IP Library › Assignment 010024/0960
Patent Assignment
Reel/Frame 010024/0960

Assignment of Assignor's Interest

Recorded: 1999-05-10 Pages: 22
Assignor
VARIAN ASSOCIATES, INC.
Executed: 1999-04-06
Assignee
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
35 DORY ROAD, GLOUCESTER, MASSACHUSETTS, 01930
Covered Properties (123)
Sputter Target for Use in a Sputter Coating Source
Patent: 4,457,825 →
Application: 06/150,532 →
End Point Detection Method for Physical Etching Process
Patent: 4,358,338 →
Application: 06/150,533 →
Unitary Electromagnet for Double Deflection Scanning of Charged Particle Beam
Patent: 4,367,411 →
Application: 06/164,415 →
Multiple Threaded Fastener Assembly
Patent: 4,370,083 →
Application: 06/176,171 →
Particle Beam Accelerator
Patent: 4,383,180 →
Application: 06/264,498 →
Temperature Control of a Workpiece Under Ion Implantation
Patent: 4,453,080 →
Application: 06/284,915 →
Dual Filament Ion Source
Patent: 4,412,153 →
Application: 06/293,026 →
Hybrid Moving Stage and Rastered Electron Beam Lithography System Employing Approximate Correction Circuit
Patent: 4,424,450 →
Application: 06/299,681 →
Beam Sharing Method and Apparatus for Ion Implantation
Patent: 4,433,247 →
Application: 06/306,056 →
Pattern Data Handling System for an Electron Beam Exposure System
Patent: 4,433,384 →
Application: 06/309,156 →
Apparatus for Thermal Treatment of Semiconductor Wafers by Gas Conduction Incorporating Peripheral Gas Inlet
Patent: 4,512,391 →
Application: 06/343,794 →
Dose Compensation by Differential Pattern Scanning
Patent: 4,449,051 →
Application: 06/349,293 →
Beam Scanning Method and Apparatus for Ion Implantation
Patent: 4,421,988 →
Application: 06/349,742 →
Charged Particle Beam Exposure System Utilizing Variable Line Scan
Patent: 4,469,950 →
Application: 06/354,822 →
Method of Thermal Treatment of a Wafer in an Evacuated Environment
Patent: 4,680,061 →
Application: 06/366,433 →
Wafer Transfer System
Patent: 4,449,885 →
Application: 06/381,085 →
Air Lock Vacuum Pumping Methods and Apparatus
Patent: 4,504,194 →
Application: 06/381,289 →
Missing or Broken Wafer Sensor
Patent: 4,513,430 →
Application: 06/381,290 →
Apparatus for Gas-Assisted, Solid-to-Solid Thermal Transfer with a Semiconductor Wafer
Patent: 4,457,359 →
Application: 06/381,669 →
Optimum Surface Contour for Conductive Heat Transfer with a Thin Flexible Workpiece
Patent: 4,458,746 →
Application: 06/381,670 →
Blackbody Radiation Source for Producing Constant Plannar Energy Flux
Patent: 4,433,246 →
Application: 06/382,852 →
Ion Chamber for Electron-Bombardment Ion Sources
Patent: 4,516,050 →
Application: 06/397,962 →
Method for Reflow of Phosphosilicate Glass
Patent: 4,474,831 →
Application: 06/412,455 →
Gap Control System for Localized Vacuum Processing
Patent: 4,528,451 →
Application: 06/435,177 →
Magnetic Targets for Use in Sputter Coating Apparatus
Patent: 4,414,086 →
Application: 06/439,681 →
Method for Photoresist Pretreatment Prior to Charged Particle Beam Processing
Patent: 4,851,691 →
Application: 06/443,080 →
Metal-Containing Organic Photoresists
Patent: 4,517,276 →
Application: 06/445,353 →
Apparatus for Enhanced Neutralization of Positively Charged Ion Beam
Patent: 4,463,255 →
Application: 06/450,819 →
Methods for Conducting Electron Beam Lithography
Patent: 4,454,200 →
Application: 06/471,577 →
Blackbody Radiation Source with Constant Planar Energy Flux
