IP Library › Granted Patent US 12,745,679
Granted Patent B2
US 12,745,679 · App. 18/494,815 · Granted Sep 22, 2026

Package-on-package assembly containing a decoupling capacitor

Inventor: Laurent Desclos (San Diego, CA)
Assignee: KYOCERA AVX Components Corporation
H10W90/00H10B80/00H10D1/696H10W44/601H10W70/685H10W90/724H10W90/754
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Quick Facts
Patent No.
US 12,745,679
App. No.
18/494,815
Granted
Sep 22, 2026
Kind
B2
Abstract

A microelectronic assembly comprising a first package comprising a first semiconductor structure electrically connected to a first package substrate and a second package electrically connected and disposed adjacent to the first package and that comprises a second semiconductor structure electrically connected to a second package substrate is provided. The assembly also comprises a decoupling capacitor that contains alternating dielectric layers and internal electrode layers, the internal electrode layers containing first internal electrode layers and second internal electrode layers. The capacitor further contains external terminals that are disposed on a first surface of the capacitor and electrically connected to the second package substrate and external terminals disposed on the second surface of the capacitor that are electrically connected to a circuit board.

Claims (37)

1 . A microelectronic assembly comprising:

a first package comprising a first semiconductor structure that is electrically connected to a first package substrate;

a second package that is electrically connected and disposed adjacent to the first package, wherein the second package comprises a second semiconductor structure that is electrically connected to a second package substrate;

a decoupling capacitor having a first surface and an opposing second surface, wherein the decoupling capacitor contains alternating dielectric layers and internal electrode layers, the internal electrode layers containing first internal electrode layers and second internal electrode layers, wherein the decoupling capacitor further contains a first external terminal that is electrically connected to the first internal electrode layers and disposed on the first surface of the decoupling capacitor, a second external terminal that is electrically connected to the first internal electrode layers and disposed on the second surface of the decoupling capacitor, a third external terminal that is electrically connected to the second internal electrode layers and disposed on the first surface of the decoupling capacitor, and a fourth external terminal that is electrically connected to the second internal electrode layers and disposed on the second surface of the decoupling capacitor, wherein the first external terminal and the third external terminal are electrically connected to the second package substrate; and

a circuit board, wherein the second external terminal and the fourth external terminal of the decoupling capacitor are electrically connected to the circuit board.

2 . The microelectronic assembly of claim 1 , wherein the first semiconductor structure, the second semiconductor structure, or both include an integrated circuit device.

3 . The microelectronic assembly of claim 2 , wherein the integrated circuit device includes a memory device, logic device, processor device, or a combination thereof.

4 . The microelectronic assembly of claim 1 , wherein the first package contains multiple first semiconductor structures.

5 . The microelectronic assembly of claim 4 , wherein the second package contains multiple first semiconductor structures.

6 . The microelectronic assembly of claim 1 , wherein the first semiconductor structure is electrically connected to the first package substrate via one or more coupling components.

7 . The microelectronic assembly of claim 6 , wherein the first package substrate, the second package substrate, or both include an insulating material through which one or more conductive pathways are formed.

8 . The microelectronic assembly of claim 7 , wherein the insulating material includes an organic material, inorganic material, semiconductor material, or a combination thereof.

9 . The microelectronic assembly of claim 7 , wherein the first package substate, the second package substrate, or both include conductive pathways formed in the insulating material.

10 . The microelectronic assembly of claim 1 , wherein the first package and the second package are spaced apart by a standoff distance.

11 . The microelectronic assembly of claim 1 , wherein the first package and the second package are connected via one or more first level coupling components.

12 . The microelectronic assembly of claim 11 , wherein the second package contains an interposer positioned between the first package substrate and the second package substrate.

13 . The microelectronic assembly of claim 12 , wherein the interposer includes a semiconductor layer that includes an active layer and a bulk semiconductor layer, wherein the second semiconductor structure is contained within the active layer.

14 . The microelectronic assembly of claim 13 , wherein conductive pathways are formed in the interposer that electrically connect the first level coupling components to conductive pathways formed in the second package substrate.

15 . The microelectronic assembly of claim 1 , wherein the first and second external terminals have a positive polarity, and the third and fourth external terminals have a negative polarity.

