IP Library Assignment 060443/0792
Patent Assignment
Reel/Frame 060443/0792

Certificate of Conversion & Change of Name

Recorded: 2022-06-27 Pages: 7
Assignor
TESSERA, INC.
Executed: 2021-10-01
Assignee
TESSERA LLC
3025 ORCHARD PARKWAY, SAN JOSE, CALIFORNIA, 95134
Covered Properties (52)
High Density Three-Dimensional Integrated Capacitors
Patent: 8,502,340 →
Application: 12/964,049 →
Publication: US 2012/0146182
High Density Three-Dimensional Integrated Capacitors
Patent: 8,742,541 →
Application: 13/182,890 →
Publication: US 2012/0181658
Package-On-Package Assembly with Wire Bonds to Encapsulation Surface
Patent: 8,618,659 →
Application: 13/462,158 →
Publication: US 2012/0280386
Package-On-Package Assembly with Wire Bonds to Encapsulation Surface
Patent: 9,093,435 →
Application: 13/792,521 →
Publication: US 2013/0203216
High Density Three-Dimensional Integrated Capacitors
Patent: 9,431,475 →
Application: 13/954,455 →
Publication: US 2013/0313680
High Density Three-Dimensional Integrated Capacitors
Patent: 9,190,463 →
Application: 14/291,672 →
Publication: US 2014/0273393
Selective Removal of Semiconductor Fins
Patent: 9,613,954 →
Application: 14/325,547 →
Publication: US 2016/0013183
Package-On-Package Assembly with Wire Bonds to Encapsulation Surface
Patent: 9,224,717 →
Application: 14/564,640 →
Publication: US 2015/0091118
Punch Through Stopper in Bulk Finfet Device
Patent: 9,559,191 →
Application: 14/578,842 →
Publication: US 2015/0303284
Structure and Process to Tuck Fin Tips Self-Aligned to Gates
Patent: 9,876,074 →
Application: 14/719,829 →
Publication: US 2016/0343861
Bulk Nanosheet with Dielectric Isolation
Patent: 9,741,792 →
Application: 14/919,451 →
Publication: US 2017/0117359
High Density Three-Dimensional Integrated Capacitors
Patent: 9,437,557 →
Application: 14/934,544 →
Publication: US 2016/0079189
Stable Work Function for Narrow-Pitch Devices
Patent: 9,583,486 →
Application: 14/946,245 →
Middle-Of-Line (Mol) Capacitance Reduction for Self-Aligned Contact in Gate Stack
Application: 14/951,333 →
Publication: US 2017/0148874
Package-On-Package Assembly with Wire Bonds to Encapsulation Surface
Patent: 9,691,731 →
Application: 14/979,053 →
Publication: US 2016/0211237
High Density Three-Dimensional Integrated Capacitors
Application: 15/198,524 →
Publication: US 2016/0315139
Semiconductor Structures Including Middle-of-Line (Mol) Capacitance Reduction for Self-Aligned Contact in Gate Stack
Application: 15/206,127 →
Publication: US 2017/0148662
Punch Through Stopper in Bulk Finfet Device
Application: 15/250,166 →
Publication: US 2016/0365432
Punch Through Stopper in Bulk Finfet Device
Application: 15/250,207 →
Publication: US 2016/0372589
Self-Forming Barrier for Use in Air Gap Formation
Application: 15/251,797 →
Publication: US 2018/0061708
Selective Gas Etching for Self-Aligned Pattern Transfer
Application: 15/284,862 →
Publication: US 2018/0096846
Stable Work Function for Narrow-Pitch Devices
Patent: 9,735,250 →
Application: 15/339,096 →
Publication: US 2017/0148892
Stacked Transistors with Different Channel Widths
Patent: 9,660,028 →
Application: 15/339,665 →
Punch Through Stopper in Bulk Finfet Device
Application: 15/342,477 →
Publication: US 2017/0077268
Nanosheet Field Effect Transistors with Partial Inside Spacers
Application: 15/417,312 →
Publication: US 2018/0219082
Alternating Hardmasks for Tight-Pitch Line Formation
Application: 15/445,112 →
Publication: US 2018/0247824
Selective Removal of Semiconductor Fins