Patent: 4,486,652 →
Application: 06/481,205 →
Scaling Circuit for Remote Measurement System
Patent: 4,571,588 →
Application: 06/497,291 →
Methods and Apparatus for Gas-Assisted Thermal Transfer with a Semiconductor Wafer
Patent: 4,542,298 →
Application: 06/502,812 →
Disk or Wafer Handling and Coating System
Patent: 4,500,407 →
Application: 06/515,247 →
Multi-Gap Magnetic Imaging Lens for Charged Particle Beams
Patent: 4,544,847 →
Application: 06/518,167 →
Rapid Pumpdown for High Vacuum Processing
Patent: 4,475,045 →
Application: 06/520,765 →
Wafer Coating System
Patent: 4,647,266 →
Application: 06/523,817 →
Process for High Temperature Drive-in Diffusion of Dopants into Semiconductor Wafers
Patent: 4,503,087 →
Application: 06/527,140 →
Localized Vacuum Processing Apparatus
Patent: 4,524,261 →
Application: 06/533,822 →
Apparatus for Positioning a Workpiece in a Localized Vacuum Processing System
Patent: 4,560,880 →
Application: 06/533,823 →
Multiple Wafer Holder for a Wafer Transfer System
Patent: 4,602,713 →
Application: 06/534,949 →
Method for Reducing Phosphorous Contamination in a Vacuum Processing Chamber
Patent: 4,512,812 →
Application: 06/534,950 →
Ferromagnetic Films for High Density Recording and Methods of Production
Patent: 4,520,040 →
Application: 06/561,692 →
Wafer Holding Apparatus for Ion Implantation
Patent: 4,553,069 →
Application: 06/568,175 →
Method for Conductive Heat Transfer with a Thin Flexible Workpiece
Patent: 4,537,244 →
Application: 06/585,743 →
Method for Gas-Assisted, Solid-to-Solid Thermal Transfer with a Semiconductor Wafer
Patent: 4,508,161 →
Application: 06/585,819 →
Method and Apparatus for Controlling Thermal Transfer in a Cyclic Vacuum Processing System
Patent: 4,535,834 →
Application: 06/606,051 →
Apparatus for Controlling Thermal Transfer in a Cyclic Vacuum Processing System
Patent: 4,527,620 →
Application: 06/606,052 →
Apparatus for and the Method of Controlling Magnetron Sputter Device Having Separate Confining Magnetic Fields to Separate Targets Subject to Separate Discharges
Patent: 4,595,482 →
Application: 06/611,435 →
Optimum Surface Contour for Conductive Heat Transfer with a Thin Flexible Workpiece
Patent: 4,535,835 →
Application: 06/631,527 →
Wafer Transport System
Patent: 4,518,078 →
Application: 06/634,175 →
Dual Filament Ion Source with Improved Beam Characteristics
Patent: 4,608,513 →
Application: 06/650,014 →
Wafer Transfer System
Patent: 4,634,331 →
Application: 06/680,202 →
Charged Particle Beam Lithography Machine Incorporating Localized Vacuum Envelope
Patent: 4,607,167 →
Application: 06/701,439 →
High Speed Pattern Generator for Electron Beam Lithography
Patent: 4,698,509 →
Application: 06/701,711 →
Ferromagnetic Films for High Density Recording and Methods of Production
Patent: 4,714,641 →
Application: 06/707,995 →
Envelope Apparatus for Localized Vacuum Processing
Patent: 4,584,479 →
Application: 06/708,104 →
Apparatus for Scanning a High Current Ion Beam with a Constant Angle of Incidence
Patent: 4,661,712 →
Application: 06/737,840 →
Method and Apparatus for Controlling Thermal Transfer in a Cyclic Vacuum Processing System
Patent: 4,567,938 →
Application: 06/743,196 →
Charge Conversion Unit for Negative Ion Source
Patent: 4,712,012 →
Application: 06/759,464 →
Vacuum Pick for Semiconductor Wafers
Patent: 4,620,738 →
Application: 06/766,458 →
