Patent Assignment
Reel/Frame 015972/0092
Assignment of Assignor's Interest
Recorded: 2005-05-04
Pages: 9
Assignor
CLARIANT FINANCE (BVI) LIMITED
Executed: 2005-01-27
Assignee
AZ ELECTRONIC MATERIALS USA CORP.
70 MEISTER AVENUE, SOMERVILLE, NEW JERSEY, 08876
Covered Properties
(142)
Positive Photoresist Compositions with O-Quinone Diazide, Novolak, and Ptlopylene Glycol Alkyl Ether Acetate
Patent:
4,550,069 →
Application:
06/619,468 →
Positive Photoresist Processing with Mid U-V Range Exposure
Patent:
4,596,763 →
Application:
06/655,824 →
Copolymers from Maleimide and Aliphatic Vinyl Ethers and Esters Used in Positive Photoresist
Patent:
4,720,445 →
Application:
06/829,874 →
Novel Mixed Ester O-Quinone Photosensitizers
Patent:
4,732,837 →
Application:
06/858,631 →
High Temperature Post Exposure Baking Treatment for Positive Photoresist Compositions
Patent:
4,885,232 →
Application:
06/921,879 →
Positive Photoresist Thermally Stable Compositions and Elements Having Deep Uv Response with Maleimide Copolymer
Patent:
4,857,435 →
Application:
07/024,875 →
Method of Developing a High Contrast,Positive Photoresist Using a Developer Containing Alkanolamine
Patent:
4,808,513 →
Application:
07/035,413 →
Blocked Monomer and Polymers Therefrom for Use as Photoresists
Patent:
4,810,613 →
Application:
07/052,950 →
Composition Containing a Mixture of Hexa-Alkyl Disilazane and Propylene Glycol Alkyl Ether and/or Propylene Glycol Alkyl Ether Acetate
Patent:
4,806,458 →
Application:
07/064,969 →
Hydroxy Polyimides and High Temperature Positive Photoresists Therefrom
Patent:
4,927,736 →
Application:
07/076,098 →
Heat Resistant Polyamides and Polybenzoxazoles from Bis-((Amino- Hydroxyphenyl)Hexafluoroisopropyl)Diphenyl Ethers
Patent:
4,845,183 →
Application:
07/124,634 →
Photosensitive Polyimide Polymer Compositions
Patent:
4,803,147 →
Application:
07/124,742 →
1,3 Disubstituted-5-Diazobarbituric Acids
Patent:
4,902,784 →
Application:
07/140,447 →
Positive-Working Photoresist Compositions
Patent:
5,104,770 →
Application:
07/167,068 →
Mixed Ester O-Quinone Diazide Photosensitizers Process of Preparation
Patent:
4,892,801 →
Application:
07/170,534 →
Protective Coatings of a Cured Hydroxystyrene Mannich Base and Blocked Polyisocyanates
Patent:
4,872,960 →
Application:
07/219,695 →
Poly(Epoxide) Coatings Containing a Mannich Base of a Hydroxystyrene Containing Polymer
Patent:
4,877,502 →
Application:
07/219,697 →
Process for the Production of 3-Mono or 3,5, Disubstituted-4- Acetoxystyrene Its Polymerization, and Hydrolysis
Patent:
4,868,256 →
Application:
07/226,258 →
High Contrast High Thermal Stability Positive Photoresists with Mixed Cresol and Hydroxybenzaldehyde Prepared Novolak and Photosensitive Diazoquinone
Patent:
4,920,028 →
Application:
07/227,404 →
Image Reversal Negative Working O-Naphthoquinone Diazide and Cross- Linking Compound Containing Photoresist Process with Thermal Curing
Patent:
4,929,536 →
Application:
07/268,639 →
Image Reversal Negative Working O-Quinone Diazide and Cross-Linking Compound Containing Photoresist Process with Thermal Curing Treatment
Patent:
4,931,381 →
Application:
07/268,640 →
Blocked Monomer and Polymers Therefrom for Use as Photoresists
Patent:
4,962,171 →
Application:
07/289,592 →
Process for the Production of 3-Mono or 3,5 Disubstituted-4- Acetoxystyrene, Its Polymerization
Patent:
4,868,257 →
Application:
07/312,170 →
Polyamide-Polyimide and Polybenzoxazole-Polyimide Polymer
Patent:
4,980,447 →
Application:
07/321,021 →
Photoresist Treating Composition Consisting of a Mixture of Propylene Glycol Alkyl Ether and Propylene Gylcol Alkyl Ether Acetate
