IP Library › Assignment 014484/0588
Patent Assignment
Reel/Frame 014484/0588

Certificate of Ownership and Merger, Conversion, Merger, and Confirmatory Assignment

Recorded: 2004-04-08 Pages: 27
Assignors
SVG LITHOGRAPHY SYSTEMS, INC.
Executed: 2001-12-31
ASML US, INC.
Executed: 2002-10-04
ASML US, INC.
Executed: 2003-10-09
Assignees
ASML US, INC.
8555 SOUTH RIVER PARKWAY, TEMPE, ARIZONA, 85284
ASML US, LLC
1209 ORANGE STREET, WILMINGTON, DELAWARE, 19801
ASML US, INC.
8555 SOUTH RIVER PARKWAY, TEMPE, ARIZONA, 85284
ASML HOLDING N.V.
DE RUN 6501, VELDHOVEN, NL-5504 DR, NETHERLANDS
Covered Properties (26)
Wafer Flip Apparatus
Patent: 4,778,332 →
Application: 07/012,537 →
Wafer Stage with Reference Surface
Patent: 5,285,142 →
Application: 08/015,520 →
Brushless Polyphase Reduced Force Variation Motor
Patent: 5,352,962 →
Application: 08/048,860 →
Illumination System and Method Employing a Deformable Mirror and Diffractive Optical Elements
Patent: 5,684,566 →
Application: 08/449,005 →
Hybrid Illumination System for Use in Photolithography
Patent: 5,631,721 →
Application: 08/449,301 →
Reticle Container with Corner Holding
Application: 08/545,331 →
High Numerical Aperture Ring Field Optical Reduction System
Patent: 5,815,310 →
Application: 08/571,081 →
Reticle Container with Corner Holding
Patent: 5,727,685 →
Application: 08/686,085 →
On-Axix Mask and Wafer Alignment System
Patent: 5,966,216 →
Application: 08/793,069 →
Illumination System with Spatially Controllable Partial Coherence
Patent: 6,259,513 →
Application: 08/799,107 →
Adjustable Slit
Patent: 5,966,202 →
Application: 08/829,099 →
Reduction of Pattern Noise in Scanning Lithographic System Illuminators
Patent: 5,896,188 →
Application: 08/835,653 →
Multiple Detector Alignment System for Photolithography
Patent: 5,767,523 →
Application: 08/838,549 →
Method for Adjusting an Illumination Field Based on Selected Reticle Feature
Patent: 5,895,737 →
Application: 09/023,407 →
Dose Correction for Along Scan Linewidth Variation
Patent: 6,292,255 →
Application: 09/232,756 →
Method Controlling Illumination Field to Reduce Line Width Variation
Patent: 6,013,401 →
Application: 09/232,758 →
Method and Apparatus for Characterization of Optical Systems
Patent: 7,016,025 →
Application: 09/339,506 →
Dynamically Adjustable High Resolution Adjustable Slit
Patent: 6,097,474 →
Application: 09/391,928 →
Non Absorbing Reticle and Method of Making Same
Patent: 6,444,372 →
Application: 09/426,250 →
Self Referencing Mark Independent Alignment Sensor
Patent: 6,628,406 →
Application: 09/553,270 →
Illumination System with Spatially Controllable Partial Coherence Compensating for Line Width Variances in a Photolithographic System
Patent: 6,628,370 →
Application: 09/599,383 →
Non Absorbing Reticle and Method of Making Same
Patent: 6,686,101 →
Application: 10/198,332 →
Publication: US 2002/0182519
Illumination System with Spatially Controllable Partial Coherence Compensation for Line Width Variances in a Photolithographic System
Patent: 6,822,728 →
Application: 10/667,387 →
Publication: US 2004/0057033
Self Referencing Mark Independent Alignment Sensor
Patent: 6,809,827 →
Application: 10/670,028 →
Publication: US 2004/0066518
Non Absorbing Reticle and Method of Making Same
Patent: 7,014,963 →
Application: 10/735,658 →
Publication: US 2004/0131954
Illumination System with Spatially Controllable Partial Coherence
Application: 60/031,725 →
Related Assignments (24)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest. Feb 9, 1987
From: BYERS, WILLIAM; KOCHERSPERGER, PETER
To: PERKIN-ELMER CORPORATION, THE, A CORP. OF NEW YORK
