Patent Assignment
Reel/Frame 017718/0964
Change of Name
Recorded: 2006-06-06
Received: 2006-06-06
Pages: 21
Assignor
DONGBU ANAM SEMICONDUCTORS, INC
Executed: 2006-04-10
Assignee
DONGBU ELECTRONICS CO., LTD.
891-10, DAECHI-DONG, GANGNAM-GU, SEOUL, KRX, KOREA, REPUBLIC OF
Covered Properties
(89)
Multi-Layered Copper Line Structure of Semiconductor Device and Method for Forming the Same
Application:
11/433,037 →
Method for imaging of a periodically-moving subject region of a subject
Application:
11/324,376 →
Semiconductor Devices to Reduce Stress on a Metal Interconnect
Application:
11/205,376 →
Method of manufacturing a semiconductor device
Application:
11/156,422 →
Method of making a MOS transistor
Application:
11/044,331 →
Semiconductor Device and Fabricating Method Thereof
Application:
11/026,972 →
Transistors of Semiconductor Devices and Methods of Fabricating the Same
Application:
11/027,518 →
Methods of forming copper interconnections using electrochemical plating processes
Application:
11/027,514 →
Methods for Preventing Copper Oxidation in a Dual Damascene Process
Application:
11/026,984 →
Method for Forming Metallic Interconnects in Semiconductor Devices
Application:
11/026,756 →
Methods of Fabricating Semiconductor Devices
Application:
11/026,714 →
Methods of Fabricating Mim Capacitors in Semiconductor Devices
Application:
11/027,524 →
Methods of Fabricating Mim Capacitors of Semiconductor Devices
Application:
11/027,312 →
Methods for Forming Copper Interconnect of Semiconductor Devices
Application:
11/027,533 →
Methods of Fabricating Gate Spacers for Semiconductor Devices
Application:
11/026,937 →
Devices and Methods of Preventing Plasma Charging Damage in Semiconductor Devices
Application:
11/027,049 →
Methods of Fabricating Nonvolatile Memory Using a Quantum Dot
Application:
11/026,715 →
Semiconductor Devices and Method for Fabricating the Same
Application:
11/026,941 →
Methods for Cleaning a Chamber of Semiconductor Device Manufacturing Equipment
Application:
11/027,086 →
Photomasks
Application:
11/026,486 →
Methods for Forming Shallow Trench Isolation Structures in Semiconductor Devices
Application:
11/026,232 →
Lateral double-diffused MOS transistor device
Application:
11/027,348 →
Method of Fabricating a Test Pattern for Junction Leakage Current
Application:
11/027,349 →
Methods of Fabricating Transistors in Semiconductor Devices
Application:
11/024,994 →
Methods of manufacturing semiconductor devices
Application:
11/023,260 →
Methods of Forming Shallow Trench Isolation
Application:
11/021,803 →
Methods of Fabricating Semiconductor Devices
Application:
11/021,731 →
Methods for Fabricating Semiconductor Devices
Application:
11/010,157 →
Methods for manufacturing semiconductor device
Application:
11/008,524 →
Semiconductor Devices and Methods of Fabricating the Same
Application:
10/972,189 →
Methods for Fabricating an Interlayer Dielectric Layer of a Semiconductor Device
Application:
10/964,307 →
Flash Memory Devices and Methods of Fabricating the Same
Application:
10/960,377 →
Method of Fabricating Flash Memory
Application:
10/950,218 →
Method of Forming a Semiconductor Device Using a Silicide Etching Mask
Application:
10/950,017 →
Methods for Forming a Device Isolation Structure in a Semiconductor Device
Application:
10/946,717 →
Methods for fabricating semiconductor devices
Application:
10/944,115 →
Field Effect Transistors and Methods for Manufacturing Field Effect Transistors
Application:
10/926,874 →
Methods for Fabricating a Copper Interconnect
Application:
10/925,078 →
Semiconductor Devices Having a via Hole and Methods for Forming a via Hole in a Semiconductor Device
Application:
10/922,756 →
Methods and Apparatus for Cleaning Semiconductor Devices
Application:
10/918,047 →
Apparatus and Method for Chemical Mechanical Polishing Process
Application:
10/909,473 →
Methods for Fabricating Semiconductor Devices
Application:
10/909,690 →