Method for Doping Semiconductor Wafers by Rapid Thermal Processing of Solid Planar Diffusion Sources
Patent: 4,661,177 →
Application: 06/785,418 →
Magnetron Sputter Device Having Planar and Curved Targets
Patent: 4,606,806 →
Application: 06/811,306 →
Inverted Re-Entrant Magnetron Ion Source
Patent: 4,774,437 →
Application: 06/835,072 →
Targets for Magnetron Sputter Device Having Separate Confining Magnetic Fields to Separate Targets Subject to Separate Discharges
Patent: 4,657,654 →
Application: 06/856,430 →
Gate Valve for Wafer Processing System
Patent: 4,715,764 →
Application: 06/856,876 →
Low Compliance Seal for Gas-Enhanced Wafer Cooling in Vacuum
Patent: 4,671,204 →
Application: 06/864,097 →
Dose Measurement and Uniformity Monitoring System for Ion Implantation
Patent: 4,751,393 →
Application: 06/864,584 →
Ion Beam Fast Parallel Scanning Having Dipole Magnetic Lens with Nonuniform Field
Patent: 4,745,281 →
Application: 06/899,966 →
Linear Gas Bearing with Integral Vacuum Seal for Use in Serial Process Ion Implantation Equipment
Patent: 4,726,689 →
Application: 06/921,435 →
Ion Implantation with Variable Implant Angle
Patent: 4,745,287 →
Application: 06/922,319 →
Method and Apparatus for Ion Beam Centroid Location
Patent: 4,724,324 →
Application: 06/934,011 →
Threating Workpieces with Beams
Patent: 4,775,796 →
Application: 07/000,703 →
Rapid Thermal Cvd Apparatus
Patent: 4,796,562 →
Application: 07/003,516 →
Low Deflection Force Sensitive Pick
Patent: 4,744,709 →
Application: 07/032,204 →
Apparatus for Retaining Wafers
Patent: 4,817,556 →
Application: 07/046,230 →
Vaporizer System for Ion Source
Patent: 4,791,273 →
Application: 07/051,076 →
Platen and Beam Setup Flag Assembly for Ion Implanter
Patent: 4,717,829 →
Application: 07/051,269 →
Method of Thermal Treatment of a Wafer in an Evacuated Enviroment
Patent: 4,743,570 →
Application: 07/072,194 →
Wafer Transfer System
Patent: 4,836,733 →
Application: 07/135,568 →
Ion Beam Scanning Method and Apparatus
Patent: 4,922,106 →
Application: 07/138,925 →
Methods and Apparatus for Thermal Transfer with a Semiconductor Wafer in Vacuum
Patent: 4,832,781 →
Application: 07/141,709 →
Wafer Coating System
Patent: 5,024,747 →
Application: 07/183,013 →
Compensated Scan Wave Form Generator for Ion Implantation Equipment
Patent: 4,851,693 →
Application: 07/202,748 →
Method and Apparatus for Venting Vacuum Processing Equipment
Patent: 4,836,233 →
Application: 07/203,009 →
Bus Driving and Decoding Circuit
Patent: 4,967,390 →
Application: 07/230,636 →
Horizontal Laminar Air Flow Work Station
Patent: 4,927,438 →
Application: 07/290,889 →
Isolation Valve for Vacuum and Non-Vacuum Application
Patent: 4,903,937 →
Application: 07/326,398 →
Sputtering Apparatus with a Rotating Magnet Array Having a Geometry for Specified Target Erosion Profile
Patent: 4,995,958 →
Application: 07/355,713 →
Modular Wafer Transport and Processing System
Patent: 4,917,556 →
Application: 07/358,461 →
Disk Scanning Apparatus for Batch Ion Implanters
Patent: 4,899,059 →
Application: 07/366,202 →
Warping Yarn Accumulator
Patent: 4,903,914 →
Application: 07/367,122 →
Disk Scanning Apparatus for Batch Ion Implanters
Patent: 4,965,862 →
Application: 07/407,855 →
Methods and Apparatus for Fabricating a High Purity Thermally- Conductive Polymer Layer
Patent: 4,997,606 →
Application: 07/420,668 →
Methods for Thermal Transfer with a Semiconductor
Patent: 4,938,992 →