Patent:
4,983,490 →
Application:
07/352,618 →
Hydroxlated Aromatic Polyamide Polymer Containing Bound Naphthoquinone Diazide Photosensitizer,Method of Making and Use
Patent:
5,037,720 →
Application:
07/363,245 →
Photochemical Image Process of Positive Photoresist Element with Maleimide Copolymer
Patent:
5,059,513 →
Application:
07/366,088 →
Deep U.V. Photoresist Compositions Containing Polycyclic Cyclopentane -2- Diazo-1,3-Dione
Patent:
5,039,596 →
Application:
07/373,358 →
Positive O-Quinone Diazide Photoresist with a Solvent Mixture of Propylene Glycol Alkyl Ether and Propylene Glycol Alkyl Ether Acetate
Patent:
4,948,697 →
Application:
07/376,147 →
Polyamide Containing the Hexafluoroisopropylidene Group with O-Quinone Diazide in Positive Working Photoresist
Patent:
5,021,320 →
Application:
07/376,684 →
High Sensitivity Mid and Deep Uv Resist
Patent:
4,943,511 →
Application:
07/376,971 →
Base Developable Negative Acting Photoresists
Patent:
5,106,720 →
Application:
07/405,493 →
Method of Forming a Thermally Stable Mixed Aldehyde Novolak Resin Containing Resist Pattern and That Pattern on a Substrate
Patent:
4,997,734 →
Application:
07/454,409 →
Novolak Resins of Lowered Hydroxyl Content and High Contrast High Thermal Stability Positive Photoresists Prepared Therefrom
Patent:
5,182,184 →
Application:
07/475,402 →
Photoresist Compositions Containing Polyamides from Bis(Aminohydroxyy- Phenyl) Hexafluoroisopropyl) Diphenyl Ethers
Patent:
5,011,753 →
Application:
07/476,332 →
Method of Forming Resist Pattern and Thermally Stable and Highly Resolved Resist Pattern
Patent:
4,996,122 →
Application:
07/496,240 →
Method for Producing and Using a Positive Photoresist with O-Quinone Diazide, Novolak, and Propylene Glycol Alkyl Ether Acetate
Patent:
5,066,561 →
Application:
07/501,970 →
Biz-Diazotized Diaryl Diamine Coupled Dyes Having Improved Solubility in Organic Solvent
Patent:
5,068,319 →
Application:
07/502,075 →
Polyamide Containing the Hexafluoroisopropylidene Group
Patent:
5,077,378 →
Application:
07/526,583 →
Image Reversal Negative Working O-Quinone Diazide and Cross-Linking Compound Containing Photoresist Process with Thermal Curing Treat- Ment and Element Produced Therefrom
Patent:
5,217,840 →
Application:
07/530,545 →
Positive Photoresist Containing a Mixture of Propylene Glycol Alkyl Ethers and Propylene Glycol Alkyl Ether Acetate
Patent:
5,039,594 →
Application:
07/533,966 →
Blocked Monomer and Polymers Therefrom for Use as Photoresists
Patent:
5,081,001 →
Application:
07/543,321 →
Process for the Preparation of Novolak Resins with Low Metal Ion Content
Patent:
5,073,622 →
Application:
07/550,692 →
Polyamide-Polyimide and Polybenzoxazole-Polyimide Polymer
Patent:
5,071,948 →
Application:
07/558,739 →
Positive-Working Photoresist Composition Containing Purified Broadband Dye and Process of Using
Patent:
5,108,870 →
Application:
07/561,798 →
Method of Developing a High Contrast, Positive Photoresist Using a Developer Containing a Alkanolamine
Patent:
5,094,934 →
Application:
07/564,665 →
High Contrast, Positive Photoresist Developer Containing Alkanolamine
Patent:
5,126,230 →
Application:
07/587,320 →
Mixed Aldehyde Novolak Resins Useful as High Contrast Thermal Stability Positive Photoresists
Patent:
5,130,409 →
Application:
07/614,636 →
Process of Making Naphthoquinone Diazide Esters Using Lactone Solvents
Patent:
5,300,396 →
Application:
07/619,154 →
Photosensitizer Compositions Containing Diazo Fluorinated Esters of Hexafluoro-Bis-Phenols or Bis-Hexafluoroethers
Patent:
5,260,162 →
Application:
07/628,549 →
Bis-N,N' Nitro or Amino Benzoyl Amino Phenols