16 . The microelectronic assembly of claim 1 , wherein at least one of the first, second, third, or fourth external terminals extend to an end surface of the capacitor.

17 . The microelectronic assembly of claim 1 , wherein the first, second, third, and fourth external terminals do not extend to an end surface of the decoupling capacitor.

18 . The microelectronic assembly of claim 1 , wherein the decoupling capacitor contains only the first external terminal and the third external terminal on the first surface, and only the second external terminal and the fourth external terminal on the second surface.

19 . The microelectronic assembly of claim 1 , wherein the decoupling capacitor contains at least four external terminals on the first surface and at least four external terminals on the second surface.

20 . The microelectronic assembly of claim 19 , wherein the external terminals are arranged in a linear fashion on the first surface and the second surface.

21 . The microelectronic assembly of claim 19 , wherein the external terminals are arranged in a multi-dimensional array on the first surface and the second surface.

22 . The microelectronic assembly of claim 1 , wherein the first and the second internal electrode layers are arranged vertically.

23 . The microelectronic assembly of claim 22 , wherein the first internal electrode layers contain lead tabs extending to the first surface for contact with the first external terminal and lead tabs extending to the second surface for contact with the third external terminal, and further wherein the second internal electrode layers contain lead tabs extending to the first surface for contact with the second external terminal and lead tabs extending to the second surface for contact with the fourth external terminal.

24 . The microelectronic assembly of claim 1 , wherein the first and the second internal electrode layers are arranged horizontally.

25 . The microelectronic assembly of claim 24 , wherein the first and the second internal electrode layers are connected to the first, second, third, and fourth external terminals through conductive vias.

26 . The microelectronic assembly of claim 1 , wherein the dielectric layers of the decoupling capacitor include a ceramic material.

27 . The microelectronic assembly of claim 26 , wherein the ceramic material is a barium titanate ceramic material.

28 . The microelectronic assembly of claim 1 , wherein the first, second, third, and fourth external terminals contain at least one plated layer.

29 . The microelectronic assembly of claim 28 , wherein the plated layer is formed by a process that includes electroless plating, electrolytic plating, or a combination thereof.

30 . The microelectronic assembly of claim 1 , wherein the circuit board is electrically connected to the second package substrate via coupling components.

31 . The microelectronic assembly of claim 30 , wherein the coupling components include solder.

32 . The microelectronic assembly of claim 1 , wherein the first and the third external terminals of the decoupling capacitor are electrically connected to the second package substrate via coupling components.

