IP Library › Assignment 010881/0362
Patent Assignment
Reel/Frame 010881/0362

Change of Name

Recorded: 2000-06-13 Pages: 15
Assignor
Assignee
ASM AMERICA, INC.
3440 EAST UNIVERSITY DRIVE, PHOENIX, ARIZONA, 85034
Covered Properties (87)
Surface Inspection System
Patent: 4,402,613 →
Application: 06/024,944 →
Stepping Motor Drive Circuit
Patent: 4,414,498 →
Application: 06/236,840 →
Plasma Deposition of Silicon
Patent: 4,401,687 →
Application: 06/320,451 →
Semiconductor Testing and Apparatus Therefor
Patent: 4,520,313 →
Application: 06/363,641 →
Method and Apparatus for Achieving Spatially Uniform Externally Excited Non-Thermal Chemical Reactions
Patent: 4,401,507 →
Application: 06/398,066 →
Object Detection Apparatus and Method
Patent: 4,451,197 →
Application: 06/401,936 →
Spacer for Preventing Shorting Between Conductive Plates
Patent: 4,491,606 →
Application: 06/492,545 →
Article Handling Apparatus and Method
Patent: 4,557,657 →
Application: 06/538,411 →
Metal-Silicide Deposition Using Plasma-Enhanced Chemical Vapor Deposition
Patent: 4,557,943 →
Application: 06/547,050 →
Stable Conductive Elements for Direct Exposure to Reactive Environments
Patent: 4,633,051 →
Application: 06/554,978 →
Apparatus for Processing Semiconductor Wafers or the Like
Patent: 4,610,748 →
Application: 06/679,898 →
Semiconductor Testing and Apparatus Therefor
Patent: 4,746,856 →
Application: 06/714,194 →
Method and Apparatus for Substrate Heating in an Axially Symmetric Epitaxial Deposition Apparatus
Patent: 4,654,509 →
Application: 06/784,739 →
Vacuum Wafer Expander Apparatus
Patent: 4,744,550 →
Application: 06/855,841 →
Electrode Boat Apparatus for Processing Semiconductor Wafers or the Like
Patent: 4,799,451 →
Application: 07/017,778 →
Method and Apparatus for Substrate Heating in an Axially Symmetric Epitaxial Deposition Apparatus
Patent: 4,789,771 →
Application: 07/031,519 →
Rotatable Substrate Supporting Mechanism with Temperature Sensing Device for Use in Chemical Vapor Deposition Equipment
Patent: 4,821,674 →
Application: 07/032,474 →
Apparatus and Method for Automated Wafer Handling
Patent: 4,813,732 →
Application: 07/037,098 →
Heating System for Reaction Chamber of Chemical Vapor Deposition Equipment
Patent: 4,836,138 →
Application: 07/063,409 →
Reaction Chambers for Cvd Systems
Patent: 4,846,102 →
Application: 07/065,945 →
Improved Gas Injectors for Reaction Chambers in Cvd Systems
Patent: 5,221,556 →
Application: 07/066,019 →
Chemical Vapor Deposition System
Patent: 4,828,224 →
Application: 07/108,771 →
Apparatus and Method for Chemical Vapor Deposition Using an Axially Symmetric Gas Flow
Patent: 4,798,165 →
Application: 07/147,100 →
Process for Epitaxial Deposition of Silicon
Patent: 4,874,464 →
Application: 07/167,347 →
Substrate Loading Apparatus for a Cvd Process
Patent: 5,092,728 →
Application: 07/315,332 →
Substrate Handling and Transporting Apparatus
Patent: 5,020,475 →
Application: 07/315,723 →
Heating System for Substrates
Patent: 4,975,561 →
Application: 07/319,260 →
Method for Improving the Reactant Gas Flow in a Reaction Chambers
Patent: 5,096,534 →
Application: 07/329,778 →
Rotatable Substrate Supporting Susciptor with Temperature Sensors
Patent: 4,996,942 →
Application: 07/330,200 →
Susceptor with Temperature Sensing Device
Patent: 4,993,355 →
Application: 07/339,310 →
High Throughput Multi Station Processor for Multiple Single Wafers