Application: 07/427,921 →
Method and Apparatus for High Efficiency Scanning in an Ion Implanter
Patent: 4,980,562 →
Application: 07/432,470 →
Apparatus for Retaining Wafers
Patent: 5,040,484 →
Application: 07/488,491 →
Apparatus for Generating High Currents of Negative Ions
Patent: 4,980,556 →
Application: 07/492,428 →
Method of and Apparatus for Non-Contact Temperature Measurement
Patent: 5,208,643 →
Application: 07/594,528 →
Wafer Arm Handler Mechanism
Patent: 5,096,364 →
Application: 07/596,119 →
Charge Neutralization Apparatus for Ion Implantation System
Patent: 5,136,171 →
Application: 07/646,361 →
Ion Source
Patent: 5,162,699 →
Application: 07/776,598 →
Narrow Spectral Band Pyrometry
Patent: 5,203,631 →
Application: 07/779,444 →
Plasma Etch Process and Equipment
Patent: 5,376,223 →
Application: 07/818,662 →
Ion Accelerator
Patent: 5,300,891 →
Application: 07/877,452 →
Method of Monitoring Ion Beam Current in Ion Implantation Apparatus for Use in Manufacturing Semiconductors
Patent: 5,319,212 →
Application: 07/958,077 →
Spiral Scan Computer Tomography Apparatus
Patent: 5,345,381 →
Application: 07/964,381 →
Production of High Beam Currents at Low Energies for Use in Ion Implantation Systems
Patent: 5,306,922 →
Application: 08/033,286 →
Charge Monitor for High Potential Pulse Current Dose Measurement Apparatus and Method
Patent: 5,572,038 →
Application: 08/059,033 →
Wafer Retaining Platen Having Peripheral Clamp and Wafer Lifting Means
Patent: 5,350,427 →
Application: 08/076,509 →
Scan Technique to Reduce Transient Wafer Temperatures During Ion Implantation
Patent: 5,486,702 →
Application: 08/125,117 →
Anti-Stick Electrostatic Chuck for a Low Pressure Environment
Patent: 5,426,558 →
Application: 08/213,459 →
Plasma Etch Equipment
Patent: 5,587,039 →
Application: 08/304,719 →
Method of Constructing Cmos Vertically Modulated Wells (Vmw) by Clustered Mev Billi (Buried Implanted Layer for Lateral Isolation) Implantation
Patent: 5,501,993 →
Application: 08/343,116 →
Electrostatic Wafer Clamp
Patent: 5,452,177 →
Application: 08/383,554 →
Apparatus for Obtaining Dose Uniformity in Plasma Doping (Plad) Ion Implantation Processes
Patent: 5,711,812 →
Application: 08/469,401 →
Optical Position Calibration System
Patent: 5,742,393 →
Application: 08/474,027 →
Charged Particle Beam System Having Beam-Defining Slit Formed by Rotating Cyclinders
Patent: 5,629,528 →
Application: 08/585,626 →
Semiconductor Device Having at Least One Field Oxide Area and Cmos Vertically Modulated Wells (Vmw) with a Buried Implanted Layer for Lateral Isolation
Patent: 5,814,866 →
Application: 08/617,293 →
Wafer Orientation Alignment System
Patent: 5,690,744 →
Application: 08/728,421 →
Zero Deflection Magnetically-Suppressed Faraday for Ion Implanters
Patent: 5,757,018 →
Application: 08/763,250 →
Apparatus and Method for Temperature Control of Workpieces in Vacuum
Patent: 5,822,172 →
Application: 08/779,899 →
Method for Cmos Latch-Up Improvement by Mev Billi (Buried Implanted Layer for Lateral Isolation) Plus Buried Layer Implantation
Patent: 5,821,589 →
Application: 08/822,537 →
Charge Exchange Cell
Patent: 5,838,012 →
Application: 08/822,543 →
Related Assignments (19)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest. Aug 31, 1981
From: TURNER, NORMAN
To: VARIAN ASSOCIATES, INC.
Reel/Frame 003902/0875 →
Assignment of Assignors Interest. Oct 23, 1981
From: BERKOWITZ, EDWARD H.