33 . The microelectronic assembly of claim 1 , wherein the second and the fourth external terminals of the decoupling capacitor are electrically connected to the circuit board via coupling components.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 13, 2023
From: DESCLOS, LAURENT
To: KYOCERA AVX COMPONENTS CORPORATION
Reel/Frame 065542/0445 →
Continuity (2)
Provisional Application 63420748 · Oct 31, 2022
Related Publication 20240145452A1 · May 2, 2024
References Cited (295)
US 4831494A · Arnold et al. · 1989 [cited by applicant]
US 5583738A · Kohno · 1996 [cited by applicant]
US 5880925A · DuPre et al. · 1999 [cited by applicant]
US 6034864A · Naito et al. · 2000 [cited by applicant]
US 6075285A · Taylor et al. · 2000 [cited by applicant]
US 6243253B1 · DuPre et al. · 2001 [cited by applicant]
US 6292351B1 · Ahiko et al. · 2001 [cited by applicant]
US 6407907B1 · Ahiko et al. · 2002 [cited by applicant]
US 6456561B2 · Maeda · 2002 [cited by applicant]
US 6459561B1 · Galvagni et al. · 2002 [cited by applicant]
US 6477032B2 · Makl, Jr. · 2002 [cited by applicant]
US 6496355B1 · Galvagni et al. · 2002 [cited by applicant]
US 6532143B2 · Figueroa et al. · 2003 [cited by applicant]
US 6594136B2 · Kuroda et al. · 2003 [cited by applicant]
US 6606237B1 · Naito et al. · 2003 [cited by applicant]
US 6664628B2 · Khandros et al. · 2003 [cited by applicant]
US 6752152B2 · Gale et al. · 2004 [cited by applicant]
US 6757152B2 · Galvagni et al. · 2004 [cited by applicant]
US 6795294B2 · Kuroda et al. · 2004 [cited by applicant]
US 6829134B2 · Yamauchi et al. · 2004 [cited by applicant]
US 6950300B2 · Sutardja · 2005 [cited by applicant]
US 6960366B2 · Ritter et al. · 2005 [cited by applicant]
US 6970362B1 · Chakravorty · 2005 [cited by applicant]
US 7068490B2 · Prymak · 2006 [cited by applicant]
US 7149072B2 · Lee et al. · 2006 [cited by applicant]
US 7170737B2 · MacNeal et al. · 2007 [cited by applicant]
US 7177137B2 · Ritter et al. · 2007 [cited by applicant]
US 7230816B2 · Sutardja · 2007 [cited by applicant]
US 7310217B2 · Takashima et al. · 2007 [cited by applicant]
US 7317622B2 · Li · 2008 [cited by applicant]
US 7414857B2 · Ritter et al. · 2008 [cited by applicant]
US 7417857B2 · Rondier et al. · 2008 [cited by applicant]
US 7463474B2 · Ritter et al. · 2008 [cited by applicant]
US 7545623B2 · Randall et al. · 2009 [cited by applicant]
US 7573698B2 · Eggerding et al. · 2009 [cited by applicant]
US 7576968B2 · Ritter et al. · 2009 [cited by applicant]
US 7633739B2 · Devoe · 2009 [cited by applicant]
US 7667950B2 · Togashi · 2010 [cited by applicant]
US 7697262B2 · Ritter et al. · 2010 [cited by applicant]
US 7701695B2 · Sutardja · 2010 [cited by applicant]
US 7715171B2 · Nakano et al. · 2010 [cited by applicant]
US 7724496B2 · Eggerding et al. · 2010 [cited by applicant]
US 7724498B2 · Mosley et al. · 2010 [cited by applicant]
US 7732296B2 · Park et al. · 2010 [cited by applicant]
US 7737563B2 · Su et al. · 2010 [cited by applicant]
US 7791192B1 · Joshi et al. · 2010 [cited by applicant]
US 7897433B2 · Su et al. · 2011 [cited by applicant]
US 7958627B2 · Randall et al. · 2011 [cited by applicant]
US 7961453B2 · Lee et al. · 2011 [cited by applicant]
US 8045319B2 · Ritter et al. · 2011 [cited by applicant]
US 8054607B2 · Lee et al. · 2011 [cited by applicant]
US 8084297B1 · Joshi et al. · 2011 [cited by applicant]
US 8111524B2 · Randall et al. · 2012 [cited by applicant]
US 8159813B2 · Lee et al. · 2012 [cited by applicant]
