Patent Assignment
Reel/Frame 075742/0084
Release of Security Interest
Recorded: 2026-06-10
Pages: 4
Assignor
PNC BANK, NATIONAL ASSOCIATION
Executed: 2026-06-10
Assignee
AKRION TECHNOLOGIES, INC.
6330 HEDGEWOOD DRIVE, SUITE 150, ALLENTOWN, PENNSYLVANIA, 18106
Covered Properties
(79)
Wafer Carrier Holder for Wafer Carriers
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5,100,190 →
Application:
07/438,024 →
Decorative Earrings with Animal Shapes
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5,080,518 →
Application:
07/669,751 →
Megasonic Cleaning System
Patent:
5,247,954 →
Application:
07/791,094 →
Process for Etching Oxide Films in a Sealed Photochemical Reactor
Patent:
5,234,540 →
Application:
07/876,043 →
Megasonic Cleaning System
Patent:
5,625,249 →
Application:
08/277,792 →
Particle Barrier Drain
System for Removal of Photoresist Using Sparger
Method and System for Chemical Injection in Silicon Wafer Processing
Low Profile Wafer Carrier
Cleaning and Drying Method and Apparatus
Drying Vapor Generation
Chemical Concentration Control Device
Membrane Dryer
Process Tank with Pressurized Mist Generation
Nextgen Wet Process Tank
Method of Processing Substrates Using Pressurized Mist Generation
Capillary Drying of Substrates
Process and Apparatus for Removal of Photoresist from Semiconductor Wafers Using Spray Nozzles
Method for Removal of Photoresist Using Sparger
Substrate Process Tank with Acoustical Source Transmission and Method of Processing Substrates
System and Method for Point-of-Use Filtration and Purification of Fluids Used in Substrate Processing
Process Sequence for Photoresist Stripping and/or Cleaning of Photomasks for Integrated Circuit Manufacturing
Apparatus for carrying reticles and method of using the same to process reticles
Application:
10/931,441 →
Publication:
US US20050051083A1
Membrane Dryer
System and method for pre-gate cleaning of substrates
Application:
11/176,406 →
Publication:
US US20060011214A1
Method and apparatus for creating ozonated process solutions having high ozone concentration
Application:
11/177,147 →
Publication:
US US20060021634A1
Reduced pressure irradiation processing method and apparatus
Application:
11/178,923 →
Publication:
US US20060016458A1
System and method of powering a sonic energy source and use of the same to process substrates
Application:
11/227,705 →
Publication:
US US20060054182A1
Apparatus and Method for Removing Trace Amounts of Liquid from Substrates During Single-Substrate Processing
Application:
11/266,402 →
Publication:
US US20070094885A1
System and method of cleaning substrates using high frequency megasonics and/or cavitation control
Application:
60/690,586 →
System and method of processing substrates using a sub-ambient process solution and sonic energy
Application:
60/724,495 →
Cleaning Apparatus
Patent:
4,804,007 →
Application:
07/043,852 →
Megasonic Cleaning Apparatus
Patent:
4,869,278 →
Application:
07/144,515 →
Apparatus for Treating Wafers Utilizing Megasonic Energy
Patent:
4,854,337 →
Application:
07/197,867 →
Megasonic Cleaning Apparatus
Patent:
4,998,549 →
Application:
07/272,501 →
Megasonic Cleaning Method
Patent:
5,037,481 →
Application:
07/482,086 →
Single Wafer Megasonic Semiconductor Wafer Processing System
Patent:
5,090,432 →
Application:
07/598,426 →
Single Chamber Megasonic Energy Cleaner
Patent:
5,148,823 →
Application:
07/598,909 →
Single Wafer Megasonic Semiconductor Wafer Processeng System
Patent:
5,286,657 →
Application:
07/809,799 →
Megasonic Transducer Assembly
Patent:
5,365,960 →
Application:
08/042,889 →
