IP Library › Assignment 015653/0738
Patent Assignment
Reel/Frame 015653/0738

Assignment of Assignor's Interest

Recorded: 2005-02-04 Received: 2005-02-04 Pages: 15
Assignor
SYNOPSYS MERGER HOLDINGS LLC
Executed: 2004-12-23
Assignee
SYNOPSYS, INC.
700 E. MIDDLEFIELD ROAD, MOUNTAIN VIEW, CA, 94043, UNITED STATES
Covered Properties (99)
Design and Layout of Phase Shifting Photolithographic Masks
Application: 10/938,653 →
Phase Shift Mask Including Sub-Resolution Assist Features for Isolated Spaces
Application: 10/920,027 →
Visual Inspection and Verification System
Application: 10/878,847 →
Dissection of Edges with Projection Points in a Fabrication Layout for Correcting Proximity Effects
Application: 10/855,673 →
Model-Based Data Conversion
Application: 10/844,987 →
Phase Shifting Circuit Manufacture Method and Apparatus
Application: 10/843,974 →
Phase Conflict Resolution for Photolithographic Masks
Application: 10/834,623 →
Phase Shift Masking for Complex Patterns with Proximity Adjustments
Application: 10/818,727 →
Design and Layout of Phase Shifting Photolithographic Masks
Application: 10/809,650 →
Design and Layout of Phase Shifting Photolithographic Masks
Application: 10/799,073 →
Method and Apparatus of Wafer Print Simulation Using Hybrid Model with Mask Optical Images
Correcting 3D Effects in Phase Shifting Masks Using Sub-Resolution Features
Application: 10/774,342 →
Displacing Edge Segments on a Fabrication Layout Based on Proximity Effects Model Amplitudes for Correcting Proximity Effects
Application: 10/688,559 →
System and Method for Correcting 3D Effects in an Alternating Phase-Shifting Mask
Application: 10/685,751 →
Processing transactions using a semantic network
Application: 10/656,933 →
System and Method for Providing Defect Printability Analysis of Photolithographic Masks with Job-Based Automation
Application: 10/618,816 →
Graphical User Interface for a Cell Router Usable by Both Novice and Advanced Users
Application: 10/461,674 →
Cell Library That Can Automatically Avoid Forbidden Pitches
Application: 10/426,545 →
Method and Apparatus for Performing Target-Image-Based Optical Proximity Correction
Application: 10/426,583 →
Mask Cost Driven Logic Optimization and Synthesis
Application: 10/420,951 →
Method and Apparatus for Fracturing Polygons on Masks Used in an Optical Lithography Process
Application: 10/412,172 →
Fracturing Polygons Used in a Lithography Process for Fabricating an Integrated Circuit
Application: 10/412,171 →
Programmable aperture for lithographic imaging systems
Application: 10/405,228 →
Method and apparatus of wafer print simulation using hybrid model with mask optical images
Application: 60/451,235 →
Incrementally Resolved Phase-Shift Conflicts in Layouts for Phase-Shifted Features
Application: 10/377,341 →
User Interface for a Network-Based Mask Defect Printability Analysis System
Application: 10/372,066 →
High Yield Reticle with Proximity Effect Halos
Application: 10/369,713 →
Simulation Based Psm Clear Defect Repair Method and System
Application: 10/364,260 →
System and Method for Generating a Two-Dimensional Yield Map for a Full Layout
Application: 10/354,382 →
Dissection of Printed Edges from a Fabrication Layout for Correcting Proximity Effects
Application: 10/346,903 →
Phase Shifting Circuit Manufacture Method and Apparatus
Application: 10/341,290 →
Cutting Patterns for Full Phase Shifting Masks
Application: 10/340,377 →
Method and Apparatus for Creating a Phase-Shifting Mask for a Photolithographic Process
Application: 10/334,566 →
Lithography Process Modeling of Asymmetric Patterns
Application: 10/335,513 →
Method and Apparatus for Providing Feedback from a Compactor to a Router to Facilitate Layout of an Integrated Circuit
Application: 10/329,010 →
Incremental Lithography Mask Layout Design and Verification
Application: 10/327,446 →
Method and Apparatus for Mixed-Mode Optical Proximity Correction
Application: 10/327,454 →
Verification Utilizing Instance-Based Hierarchy Management
Application: 10/323,565 →
Reference Image Generation from Subject Image for Photolithography Mask Analysis
Application: 10/316,280 →
Identifying Phantom Images Generated by Side-Lobes
Application: 10/316,275 →
Alleviating Line End Shortening by Extending Phase Shifters
Application: 10/313,325 →
Method for Facilitating Automatic Analysis of Defect Printability
Application: 10/313,706 →
Simulation-Based Selection of Evaluation Points for Model-Based Optical Proximity Correction
Application: 10/306,055 →
Automated Creation of Metrology Recipes
Application: 10/301,225 →
Full Phase Shifting Mask in Damascene Process
Application: 10/295,575 →
Method and Apparatus for Using a Complementary Mask to Clear Phase Conflicts on a Phase Shifting Mask
Application: 10/294,253 →
Critical Dimension Control Using Full Phase and Trim Masks
Application: 10/295,160 →
Mask Repair Using Multiple Exposures
Application: 10/282,483 →
Performing Optical Proximity Correction on Trim-Level Segments Not Abutting Features to Be Printed
