IP Library › Assignment 029756/0053
Patent Assignment
Reel/Frame 029756/0053

Assignment of Assignor's Interest

Recorded: 2013-02-05 Pages: 8
Assignor
PANASONIC CORPORATION
Executed: 2013-01-31
Assignee
RPX CORPORATION
ONE MARKET PLAZA, STEUART TOWER, SUITE 800, SAN FRANCISCO, CALIFORNIA, 94105
Covered Properties (29)
Pattern Formation Method and Exposure System
Patent: 7,094,521 →
Application: 10/640,061 →
Publication: US 2004/0224265
Pattern Formation Method
Patent: 6,992,015 →
Application: 10/643,929 →
Publication: US 2004/0224525
Pattern Formation Method
Patent: 7,132,224 →
Application: 10/661,542 →
Publication: US 2004/0253548
Pattern Formation Method
Patent: 7,135,273 →
Application: 10/713,217 →
Publication: US 2004/0259040
Pattern Formation Method
Patent: 7,393,794 →
Application: 10/715,433 →
Publication: US 2004/0259008
Semiconductor Manufacturing Apparatus and Pattern Formation Method
Patent: 7,195,860 →
Application: 10/983,655 →
Publication: US 2005/0106512
Exposure System and Pattern Formation Method Using the Same
Patent: 7,700,268 →
Application: 11/010,422 →
Publication: US 2005/0136361
Barrier Film Material and Pattern Formation Method Using the Same
Patent: 7,550,253 →
Application: 11/058,369 →
Publication: US 2005/0186516
Exposure System and Pattern Formation Method
Patent: 7,713,685 →
Application: 11/143,666 →
Publication: US 2005/0277069
Semiconductor Manufacturing Apparatus and Pattern Formation Method
Patent: 7,771,918 →
Application: 11/143,667 →
Publication: US 2005/0277068
Resist Material and Pattern Formation Method
Patent: 7,338,743 →
Application: 11/197,296 →
Publication: US 2006/0051702
Pattern Formation Method Through Liquid Immersion Lithography
Patent: 7,470,501 →
Application: 11/203,161 →
Publication: US 2006/0051709
Barrier Film Material and Pattern Formation Method Using the Same
Patent: 7,727,707 →
Application: 11/224,980 →
Publication: US 2006/0127812
Pattern Formation Method
Patent: 7,556,914 →
Application: 11/253,701 →
Publication: US 2006/0148266
Pattern Formation Method
Patent: 7,524,772 →
Application: 11/254,819 →
Publication: US 2006/0040215
Pattern formation method and exposure system
Application: 11/376,188 →
Publication: US 2006/0160032
Chemically Amplified Resist Material and Pattern Formation Method Using the Same
Patent: 7,314,703 →
Application: 11/409,207 →
Publication: US 2006/0281025
Pattern Formation Method
Patent: 7,595,142 →
Application: 11/430,993 →
Publication: US 2006/0275707
Pattern formation method and exposure system
Application: 11/653,331 →
Publication: US 2007/0128558
Semiconductor manufacturing apparatus and pattern formation method
Application: 11/715,852 →
Publication: US 2007/0153245
Pattern Formation Method
Patent: 7,655,385 →
Application: 11/723,056 →
Publication: US 2007/0287102
Barrier Film Material and Pattern Formation Method Using the Same
Patent: 7,871,759 →
Application: 11/949,338 →
Publication: US 2008/0193883
Chemically Amplified Resist Material, Topcoat Film Material and Pattern Formation Method Using the Same
Patent: 7,541,132 →
Application: 11/968,826 →
Publication: US 2008/0286687
Barrier Film Material and Pattern Formation Method Using the Same
Patent: 7,939,242 →
Application: 12/046,996 →
Publication: US 2008/0233491
Exposure system and pattern formation method
Application: 12/314,208 →
Publication: US 2009/0091719
Pattern Formation Method
Patent: 8,080,364 →
Application: 12/412,942 →
Publication: US 2009/0186484
Barrier Film Material and Pattern Formation Method Using the Same
Application: 12/466,769 →
Publication: US 2009/0227111
Exposure System and Pattern Formation Method
Patent: 8,088,565 →
Application: 12/749,289 →
Publication: US 2010/0183988
Semiconductor Manufacturing Apparatus Controlling Wafer Holding Section Temperature to Be Lower Than Imersion Liquid Temperature
Application: 12/824,793 →
Publication: US 2010/0265477
Related Assignments (15)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 1, 2006
From: ENDO, MASAYUKI; SASAGO, MASARU
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 018199/0528 →
Assignment of Assignor's Interest Sep 12, 2006
From: ENDO, MASAYUKI; SASAGO, MASARU
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 018233/0058 →
Change of Name Nov 20, 2008
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 021930/0876 →
Change of Name Nov 24, 2008
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 021897/0671 →
Change of Name Nov 24, 2008
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 021897/0653 →
Change of Name Nov 12, 2012
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 029283/0318 →
Assignment of Assignor's Interest Dec 26, 2012
From: ENDO, MASAYUKI; SASAGO, MASARU
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 029525/0382 →
Assignment of Assignor's Interest Dec 26, 2012
From: ENDO, MASAYUKI; SASAGO, MASARU
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 029525/0515 →
Change of Name Dec 26, 2012
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 029539/0228 →
Security Interest Jun 29, 2018
From: RPX CORPORATION
To: JEFFERIES FINANCE LLC
Reel/Frame 046486/0433 →
Patent Security Agreement Oct 23, 2020
From: RPX CLEARINGHOUSE LLC; RPX CORPORATION
To: BARINGS FINANCE LLC, AS COLLATERAL AGENT
Reel/Frame 054244/0566 →
Patent Security Agreement Oct 23, 2020
From: RPX CLEARINGHOUSE LLC; RPX CORPORATION
To: BARINGS FINANCE LLC, AS COLLATERAL AGENT
Reel/Frame 054198/0029 →
Release of Security Interest Oct 26, 2020
From: JEFFERIES FINANCE LLC
To: RPX CORPORATION
Reel/Frame 054486/0422 →
Release of Lien on Patents Aug 5, 2024
From: BARINGS FINANCE LLC
To: RPX CORPORATION
Reel/Frame 068328/0278 →
Patent Security Agreement Aug 6, 2024
From: RPX CORPORATION; RPX CLEARINGHOUSE LLC
To: BARINGS FINANCE LLC, AS COLLATERAL AGENT
Reel/Frame 068328/0674 →