Patent:
5,130,481 →
Application:
07/645,332 →
Polyamide Containing the Hexafluoroisopropylidene Group and Process of Using to Form a Positive Image
Patent:
5,240,819 →
Application:
07/667,761 →
Preparation and Use of Poly(3,5-Disubstituted 4-Hydroxystyrene/ N-Substituted Maleimide
Patent:
5,462,840 →
Application:
07/673,243 →
Deep U.V. Photoresist Compositions Containing 4-Tert-Butylstyrene/ Maleimide Copolymer and Cyclopentane -2-Diazo-1,3-Dione and Elements Utilizing the Compositions
Patent:
5,182,185 →
Application:
07/693,513 →
Positive Photoresist Compositions with O-Quinone Diazide, Novolak and Propylene Glycol Alkyl Ether Acetate
Patent:
5,143,814 →
Application:
07/772,976 →
Blocked Monomer and Polymers Therefrom for Use as Photoresists
Patent:
5,200,529 →
Application:
07/782,699 →
Image Reversal Negative Working O-Naphthoquinone Diazide and Cross- Linking Compound Containing Photoresist Process with Thermal Curing
Patent:
5,256,522 →
Application:
07/815,645 →
Diazo Ester of a Benzolactone Ring Compound and Positive Photoresist Composition and Element Utilizing the Diazo Ester
Patent:
5,221,592 →
Application:
07/847,527 →
Deep Uv Sensitive Photoresist Resistant to Latent Image Decay
Patent:
5,342,734 →
Application:
07/882,207 →
High Contrast High Thermal Stability Positive Photoresists Having Novolak Resins of Lowered Hydroxyl Content
Patent:
5,208,138 →
Application:
07/886,976 →
Novolak Resin Mixtures
Patent:
5,371,169 →
Application:
07/953,031 →
Image Reversal Negative Working Photoresist Containing O-Quinone Diazide and Cross-Linking Compound
Patent:
5,399,456 →
Application:
07/978,099 →
Novolak Resin Blends for Photoresist Applications
Patent:
5,374,693 →
Application:
07/996,924 →
Process for Producing a Developer Having a Low Metal Ion Level
Patent:
5,286,606 →
Application:
07/996,925 →
Using a Lewis Base to Control Molecular Weight of Novolak Resins
Patent:
5,614,349 →
Application:
07/997,942 →
Metal Ion Reduction in the Raw Materials and Using a Lewis Base to Control Molecular Weight of Novolak Resin to Be Used in Positive Photoresists
Patent:
5,476,750 →
Application:
07/999,500 →
Composition and Method for Removing Photoresist Composition from Substrates Surfaces
Patent:
5,426,017 →
Application:
08/033,076 →
Method for Producing Positive Photoresist Image Utilizing Diazo Ester of Benzolactone Ring Compound and Diazo Sulfonyl Chloride
Patent:
5,348,842 →
Application:
08/042,362 →
Separating Metals Using a Modified Deionizing Resin
Patent:
5,565,496 →
Application:
08/156,182 →
Process of Making a Stable Solution of Poly(Hydroxystyrene) Functionalized with T-Butyloxycarbonyl Groups
Patent:
5,395,871 →
Application:
08/239,096 →
Metal Ion Reduction in Top Anti-Reflective Coatings for Photoresists
Patent:
5,516,886 →
Application:
08/258,898 →
Photoresist Having a Low Level of Metal Ions
Patent:
5,543,263 →
Application:
08/261,646 →
Metal Ion Reduction in Novolak Resins and Photoresists
Patent:
5,594,098 →
Application:
08/272,962 →
Metal Ion Reduction in Novolak Resin Solution Using an Anion Exchange Resin
Patent:
5,686,561 →
Application:
08/294,453 →
Novel Matrix Resin for High-Temperature Stable Photoimageable Compositions
Patent:
5,510,420 →
Application:
08/353,000 →
Metal Ion Reduction in Novolak Resin Using an Ion Exchange Catalyst in a Polar Solvent and Photoresists Compositions Therefrom
Patent:
5,521,052 →
Application:
08/365,659 →
Metal Ion Reduction in Novolak Resins Solution in Pgmea by Chelating Ion Exchange Resin
Patent:
5,614,352 →
Application:
08/366,614 →
Isolation of Novolak Resin by Low Temperature Sub Surface Forced Steam Distillation
