Microelectronic assemblies
View Patent ↗Various embodiments of fanout packages are disclosed. A method of forming a microelectronic assembly is disclosed. The method can include bonding a first surface of at least one microelectronic substrate to a surface of a carrier using a direct bonding technique without an intervening adhesive, the microelectronic substrate having a plurality of conductive interconnections on at least one surface of the microelectronic substrate. The method can include applying a molding material to an area of the surface of the carrier surrounding the microelectronic substrate to form a reconstituted substrate. The method can include processing the microelectronic substrate. The method can include singulating the reconstituted substrate at the area of the surface of the carrier and at the molding material to form the microelectronic assembly.
1. A method of forming a microelectronic assembly, comprising:
direct bonding a first surface of a microelectronic substrate to a surface of a carrier, wherein the microelectronic substrate comprises a plurality of conductive interconnections;
applying a material over the carrier and the microelectronic substrate to form a reconstituted substrate, wherein the material surrounds the microelectronic substrate;
after forming the reconstituted substrate, processing the reconstituted substrate to form a processed reconstituted substrate, wherein processing the reconstituted substrate comprises thinning the reconstituted substrate;
removing the carrier from the processed reconstituted substrate; and
after removing the carrier, singulating the processed reconstituted substrate through the material to form the microelectronic assembly.
2. The method of claim 1 , wherein applying the material over the carrier and the microelectronic substrate comprises applying the material such that a portion of the material covers a second surface of the microelectronic substrate opposite the first surface.
3. The method of claim 2 , wherein thinning the reconstituted substrate comprises removing the portion of the material covering the second surface of the microelectronic substrate.
4. The method of claim 3 , wherein thinning the reconstituted substrate comprises thinning the microelectronic substrate to form a post-thinning surface of the microelectronic substrate.
5. The method of claim 1 , wherein processing the reconstituted substrate comprises forming a post-processing surface of the processed reconstituted substrate, the method further comprising forming a metallization layer over the post-processing surface.
6. The method of claim 1 , further comprising forming one or more cavities in the material and filling the one or more cavities with a conductive material to form one or more conductive vias.
7. The method of claim 1 , further comprising forming a metallization layer over the processed reconstituted substrate.
8. The method of claim 7 , wherein after removing the carrier from the processed reconstituted substrate, one or more of the plurality of conductive interconnections are revealed and wherein forming the metallization layer over the processed reconstituted substrate comprises forming the metallization layer on the revealed one or more of the plurality of conductive interconnections.
9. The method of claim 1 , wherein the microelectronic substrate comprises a second surface opposite the first surface and wherein the plurality of conductive interconnections are positioned closer to the first surface than the second surface.
10. The method of claim 9 , wherein removing the carrier from the processed reconstituted substrate comprises removing the carrier from the processed reconstituted substrate to form a third surface of the processed reconstituted substrate.
11. The method of claim 10 , wherein the third surface comprises the plurality of conductive interconnects and wherein forming the third surface comprises revealing the plurality of conductive interconnects.
12. The method of claim 10 , further comprising adding a routing layer to the third surface of the processed reconstituted substrate.
13. The method of claim 10 , wherein removing the carrier from the microelectronic substrate comprises thinning, etching, or grinding the carrier.
14. The method of claim 10 , wherein thinning the reconstituted substrate comprises thinning the microelectronic substrate and wherein the processed reconstituted substrate comprises a fourth surface.
15. The method of claim 14 , wherein, after removing the carrier, the processed reconstituted substrate comprises vias that extend from the third surface to the fourth surface.
16. The method of claim 1 , wherein the microelectronic substrate comprises a first microelectronic substrate, the method further comprising:
direct bonding a second microelectronic substrate to the surface of the carrier, wherein the first and second microelectronic substrate are separated from each other by a gap and wherein applying the material over the carrier comprises at least partially filling the gap with the material.
17. The method of claim 16 , wherein singulating the processed reconstituted substrate through the material comprises singulating the processed reconstituted substrate through the material formed in the gap.
18. The method of claim 1 , wherein direct bonding the first surface of the microelectronic substrate to the surface of the carrier comprises direct bonding the first surface of the microelectronic substrate to the surface of the carrier without an adhesive and at ambient conditions.
19. The method of claim 1 , wherein direct bonding the first surface of the microelectronic substrate to the surface of the carrier comprises direct bonding the microelectronic substrate face down onto the carrier.
20. The method of claim 1 , wherein direct bonding the first surface of the microelectronic substrate to the surface of the carrier comprises direct bonding the microelectronic substrate face up onto the carrier.