Methods for Fabricating Flash Memory Devices
Application:
10/902,543 →
Methods for Forming Shallow Trench Isolation
Application:
10/900,685 →
Cmp Polishing Heads and Methods of Using the Same
Application:
10/889,344 →
Photoresist Coating Failure Sensing Methods and Detection Devices
Application:
10/875,967 →
Sputter Etch Methods
Application:
10/875,125 →
Latch-Up Prevention for Memory Cells
Application:
10/869,128 →
Pinned Photodiode for a Cmos Image Sensor and Fabricating Method Thereof
Application:
10/831,815 →
Methods of Fabricating Self-Aligned Source of Flash Memory Device
Application:
10/758,188 →
Capacitors of Semiconductor Devices and Methods of Fabricating the Same
Application:
10/758,346 →
Method of Making a Monitoring Pattern to Measure a Depth and a Profile of a Shallow Trench Isolation
Application:
10/757,821 →
Method for Fabricating a Metal-Insulator-Metal Capacitor in a Semiconductor Device
Application:
10/758,150 →
Semiconductor Devices and Methods for Fabricating the Same
Application:
10/757,820 →
Method for Fabricating and-Type Flash Memory Cell
Application:
10/750,250 →
Methods for Fabricating Nonvolatile Memory Devices
Application:
10/750,252 →
Methods of Forming Quantum Dots in Semiconductor Devices
Application:
10/750,249 →
Flash Memory with Reduced Source Resistance and Fabrication Method Thereof
Application:
10/749,648 →
Methods of Manufacturing and-Type Flash Memory Devices
Application:
10/749,489 →
Methods for Fabricating Semiconductor Devices
Application:
10/747,599 →
Method for fabricating a transistor
Application:
10/747,601 →
Methods of Manufacturing Semiconductor Devices
Application:
10/747,830 →
Method for Forming Semiconductor Device Bonding Pads
Application:
10/747,603 →
Memory Cell Structures Including a Gap Filling Layer and Methods of Fabricating the Same
Application:
10/747,600 →
Methods of Fabricating Semiconductor Devices
Application:
10/747,602 →
Methods of manufacturing a semiconductor device
Application:
10/746,836 →
Methods of Manufacturing Semiconductor Devices
Application:
10/746,837 →
Methods of Manufacturing Semiconductor Devices
Application:
10/746,805 →
Methods for Fabricating a Semiconductor Device
Application:
10/745,854 →
Method of Fabricating a Semiconductor Device That Includes Removing a Residual Conducting Layer from a Sidewall Spacer Corresponding to a Gate Electrode of a Flash Memory
Application:
10/745,853 →
Image Sensors and Methods of Manufacturing the Same
Application:
10/744,189 →
Method of Manufacturing an Eeprom Device
Application:
10/743,483 →
Methods of Preventing Oxidation of Barrier Metal of Semiconductor Devices
Application:
10/743,629 →
Semiconductor Device and Method of Manufacturing the Same
Application:
10/743,113 →
Methods for Forming Capacitors and Contact Holes of Semiconductor Devices Simultaneously
Application:
10/743,608 →
Apparatus and Methods of Chemical Mechanical Polishing
Application:
10/733,067 →
Methods of Manufacturing Semiconductor Devices
Application:
10/729,227 →
Methods of Manufacturing Semiconductor Devices
Application:
10/726,871 →
Methods of Manufacturing a Semiconductor Device
Application:
10/722,312 →
Method and Apparatus for Forming a Barrier Metal Layer in Semiconductor Devices
Application:
10/701,341 →
Methods for Manufacturing Semiconductor Devices
Application:
10/694,489 →
Methods to Reduce Stress on a Metal Interconnect
Application:
10/694,035 →
Apparatus and methods for slurry flow control
Application:
10/676,643 →
Methods of Fabricating a Mosfet
Application:
10/627,418 →
Method of Making a Mos Transistor
Application:
10/627,059 →
Pinned Photodiode for a Cmos Image Sensor and Fabricating Method Thereof
Application:
10/623,389 →
Methods of Making Shallow Trench-Type Pixels for Cmos Image Sensors
Application:
10/606,693 →
Thinning Agent Supplying Systems
Application:
10/458,870 →
Method for Inspecting Wafer Defects of a Semiconductor Device
Application:
10/458,871 →