Application: 10/277,250 →
Alternating Phase Shift Mask Design Conflict Resolution
Application: 10/272,104 →
Phase Shifting Mask Topography Effect Correction Based on Near-Field Image Properties
Application: 10/268,874 →
Alternating Phase Shift Masking for Multiple Levels of Masking Resolution
Application: 10/240,006 →
Selectively Applying Resolution Enhancement Techniques to Improve Performance and Manufacturing Cost of Integrated Circuits
Application: 10/254,702 →
Accelerated Layout Processing Using Opc Pre-Processing
Application: 10/253,204 →
Phase Shift Mask Including Sub-Resolution Assist Features for Isolated Spaces
Application: 10/244,226 →
Using Second Exposure to Assist a Psm Exposure in Printing a Tight Space Adjacent to Large Feature
Application: 10/244,451 →
Soft Defect Printability Simulation and Analysis for Masks
Application: 10/243,629 →
Hybrid Optical Proximity Correction for Alternating Aperture Phase Shifting Designs
Application: 10/237,883 →
Phase Shift Mask Layout Process for Patterns Including Intersecting Line Segments
Application: 10/235,458 →
Considering Mask Writer Properties During the Optical Proximity Correction Process
Application: 10/232,130 →
Phase Shift Masking for "Double-T" Intersecting Lines
Application: 10/224,064 →
Repetition Recognition Using Segments
Application: 10/208,891 →
General purpose shape-based layout processing scheme for IC layout modifications
Application: 10/194,703 →
Method and Apparatus for Reducing Optical Proximity Correction Output File Size
Application: 10/189,900 →
Method and Apparatus for Data Hierarchy Maintenance in a System for Mask Description
Application: 10/173,198 →
Model-Based Data Conversion
Application: 10/171,066 →
Design and Layout of Phase Shifting Photolithographic Masks
Design Data Format and Hierarchy Management for Phase Processing
Application: 10/165,550 →
Phase Conflict Resolution for Photolithographic Masks
Exposure Control for Phase Shifting Photolithographic Masks
Standard Cell Design Incorporating Phase Information
Application: 10/165,557 →
Optical Proximity Correction for Phase Shifting Photolithgraphic Masks
Phase Shifting Circuit Manufacture Method and Apparatus
Application: 10/154,858 →
Facilitating Optical Proximity Effect Correction Through Pupil Filtering
Application: 10/146,274 →
Phase shifting design and layout for static random access memory
Application: 60/381,048 →
Method and System for Simulating Resist and Etch Edges
Application: 10/137,828 →
Method and Apparatus for Exposing a Wafer Using Multiple Masks During an Integrated Circuit Manufacturing Process
Application: 10/117,838 →
Method and Apparatus for Facilitating Process-Compliant Layout Optimization
Application: 10/116,914 →
Method and apparatus to facilitate test pattern design for model calibration and proximity correction
Application: 10/116,286 →
System and Method to Determine Impact of Line End Shortening
Application: 10/116,661 →
Automated Flow in Psm Phase Assignment
Application: 10/116,660 →
Method and Apparatus for Identifying an Identical Cell in an Ic Layout with an Existing Solution
Application: 10/098,713 →
Mask Product Made by Selection of Evaluation Point Locations Based on Proximity Effects Model Amplitudes for Correcting Proximity Effects in a Fabricat Layout
Application: 10/099,279 →
Using a Suggested Solution to Speed Up a Process for Simulating and Correcting an Integrated Circuit Layout
Application: 10/098,714 →
Full phase mask in damascene process
Application: 60/363,674 →
Facilitating an Adjustable Level of Phase Shifting During an Optical Lithography Process for Manufacturing an Integrated Circuit
Application: 10/094,487 →
Design and Layout of Phase Shifting Photolithographic Masks
Application: 10/085,759 →
Non-critical blocking for full phase masks
Application: 60/359,909 →
Optical Proximity Correction for Phase Shifting Photolithographic Masks
Application: 10/082,697 →
Method and Apparatus to Facilitate Auto-Alignment of Images for Defect Inspection and Defect Analysis
Application: 10/074,751 →
Phase Shift Masking for Complex Patterns with Proximity Adjustments
Application: 10/068,513 →
Shape-Based Geometry Engine to Perform Smoothing and Other Layout Beautification Operations
Application: 10/040,055 →
System and method for determining manufacturing error enhancement factor
Application: 10/033,054 →
Simulation-Based Feed Forward Process Control
Application: 10/033,511 →
Facilitating Minimum Spacing and/or Width Control During Optical Proximity Correction
Application: 10/029,041 →
Method for Providing Flexible and Dynamic Reporting Capability Using Simulation Tools
Application: 10/025,414 →
Method and Apparatus for Controlling Rippling During Optical Proximity Correction
Application: 10/016,837 →
Resolving Phase-Shift Conflicts in Layouts Using Weighted Links Between Phase Shifters
Application: 10/012,069 →
Phase Shifting Design and Layout for Static Random Access Memory
Application: 09/996,973 →