Method and Apparatus for Drying Semiconductor Wafers
Patent:
5,556,479 →
Application:
08/275,807 →
Semiconductor Wafer Cleaning System
Patent:
5,656,097 →
Application:
08/361,139 →
Wafer Cleaning System
Patent:
6,039,059 →
Application:
08/724,518 →
Semiconductor Wafer Cleaning System
Patent:
5,996,595 →
Application:
08/908,345 →
Semiconductor Wafer Cleaning System
Patent:
5,950,645 →
Application:
08/910,033 →
Gas Seal and Support for Rotating Semiconductor Processor
Patent:
6,125,551 →
Application:
09/040,176 →
Wafer Cleaning System
Patent:
6,140,744 →
Application:
09/057,182 →
Semiconductor Wafer Cleaning Method
Patent:
6,158,445 →
Application:
09/358,568 →
Awning Sleeve Shire
Patent:
6,148,445 →
Application:
09/360,567 →
Connecting Device
Patent:
6,462,938 →
Application:
09/465,712 →
Wafer Cleaning Method
Patent:
6,295,999 →
Application:
09/643,328 →
Semiconductor Wafer Cleaning System
Patent:
6,378,534 →
Application:
09/694,938 →
Megasonic Cleaner Probe System with Gasified Fluid
Megasonic Probe Energy Attenuator
Wafer Cleaning Method
Megasonic Probe Energy Director
Reciprocating Megasonic Probe
Megasonic Cleaner and Dryer
Stackable Process Chambers
Megasonic Cleaner and Dryer System
Method of applying liquid to a megasonic apparatus for improved cleaning control
Application:
10/171,431 →
Publication:
US US20020185155A1
System and Method for Prediction of Protein-Ligand Interactions and Their Bioactivity
Patent:
11,176,462 →
Application:
17/171,494 →
Wafer Cleaning
Megasonic Cleaning System with Buffered Cavitation Method
Method of Cleaning a Side of a Thin Flat Substrate by Applying Sonic Energy to the Opposite Side of the Substrate
Sonic-Energy Cleaner System with Gasified Fluid
Apparatus and Methods for Reducing Damage to Substrates During Megasonic Cleaning Processes
Megasonic Cleaner and Dryer
Megasonic Cleaning Using Supersaturated Cleaning Solution
Megasonic cleaner and dryer
Application:
10/865,440 →
Publication:
US US20040231188A1
Megasonic processing system with gasified fluid
Application:
10/931,457 →
Publication:
US US20050087209A1
Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devices
Application:
11/370,361 →
Publication:
US US20060260638A1
Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devices
Application:
11/370,707 →
Publication:
US US20060260639A1
Transducer Assembly for Magasonic Processing of an Article and Apparatus Utilizing the Same
Apparatus for Megasonic Processing of an Article
System and method for drying a rotating substrate
Application:
60/759,948 →
Backside cleaning of substrates
Application:
60/760,820 →
Semiconductor Wafer Cleaning System
Patent:
5,908,509 →
Application:
08/908,330 →
Wafer Cleaning
Related Assignments
(25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest.
Nov 20, 1989
From: MOLINARO, JAMES
To: SUBMICRON SYSTEMS, INC.
Reel/Frame 005209/0153 →
Assignment of Assignors Interest.
Aug 6, 1991
From: MASON, HARRY
To: HARRY MASON, INC.,
Reel/Frame 005794/0847 →
Assignment of Assignors Interest.
Jan 27, 1992
From: GRANT, ROBERT W.; NOVAK, RICHARD E.
To: SUBMICRON SYSTEMS, INC.
Reel/Frame 005984/0808 →
Assignment of Assignors Interest.
Apr 30, 1992
From: GRANT, ROBERT W.; TOREK, KEVIN; NOVAK, RICHARD E.; RUZYLLO, JERZY
To: SUBMICRON SYSTEMS, INC.
Reel/Frame 006112/0015 →
Security Interest
Aug 12, 1993
From: SUBMICRON SYSTEMS, INC.
To: FIRST FIDELITY BANK NATIONAL ASSOCIATION, PENNSYLVANIA
Reel/Frame 006650/0302 →
Assignment Back of Security Interest
Dec 15, 1995
From: FIRST FIDELITY BANK, NATIONAL ASSOCIATION
To: SUBMICRON SYSTEMS, INC.