Application: 15/450,829 →
Publication: US 2017/0178960
Stacked Transistors with Different Channel Widths
Application: 15/463,155 →
Publication: US 2018/0122703
Forming Self-Aligned Vias and Air-Gaps in Semiconductor Fabrication
Patent: 9,911,652 →
Application: 15/472,745 →
Package-On-Package Assembly with Wire Bonds to Encapsulation Surface
Application: 15/628,851 →
Publication: US 2017/0287733
Bulk Nanosheet with Dielectric Isolation
Application: 15/642,690 →
Publication: US 2017/0309706
Bulk Nanosheet with Dielectric Isolation
Application: 15/651,420 →
Publication: US 2017/0317168
Punch Through Stopper in Bulk Finfet Device
Application: 15/656,326 →
Publication: US 2017/0323956
Punch Through Stopper in Bulk Finfet Device
Application: 15/715,593 →
Publication: US 2018/0026120
Nanosheet Field Effect Transistors with Partial Inside Spacers
Application: 15/797,648 →
Publication: US 2018/0219083
Alternating Hardmasks for Tight-Pitch Line Formation
Application: 15/802,634 →
Publication: US 2018/0247825
Stable Work Function for Narrow-Pitch Devices
Application: 15/813,634 →
Publication: US 2018/0083116
Forming Self-Aligned Vias and Air-Gaps in Semiconductor Fabrication
Application: 15/815,173 →
Publication: US 2018/0286750
Selective Gas Etching for Self-Aligned Pattern Transfer
Application: 16/001,426 →
Publication: US 2018/0286682
Punch Through Stopper in Bulk Finfet Device
Application: 16/056,940 →
Publication: US 2018/0350959
Package-On-Package Assembly with Wire Bonds to Encapsulation Surface
Application: 16/058,425 →
Publication: US 2018/0350766
High Density Three-dimensional Integrated Capacitors
Application: 16/219,225 →
Publication: US 2019/0131387
Self-Forming Barrier for Use in Air Gap Formation
Application: 16/250,561 →
Publication: US 2019/0157146
Forming Self-Aligned Vias and Air-Gaps in Semiconductor Fabrication
Application: 16/257,221 →
Publication: US 2019/0172748
Middle-Of-Line (Mol) Capacitance Reduction for Self-Aligned Contact in Gate Stack
Application: 16/261,305 →
Publication: US 2019/0157388
Semiconductor Structures Including Middle-of-Line (Mol) Capacitance Reduction for Self-Aligned Contact in Gate Stack
Application: 16/399,845 →
Publication: US 2019/0259831
Alternating Hardmasks for Tight-Pitch Line Formation
Application: 16/508,691 →
Publication: US 2019/0333774
Selective Gas Etching for Self-Aligned Pattern Transfer
Application: 16/682,588 →
Publication: US 2020/0083045
Nanosheet Field Effect Transistors with Partial Inside Spacers
Application: 16/684,115 →
Publication: US 2020/0098893
Package-On-Package Assembly with Wire Bonds to Encapsulation Surface
Application: 16/778,899 →
Publication: US 2020/0168579
Selective Gas Etching for Self-Aligned Pattern Transfer
Application: 17/181,269 →
Publication: US 2021/0183653
Punch Through Stopper in Bulk Finfet Device
Application: 61/980,292 →
Related Assignments (22)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 12, 2013
From: OGANESIAN, VAGE; HABA, BELGACEM; MOHAMMED, ILYAS; SAVALIA, PIYUSH
To: TESSERA RESEARCH LLC
Reel/Frame 031096/0654 →
Assignment of Assignor's Interest Aug 14, 2013
From: TESSERA RESEARCH LLC
To: TESSERA, INC.
Reel/Frame 031169/0620 →
Assignment of Assignor's Interest Dec 22, 2014
From: BASKER, VEERARAGHAVAN S.; LIU, ZUOGUANG; YAMASHITA, TENKO; YEH, CHUN-CHEN
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 034567/0795 →
Assignment of Assignor's Interest Jan 27, 2015
From: MOHAMMED, ILYAS; HABA, BELGACEM; UZOH, CYPRIAN; SAVALIA, PIYUSH
To: TESSERA, INC.
