1 · Chiu et al. · 2014 [cited by applicant]
US 20140070403A1 · Pan et al. · 2014 [cited by applicant]
US 20140131858A1 · Pan et al. · 2014 [cited by applicant]
US 20140183731A1 · Lin et al. · 2014 [cited by applicant]
US 20140185264A1 · Chen et al. · 2014 [cited by applicant]
US 20140203412A1 · Wang et al. · 2014 [cited by applicant]
US 20140210097A1 · Chen · 2014 [cited by applicant]
US 20140254232A1 · Wu · 2014 [cited by applicant]
US 20140302659A1 · Phatak · 2014 [cited by applicant]
US 20150008957A1 · Olgiati et al. · 2015 [cited by applicant]
US 20150014844A1 · Wu et al. · 2015 [cited by applicant]
US 20150085560A1 · Candelier et al. · 2015 [cited by applicant]
US 20150116965A1 · Kim et al. · 2015 [cited by applicant]
US 20150227662A1 · Lepercq · 2015 [cited by applicant]
US 20150287672A1 · Yazdani · 2015 [cited by applicant]
US 20150327367A1 · Shen · 2015 [cited by applicant]
US 20160118390A1 · Liaw · 2016 [cited by applicant]
US 20160133571A1 · Lee et al. · 2016 [cited by applicant]
US 20160141228A1 · Leobandung · 2016 [cited by applicant]
US 20160173101A1 · Gao et al. · 2016 [cited by applicant]
US 20160190113A1 · Sharan et al. · 2016 [cited by applicant]
US 20160217835A1 · Blott et al. · 2016 [cited by applicant]
US 20160351626A1 · McCollum · 2016 [cited by applicant]
US 20160372449A1 · Rusu et al. · 2016 [cited by applicant]
US 20170071552A1 · Harpe et al. · 2017 [cited by applicant]
US 20170117263A1 · Yeh et al. · 2017 [cited by applicant]
US 20170301650A1 · Yu · 2017 [cited by applicant]
US 20170358557A1 · Chen et al. · 2017 [cited by applicant]
US 20180053730A1 · Shao · 2018 [cited by applicant]
US 20180061742A1 · Ananiev · 2018 [cited by applicant]
US 20180068937A1 · Marimuthu et al. · 2018 [cited by applicant]
US 20180076179A1 · Hsu et al. · 2018 [cited by applicant]
US 20180102776A1 · Chandrasekar et al. · 2018 [cited by applicant]
US 20180150667A1 · Yu et al. · 2018 [cited by applicant]
US 20180151477A1 · Yu et al. · 2018 [cited by applicant]
US 20180151501A1 · Yu et al. · 2018 [cited by applicant]
US 20180158746A1 · Lin · 2018 [cited by applicant]
US 20180165396A1 · Lin et al. · 2018 [cited by applicant]
US 20180174865A1 · Yu et al. · 2018 [cited by applicant]
US 20180204810A1 · Yu et al. · 2018 [cited by applicant]
US 20180204828A1 · Yu et al. · 2018 [cited by applicant]
US 20180210799A1 · Gao · 2018 [cited by applicant]
US 20180226349A1 · Yu et al. · 2018 [cited by applicant]
US 20180226371A1 · Enquist · 2018 [cited by applicant]
US 20180247905A1 · Yu et al. · 2018 [cited by applicant]
US 20180269188A1 · Yu et al. · 2018 [cited by applicant]
US 20180275193A1 · Rouge et al. · 2018 [cited by applicant]
US 20180284186A1 · Chadha · 2018 [cited by applicant]
US 20180286776A1 · Yu et al. · 2018 [cited by applicant]
US 20180301351A1 · Yu et al. · 2018 [cited by applicant]
US 20180301376A1 · Shih et al. · 2018 [cited by applicant]
US 20180350629A1 · Liu et al. · 2018 [cited by applicant]