Patent: 4,987,856 →
Application: 07/354,922 →
Apparatus for Improving the Reactant Gas Flow in a Reaction Chamber
Patent: 5,044,315 →
Application: 07/468,630 →
Drive Shaft Apparatus for a Susceptor
Patent: 5,117,769 →
Application: 07/539,062 →
Wafer Handling System with Bernoulli Pick-Up
Patent: 5,080,549 →
Application: 07/547,463 →
Method for Processing Wafers in a Multi Station Common Chamber Reactor
Patent: 5,091,217 →
Application: 07/587,737 →
Transmission Line for Providing Power to an Electrode Boat in a Plasma Enhanced Chemical Vapor Deposition System
Patent: 5,175,021 →
Application: 07/624,320 →
Substrate Supporting Apparatus
Patent: 5,318,634 →
Application: 07/655,731 →
Rotatable Substrate Supporting Mechanism with Temperature Sensing Device for Use in Chemical Vapor Deposition Equipment
Patent: 5,198,034 →
Application: 07/664,867 →
Apparatus for Improving the Reactant Gas Flow in a Reaction Chamber
Patent: 5,244,694 →
Application: 07/695,410 →
Method for Loading a Substrate into a Cvd Apparatus
Patent: 5,156,521 →
Application: 07/720,750 →
Gas Injectors for Reaction Chambers in Cvd Systems
Patent: 5,411,590 →
Application: 07/782,060 →
Wafer Handling System with Bernoulli Pick-Up
Patent: 5,324,155 →
Application: 07/819,098 →
Rotatable Substrate Supporting Mechanism with Temperature Sensing Device for Use in Chemical Vapor Deposition Equipment
Patent: 5,427,620 →
Application: 07/882,309 →
Reaction Chambers for Cvd Systems
Patent: 5,261,960 →
Application: 07/882,844 →
Rotatable Substrate Supporting Mechanism with Temperature Sensing Device for Use in Chemical Vapor Deposition Equipment
Patent: 5,374,315 →
Application: 08/133,659 →
Gas Injectors for Reaction Chambers in Cvd Systems
Patent: 5,458,918 →
Application: 08/171,265 →
Chemical Vapor Desposition System
Patent: 5,435,682 →
Application: 08/255,114 →
Method of Making a Quartz Dome Reactor Chamber
Patent: 5,573,566 →
Application: 08/451,926 →
Rotatable Substrate Supporting Mechanism with Temperature Sensing Device for Use in Chemical Vapor Deposition Equipment
Patent: 5,902,407 →
Application: 08/513,321 →
Gas Injectors for Reaction Chambers in Cvd Systems
Patent: 5,525,157 →
Application: 08/514,420 →
Low-Mass Susceptor
Patent: 6,086,680 →
Application: 08/621,627 →
Process Chamber with Inner Support
Patent: 6,093,252 →
Application: 08/637,616 →
Gas Injection System for Reaction Chambers in Cvd Systems
Patent: 5,819,684 →
Application: 08/661,461 →
Wafer Support System
Patent: 6,053,982 →
Application: 08/706,069 →
Semiconductor Processing System with Gas Curtain
Patent: 5,997,588 →
Application: 08/729,550 →
Tungsten Silicide Deposition Process
Patent: 6,335,280 →
Application: 08/783,815 →
Method and System for Adjusting Semiconductor Processing Equipment
Patent: 6,126,744 →
Application: 08/911,865 →
Wafer Support System
Patent: 6,113,702 →
Application: 08/923,241 →
Substrate Transfer System for Semiconductor Processing Equipment
Patent: 6,068,441 →
Application: 08/976,537 →
Dual Arm Linear Hand-Off Wafer Transfer Assembly
Patent: 6,183,183 →
Application: 09/006,325 →
Stackable Cassette for Use with Wafer Cassettes
Patent: 6,162,006 →
Application: 09/083,833 →
Reflective Surface for Cvd Reactor Walls
Patent: 6,021,152 →
Application: 09/110,541 →
Substrate Cooling System and Method
Patent: 6,073,366 →
Application: 09/110,544 →
