IP Library › Assignment 005424/0111
Patent Assignment
Reel/Frame 005424/0111

Assignment of Assignors Interest.

Recorded: 1990-08-09 Pages: 116
Assignor
PERKIN-ELMER CORPORATION, THE,
Executed: 1990-05-15
Assignee
Covered Properties (79)
Precision Base Mercury Vapor Lamp
Patent: 30,315 →
Application: 05/916,278 →
Temperature Compensated Alignment System
Patent: 4,202,623 →
Application: 06/001,991 →
Automatic Mask Alignment
Patent: 4,353,087 →
Application: 06/019,964 →
Catadioptric Telescopes
Patent: 4,342,503 →
Application: 06/082,699 →
Monocentric Optical Systems
Patent: 4,331,390 →
Application: 06/082,814 →
Unit Magnification Relay Systems
Patent: 4,272,152 →
Application: 06/084,745 →
Coating Apparatus
Patent: 4,290,384 →
Application: 06/135,042 →
Method and Apparatus for Aligning an Opaque Mask with an Integrated Circuit Wafer
Patent: 4,335,313 →
Application: 06/149,106 →
Compression Base Lamp
Patent: 4,453,106 →
Application: 06/171,681 →
Means for Providing Uniform Illumination to a Light Sensitive Element
Patent: 4,362,384 →
Application: 06/261,314 →
Precise Lamp Positioner
Patent: 4,390,929 →
Application: 06/262,561 →
Method and Apparatus for Measuring Intensity Variation in a Light Source
Application: 06/292,466 →
Method and Apparatus for Optical System Adjustments
Patent: 4,693,569 →
Application: 06/308,647 →
Technique to Modify Wafer Geometry
Patent: 4,425,038 →
Application: 06/312,488 →
Reusable Electrical Overlay Measurement Circuit and Process
Patent: 4,437,760 →
Application: 06/327,862 →
Wafer Prealigner Using Pulsed Vacuum Spinners
Patent: 4,466,073 →
Application: 06/371,402 →
Restrictive Off-Avis Field Optical System
Patent: 4,469,414 →
Application: 06/383,683 →
Simple Electromechanical Tilt and Focus Device
Patent: 4,504,144 →
Application: 06/395,414 →
Electron Gun Assembly
Patent: 4,493,097 →
Application: 06/412,461 →
Optical Transformer Using Curved Strip Waveguides to Achieve Nearly Unchanged F/Number
Patent: 4,530,565 →
Application: 06/450,952 →
Alignment and Focusing System for a Scanning Mask Aligner
Patent: 4,549,084 →
Application: 06/451,900 →
Method of Fabricating a Pellicle Cover for Projection Printing System
Patent: 4,465,759 →
Application: 06/466,268 →
Wafer Alignment Device
Patent: 4,545,683 →
Application: 06/470,426 →
Overlay Test Wafer
Patent: 4,538,105 →
Application: 06/489,641 →
Overlay Test Measurement Systems
Patent: 4,475,811 →
Application: 06/489,664 →
Continuous Alignment Target Pattern and Signal Processing
Patent: 4,578,590 →
Application: 06/490,614 →
Electro-Magentic Apparatus
Patent: 4,506,204 →
Application: 06/502,993 →
Electro-Magnetic Alignment Assemblies
Patent: 4,507,597 →
Application: 06/502,995 →
Electro-Magnetic Alignment Device
Patent: 4,485,339 →
Application: 06/502,997 →
Electro-Magnetic Aligment Apparatus
Patent: 4,506,205 →
Application: 06/502,998 →
Wafer Transferring Chuck Assembly
Patent: 4,530,635 →
Application: 06/504,718 →
Motion Measurement and Alignment Method and Apparatus
Patent: 4,547,446 →
Application: 06/505,591 →
Fine Alignment System
Patent: 4,606,643 →
Application: 06/505,592 →
Method of Fabrication of an Optically Flat Membrane
Patent: 4,579,616 →
Application: 06/551,224 →
Method and Apparatus for Inspecting Photomasks to Detect Defects
Patent: 4,588,293 →
Application: 06/560,679 →
Chuck Handling Device
Patent: 4,553,311 →
Application: 06/564,266 →
Method and Apparatus for Measuring Intensity Variation in a Light Source
Patent: 4,516,852 →
Application: 06/568,764 →
X-Ray Lithography System
Patent: 4,539,695 →
Application: 06/568,775 →