US 20180350763A1 · Yu et al. · 2018 [cited by applicant]
US 20180358312A1 · Yu et al. · 2018 [cited by applicant]
US 20180374824A1 · Yu et al. · 2018 [cited by applicant]
US 20190013276A1 · Lee et al. · 2019 [cited by applicant]
US 20190019756A1 · Yu et al. · 2019 [cited by applicant]
US 20190020343A1 · Lin et al. · 2019 [cited by applicant]
US 20190051641A1 · Lin et al. · 2019 [cited by applicant]
US 20190057931A1 · Hsu et al. · 2019 [cited by applicant]
US 20190057932A1 · Wu et al. · 2019 [cited by applicant]
US 20190067152A1 · Wuu et al. · 2019 [cited by applicant]
US 20190097304A1 · Hsiao et al. · 2019 [cited by applicant]
US 20190129817A1 · Zhuo · 2019 [cited by applicant]
US 20190131242A1 · Lee · 2019 [cited by examiner]
US 20190164834A1 · Or-Bach et al. · 2019 [cited by applicant]
US 20190221547A1 · Drab et al. · 2019 [cited by applicant]
US 20190238134A1 · Lin et al. · 2019 [cited by applicant]
US 20190238135A1 · Lin et al. · 2019 [cited by applicant]
US 20190245543A1 · Lin et al. · 2019 [cited by applicant]
US 20190253056A1 · Lin et al. · 2019 [cited by applicant]
US 20190304803A1 · Hu et al. · 2019 [cited by applicant]
US 20190333871A1 · Chen et al. · 2019 [cited by applicant]
US 20190347790A1 · Lin et al. · 2019 [cited by applicant]
US 20190363715A1 · Lin et al. · 2019 [cited by applicant]
US 20190371763A1 · Agarwal et al. · 2019 [cited by applicant]
US 20190372574A1 · Lin et al. · 2019 [cited by applicant]
US 20200006274A1 · Chiang et al. · 2020 [cited by applicant]
US 20200058617A1 · Wu et al. · 2020 [cited by applicant]
US 20200058626A1 · Tai et al. · 2020 [cited by applicant]
US 20200082885A1 · Lin et al. · 2020 [cited by applicant]
US 20200111734A1 · Lin et al. · 2020 [cited by applicant]
US 20200144224A1 · Lin et al. · 2020 [cited by applicant]
US 20200161242A1 · Lin et al. · 2020 [cited by applicant]
US 20200243422A1 · Kim et al. · 2020 [cited by applicant]
US 20200373215A1 · Wu et al. · 2020 [cited by applicant]
US 20200395350A1 · Wu et al. · 2020 [cited by applicant]
US 20210005592A1 · Lin et al. · 2021 [cited by applicant]
US 20210043557A1 · Lin et al. · 2021 [cited by applicant]
US 20210050300A1 · Lin et al. · 2021 [cited by applicant]
US 20210090983A1 · Lin et al. · 2021 [cited by applicant]
US 20210159180A1 · Zhai et al. · 2021 [cited by applicant]
US 20210217702A1 · Dabral et al. · 2021 [cited by applicant]
US 20210232744A1 · Lin et al. · 2021 [cited by applicant]
US 20220013504A1 · Dabral et al. · 2022 [cited by applicant]
US 20220020729A1 · Gao et al. · 2022 [cited by applicant]
CN 103681367 · 2014 [cited by applicant]
CN 104078453 · 2014 [cited by applicant]
CN 104282650 · 2015 [cited by applicant]
CN 105745752 · 2016 [cited by applicant]
CN 104064556 · 2019 [cited by applicant]
TW 200623398 · 2006 [cited by applicant]
WO WO0036748 · 2000 [cited by applicant]
WO WO2005010976 · 2005 [cited by applicant]
WO WO2016160063 · 2016 [cited by applicant]
WO WO2018004092 · 2018 [cited by applicant]
Cited By (1)
US 12,400,939