Reel/Frame 007737/0595 →
Assignment of Assignor's Interest
Dec 15, 1995
From: GRANT, ROBERT W.
To: SUBMICRON SYSTEMS, INC.
Reel/Frame 007740/0611 →
Security Agreement
Apr 3, 1996
From: SUBMICRON SYSTEMS, INC.
To: CORESTATES BANK, N.A.
Reel/Frame 007869/0618 →
Security Interest
Jan 9, 1998
From: SUBMICRON SYSTEMS, INC.
To: GREYROCK BUSINESS CREDIT, A DIVISION OF NATIONSCREDIT COMMERCIAL CORPORATION
Reel/Frame 008886/0373 →
Security Interest
Jul 12, 1999
From: SUBMICRON SYSTEMS CORPORATION
To: WILMINGTON TRUST COMPANY
Reel/Frame 010078/0687 →
Release of Security Interest
Oct 25, 1999
From: WILMINGTON TRUST COMPANY
To: SUBMICRON SYSTEMS CORPORATION
Reel/Frame 010321/0985 →
Security Interest
Feb 14, 2000
From: AKRION LLC
To: GREYROCK CAPITAL, A DIVISION OF BANC OF AMERICA COMMERCIAL FINANCE CORPORATION
Reel/Frame 010602/0246 →
Assignment of Assignor's Interest
Nov 15, 2000
From: SUBMICRON SYSTEMS INC.
To: AKRION LLC
Reel/Frame 011314/0462 →
Release of Security Interest
Nov 15, 2000
From: CORESTATES BANK, N.A.
To: SUBMICRON SYSTEMS, INC.
Reel/Frame 011325/0572 →
Assignment of Assignor's Interest
Nov 28, 2000
From: GREYROCK CAPITAL, A DIVISION OF BANC OF AMERICA COMMERCIAL FINANCE CORPORATION
To: PRIMAXX, INC.
Reel/Frame 011325/0961 →
Security Interest
Dec 8, 2000
From: PRIMAXX, INC.
To: SAND HILL CAPITAL II, LP
Reel/Frame 011390/0292 →
Assignment of Assignor's Interest
Jan 11, 2001
From: CORESTATES BANK, N.A.
To: PRIMAXX, INC.
Reel/Frame 011425/0495 →
Security Interest
Feb 14, 2001
From: AKRION LLC
To: GENERAL ELECTRIC CAPITAL CORPORATION
Reel/Frame 011497/0675 →
Security Agreement
Apr 20, 2001
From: SAND HILL CAPITAL II,L.P.; SAND HILL CAPITAL II Q, L.P.; SAND HILL CAPITAL, LLC
To: FB COMMERCIAL FINANCE, INC.
Reel/Frame 011731/0841 →
Acknowledgement of Termination of Security Agreement
Jun 22, 2001
From: CORESTATES BANK, N.A.
To: SUBMICRON SYSTEMS, INC.
Reel/Frame 011898/0581 →
Assignment of Assignor's Interest
Dec 11, 2001
From: MYLAND, LARRY
To: AKRION, LLC
Reel/Frame 012380/0661 →
Assignment of Assignor's Interest
Jan 17, 2002
From: NOVAK, RICHARD; KASHKOUSH, ISMAIL
To: AKRION, LLC
Reel/Frame 012533/0405 →
Assignment of Assignor's Interest
Jan 18, 2002
From: KUO, CHANG; KASHKOUSH, ISMAIL; YIALAMAS, NICK; SKIBINSKI, GREG
To: AKRION, LLC
Reel/Frame 012533/0589 →
Assignment of Assignor's Interest
Mar 4, 2002
From: KASHKOUSH, ISMAIL I.; CHEN, GIM-SYANG; CIARI, RICHARD; NOVAK, RICHARD
To: AKRION, LLC
Reel/Frame 012668/0631 →
Assignment of Assignor's Interest
Mar 15, 2002
From: MYLAND, LARRY
To: AKRION, LLC
Reel/Frame 012709/0144 →