Mask Ring Assembly for X-Ray Lithography
Patent: 4,534,047 →
Application: 06/568,776 →
X-Ray Anode Assembly
Patent: 4,584,699 →
Application: 06/568,777 →
X-Ray Mask Ring and Apparatus for Making Same
Patent: 4,610,020 →
Application: 06/568,778 →
Method of Fabricating a Pellicle Cover for Projection Printing System
Patent: 4,523,974 →
Application: 06/592,040 →
Apparatus for Measuring Overlay Error
Patent: 4,703,434 →
Application: 06/602,878 →
Bistable Aligner Cartridge Foot
Patent: 4,617,681 →
Application: 06/605,941 →
Apparatus for Detecting Defocus
Patent: 4,614,864 →
Application: 06/614,360 →
High Voltage Operational Amplifier
Patent: 4,580,104 →
Application: 06/621,839 →
Single Mirror Projection Optical System
Patent: 4,779,966 →
Application: 06/684,760 →
Optical Lithographic System
Patent: 4,650,315 →
Application: 06/732,593 →
Ring Field Projection System
Patent: 4,711,535 →
Application: 06/732,764 →
Lens Assembly
Patent: 4,586,787 →
Application: 06/780,786 →
Optical Figuring by Plasma Assisted Chemical Transport and Etching Apparatus Therefor
Patent: 4,668,366 →
Application: 06/790,673 →
Short Arc Lamp Image Transformer
Patent: 4,734,829 →
Application: 06/796,339 →
Precision Lens Mounting
Patent: 4,733,945 →
Application: 06/818,925 →
Universal Edged-Based Wafer Alignment Apparatus
Patent: 4,907,035 →
Application: 06/842,145 →
Adjustable Mount for Large Mirrors
Patent: 4,681,408 →
Application: 06/856,881 →
Wafer Cassette Transfer Mechanism
Patent: 4,750,857 →
Application: 06/859,586 →
Reverse Dark Field Alignment System for Scanning Lithographic Aligner
Patent: 4,697,087 →
Application: 06/868,506 →
High Resonance Adjustable Mirror Mount
Patent: 4,726,671 →
Application: 06/876,068 →
Reticle Transporter
Patent: 4,719,705 →
Application: 06/877,817 →
Illumination System
Patent: 4,747,030 →
Application: 06/896,486 →
Optical Sensor Circuitry
Patent: 4,740,686 →
Application: 06/905,716 →
Mounting for High Resolution Projection Lenses
Patent: 4,929,054 →
Application: 06/914,953 →
High Speed Reticle Change System
Patent: 4,760,429 →
Application: 06/927,202 →
Wide Angle Lens with Improved Flat Field Characteristics
Patent: 4,772,107 →
Application: 06/927,215 →
Lens Usable in the Ultraviolet
Patent: 4,770,477 →
Application: 06/938,091 →
Optical Relay System with Magnification
Patent: 4,747,678 →
Application: 06/942,899 →
Wafer Flip Apparatus
Patent: 4,778,332 →
Application: 07/012,537 →
Wafer Handling System
Patent: 4,846,626 →
Application: 07/012,538 →
Reticle Frame Assembly
Patent: 4,986,007 →
Application: 07/030,009 →
Illumination System for X-Ray Lithography
Patent: 4,831,640 →
Application: 07/065,135 →
Exposure Control System for Full Field Photolithography Using Pulsed Sources
Patent: 4,804,978 →
Application: 07/157,755 →
Synthetic Imaging Technique
Patent: 4,913,524 →
Application: 07/193,015 →
Microlithographic Apparatus
Patent: 4,952,858 →
Application: 07/198,545 →
Apparatus and Method for Reproducing a Pattern in an Annular Area
Application: 07/200,142 →
Optical Reduction System
Patent: 4,953,960 →
Application: 07/223,968 →
Air Gauge Sensor
Patent: 4,953,388 →
Application: 07/301,088 →
Wafer Handling System
Patent: 4,973,217 →
Application: 07/351,741 →
Apparatus and Method for Reproducing a Pattern in an Annular Area
Patent: 4,933,714 →
Application: 07/368,978 →
Ultra Precision Pressure Regulator
Patent: 5,014,031 →
Application: 07/382,943 →
Related Assignments (22)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest. Jan 30, 1981
From: LA FIANDRA CARLO; ESTES LESLIE E.; OSTNER ALWIN G.; ARIAS MICHAEL P.