US 8193039B2 · Su et al. · 2012 [cited by applicant]
US 8203198B2 · Shioga et al. · 2012 [cited by applicant]
US 8238116B2 · Eggerding et al. · 2012 [cited by applicant]
US 8293636B2 · Schulze et al. · 2012 [cited by applicant]
US 8299633B2 · Su · 2012 [cited by applicant]
US 8338961B2 · Su et al. · 2012 [cited by applicant]
US 8394672B2 · Su et al. · 2013 [cited by applicant]
US 8446705B2 · Ritter et al. · 2013 [cited by applicant]
US 8451014B2 · Black et al. · 2013 [cited by applicant]
US 8472190B2 · Refai-Ahmed et al. · 2013 [cited by applicant]
US 8574965B2 · Refai-Ahmed et al. · 2013 [cited by applicant]
US 8624404B1 · Su et al. · 2014 [cited by applicant]
US 8647974B2 · Topacio et al. · 2014 [cited by applicant]
US 8691626B2 · Su et al. · 2014 [cited by applicant]
US 8704353B2 · Su et al. · 2014 [cited by applicant]
US 8717774B2 · Randall et al. · 2014 [cited by applicant]
US 8723314B2 · Su et al. · 2014 [cited by applicant]
US 8759962B2 · Su · 2014 [cited by applicant]
US 8796842B2 · Refai-Ahmed et al. · 2014 [cited by applicant]
US 8816474B2 · Hanke et al. · 2014 [cited by applicant]
US 8866276B2 · Su et al. · 2014 [cited by applicant]
US 9142468B2 · Bower et al. · 2015 [cited by applicant]
US 9177724B2 · Abe et al. · 2015 [cited by applicant]
US 9214283B2 · Togashi · 2015 [cited by applicant]
US 9385055B2 · Refai-Ahmed et al. · 2016 [cited by applicant]
US 9437561B2 · Black et al. · 2016 [cited by applicant]
US 9449907B2 · Fu et al. · 2016 [cited by applicant]
US 9524826B2 · Choi · 2016 [cited by applicant]
US 9613755B2 · Oh et al. · 2017 [cited by applicant]
US 9627281B2 · Prejean et al. · 2017 [cited by applicant]
US 9660008B2 · Bower et al. · 2017 [cited by applicant]
US 9793239B2 · Su et al. · 2017 [cited by applicant]
US 9806014B2 · Alfano et al. · 2017 [cited by applicant]
US 9960146B1 · Lin · 2018 [cited by applicant]
US 9997467B2 · Shao et al. · 2018 [cited by applicant]
US 10083795B2 · Itamura · 2018 [cited by applicant]
US 10163735B2 · Bower et al. · 2018 [cited by applicant]
US 10204737B2 · Ritter et al. · 2019 [cited by applicant]
US 10306770B2 · Hattori · 2019 [cited by applicant]
US 10418331B2 · Bower · 2019 [cited by applicant]
US 10424438B2 · Martinez et al. · 2019 [cited by applicant]
US 10490540B2 · Yu et al. · 2019 [cited by applicant]
US 10522352B2 · Delacruz et al. · 2019 [cited by applicant]
US 10593618B2 · Cheah et al. · 2020 [cited by applicant]
US 10621387B2 · Chhabra et al. · 2020 [cited by applicant]
US 10672563B2 · Cain · 2020 [cited by applicant]
US 10707145B2 · Bultitude et al. · 2020 [cited by applicant]
US 10832912B2 · Delacruz et al. · 2020 [cited by applicant]
US 10939563B2 · Silvano De Sousa · 2021 [cited by applicant]
US 10943735B2 · Horn et al. · 2021 [cited by applicant]
US 10943869B2 · Zhai et al. · 2021 [cited by applicant]
US 11121074B2 · Cheah et al. · 2021 [cited by applicant]
US 11257785B2 · Zhang et al. · 2022 [cited by applicant]
US 11296043B2 · Kung et al. · 2022 [cited by applicant]
US 11362026B2 · Kuo et al. · 2022 [cited by applicant]
US 11373809B2 · Berolini et al. · 2022 [cited by applicant]
US 11393775B2 · Hsieh et al. · 2022 [cited by applicant]
US 11636978B2 · Cain · 2023 [cited by applicant]
US 11721488B2 · Horn et al. · 2023 [cited by applicant]
US 11735533B2 · Mallik et al. · 2023 [cited by applicant]
US 11823906B2 · DeLaCruz et al. · 2023 [cited by applicant]
US 11837405B2 · Berolini et al. · 2023 [cited by applicant]