Reel/Frame 004669/0159 →
Assignment of Assignors Interest. Aug 9, 1990
From: PERKIN-ELMER CORPORATION, THE,
To: SVG LITHOGRAPHY, INC., A CORP OF DE
Reel/Frame 005424/0111 →
Assignment of Assignors Interest. Feb 9, 1993
From: GALBURT, DANIEL N.; O'CONNER, GEOFFREY
To: SVGT LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 006432/0623 →
Assignment of Assignor's Interest Apr 19, 1993
From: GALBURT, DANIEL N.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 006541/0419 →
Assignment of Assignor's Interest May 24, 1995
From: STANTON, STUART T.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 007494/0688 →
Assignment of Assignor's Interest Aug 18, 1995
From: STANTON, STUART; GALLATIN, GREG; OSKOTSKY, MARK L.; ZERNIKE, FRITS
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 007595/0744 →
Assignment of Assignor's Interest Dec 12, 1995
From: WILLIAMSON, DAVID M.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 007860/0278 →
Assignment of Assignor's Interest Jan 22, 1996
From: EASOM ENGINEERING & MANUFACTURING COPRORATION
To: EASOM ENGINEERING & MANUFACTURING COMPANY
Reel/Frame 007779/0680 →
Assignment of Assignor's Interest Jul 24, 1996
From: LAGANZA, JOSEPH; YAP, HOON-YENG; CRUZ, TEODORICO A.; MAGNUSSEN, ERIK
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 008115/0899 →
Assignment of Assignor's Interest Feb 11, 1997
From: GALLATIN, GREGG; MCCULLOUGH, ANDREW W.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 008501/0572 →
Assignment of Assignor's Interest Feb 14, 1997
From: GALBURT, DANIEL N.; WILLIAMSON, DAVID M.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 008678/0201 →
Assignment of Assignor's Interest Mar 31, 1997
From: MCCULLOUGH, ANDREW W.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 008487/0287 →
Assignment of Assignor's Interest Apr 10, 1997
From: MCCULLOUGH, ANDREW W.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 008499/0050 →
Assignment of Assignor's Interest Feb 12, 1998
From: MCCULLOUGH, ANDREW W.; GOVIL, PRADEEP K.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 009035/0657 →
Assignment of Assignor's Interest Jan 16, 1999
From: MCCULLOUGH, ANDREW W.
To: SVG LITHOGRAPH SYSTEMS, INC.
Reel/Frame 009715/0933 →
Assignment of Assignor's Interest Feb 22, 1999
From: MCCULLOUGH, ANDREW W.; GOVIL, PRADEEP K.; GALBURT, DANIEL N.; CALLAN, DAVID
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 009776/0719 →
Assignment of Assignor's Interest Jun 24, 1999
From: HANSEN, MATTHEW E.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 010071/0630 →
Assignment of Assignor's Interest Oct 25, 1999
From: MCCLULLUGH, ANDREW W.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 010355/0955 →
Assignment of Assignor's Interest Apr 20, 2000
From: KREUZER, JUSTIN L.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 010743/0553 →
Assignment of Assignor's Interest Jun 22, 2000
From: GALLATIN, GREGG M.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 010895/0780 →
Assignment of Assignor's Interest Sep 12, 2000
From: MCCULLOUGH, ANDREW W.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 011095/0202 →
Assignment of Assignor's Interest Jul 17, 2002
From: MCCULLUGH, ANDREW W.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 013121/0177 →
Confirmatory License Jun 24, 2003
From: ASML
To: NAVY, SECRETARY OF THE, UNITED STATES OF AMERICA
Reel/Frame 014197/0833 →
Confirmatory Assignment; Merger; Change of Name; Merger Apr 7, 2004
From: ASML US, INC.; SVG LITHOGRAPHY SYSTEMS, INC.; ASML US, INC.; ASML US, LLC
To: ASML HOLDING N.V.; ASML US, INC.; ASML US, LLC; ASML US, INC.
Reel/Frame 014475/0979 →