Reel/Frame 034825/0370 →
Assignment of Assignor's Interest May 22, 2015
From: DORIS, BRUCE B.; HE, HONG; KANAKASABAPATHY, SIVANANDA K.; KARVE, GAURI
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 035699/0303 →
Assignment of Assignor's Interest May 27, 2015
From: SATO, HIROAKI; KANG, TECK-GYU; HABA, BELGACEM; OSBORN, PHILIP R.
To: TESSERA, INC.
Reel/Frame 035721/0587 →
Assignment of Assignor's Interest Oct 21, 2015
From: CHENG, KANGGUO; DORIS, BRUCE B.; WANG, JUNLI
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 036849/0593 →
Assignment of Assignor's Interest Nov 17, 2015
From: MOHAMMED, ILYAS; HABA, BELGACEM; UZOH, CYPRIAN; SAVALIA, PIYUSH
To: TESSERA, INC.
Reel/Frame 037061/0420 →
Assignment of Assignor's Interest Nov 19, 2015
From: ANDO, TAKASHI; BAJAJ, MOHIT; HOOK, TERENCE B.; PANDEY, RAJAN K.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 037092/0027 →
Assignment of Assignor's Interest Nov 24, 2015
From: OK, INJO; PRANATHARTHIHARAN, BALASUBRAMANIAN; SEO, SOON-CHEON; SURISETTY, CHARAN V.V.S.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 037136/0608 →
Assignment of Assignor's Interest Jan 5, 2016
From: SATO, HIROAKI; KANG, TECK-GYU; HABA, BELGACEM; OSBORN, PHILIP R.
To: TESSERA, INC.
Reel/Frame 037410/0882 →
Assignment of Assignor's Interest Jul 1, 2016
From: OGANESIAN, VAGE; HABA, BELGACEM; MOHAMMED, ILYAS; SAVALIA, PIYUSH
To: TESSERA RESEARCH LLC
Reel/Frame 039062/0355 →
Assignment of Assignor's Interest Jul 5, 2016
From: TESSERA RESEARCH LLC
To: TESSERA, INC.
Reel/Frame 039074/0417 →
Assignment of Assignor's Interest Jul 8, 2016
From: OK, INJO; PRANATHARTHIHARAN, BALASUBRAMANIAN; SEO, SOON-CHEON; SURISETTY, CHARAN V.V.S.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 039112/0796 →
Security Interest Dec 2, 2016
From: INVENSAS CORPORATION; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; ZIPTRONIX, INC.
To: ROYAL BANK OF CANADA, AS COLLATERAL AGENT
Reel/Frame 040797/0001 →
Assignment of Assignor's Interest Jan 6, 2020
From: INTERNATIONAL BUSINESS MACHINES CORPORATION
To: TESSERA, INC.
Reel/Frame 051489/0557 →
Security Interest Jun 1, 2020
From: ROVI SOLUTIONS CORPORATION; ROVI TECHNOLOGIES CORPORATION; ROVI GUIDES, INC.; TIVO SOLUTIONS INC.
To: BANK OF AMERICA, N.A.
Reel/Frame 053468/0001 →
Release of Security Interest Jun 11, 2020
From: ROYAL BANK OF CANADA
To: TESSERA, INC.; INVENSAS BONDING TECHNOLOGIES, INC. (F/K/A ZIPTRONIX, INC.); FOTONATION CORPORATION (F/K/A DIGITALOPTICS CORPORATION AND F/K/A DIGITALOPTICS CORPORATION MEMS); INVENSAS CORPORATION
Reel/Frame 052920/0001 →
Change of Name Sep 13, 2023
From: TESSERA LLC
To: ADEIA SEMICONDUCTOR SOLUTIONS LLC
Reel/Frame 064897/0184 →
Change of Name Jun 14, 2024
From: TESSERA LLC
To: ADEIA SEMICONDUCTOR SOLUTIONS LLC
Reel/Frame 067737/0757 →
Change of Name Sep 27, 2024
From: TESSERA LLC
To: ADEIA SEMICONDUCTOR SOLUTIONS LLC
Reel/Frame 069067/0454 →
Change of Name Sep 27, 2024
From: TESSERA LLC
To: ADEIA SEMICONDUCTOR SOLUTIONS LLC
Reel/Frame 069067/0410 →