US 11848160B2 · Kobayashi et al. · 2023 [cited by applicant]
US 12074118B2 · Huang et al. · 2024 [cited by applicant]
US 12170241B2 · Kuo et al. · 2024 [cited by applicant]
US 12506116B2 · Lin et al. · 2025 [cited by applicant]
US 20020024801A1 · Hung et al. · 2002 [cited by applicant]
US 20040042156A1 · Devoe et al. · 2004 [cited by applicant]
US 20040124511A1 · Li · 2004 [cited by applicant]
US 20040125539A1 · Murakami et al. · 2004 [cited by applicant]
US 20040125580A1 · Chung et al. · 2004 [cited by applicant]
US 20040136141A1 · Korony et al. · 2004 [cited by applicant]
US 20040184219A1 · Otsuk et al. · 2004 [cited by applicant]
US 20040223289A1 · Kuroda et al. · 2004 [cited by applicant]
US 20040257748A1 · Ritter et al. · 2004 [cited by applicant]
US 20050046536A1 · Ritter et al. · 2005 [cited by applicant]
US 20060049131A1 · Satou · 2006 [cited by applicant]
US 20070019364A1 · Roy · 2007 [cited by applicant]
US 20070025053A1 · Akihiro · 2007 [cited by applicant]
US 20070035014A1 · Fung · 2007 [cited by applicant]
US 20070096254A1 · Ritter et al. · 2007 [cited by applicant]
US 20070103846A1 · Eggerding et al. · 2007 [cited by applicant]
US 20070121275A1 · Takashima et al. · 2007 [cited by applicant]
US 20070133147A1 · Ritter et al. · 2007 [cited by applicant]
US 20070165361A1 · Randall et al. · 2007 [cited by applicant]
US 20070188975A1 · Togashi et al. · 2007 [cited by applicant]
US 20080049377A1 · Sutardja · 2008 [cited by applicant]
US 20080123247A1 · Randall et al. · 2008 [cited by applicant]
US 20080174934A1 · Togashi · 2008 [cited by applicant]
US 20080180879A1 · Lee et al. · 2008 [cited by applicant]
US 20080186650A1 · Beker · 2008 [cited by examiner]
US 20090002921A1 · Ritter et al. · 2009 [cited by applicant]
US 20090201624A1 · Hattori et al. · 2009 [cited by applicant]
US 20090244807A1 · Lee et al. · 2009 [cited by applicant]
US 20090284897A1 · Itamura · 2009 [cited by applicant]
US 20090291317A1 · Kawasaki et al. · 2009 [cited by applicant]
US 20100039749A1 · Ritter et al. · 2010 [cited by applicant]
US 20100188799A1 · Galvagni et al. · 2010 [cited by applicant]
US 20100232126A1 · Maeda · 2010 [cited by examiner]
US 20100254070A1 · Lee et al. · 2010 [cited by applicant]
US 20110080683A1 · Jones et al. · 2011 [cited by applicant]
US 20110250791A1 · Straka et al. · 2011 [cited by applicant]
US 20130002388A1 · Kim et al. · 2013 [cited by applicant]
US 20130094157A1 · Giuliano · 2013 [cited by applicant]
US 20130201615A1 · Arnold et al. · 2013 [cited by applicant]
US 20130256913A1 · Black et al. · 2013 [cited by applicant]
US 20130321984A1 · Masuda et al. · 2013 [cited by applicant]
US 20140185264A1 · Chen et al. · 2014 [cited by applicant]
US 20140252544A1 · Li et al. · 2014 [cited by applicant]
US 20140293501A1 · Jeong · 2014 [cited by applicant]
US 20150014037A1 · Ahn et al. · 2015 [cited by applicant]
US 20150016016A1 · Lee et al. · 2015 [cited by applicant]
US 20150069623A1 · Tsai et al. · 2015 [cited by applicant]
US 20150229446A1 · Feng · 2015 [cited by applicant]
US 20150243438A1 · Ahn et al. · 2015 [cited by applicant]
US 20150243440A1 · Gong et al. · 2015 [cited by applicant]
US 20150294791A1 · Hwang et al. · 2015 [cited by applicant]
US 20150348711A1 · Kim et al. · 2015 [cited by applicant]
US 20160020025A1 · Yao · 2016 [cited by applicant]
US 20160027582A1 · Ahn et al. · 2016 [cited by applicant]
US 20160126013A1 · Park et al. · 2016 [cited by applicant]
US 20160142033A1 · Chong et al. · 2016 [cited by applicant]