To: VARIAN ASSOCIATES, INC., A CORP. OF DE.
Reel/Frame 003932/0473 →
Assignment of Assignors Interest. Dec 11, 1981
From: WARD, BILLY W.; WELLS, WILLIAM D.
To: VARIAN ASSOCIATES, INC., A CORP. OF DE
Reel/Frame 003933/0286 →
Assignment of Assignors Interest. Jan 28, 1982
From: TURNER, NORMAN L.
To: VARIAN ASSOCIATES, INC., A CORP. OF DE.
Reel/Frame 003953/0744 →
Assignment of Assignors Interest. Jan 28, 1982
From: BERRIAN, DONALD W.; WARD, BILLY W.
To: VARIAN ASSOCIATES, INC., A CORP. OF DE.
Reel/Frame 003953/0741 →
Assignment of Assignors Interest. Apr 29, 1982
From: BURNETT, WILLIAM R.; THOMPSON, CHARLES T.
To: VARIAN ASSOCIATES, INC. A CORP. OF DE
Reel/Frame 003983/0152 →
Assignment of Assignors Interest. May 3, 1982
From: HARRA, DAVID J.
To: VARIAN ASSOCIATES, INC., A CORP. OF DE.
Reel/Frame 003980/0413 →
Assignment of Assignors Interest. May 17, 1982
From: BERKOWITZ, EDWARD H.
To: VARIAN ASSOCIATES, INC.
Reel/Frame 003990/0863 →
Assignment of Assignors Interest. Jun 4, 1982
From: ROBERTSON, DAVID A.; TURNER, NORMAN L.
To: VARIAN ASSOCIATES, INC, A CORP. OF DEL.
Reel/Frame 003997/0818 →
Assignment of Assignors Interest. Jun 17, 1982
From: TAYLOR, NORMAN J; PETRIC, PAUL F
To: VARIAN ASSOCIATES, INC., A CORP. OF DE.
Reel/Frame 004004/0042 →
Assignment of Assignors Interest. Jul 30, 1982
From: HOLDEN, SCOTT C.
To: VARIAN ASSOCIATES INC PALO ALTO CA A CORP OF
Reel/Frame 004019/0620 →
Assignment of Assignors Interest. Jul 30, 1982
From: HOLDEN, SCOTT C.; HANLEY, PETER R.
To: VARIAN ASSOCIATES INC PALO ALTO CA A CORP OF
Reel/Frame 004019/0624 →
Assignment of Assignors Interest. Aug 25, 1982
From: VORA, MAHASUKH; MALHOTRA, RAJENDER
To: VARIAN ASSOCIATES, INC., A CORP. OF DE
Reel/Frame 004029/0185 →
Assignment of Assignors Interest. Aug 25, 1982
From: HOLDEN, SCOTT C.
To: VARIAN ASSOCIATES, INC., A CORP. OF DE
Reel/Frame 004029/0187 →
Assignment of Assignors Interest. Aug 25, 1982
From: HERTEL, RICHARD J.; MACINTOSH, EDWARD D.
To: VARIAN ASSOCIATES, INC., A CORP. OF DE
Reel/Frame 004029/0491 →
Assignment of Assignors Interest. Nov 3, 1982
From: RUSSO, CARL J.
To: VARIAN ASSOCIATES, INC.
Reel/Frame 004058/0696 →
Assignment of Assignors Interest. Nov 3, 1982
From: DOWNEY, DANIEL F.
To: VARIAN ASSOCIATES, INC.
Reel/Frame 004058/0698 →
Assignment of Assignors Interest. Jan 10, 1983
From: LAMONT, LAWRENCE T. JR.
To: VARIAN ASSOCIATES, INC.
Reel/Frame 004075/0174 →
Assignment of Assignors Interest. Feb 3, 1983
From: PETRIC, PAUL F.; FOLEY, MICHAEL S.; UTLAUT, MARK W.; LAIACANO, JOSEPH A.
To: VARIAN ASSOCIATES, INC., A CORP. OF DE
Reel/Frame 004091/0843 →