Patent Assignment
Reel/Frame 011934/0895
Assignment of Assignor's Interest
Recorded: 2001-07-09
Pages: 11
Assignor
ETEC SYSTEMS, INC.
Executed: 2001-06-15
Assignee
APPLIED MATERIALS, INC.
M/S 2061, 2881 SCOTT BLVD., SANTA CLARA, CALIFORNIA, 95050
Covered Properties
(57)
Particle Beam Instrumentation Ion Pump
Patent:
4,397,611 →
Application:
06/280,414 →
High Throughput/High Resolution Particle Beam System
Patent:
4,445,039 →
Application:
06/280,416 →
Laser Pattern Generating System
Patent:
4,541,712 →
Application:
06/332,832 →
Electrostatic Cassette
Patent:
4,412,133 →
Application:
06/337,205 →
Composite Concentric-Gap Magnetic Lens
Patent:
4,469,948 →
Application:
06/342,696 →
Virtual Addressing for E-Beam Lithography
Patent:
4,498,010 →
Application:
06/491,678 →
Data Handling System for a Pattern Generator
Patent:
4,620,288 →
Application:
06/545,650 →
Field Emission Gun Electrode Geometry for Improved Focus Stability
Patent:
4,695,773 →
Application:
06/600,246 →
Specimen Distance Measuring System
Patent:
4,788,431 →
Application:
07/036,731 →
Differentially Pumped Seal Apparatus
Patent:
4,792,688 →
Application:
07/062,038 →
Laser Pattern Generating System
Patent:
33,931 →
Application:
07/075,175 →
Guard Ring for a Differentially Pumped Seal Apparatus
Patent:
4,837,443 →
Application:
07/109,883 →
Apparatus for Preselecting and Maintaining a Fixed Gap Between a Workpiece and a Vacuum Seal Apparatus in Particle Beam Lithography Systems
Patent:
4,818,838 →
Application:
07/141,812 →
Silcon Grid as a Reference and Calibration Standard in a Particle Beam Lithography System
Patent:
4,885,472 →
Application:
07/167,601 →
Method of Creating Isolated Plates on the Inside Surface of a Metallized Substrate
Patent:
4,966,787 →
Application:
07/367,919 →
Passive Electrostatic Vacuum Particle Collector
Patent:
4,929,139 →
Application:
07/385,042 →
Electron-Detector Diode Biassing Scheme for Improved Writing by an Electron Beam Lithography Machine
Patent:
4,987,311 →
Application:
07/391,202 →
Non-Contacting Method of Cleaning Surfaces with a Planoar Gas Bearing
Patent:
4,956,024 →
Application:
07/391,715 →
Thermally Stable Magnetic Deflection Assembly and Method of Making Same
Patent:
5,012,104 →
Application:
07/524,508 →
Temperature Stable Magnetic Deflection Assembly
Patent:
5,136,166 →
Application:
07/648,667 →
Multiphase Printing for E-Beam Lithography
Patent:
5,103,101 →
Application:
07/664,066 →
Low Aberration Field Emission Electron Gun
Patent:
5,196,707 →
Application:
07/671,425 →
Laminar Flow Gas Diffuser
Patent:
5,209,402 →
Application:
07/705,227 →
High Accuracy Beam Blanker
Patent:
5,276,330 →
Application:
07/706,612 →
Rolling Element Cage Constraint
Patent:
5,180,230 →
Application:
07/713,929 →
Small Field Scanner
Patent:
5,227,839 →
Application:
07/720,205 →
Discrete Phase Shift Mask Writing
Patent:
5,246,800 →
Application:
07/759,553 →
Arc Suppressor for Electron Gun
Patent:
5,177,402 →
Application:
07/816,981 →
Mechanically Stable Field Emission Gun
Patent:
5,304,888 →
Application:
07/828,538 →
Laser Pattern Generation Apparatus
Patent:
5,386,221 →
Application:
07/970,480 →
Small Field Scanner
Patent:
5,255,051 →
Application:
08/000,676 →
Differential Virtual Ground Beam Blanker
Patent:
5,412,218 →
Application:
08/023,983 →
Method and Structure for Electronically Measuring Beam Parameters
Patent:
5,345,085 →
Application:
08/037,964 →
Dose Modulation and Pixel Deflection for Raster Scan Lithography
Patent:
5,393,987 →
Application:
08/069,222 →
Rasterizer for a Pattern Generation Apparatus
Patent:
5,533,170 →
Application:
08/344,417 →