Patent:
5,750,632 →
Application:
08/366,634 →
Quinone Diazide Compositions Containing Low Metals P-Cresol Oligomers and Process of Producing the Composition
Patent:
5,837,417 →
Application:
08/366,635 →
Positive Photoresist Composition Comprising a Mixed Ester of Tris- Hydroxyphenyl Ethane and a Mixed Ester of Trihydroxybenzophenone
Patent:
5,612,164 →
Application:
08/385,857 →
Method for Removing Photoresist Composition from Substrate Surfaces
Patent:
5,637,436 →
Application:
08/416,234 →
Metal Ion Reduction in Novolak Resins and Photoresists
Patent:
5,580,949 →
Application:
08/458,588 →
Metal Ion Reduction in Top Anti-Reflective Coatings for Photoresisis
Patent:
5,624,789 →
Application:
08/460,392 →
Metal Ion Reduction in Bottom Anti-Reflective Coatings for Use in Semiconductor Device Formation
Patent:
5,580,700 →
Application:
08/460,611 →
Preparation and Use of Poly (3,5 Disubstituted-4- Hydroxystyrene /N-Substituted Maleimide)
Patent:
5,594,086 →
Application:
08/487,944 →
Fractionation of Phenol Formaldehyde Condensate and Photoresist Compositions Produced Therefrom
Patent:
5,693,749 →
Application:
08/530,648 →
Fractionation of Phenol Formaldehyde Condensate and Photoresist Compositions Produced Therefrom
Patent:
5,739,265 →
Application:
08/530,847 →
Process for Producing Surfactant Having a Low Metal Ion Level and Developer Produced Therefrom
Patent:
5,750,031 →
Application:
08/533,828 →
Low Metals Perfluorooctanoic Acid and Top Anti-Reflective Coatings for Photoresists
Patent:
5,830,990 →
Application:
08/537,199 →
Metal Ion Reduction in Photoresist Compositions by Chelating Ion Exchange Resin
Patent:
5,962,183 →
Application:
08/562,867 →
Positive Photoresist Utilizing Mixed Solvent Consistiing Essentially of 3-Methyl-3-Methoxy Butanol and Propylene Glycol Alkyl Ether Acetate
Patent:
5,853,947 →
Application:
08/576,748 →
Novolak Resin Blends for Photoresist Applications
Patent:
5,646,218 →
Application:
08/692,306 →
Positive Photoresist Composition Containing a 2,4-Dinitro-1-Naphthol
Patent:
5,719,004 →
Application:
08/695,157 →
Light Sensitive Composition Containing an Arylhydrazo Dye
Patent:
5,763,135 →
Application:
08/722,711 →
Antireflective Coating for Photoresist Compositions
Patent:
5,733,714 →
Application:
08/724,109 →
Fractionated Novolak Resin and Photoresist Composition Therefrom
Patent:
5,853,954 →
Application:
08/768,539 →
Fractionated Novolak Resin from Cresol-Formaldehyde Reaction Mixture and Photoresist Composition Therefrom
Patent:
5,910,559 →
Application:
08/768,541 →
Method of Using a Lewis Base to Control Molecular Weight of Novolak Resins
Patent:
5,688,893 →
Application:
08/771,715 →
Process for Obtaining a Lift-Off Imaging Profile
Patent:
5,922,503 →
Application:
08/802,807 →
Bottom Antireflective Coatings Through Refractive Index Modification by Anomalous Dispersion
Patent:
6,042,992 →
Application:
08/811,806 →
Positive Photoresists Containing Novel Photoactive Compounds
Patent:
5,876,897 →
Application:
08/812,542 →
Photosensitive Quinolone Compounds and a Process of Preparation
Patent:
5,866,295 →
Application:
08/813,167 →
Use of Mixtures of Ethyl Lactate and N-Methyl Pyrollidone as an Edge Bead Remover for Photoresists
Patent:
5,814,433 →
Application:
08/833,170 →
Metal Ion Reduction in Novolak Resin Solution Using an Anion Exchange Resin
Patent:
6,043,002 →
Application:
08/902,442 →
Image Formation Utilizing Photosensitive Compositions Containing Low Metal Content P-Cresol Oligomers
Patent:
5,858,627 →
Application:
08/920,564 →
Isolation of Novolak Resin Without High Temperature Distillation and Photoresist Composition Therefrom
Patent:
