Direct hybrid bonding of substrates having microelectronic components with different profiles and/or pitches at the bonding interface
Representative implementations of techniques and methods include chemical mechanical polishing for hybrid bonding. The disclosed methods include depositing and patterning a dielectric layer on a substrate to form openings in the dielectric layer, depositing a barrier layer over the dielectric layer and within a first portion of the openings, and depositing a conductive structure over the barrier layer and within a second portion of the openings not occupied by the barrier layer, at least a portion of the conductive structure in the second portion of the openings coupled or contacting electrical circuitry within the substrate. Additionally, the conductive structure is polished to reveal portions of the barrier layer deposited over the dielectric layer and not in the second portion of the openings. Further, the barrier layer is polished with a selective polish to reveal a bonding surface on or at the dielectric layer.
1. A component comprising:
a first substrate comprising at least a first dielectric layer, a first plurality of first conductive structures at least partially embedded in the first dielectric layer, and a second plurality of second conductive structures at least partially embedded in the first dielectric layer, wherein at least one of the first conductive structures in the first plurality of first conductive structures has a first profile along a first bonding surface of the first substrate, wherein at least one of the second conductive structures in the second plurality of second conductive structures has a second profile along the first bonding surface, the second profile being different from the first profile, the first and second pluralities being on a same side of the first substrate; and
a second substrate directly hybrid bonded to the first substrate, the second substrate comprising at least a second dielectric layer directly bonded to the first dielectric layer, a third plurality of third conductive structures at least partially embedded in the second dielectric layer, and a fourth plurality of fourth conductive structures at least partially embedded in the second dielectric layer, the third and fourth pluralities being on a same side of the second substrate, at least one of the third conductive structures on the second substrate directly bonded to at least one of the first conductive structures on the first substrate and at least one of the fourth conductive structures on the second substrate directly bonded to at least one of the second conductive structures on the first substrate,
wherein the at least one of the third conductive structures comprises a first copper structure, wherein the at least one of the first conductive structures comprises a second copper structure, and wherein the first and second copper structures are in direct physical contact along a bonding interface,
wherein the at least one of the fourth conductive structures comprises a third copper structure, wherein the at least one of the second conductive structures comprises a fourth copper structure, and wherein the third and fourth copper structures are in direct physical contact along the bonding interface.
2. The component of claim 1 , wherein a pitch of the first plurality of first conductive structures is different from a pitch of the second plurality of second conductive structures.
3. The component of claim 1 , wherein the first and second profiles comprise different shapes.
4. The component of claim 1 , wherein each first conductive structure of the first plurality of first conductive structures has a width of at least 5 microns.
5. The component of claim 1 , wherein a pitch of the first plurality of first conductive structures is at least 1.2 times a width of at least one of the first conductive structures.
6. The component of claim 1 , wherein the first plurality of first conductive structures is separated from the second plurality of second conductive structures by a distance that is greater than either the pitch of the first plurality or the pitch of the second plurality.
7. The component of claim 1 , wherein the first and second pluralities of first and second conductive structures each have a uniform pitch.
8. The component of claim 1 , wherein the first profile comprises a first width and the second profile comprises a second width greater than the first width.
9. The component of claim 1 , wherein a first spacing between adjacent first conductive structures is less than a second spacing between adjacent second conductive structures.
10. The component of claim 1 , wherein a shape of the first plurality of first conductive structures is circular.
11. The component of claim 1 , wherein widths of the first conductive structures in the first plurality are uniform.
12. The component of claim 1 , wherein a pitch of the first conductive structures in the first plurality is uniform.
13. The component of claim 1 , wherein widths of the first conductive structures are uniform and widths of the second conductive structures are uniform.
14. The component of claim 1 , wherein the first substrate comprises an optical device.
15. The component of claim 1 , wherein the first plurality of first conductive structures has a first pitch and the second plurality of second conductive structures has a second pitch that is different than the first pitch and wherein the first profile comprises a first width and the second profile comprises a second width greater than the first width.
16. A component comprising:
a first substrate comprising at least a first dielectric layer, a first plurality of first conductive structures at least partially embedded in the first dielectric layer and having a first pitch, and a second plurality of second conductive structures at least partially embedded in the first dielectric layer and having a second pitch different from the first pitch, the first and second pluralities being on a same side of the first substrate, the first dielectric layer at a bonding interface comprising a deposited layer including nitrogen; and
a second substrate directly hybrid bonded to the first substrate, the second substrate comprising at least a second dielectric layer directly bonded to the first dielectric layer at the bonding interface, a third plurality of third conductive structures at least partially embedded in the second dielectric layer and a fourth plurality of fourth conductive structures at least partially embedded in the second dielectric layer, the third and fourth pluralities being on a same side of the second substrate, at least one of the third conductive structures on the second substrate directly bonded to at least one of the first conductive structures on the first substrate and at least one of the fourth conductive structures on the second substrate directly bonded to at least one of the second conductive structures on the first substrate.
17. The component of claim 16 , wherein at least one of the first conductive structures in the first plurality has a width that is different than a width of at least one of the second conductive structures in the second plurality.
18. The component of claim 16 , wherein a pitch of the first plurality of first conductive structures is at least 1.2 times a width of at least one of the first conductive structures.
19. The component of claim 16 , wherein the first substrate further comprises a first region with no conductive structures on the same side of the first substrate as the first and second pluralities along the bonding interface between the first and second substrates.
20. The component of claim 19 , wherein the first region is in a central region along the bonding interface between the first and second substrates, and wherein the central region comprises less than half of the area of the bonding interface.
21. The component of claim 16 , wherein the first plurality is separated from the second plurality by a distance that is greater than either the first pitch of the first plurality or the second pitch of the second plurality, and wherein a region separating the first plurality from the second plurality is free of conductive structures.
22. The component of claim 16 , wherein widths of the first conductive structures in the first plurality are uniform.
23. The component of claim 16 , wherein a pitch of the first conductive structures in the first plurality is uniform.
24. The component of claim 16 , wherein the first dielectric layer comprises silicon nitride.
25. The component of claim 16 , wherein the second dielectric layer comprises a deposited layer including nitrogen.
26. The component of claim 25 , wherein the second dielectric layer comprises silicon nitride.