Magnification Correction for Small Field Scanning
Patent:
5,739,964 →
Application:
08/409,251 →
Scanning Lithography System with Opposing Motion
Patent:
5,815,245 →
Application:
08/410,601 →
Scanning Lithography System Having Double Pass Wynne-Dyson Optics
Patent:
5,757,469 →
Application:
08/412,232 →
Magnification Correction for Small Field Scanning
Patent:
5,781,346 →
Application:
08/691,754 →
Composite Concentric-Gap Magnetic Lens and Deflector with Conical Pole Pieces
Patent:
5,729,022 →
Application:
08/721,287 →
Operating a Solid State Particle Detector Within a Magnetic Deflection Field So as to Minimize Eddy Currents
Patent:
5,900,667 →
Application:
08/726,449 →
Conical Baffle for Reducing Charging Drift in a Particle Beam System
Patent:
5,838,006 →
Application:
08/733,673 →
Vacuum Compatible Linear Motion Device
Patent:
5,784,925 →
Application:
08/766,271 →
Short Wavelength Pulsed Laser Scanner
Patent:
6,037,967 →
Application:
08/769,169 →
Articulated Platform Mechanism for Laser Pattern Generation on a Workpiece
Patent:
5,835,198 →
Application:
08/779,180 →
Method and Apparatus for Run-Time Correction of Proximity Effects in Pattern Generation
Patent:
5,847,959 →
Application:
08/789,246 →
Raster Shape Beam Writing Strategy System and Method for Pattern Generation
Patent:
5,876,902 →
Application:
08/789,247 →
Composite Concentric- Gap Magnetic Lens and Deflector with Conical Polwe Pieces
Patent:
6,002,135 →
Application:
09/007,018 →
T-Shaped Electron-Beam Microcolumn as a General Purpose Scanning Electron Microscope
Patent:
6,023,060 →
Application:
09/034,893 →
Method and Apparatus for Direct Writing of Semiconductor Die Using Microcolumn Array
Patent:
6,145,438 →
Application:
09/045,490 →
Shaped Shadow Projection for an Electron Beam Column
Patent:
6,011,269 →
Application:
09/058,258 →
Detecting Registration Marks with a Low Energy Electron Beam
Patent:
6,008,060 →
Application:
09/060,496 →
Charged Particle Beam Illumination of Blanking Aperture Array
Patent:
6,157,039 →
Application:
09/074,558 →
Chevron Correction and Autofocus Optics for Laser Scanner
Patent:
6,107,622 →
Application:
09/092,319 →
Two Piece Mirror Arrangement for Interferometrically Controlled Stage
Patent:
6,057,921 →
Application:
09/106,917 →
Silicon Microlens Cleaning System
Patent:
6,077,417 →
Application:
09/195,843 →
Photoresist Developer and Method
Patent:
6,107,009 →
Application:
09/372,471 →
Related Assignments
(25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest.
Jul 6, 1981
From: WIESNER, JOHN C.; VENEKLASEN, LEE H.
To: PERKIN-ELMER CORPORATION
Reel/Frame 003899/0554 →
Assignment of Assignors Interest.
Nov 5, 1981
From: YEW, NELSON C.
To: PERKIN-ELMER CORPORATION, THE
Reel/Frame 003929/0834 →
Assignment of Assignors Interest.
Jan 5, 1982
From: ECKES, WILLIAM A.; RHOADES, RUSSELL H.; VORREITER, JOHN W.; WIESNER, JOHN C.
To: PERKIN-ELMER ELECTRON BEAM TECHNOLOGY, INC., A CORP. OF CA
Reel/Frame 003973/0427 →
Assignment of Assignors Interest.
Jan 26, 1982
From: VENEKLASEN, LEE H.; DE VORE, WILLIAM J.
To: PERKIN-ELMER ELECTRON BEAM TECHNOLOGY, INC., A CORP. OF CA.
Reel/Frame 003960/0354 →
Assignment of Assignors Interest.
Jun 21, 1982
From: PERKIN-ELMER ELECTRON BEAM TECHNOLOGY, INC.
To: PERKIN-ELMER CORPORATION,THE, MAIN AVENUE, NORWALK, CT. 06856 A CORP. OF N.Y.
Reel/Frame 004002/0792 →
Assignment of Assignors Interest.
Jul 6, 1982
From: WHITNEY, THEODORE R.
To: TRE SEMICONDUCTOR EQUIPMENT CORPORATION, 6109 DESOTO AVE., WOODLAND HILLS, CA 91637 A CA CORP.
Reel/Frame 004008/0288 →
Assignment of Assignors Interest.
Oct 26, 1983
From: WELMERS, THOMAS E.