US 20160150651A1 · Tsai et al. · 2016 [cited by applicant]
US 20160189864A1 · Ritter et al. · 2016 [cited by applicant]
US 20160240317A1 · Ro · 2016 [cited by applicant]
US 20160351335A1 · Takahashi · 2016 [cited by applicant]
US 20160351504A1 · Teshima et al. · 2016 [cited by applicant]
US 20160365335A1 · Black et al. · 2016 [cited by applicant]
US 20160381802A1 · Taniguchi et al. · 2016 [cited by applicant]
US 20170012029A1 · Lambert et al. · 2017 [cited by applicant]
US 20170047168A1 · Lee et al. · 2017 [cited by applicant]
US 20170048976A1 · Prevatte et al. · 2017 [cited by applicant]
US 20170103946A1 · Chang et al. · 2017 [cited by applicant]
US 20170263383A1 · Kageyama et al. · 2017 [cited by applicant]
US 20170309403A1 · Park et al. · 2017 [cited by applicant]
US 20180012702A1 · Azuma et al. · 2018 [cited by applicant]
US 20180090273A1 · Hwang et al. · 2018 [cited by applicant]
US 20180122580A1 · Park et al. · 2018 [cited by applicant]
US 20180130603A1 · Chong et al. · 2018 [cited by applicant]
US 20180158772A1 · Tanaka · 2018 [cited by applicant]
US 20180190580A1 · Haba et al. · 2018 [cited by applicant]
US 20180330880A1 · Cain · 2018 [cited by applicant]
US 20180330881A1 · Cain · 2018 [cited by applicant]
US 20180350753A1 · Lee et al. · 2018 [cited by applicant]
US 20180358292A1 · Kong et al. · 2018 [cited by applicant]
US 20190006104A1 · Cain · 2019 [cited by examiner]
US 20190080982A1 · Bultitude et al. · 2019 [cited by applicant]
US 20190312005A1 · Pon et al. · 2019 [cited by applicant]
US 20200075571A1 · Chen et al. · 2020 [cited by applicant]
US 20200082979A1 · Kim · 2020 [cited by examiner]
US 20200303127A1 · Cain · 2020 [cited by applicant]
US 20200350303A1 · Sounart et al. · 2020 [cited by applicant]
US 20210005547A1 · Cheah et al. · 2021 [cited by applicant]
US 20210066264A1 · Huang et al. · 2021 [cited by applicant]
US 20210159200A1 · Lee · 2021 [cited by applicant]
US 20210166993A1 · Yen et al. · 2021 [cited by applicant]
US 20210183755A1 · Ong et al. · 2021 [cited by applicant]
US 20210202393A1 · Lu et al. · 2021 [cited by applicant]
US 20210202395A1 · Lu · 2021 [cited by applicant]
US 20210202409A1 · Kung et al. · 2021 [cited by applicant]
US 20210210433A1 · Liu · 2021 [cited by applicant]
US 20210265115A1 · Geum et al. · 2021 [cited by applicant]
US 20210265280A1 · Shih et al. · 2021 [cited by applicant]
US 20210305192A1 · Chu et al. · 2021 [cited by applicant]
US 20210358859A1 · Chen et al. · 2021 [cited by applicant]
US 20210366884A1 · Jung et al. · 2021 [cited by applicant]
US 20210391271A1 · Hsu et al. · 2021 [cited by applicant]
US 20220013452A1 · Kim et al. · 2022 [cited by applicant]
US 20220020605A1 · Essig et al. · 2022 [cited by applicant]
US 20220020654A1 · Cho et al. · 2022 [cited by applicant]
US 20220028801A1 · Tien et al. · 2022 [cited by applicant]
US 20220028836A1 · Wu et al. · 2022 [cited by applicant]
US 20220037244A1 · Tai et al. · 2022 [cited by applicant]
US 20220037290A1 · Yen et al. · 2022 [cited by applicant]
US 20220052004A1 · Lin · 2022 [cited by applicant]
US 20220052013A1 · Yen et al. · 2022 [cited by applicant]
US 20220052024A1 · Lu · 2022 [cited by applicant]
US 20220059476A1 · Collins et al. · 2022 [cited by applicant]
US 20220068840A1 · Cheng et al. · 2022 [cited by applicant]
US 20220084958A1 · Yang et al. · 2022 [cited by applicant]
US 20220102453A1 · Chen et al. · 2022 [cited by applicant]
US 20220115288A1 · Yen et al. · 2022 [cited by applicant]