Wafer Carrier and Method for Handling of Wafers with Minimal Contact
Patent: 6,158,951 →
Application: 09/113,441 →
Multi-Position Load Lock Chamber
Patent: 6,162,299 →
Application: 09/113,767 →
Method and Apparatus for Cooling Substrates
Patent: 6,108,937 →
Application: 09/150,986 →
Long Life High Temperature Process Chamber
Patent: 6,325,858 →
Application: 09/184,490 →
Method of Processing Wafers with Low Mass Support
Patent: 6,121,061 →
Application: 09/184,491 →
Low Mass Wafer Support System
Application: 09/184,757 →
Substrate Transfer System for Semiconductor Processing Equipment
Patent: 6,293,749 →
Application: 09/193,991 →
Compact Process Chamber for Improved Process Uniformity
Patent: 6,143,079 →
Application: 09/195,793 →
In Situ Growth of Oxide and Silicon Layers
Patent: 6,749,687 →
Application: 09/227,679 →
Wafer Carrier and Method for Handling of Wafers with Minimal Contact
Patent: 6,318,957 →
Application: 09/256,743 →
Method of Depositing Silicon with High Step Coverage
Patent: 6,232,196 →
Application: 09/264,167 →
Multi-Stage Single-Drive Foup Door Opening System
Patent: 6,042,324 →
Application: 09/277,662 →
Bellows Isolation for Index Platforms
Patent: 6,551,044 →
Application: 09/395,795 →
Wafer Holder
Patent: 6,242,718 →
Application: 09/434,030 →
Reflective Surface for Cvd Reactor Walls
Patent: 6,319,556 →
Application: 09/437,069 →
Method and Apparatus for Cooling Substrates
Patent: 6,209,220 →
Application: 09/438,200 →
Exhaust System for Vapor Deposition Reactor and Method of Using Same
Patent: 6,572,924 →
Application: 09/443,552 →
Process Chamber Cooling
Patent: 6,259,062 →
Application: 09/454,377 →
Deposition of Gate Stacks Including Silicon Germanium Layers
Application: 09/460,190 →
Wafer support system
Patent: 6,203,622 →
Application: 09/480,918 →
Gridded Substrate Transport Spatula
Patent: 6,331,023 →
Application: 09/483,604 →
System of controlling the temperature of a processing chamber
Patent: 6,191,399 →
Application: 09/495,765 →
Rotating Semiconductor Processing Apparatus
Patent: 6,554,905 →
Application: 09/550,680 →
Barrier coating for vitreous materials
Application: 60/195,561 →
Related Assignments (23)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest. Feb 23, 1981
From: GESSNER, GERALD A.
To: ELMONT AG
Reel/Frame 003918/0741 →
Assignment of Assignors Interest. Nov 12, 1981
From: ROSLER, RICHARD S.; ENGLE, GEORGE M.
To: ADVANCED SEMICONDUCTOR MATERIALS AMERICA, INC., CORP. OF AZ.
Reel/Frame 003953/0074 →
Assignment of Assignors Interest. Mar 30, 1982
From: ALLRED, LAURENCE L., JR.; LANGE, BRADLEY N.
To: ADVANCED SEMICONDUCTOR MATERIALS DIE BONDING, INC.
Reel/Frame 003986/0912 →
Assignment of Assignors Interest. Jul 14, 1982
From: ENGLE GEORGE M JR
To: ADVANCED SEMICONDUCTOR MATERIALS, AMERICA INC
Reel/Frame 004027/0252 →
Assignment of Assignors Interest. Jul 26, 1982
From: LANGE, BRADLEY N.
To: ASM DIE BONDING, INC. CHANDLER, AZ A CORP. OF
Reel/Frame 004025/0149 →
Assignment of Assignors Interest. Sep 17, 1982
From: ELMONT AG
To: ELMONT INTERNATIONAL INC., A CORP OF AZ
Reel/Frame 004037/0227 →
Assignment of Assignors Interest. Oct 5, 1983
From: OLSON, DONALD M.; JACKSON, NORMAN L.; TONG, JERRY E.
To: ADVANCED SEMICONDUCTOR MATERIALS AMERICA, INC., A AZ CORP.
Reel/Frame 004181/0486 →
Assignment of Assignors Interest. Oct 31, 1983
From: ROSLER, RICHARD S.; ENGLE, GEORGE M.