To: PERKIN-ELMER CORPORATION, THE
Reel/Frame 003826/0600 →
Assignment of Assignors Interest. May 1, 1981
From: ENGELBRECHT OREST; MARKLE DAVID A.
To: PERKIN-ELMER CORPORATION, THE
Reel/Frame 003882/0539 →
Assignment of Assignors Interest. May 11, 1981
From: LA FIANDRA CARLO F.; DUGDALE GEORGE W.
To: PERKIN-ELMER CORPORATION THE, A CORP. OF NY.
Reel/Frame 003888/0361 →
Assignment of Assignors Interest. Aug 13, 1981
From: LIU, RAYMOND C.; MARKLE, DAVID A.
To: PERKIN-ELMER CORPORATION THE
Reel/Frame 003908/0472 →
Assignment of Assignors Interest. Oct 5, 1981
From: OFFNER, ABE
To: PERKIN-ELMER CORPORATION, THE, A CORP. OF N.Y.
Reel/Frame 003931/0818 →
Assignment of Assignors Interest. Oct 19, 1981
From: LA FIANDRA, CARLO F.; NELSON, BURKE E.
To: PERKIN-ELMER CORPORATION THE, A CORP. OF NY.
Reel/Frame 003936/0676 →
Assignment of Assignors Interest. Nov 20, 1981
From: LA FIANDRA, CARLO F.
To: PERKIN-ELMER CORPORATION, THE, A CORP. OF NY
Reel/Frame 003947/0371 →
Assignment of Assignors Interest. Apr 26, 1982
From: BOYAN, GERARD E.; MALERI, ENSO J.
To: PERKIN-ELMER CORPORATION THE, MAIN AVE., NORWALK, CT 06856 A CORP. OF NY
Reel/Frame 004005/0179 →
Assignment of Assignors Interest. Jun 1, 1982
From: SHAFER, DAVID R.
To: PERKIN-ELMER CORPORATION THE
Reel/Frame 004011/0116 →
Assignment of Assignors Interest. Jul 6, 1982
From: TROST, DAVID
To: PERKIN-ELMER CORPORATION THE, A CORP. OF NY
Reel/Frame 004021/0062 →
Assignment of Assignors Interest. Aug 30, 1982
From: CLAYTON, ROBERT H.
To: PERKIN-ELMER CORPORATION THE, A CORP OF NY
Reel/Frame 004041/0605 →
Assignment of Assignors Interest. Dec 7, 1982
From: AUSSCHNITT, CHRISTOPER P.
To: PERKIN-ELMER CORPORATION THE
Reel/Frame 003964/0129 →
Assignment of Assignors Interest. Dec 20, 1982
From: MARKLE, DAVID A.
To: PERKIN-ELMER CORPORATION
Reel/Frame 004078/0901 →
Assignment of Assignors Interest. Dec 21, 1982
From: MARKLE, DAVID A.
To: PERKIN-ELMER CORPORATION, THE
Reel/Frame 004079/0160 →
Assignment of Assignors Interest. Feb 14, 1983
From: DULY, DAWN L.; WINDISCHMANN, HENRY; BUCKLEY, W. D.
To: PERKIN-ELMER CORPORATION THE; A CORP OF NY.
Reel/Frame 004095/0184 →
Assignment of Assignors Interest. Feb 28, 1983
From: MARKLE, DAVID A.
To: PERKIN-ELMER CORPORATION, A CORP. OF N.Y.
Reel/Frame 004101/0361 →
Assignment of Assignors Interest. Apr 28, 1983
From: AUSSCHNITT, CHRISTOPHER P.
To: PERKIN-ELMER CORPORATION, A CORP. OF N.Y.
Reel/Frame 004136/0107 →
Confirmatory Assignment Jun 16, 2004
From: ASML US, INC.
To: ASML HOLDING N.V.
Reel/Frame 014734/0624 →
Merger Jun 16, 2004
From: ASM LITHOGRAPHY, INC. AND ASML US, LLC
To: ASML US, INC.
Reel/Frame 014734/0615 →
Conversion Jun 16, 2004
From: ASML US, INC.
To: ASML US, LLC
Reel/Frame 014734/0603 →
Merger Jun 16, 2004
From: SVG LITHOGRAPHY SYSTEMS, INC.
To: ASML US, INC.
Reel/Frame 014734/0588 →
Assignment of Assignor's Interest Jun 14, 2018
From: BORNSTEIN, MENACHEM
To: SELECTA CUT FLOWERS S.A.U.
Reel/Frame 046090/0904 →