Patent Assignment
Reel/Frame 008553/0195
Security Agreement
Recorded: 1997-06-23
Pages: 17
Assignor
EPSILON TECHNOLOGY, INC., D/B/A ASM EPITAXY
Executed: 1997-06-06
Assignee
IMPERIAL BANK
LENDING SERVICES, 9920 SOUTH LA CIENEGA BOULEVARD, INGLEWOOD, CALIFORNIA, 90301
Covered Properties
(31)
Method and Apparatus for Substrate Heating in an Axially Symmetric Epitaxial Deposition Apparatus
Patent:
4,654,509 →
Application:
06/784,739 →
Method and Apparatus for Substrate Heating in an Axially Symmetric Epitaxial Deposition Apparatus
Patent:
4,789,771 →
Application:
07/031,519 →
Rotatable Substrate Supporting Mechanism with Temperature Sensing Device for Use in Chemical Vapor Deposition Equipment
Patent:
4,821,674 →
Application:
07/032,474 →
Heating System for Reaction Chamber of Chemical Vapor Deposition Equipment
Patent:
4,836,138 →
Application:
07/063,409 →
Improved Gas Injectors for Reaction Chambers in Cvd Systems
Patent:
5,221,556 →
Application:
07/066,019 →
Chemical Vapor Deposition System
Patent:
4,828,224 →
Application:
07/108,771 →
Apparatus and Method for Chemical Vapor Deposition Using an Axially Symmetric Gas Flow
Patent:
4,798,165 →
Application:
07/147,100 →
Process for Epitaxial Deposition of Silicon
Patent:
4,874,464 →
Application:
07/167,347 →
Substrate Loading Apparatus for a Cvd Process
Patent:
5,092,728 →
Application:
07/315,332 →
Substrate Handling and Transporting Apparatus
Patent:
5,020,475 →
Application:
07/315,723 →
Heating System for Substrates
Patent:
4,975,561 →
Application:
07/319,260 →
Method for Improving the Reactant Gas Flow in a Reaction Chambers
Patent:
5,096,534 →
Application:
07/329,778 →
Rotatable Substrate Supporting Susciptor with Temperature Sensors
Patent:
4,996,942 →
Application:
07/330,200 →
Susceptor with Temperature Sensing Device
Patent:
4,993,355 →
Application:
07/339,310 →
Gas Injectors for Reaction Chambers in Cvd Systems
Application:
07/364,708 →
Apparatus for Improving the Reactant Gas Flow in a Reaction Chamber
Patent:
5,044,315 →
Application:
07/468,630 →
Drive Shaft Apparatus for a Susceptor
Patent:
5,117,769 →
Application:
07/539,062 →
Wafer Handling System with Bernoulli Pick-Up
Patent:
5,080,549 →
Application:
07/547,463 →
Substrate Supporting Apparatus
Patent:
5,318,634 →
Application:
07/655,731 →
Rotatable Substrate Supporting Mechanism with Temperature Sensing Device for Use in Chemical Vapor Deposition Equipment
Patent:
5,198,034 →
Application:
07/664,867 →
Apparatus for Improving the Reactant Gas Flow in a Reaction Chamber
Patent:
5,244,694 →
Application:
07/695,410 →
Method for Loading a Substrate into a Cvd Apparatus
Patent:
5,156,521 →
Application:
07/720,750 →
Gas Injectors for Reaction Chambers in Cvd Systems
Patent:
5,411,590 →
Application:
07/782,060 →
Wafer Handling System with Bernoulli Pick-Up
Patent:
5,324,155 →
Application:
07/819,098 →
Rotatable Substrate Supporting Mechanism with Temperature Sensing Device for Use in Chemical Vapor Deposition Equipment
Patent:
5,427,620 →
Application:
07/882,309 →
Reaction Chambers for Cvd Systems
Patent:
5,261,960 →
Application:
07/882,844 →
Rotatable Substrate Supporting Mechanism with Temperature Sensing Device for Use in Chemical Vapor Deposition Equipment
Patent:
5,374,315 →
Application:
08/133,659 →
Gas Injectors for Reaction Chambers in Cvd Systems
Patent:
5,458,918 →
Application:
08/171,265 →
Chemical Vapor Desposition System
Patent:
5,435,682 →
Application:
08/255,114 →
Method of Making a Quartz Dome Reactor Chamber
Patent:
5,573,566 →
Application:
08/451,926 →
Gas Injectors for Reaction Chambers in Cvd Systems
Patent:
5,525,157 →
Application:
08/514,420 →
Related Assignments
(9)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest.
Oct 7, 1985
From: ROBINSON, MC DONALD; BEHEE, RONALD D.; DE BOER, WIEBE B.; JOHNSON, WAYNE L.
To: EPSILON LIMITED PARTNERSHIP TEMPE, AZ A CORP OF AZ
Reel/Frame 004467/0414 →
Assignment of Assignors Interest.
Oct 15, 1987
From: DE BOER, WIEBE B.
To: EPSILON TECHNOLOGY, INC., 2300 W. HUNTINGTON ROAD, CITY OF TEMPE, ARIZONA A CORP. OF ARIZONA
Reel/Frame 004811/0825 →
Assignment of Assignors Interest.
Oct 15, 1987
From: CRABB, RICHARD; ROBINSON, MC DONALD; HAWKINS, MARK R.; GOODWIN, DENNIS L.
To: EPSILON TECHNOLOGY, INC., 2300 W. HUNTINGTON ROAD, CITY OF TEMPE, ARIZONA A CORP. OF ARIZONA
Reel/Frame 004811/0827 →
Assignment of Assignors Interest.
Oct 15, 1987
From: OZIAS, ALBERT E.
To: EPSILON TECHNOLOGY, INC., 2300 W. HUNTINGTON ROAD, CITY OF TEMPE, ARIZONA A CORP. OF ARIZONA
Reel/Frame 004811/0829 →
Assignment of Assignors Interest.
Aug 16, 1989
From: ASM EPITAXY
To: EPSILON LIMITED PARTNERSHIP
Reel/Frame 005136/0385 →
Assignment of Assignors Interest.
Jan 12, 1993
From: EPSILON TECHNOLOGY, INC.
To: ADVANCED SEMICONDUCTOR MATERIALS AMERICA, INC.
Reel/Frame 006344/0708 →
Assignment of Assignors Interest.
Jan 12, 1993
From: EPSILON LIMITED PARTNERSHIP
To: ADVANCED SEMICONUCTOR MATERIALS AMERICA, INC.
Reel/Frame 006344/0711 →
Assignment of Assignors Interest.
Feb 22, 1993
From: EPSILON TECHNOLOGY, INC.
To: ADVANCED SEMICONDUCTOR MATERIALS AMERICA, INC.
Reel/Frame 006485/0559 →
Change of Name
Jun 13, 2000
From: ADVANCED SEMICONDUCTOR MATERIALS AMERICA, INC.
To: ASM AMERICA, INC.
Reel/Frame 010881/0362 →