Patent Assignment
Reel/Frame 014953/0047
Conversion
Recorded: 2004-08-06
Pages: 4
Assignor
ASML US, INC.
Executed: 2002-10-04
Assignee
ASML US, LLC
1209 ORANGE STREET, WILMINGTON, DELAWARE, 19801
Covered Properties
(24)
Ultraviolet Polarization Beam Splitter for Microlithography
Patent:
6,480,330 →
Application:
09/538,529 →
Virtual Gauging System for Use in Lithographic Processing
Patent:
6,633,050 →
Application:
09/638,902 →
Method and System for Efficient and Accurate Filtering and Interpolation
Method and System for Dual Reticle Image Exposure
System and Method for Improving Linewidth Control in a Lithography Device by Varying the Angular Distribution of Light in an Illuminator as a Function of Field Position
System and Method for Improving Line Width Control in a Lithography Device Using an Illumination System Having Pre-Numerical Aperture Control
Methods for Optical Beam Shaping and Diffusing
Method for Determining Refractive Index Distribution
Catadioptric Lithography System and Method with Reticle Stage Orthogonal to Wafer Stage
Method and Apparatus for Managing Actinic Intensity Transients in a Lithography Mirror
Lithography tool having a vacuum reticle library coupled to a vacuum chamber
Application:
10/206,400 →
System and Method for Laser Beam Expansion Without Expanding Spatial Coherence
System and Method for Reticle Protection and Transport
High Numerical Aperture Projection System and Method for Microlithography
Reticle Focus Measurement Method Using Multiple Interferometric Beams
Method for Protection of Adhesives Used to Secure Optics from Ultra-Violet Light
Method of Making a Cube
Polarization Beam Splitter for Photolithography
Advanced Illumination System for Use in Microlithography
System and Method for Monitoring the Topography of a Wafer Surface During Lithographic Processing
Method and apparatus for acquiring offset checkshot survey data using tube-wave conversion
Application:
60/239,758 →
System and method for automated focus measuring of a lithography tool
Application:
60/391,931 →
Relay lens used in an illumination system of a lithography system
Application:
60/394,244 →
Method and system for correction of intrinsic birefringence in UV microlithography
Application:
60/400,680 →
Related Assignments
(21)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Mar 30, 2000
From: MCCLAY, JAMES A.; WILKLOW, RONALD A.; GREGOIRE, MATTHEW
To: SILICON VALLEY GROUP, INC.
Reel/Frame 010664/0290 →
Assignment of Assignor's Interest
Dec 4, 2000
From: LYONS, JOSEPH H.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 011354/0210 →
(Assignment of Assignor's Interest) Re-Record to Correct the Number of Microfilm Pages from 2 to 3 at Reel 11448, Frame 0324.
Jan 11, 2001
From: WIENER, ROBERTO B.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 011542/0746 →
Invalid Recording. Document Re-Recorded to Correct the Microfilm Pages. See Document at Reel 11542, Frame 0746.
Jan 11, 2001
From: WIENER, ROBERTO B.
To: SILICON VALLEY GROUP, INC.
Reel/Frame 011448/0324 →
Assignment of Assignor's Interest
Apr 23, 2002
From: TSACOYEANES, JAMES G.; COSTON, SCOTT D.
To: ASML US, INC.
Reel/Frame 012828/0431 →
Assignment of Assignor's Interest
Apr 23, 2002
From: COSTON, SCOTT D.; TSACOYEANES, JAMES G.
To: ASML US, INC.
Reel/Frame 012828/0428 →
Assignment of Assignor's Interest
Apr 25, 2002
From: HANSEN, MATTHEW E.
To: ASML US, INC.
Reel/Frame 012828/0850 →
Assignment of Assignor's Interest
May 20, 2002
From: SEWELL, HARRY
To: ASML US, INC.
Reel/Frame 012913/0521 →
Assignment of Assignor's Interest
May 29, 2002
From: SEWELL, HARRY; IVALDI, JORGE S.; SHAMALY, JOHN
To: ASML US, INC.
Reel/Frame 012941/0547 →
Assignment of Assignor's Interest
Jun 14, 2002
From: DEL PUERTO, SANTIAGO
To: ASML US, INC.
Reel/Frame 013004/0290 →
Assignment of Assignor's Interest
Jul 31, 2002
From: KREMER, ALEXANDER; DRAZKIEWICZ, STANLEY W.
To: ASML US, INC.
Reel/Frame 013161/0932 →
Assignment of Assignor's Interest
Aug 13, 2002
From: SMIRNOV, STANISLAV; OSKOTSKY, MARK L.; SAKIN, LEV; MARTIN, JOHN D.
To: ASML US, INC.
Reel/Frame 013189/0554 →
Assignment of Assignor's Interest
Aug 21, 2002
From: OSKOTSKY, MARK L.; SMIRNOV, STANISLAV
To: ASML US, INC.
Reel/Frame 013215/0488 →
Assignment of Assignor's Interest
Sep 6, 2002
From: ROUX, STEPHEN; BEDNAREK, TODD J.
To: ASML US, INC.
Reel/Frame 013266/0966 →
Assignment of Assignor's Interest
Sep 25, 2002
From: LIPSON, MATTHEW; WILKLOW, RONALD A.
To: ASML US, INC.
Reel/Frame 013336/0771 →
Assignment of Assignor's Interest
Oct 1, 2002
From: EDLOU, SAMAD M.; PETERSON, DAVID H.
To: ASML US, INC.
Reel/Frame 013351/0308 →
Assignment of Assignor's Interest
Jun 19, 2003
From: ASML US, INC.
To: ASML HOLDING N.V.
Reel/Frame 013743/0510 →
Confirmatory Assignment
Aug 15, 2003
From: SILICON VALLEY GROUP, INC.; ASML US, INC.; ASML US, INC.
To: ASML HOLDING N.V.
Reel/Frame 014391/0681 →
Assignment of Assignor's Interest
Jan 13, 2004
From: MCCLAY, JAMES A.; WILKLOW, RONALD A.; GREGOIRE, MATTHEW
To: SILICON VALLEY GROUP, INC.
Reel/Frame 014273/0387 →
Assignment of Assignor's Interest
Mar 2, 2004
From: DEL PUERTO, SANTIAGO E.; DEMARCO, MICHAEL A.; FRIEDMAN, GLENN M.; IVALDI, JORGE S.
To: ASML HOLDING N.V.
Reel/Frame 014381/0863 →
Merger
Aug 6, 2004
From: ASM LITHOGRAPHY, INC. AND ASML US, LLC
To: ASML US, INC.
Reel/Frame 014953/0042 →