IP Library › Granted Patent US 12,695,066
Granted Patent B2
US 12,695,066 · App. 17/632,066 · Granted Jul 28, 2026

Moveable edge rings with reduced capacitance variation for substrate processing systems

Inventors: Christopher Kimball (San Jose, CA); Hema Swaroop Mopidevi (Fremont, CA); Saravanapriyan Sriraman (Fremont, CA); Tom A. Kamp (San Jose, CA); Darrell Ehrlich (San Jose, CA); Anthony Contreras (Stockton, CA); Chiara Helena Catherina Giammanco Macpherson (Fremont, CA)
Assignee: Lam Research Corporation
H01J37/32642H10P72/7606H10P72/7611H10P72/7612H10P72/7616H01J2237/334
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Quick Facts
Patent No.
US 12,695,066
App. No.
17/632,066
Filed
Feb 1, 2022
Granted
Jul 28, 2026
Kind
B2
Art Unit
3723
USPC
269/289R
Abstract

An edge ring for a plasma processing system includes a first annular body configured to surround a substrate support during plasma processing, an upper surface, a lower surface, a radially inner surface, a radially outer surface, and N spacers arranged in N spaced locations on the radially outer surface of the edge ring to reduce variations in a predetermined gap between the first annular body of the edge ring and a structure separate from the edge ring as the edge ring is heated and cooled during plasma processing.

Claims (24)

1 . A lower edge ring for a plasma processing system, the lower edge ring comprising:

a first annular body configured to surround a substrate support during plasma processing;

an upper surface,

a lower surface;

a radially inner surface;

a radially outer surface, the upper surface and the radially outer surface configured to face an annular recess of a top edge ring; and

N spacers arranged in N spaced locations on the radially outer surface of the lower edge ring to reduce variations in a predetermined gap between the radially outer surface and the top edge ring, where N is an integer greater than or equal to 3 and less than or equal to 8,

wherein at least one of the N spacers includes a projection formed on the radially outer surface of the lower edge ring, and

wherein the projection includes a flat surface extending in a vertical direction along a vertical thickness of the radially outer surface.

2 . The lower edge ring of claim 1 , wherein the N spacers are arranged with a spacing of 360°/N.

3 . The lower edge ring of claim 1 , further comprising a coating covering the projection.

4 . The lower edge ring of claim 3 , wherein the coating includes an insulating material.

5 . The lower edge ring of claim 4 , wherein the coating is selected from a group consisting of polytetrafluoroethylene (PTFE), perfluoroalkoxy polymer (PFA), aluminum oxide deposited using atomic layer deposition, yttrium oxide deposited using atomic layer deposition, and yttrium fluoride deposited using atomic layer deposition.

6 . The lower edge ring of claim 1 , wherein N=5.

7 . An edge ring system comprising the lower edge ring of claim 1 , the edge ring system further comprising:

the top edge ring, wherein the top edge ring includes an annular body configured to surround the substrate support during plasma processing.

8 . The edge ring system of claim 7 , further comprising a lift pin to lift the top edge ring relative to the lower edge ring to adjust a height of the upper surface of the top edge ring relative to a substrate on the substrate support.

9 . The lower edge ring of claim 1 , wherein the projection extends in a vertical direction fully along the vertical thickness of the radially outer surface of the lower edge ring.

10 . The lower edge ring of claim 1 , wherein a width of the projection is less than a distance between adjacent ones of the N spacers.

11 . The lower edge ring of claim 1 , wherein the flat surface of the projection extends partially along the vertical thickness of the radially outer surface.

12 . The lower edge ring of claim 1 , wherein the flat surface of the projection extends fully along the vertical thickness from a top edge of the radially outer surface to a bottom edge of the radially outer surface.

13 . The lower edge ring of claim 1 , wherein the projection is integral with the first annular body.

14 . The lower edge ring of claim 1 , wherein the projection extends in a range from 50 micrometers to 250 micrometers from the radially outer surface.

15 . The lower edge ring of claim 1 , wherein portions of the radially outer surface between adjacent ones of the N spacers are defined by machined or removed areas of the lower edge ring.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 1, 2022
From: KIMBALL, CHRISTOPHER; MOPIDEVI, HEMA SWAROOP; SRIRAMAN, SARAVANAPRIYAN; KAMP, TOM A.; EHRLICH, DARRELL; CONTRERAS, ANTHONY; MACPHERSON, CHIARA HELENA CATHERINA GIAMMANCO
To: LAM RESEARCH CORPORATION
Reel/Frame 058848/0767 →
Continuity (3)
Provisional Application 62976088 · Feb 13, 2020
Provisional Application 62882890 · Aug 5, 2019
Related Publication 20220254612A1 · Aug 11, 2022
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