To: ADVANCED SEMICONDUCTOR MATERIALS AMERICA, INC.
Reel/Frame 004192/0717 →
Assignment of Assignors Interest. Nov 23, 1983
From: OLSON, DONALD M.
To: ADVANCED SEMICONDUCTOR MATERIALS AMERICA, INC.
Reel/Frame 004200/0538 →
Assignment of Assignors Interest. Dec 10, 1984
From: ENGLE, GEORGE M.; ROSLER, RICHARD S.
To: ASM AMERICA, INC., A CORP OF AZ
Reel/Frame 004373/0231 →
Assignment of Assignors Interest. Feb 28, 1985
From: ADVANCED SEMICONDUCTOR MATERIALS DIE BONDING, INC.
To: ADVANCED SEMICONDUCTOR MATERIALS AMERICA, INC., AN AZ CORP
Reel/Frame 004366/0502 →
Assignment of Assignors Interest. Mar 1, 1985
From: ADVANCED SEMICONDUCTOR MATERIALS DIE BONDING, INC.
To: ADVANCED SEMICONDUCTOR MATERIALS AMERICA, INC., A CORP OF AZ
Reel/Frame 004368/0690 →
Assignment of Assignors Interest. Mar 4, 1985
From: ADVANCED SEMICONUCTOR MATERIALS DIE BONDING,INC.
To: ADVANCED SEMICONDUCTOR MATERIALS AMERICA,A CORP ARIZONA
Reel/Frame 004368/0874 →
Assignment of Assignors Interest. Oct 7, 1985
From: ROBINSON, MC DONALD; BEHEE, RONALD D.; DE BOER, WIEBE B.; JOHNSON, WAYNE L.
To: EPSILON LIMITED PARTNERSHIP TEMPE, AZ A CORP OF AZ
Reel/Frame 004467/0414 →
Assignment of Assignors Interest. Apr 24, 1986
From: OGLESBEE, IVAN W.
To: ASM AMERICA, INC.
Reel/Frame 004561/0164 →
Assignment of Assignors Interest. Oct 15, 1987
From: CRABB, RICHARD; ROBINSON, MC DONALD; HAWKINS, MARK R.; GOODWIN, DENNIS L.
To: EPSILON TECHNOLOGY, INC., 2300 W. HUNTINGTON ROAD, CITY OF TEMPE, ARIZONA A CORP. OF ARIZONA
Reel/Frame 004811/0827 →
Assignment of Assignors Interest. Oct 15, 1987
From: OZIAS, ALBERT E.
To: EPSILON TECHNOLOGY, INC., 2300 W. HUNTINGTON ROAD, CITY OF TEMPE, ARIZONA A CORP. OF ARIZONA
Reel/Frame 004811/0829 →
Assignment of Assignors Interest. Oct 15, 1987
From: DE BOER, WIEBE B.
To: EPSILON TECHNOLOGY, INC., 2300 W. HUNTINGTON ROAD, CITY OF TEMPE, ARIZONA A CORP. OF ARIZONA
Reel/Frame 004811/0825 →
Assignment of Assignors Interest. Aug 16, 1989
From: ASM EPITAXY
To: EPSILON LIMITED PARTNERSHIP
Reel/Frame 005136/0385 →
Assignment of Assignors Interest. Jan 12, 1993
From: EPSILON LIMITED PARTNERSHIP
To: ADVANCED SEMICONUCTOR MATERIALS AMERICA, INC.
Reel/Frame 006344/0711 →
Assignment of Assignors Interest. Jan 12, 1993
From: EPSILON TECHNOLOGY, INC.
To: ADVANCED SEMICONDUCTOR MATERIALS AMERICA, INC.
Reel/Frame 006344/0708 →
Assignment of Assignor's Interest Jun 23, 1997
From: ADVANCED SEMICONDUCOR MATERIALS OF AMERICA, INC.
To: IMPERIAL BANK, A CALIFORNIA BANKING CORPORATION
Reel/Frame 008553/0183 →
Security Agreement Jun 23, 1997
From: EPSILON TECHNOLOGY, INC., D/B/A ASM EPITAXY
To: IMPERIAL BANK
Reel/Frame 008553/0195 →