US 20220130776A1 · Lu · 2022 [cited by applicant]
US 20220157709A1 · Shih et al. · 2022 [cited by applicant]
US 20220157782A1 · Zhai · 2022 [cited by applicant]
US 20220181267A1 · Kung et al. · 2022 [cited by applicant]
US 20220181268A1 · Kung et al. · 2022 [cited by applicant]
US 20220199538A1 · Lu · 2022 [cited by applicant]
US 20220199552A1 · Huang et al. · 2022 [cited by applicant]
US 20220199559A1 · Fang · 2022 [cited by applicant]
US 20220208623A1 · Lin et al. · 2022 [cited by applicant]
US 20220230946A1 · Shih et al. · 2022 [cited by applicant]
US 20220230950A1 · Chou · 2022 [cited by applicant]
US 20220238457A1 · Hsieh et al. · 2022 [cited by applicant]
US 20220246533A1 · Cho et al. · 2022 [cited by applicant]
US 20220254699A1 · Pi · 2022 [cited by applicant]
US 20220262697A1 · Fang · 2022 [cited by applicant]
US 20220271019A1 · Lin et al. · 2022 [cited by applicant]
US 20230019800A1 · Cain · 2023 [cited by applicant]
US 20230144129A1 · Yang et al. · 2023 [cited by applicant]
US 20230307389A1 · Kuo · 2023 [cited by applicant]
US 20240128247A1 · Marin et al. · 2024 [cited by applicant]
US 20240145169A1 · Berolini · 2024 [cited by applicant]
US 20240145172A1 · Berolini · 2024 [cited by applicant]
US 20240145176A1 · Berolini · 2024 [cited by applicant]
US 20240145449A1 · Desclos · 2024 [cited by applicant]
US 20240145451A1 · Desclos · 2024 [cited by applicant]
US 20240145528A1 · Desclos · 2024 [cited by applicant]
US 20240145529A1 · Desclos · 2024 [cited by applicant]
US 20240265305A1 · DeLaCruz et al. · 2024 [cited by applicant]
US 20240363505A1 · Kuo et al. · 2024 [cited by applicant]
US 20240429157A1 · Desclos · 2024 [cited by applicant]
US 20240429182A1 · Desclos · 2024 [cited by applicant]
EP 2689455B1 · 2016 [cited by applicant]
EP 2614521B1 · 2018 [cited by applicant]
JP 2004304159A · 2004 [cited by applicant]
JP 2005039005A · 2005 [cited by applicant]
JP 2005150283 · 2005 [cited by applicant]
JP 2008022017 · 2008 [cited by applicant]
JP 2008085054A · 2008 [cited by applicant]
JP 2009081183 · 2009 [cited by applicant]
JP 2010183025 · 2010 [cited by applicant]
JP 2010199269 · 2010 [cited by applicant]
JP 2018520507A · 2018 [cited by applicant]
KR 20050089493A · 2005 [cited by applicant]
KR 20070081537A · 2007 [cited by applicant]
KR 101539884B1 · 2015 [cited by applicant]
KR 102387826B1 · 2022 [cited by applicant]
KR 102393946B1 · 2022 [cited by applicant]
WO WO2024097034 · 2024 [cited by applicant]
WO WO2024097035 · 2024 [cited by applicant]
WO WO2024097036 · 2024 [cited by applicant]
WO WO2024097037 · 2024 [cited by applicant]
WO WO2024097038 · 2024 [cited by applicant]
AVX, LGA Low Inductance Capacitors 0204/0306 Land Grid Array, p. 85-86. [cited by applicant]
AVX, Low Inductance Capacitors, p. 1-12, http://www.avxcorp.com. [cited by applicant]
Brown, Land Grid Array (LGA) Low Inductance Capacitor Advantages in Military and Aerospace Applications, 5 pages. [cited by applicant]
Cantlebary, AVX Corporation, Technical Information, LICA (Low Inductance Capacitor Array Flip-Chip Application Notes, 14 pages. [cited by applicant]
Kyocera AVX, Low Inductance Capacitors, Surface Mount Ceramic Capacitor Products, p. 75-78. [cited by applicant]
Lau, “Chiplet Heterogeneous Integration” Semiconductor Advanced Packaging, 2021, pp. 413-439 Feb. 15, 2024, 8 pages. [cited by applicant]
International Search Report and Written Opinion for PCT/US2023/035673 Mailed on Feb. 15, 2024, 8 pages. [cited by applicant]