Patent Assignment
Reel/Frame 013743/0510
Assignment of Assignor's Interest
Recorded: 2003-06-19
Pages: 5
Assignor
ASML US, INC.
Executed: 2003-05-21
Assignee
ASML HOLDING N.V.
DE RUN 1110, VELDHOVEN, 5503 LA, NETHERLANDS
Covered Properties
(27)
Method and System for Dual Reticle Image Exposure
Apparatus, system, and method for active compensation of aberrations in an optical system
Application:
10/091,581 →
Publication:
US 2002/0089734
System and Method for Improving Linewidth Control in a Lithography Device by Varying the Angular Distribution of Light in an Illuminator as a Function of Field Position
System and Method for Improving Line Width Control in a Lithography Device Using an Illumination System Having Pre-Numerical Aperture Control
Methods for Optical Beam Shaping and Diffusing
Method for Determining Refractive Index Distribution
Catadioptric Lithography System and Method with Reticle Stage Orthogonal to Wafer Stage
Advanced Illumination System for Use in Microlithography
Method and Apparatus for Managing Actinic Intensity Transients in a Lithography Mirror
Lithography tool having a vacuum reticle library coupled to a vacuum chamber
Application:
10/206,400 →
System and Method for Laser Beam Expansion Without Expanding Spatial Coherence
System and Method for Reticle Protection and Transport
High Numerical Aperture Projection System and Method for Microlithography
Lithography Tool Having a Vacuum Reticle Library Coupled to a Vacuum Chamber
Reticle Focus Measurement Method Using Multiple Interferometric Beams
Method for Protection of Adhesives Used to Secure Optics from Ultra-Violet Light
Method of Making a Cube
Advanced Illumination System for Use in Microlithography
System and Method for Laser Beam Expansion
Method, System, and Computer Program Product for Improved Trajectory Planning and Execution
Method and Apparatus for Isolating Light Source Gas from Main Chamber Gas in a Lithography Tool
System and Method for Automated Focus Measuring of a Lithography Tool
Method and System for Correction of Intrinsic Birefringence in Uv Microlithography
Beam-Splitter Optics Design That Maintains an Unflipped (Unmirrored) Image for a Catadioptric Lithographic System
Patent:
6,731,374 →
Application:
10/307,407 →
System and method for automated focus measuring of a lithography tool
Application:
60/391,931 →
Relay lens used in an illumination system of a lithography system
Application:
60/394,244 →
Method and system for correction of intrinsic birefringence in UV microlithography
Application:
60/400,680 →
Related Assignments
(18)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Apr 23, 2002
From: COSTON, SCOTT D.; TSACOYEANES, JAMES G.
To: ASML US, INC.
Reel/Frame 012828/0428 →
Assignment of Assignor's Interest
Apr 23, 2002
From: TSACOYEANES, JAMES G.; COSTON, SCOTT D.
To: ASML US, INC.
Reel/Frame 012828/0431 →
Assignment of Assignor's Interest
Apr 25, 2002
From: HANSEN, MATTHEW E.
To: ASML US, INC.
Reel/Frame 012828/0850 →
Assignment of Assignor's Interest
May 20, 2002
From: SEWELL, HARRY
To: ASML US, INC.
Reel/Frame 012913/0521 →
Assignment of Assignor's Interest
May 29, 2002
From: SEWELL, HARRY; IVALDI, JORGE S.; SHAMALY, JOHN
To: ASML US, INC.
Reel/Frame 012941/0547 →
Assignment of Assignor's Interest
Jun 11, 2002
From: OSKOTSKY, MARK; RYZHIKOV, LEV; COSTON, SCOTT; TSACOYEANES, JAMES
To: ASML US, INC.
Reel/Frame 012999/0258 →
Assignment of Assignor's Interest
Jun 14, 2002
From: DEL PUERTO, SANTIAGO
To: ASML US, INC.
Reel/Frame 013004/0290 →
Assignment of Assignor's Interest
Jul 31, 2002
From: KREMER, ALEXANDER; DRAZKIEWICZ, STANLEY W.
To: ASML US, INC.
Reel/Frame 013161/0932 →
Assignment of Assignor's Interest
Aug 13, 2002
From: SMIRNOV, STANISLAV; OSKOTSKY, MARK L.; SAKIN, LEV; MARTIN, JOHN D.
To: ASML US, INC.
Reel/Frame 013189/0554 →
Assignment of Assignor's Interest
Aug 21, 2002
From: OSKOTSKY, MARK L.; SMIRNOV, STANISLAV
To: ASML US, INC.
Reel/Frame 013215/0488 →
Assignment of Assignor's Interest
Sep 6, 2002
From: ROUX, STEPHEN; BEDNAREK, TODD J.
To: ASML US, INC.
Reel/Frame 013266/0966 →
Assignment of Assignor's Interest
Sep 25, 2002
From: LIPSON, MATTHEW; WILKLOW, RONALD A.
To: ASML US, INC.
Reel/Frame 013336/0771 →
Assignment of Assignor's Interest
Oct 1, 2002
From: EDLOU, SAMAD M.; PETERSON, DAVID H.
To: ASML US, INC.
Reel/Frame 013351/0308 →
Assignment of Assignor's Interest
Oct 16, 2002
From: OSKOTSKY, MARK; RYZHIKOV, LEV; COSTON, SCOTT; TSACOYEANES, JAMES
To: ASML US, INC.
Reel/Frame 013391/0317 →
Assignment of Assignor's Interest
Mar 2, 2004
From: DEL PUERTO, SANTIAGO E.; DEMARCO, MICHAEL A.; FRIEDMAN, GLENN M.; IVALDI, JORGE S.
To: ASML HOLDING N.V.
Reel/Frame 014381/0863 →
Assignment of Assignor's Interest
Mar 5, 2004
From: DEL PUERTO, SANTIAGO E.; EURLINGS, MARKUS F.
To: ASML HOLDING N.V.
Reel/Frame 014393/0061 →
Conversion
Aug 6, 2004
From: ASML US, INC.
To: ASML US, LLC
Reel/Frame 014953/0047 →
Merger
Aug 6, 2004
From: ASM LITHOGRAPHY, INC. AND ASML US, LLC
To: ASML US, INC.
Reel/Frame 014953/0042 →