To: TRE SEMICONDUCTOR DEVELOPMENT CORPORATION
Reel/Frame 004189/0143 →
Assignment of Assignors Interest.
Apr 13, 1984
From: BIECHLER, CHARLES S.; CARROLL, ALLEN M.; GRAVES, RICHARD E.; LYONS, STEVEN A.
To: PERKIN-ELMER CORPORATION THE, A CORP OF NY
Reel/Frame 004244/0947 →
Assignment of Assignors Interest.
Apr 16, 1984
From: VENEKLASEN, LEE H.; YAGUNOFF, GUY G.
To: PERKIN-ELMER CORPORATION, THE, A NY CORP.
Reel/Frame 004249/0723 →
Assignment of Assignors Interest.
Dec 5, 1985
From: WELMERS, THOMAS E.
To: TRE SEMICONDUCTOR EQUIPMENT CORPORATION, A CORP OF CALIFORNIA
Reel/Frame 004484/0074 →
Assignment of Assignors Interest.
Jun 19, 1986
From: SEMICONDUCTON EQUIPMENT CORPORATION THE
To: AMERICAN SEMICONDUCTOR EQUIPMENT TECHNOLOGIES
Reel/Frame 004564/0057 →
Assignment of Assignors Interest.
Jun 20, 1986
From: TRE SEMICONDUCTOR EQUIPMENT CORPORATION
To: AMERICAN SEMICONDUCTOR EQUIPMENT TECHNOLOGIES
Reel/Frame 004568/0792 →
Assignment of Assignors Interest.
Jan 11, 1988
From: YOUNG, LYDIA J.; VENEKLASEN, LEE H.
To: PERKIN-ELMER CORPORATION, THE, A CORP. OF NEW YORK
Reel/Frame 004823/0333 →
Assignment of Assignors Interest.
Mar 14, 1988
From: YOUNG, LYDIA J.
To: PERKIN-ELMER CORPORATION, THE
Reel/Frame 004848/0410 →
Assignment of Assignors Interest.
Jun 19, 1989
From: YOUNG, LYDIA J.
To: PERKIN-ELMER CORPORATION, THE, A CORP. OF NEW YORK
Reel/Frame 005113/0383 →
Assignment of Assignors Interest.
Jul 26, 1989
From: VORREITER, JOHN W.; DEAN, ROBERT L.
To: PERKIN-ELMER CORPORATION, THE, 761 MAIN AVE, NORWALK, CT. 06859-0074 A CORP. OF NEW YORK
Reel/Frame 005105/0253 →
Assignment of Assignors Interest.
Aug 8, 1989
From: DEVORE, WILLIAM J.
To: PERKIN-ELMER CORPORATION, 761 MAIN AVENUE, NORWALK, CT 06859-0074 A CORP. OF NY
Reel/Frame 005111/0464 →
Security Interest
Mar 23, 1990
From: ETEC, A CORP. OF NV
To: MNC CREDIT CORP., 502 WASHINGTON AVE., STE. 700, TOWSON, MD
Reel/Frame 005262/0967 →
Assignment of Assignors Interest.
Jun 14, 1990
From: PERKIN-ELMER CORPORATION, THE
To: ETEC, A CORP. OF NV
Reel/Frame 005366/0501 →
Assignment of Assignors Interest.
Jul 2, 1990
From: YOUNG, LYDIA J.
To: ETEC SYSTEMS, INC., A CORP. OF NEVADA
Reel/Frame 005359/0546 →
Change of Name 8/30/90
Oct 9, 1990
From: ETEC, A CORP. OF NV
To: ETEC SYSTEMS, INC., A CORP. OF NV
Reel/Frame 005475/0559 →
Assignment of Assignors Interest.
Apr 22, 1991
From: BERGLUND, C. NEIL; THOMAS, JOHN R.; POREDA, JOHN T.
To: ETEC SYSTEMS, INC.
Reel/Frame 005705/0316 →
Assignment of Assignors Interest.
May 1, 1991
From: GESLEY, MARK A.
To: ETEC SYSTEMS, INC.,
Reel/Frame 005742/0143 →
Assignment of Assignors Interest.
May 6, 1991
From: AMERICAN SEMICONDUCTOR EQUIPMENT TECHNOLOGIES, A CORP. OF CA
To: ATEQ CORPORATION AN OREGON CORPORATION
Reel/Frame 005689/0422 →
Assignment of Assignors Interest.
May 6, 1991
From: AMERICAN SEMICONDUCTOR EQUIPMENT TECHNOLOGIES, A CORP. OF CA
To: ATEQ CORPORATION AN OREGON CORPORATION
Reel/Frame 005689/0420 →