5,863,700 →
Application:
08/939,253 →
Photoresist Composition Containing a Novel Polymer
Patent:
6,103,443 →
Application:
08/976,284 →
Chelated Polyhydroxystyrene for Removing Metal Ions from Aqueous and Nonaqueous Systems
Patent:
6,028,120 →
Application:
08/991,033 →
Process for Measuring Concentration of Nonionic Surfactants in an Aqueous Alkaline Solution
Patent:
6,017,766 →
Application:
09/014,387 →
Process for Making a Photoactive Compound and Photoresist Therefrom
Patent:
5,936,071 →
Application:
09/017,446 →
Fractionation of Phenol Formaldehyde Condensate and Photoresist Compositions Produced Therefrom
Patent:
5,976,761 →
Application:
09/047,571 →
Isolation of Novolak Resin by Low Temperature Sub Surface Forced Steam Distillation
Patent:
6,165,675 →
Application:
09/053,885 →
Water Soluble Negative-Working Photoresist Composition
Patent:
5,998,092 →
Application:
09/085,880 →
193 Nm Positive-Working Photoresist Composition
Patent:
6,060,212 →
Application:
09/096,036 →
Trace Metal Ion Reduction by Ion Exchange Pack
Patent:
5,955,570 →
Application:
09/108,817 →
Composition for Stripping Photoresist and Organic Materials from Substrate Surfaces
Patent:
6,368,421 →
Application:
09/113,892 →
Fractionated Novolak Resin and Photoresist Composition Therefrom
Patent:
5,977,288 →
Application:
09/128,900 →
Isolation of Novolak Resin Without High Temperature Distillation and Photoresist Composition Therefrom
Patent:
6,090,533 →
Application:
09/186,909 →
Antireflective Composition for a Deep Ultraviolet Photoresist
Patent:
6,114,085 →
Application:
09/195,057 →
Fractionated Novolak Resin from Cresol-Formaldehyde Reaction Mixture and Photoresist Composition Therefrom
Patent:
6,096,477 →
Application:
09/251,900 →
Light-Absorbing Antireflective Layers with Improved Performance Due to Refractive Index Optimization
Patent:
6,274,295 →
Application:
09/264,616 →
Process for Making a Photoactive Compound and Photoresit Therefrom
Patent:
6,048,665 →
Application:
09/321,768 →
Antireflective Coating for Photoresist Compositions
Patent:
6,187,506 →
Application:
09/368,740 →
Antireflective Coating Material for Photoresists
Patent:
6,106,995 →
Application:
09/373,319 →
Method for Synthesizing Polymeric Azo Dyes
Patent:
6,346,361 →
Application:
09/413,181 →
Preparation of Fractionated Novolak Resins by a Novel Extraction Technique
Patent:
6,121,412 →
Application:
09/418,239 →
Photoresist Composition for Deep Uv Radiation
Patent:
6,365,322 →
Application:
09/455,872 →
Negative-Acting Chemically Amplified Photoresist Composition
Patent:
6,576,394 →
Application:
09/596,098 →
Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge
Patent:
6,297,352 →
Application:
09/597,440 →
Photoresist Composition for Deep Uv and Process Thereof
Patent:
6,447,980 →
Application:
09/619,336 →
Mixed Solvent System for Positive Photoresists
Patent:
6,391,514 →
Application:
09/642,128 →
Edge Bead Remover for Thick Film Photoresists
Patent:
6,524,775 →
Application:
09/693,215 →
Fractionation of Resins Using a Static Mixer and a Liquid-Liquid Centrifuge
Patent:
6,512,087 →
Application:
09/698,724 →
Process for Producing Acid Sensitive Liquid Composition Containing a Carbonate
Process for Producing Film Forming Resins for Photoresist Compositions
Novel Polymer Suitable for Photoresist Compositions
Negative- Acting Aqueous Photoresist Composition
Photoresist Composition for Deep Uv Radiation Containing an Additive
Negative Deep Ultraviolet Photoresist
Novolak Resin Mixtures and Photosensitive Compositions Comprising the Same
Photoresist Compositions
Patent:
6,790,582 →
Application:
10/404,612 →
Photoresist Compositions