Patent Assignment
Reel/Frame 021976/0333
Assignment of Assignor's Interest
Recorded: 2008-12-15
Received: 2008-12-15
Pages: 5
Assignor
FUJITSU LIMITED
Executed: 2008-11-04
Assignee
FUJITSU MICROELECTRONICS LIMITED
7-1, NISHI-SHINJUKU 2-CHOME, SHINJUKU-KU, TOKYO, JPX, 163-0722, JAPAN
Covered Properties
(81)
Selective Epitaxial Growth Method Using Halogen Containing Gate Sidewall Mask
Application:
12/285,723 →
Semiconductor Device and Method of Manufacturing the Same
Application:
12/285,275 →
Semiconductor Device Fabricated by Selective Epitaxial Growth Method
Application:
12/230,373 →
Semiconductor Device and Method of Manufacturing the Same
Application:
12/187,851 →
Method of Manufacturing Semiconductor Device
Application:
12/219,271 →
Method of Manufacturing Semiconductor Device Suitable for Forming Wiring Using Damascene Method
Application:
12/216,832 →
Semiconductor Device and Manufacturing Method of the Semiconductor Device
Application:
12/136,955 →
Semiconductor Device Fabrication Method, Semiconductor Device, and Semiconductor Layer Formation Method
Application:
12/120,576 →
Methods and Kits for Methylation Detection
Application:
12/111,008 →
Method of Forming a Gate Layer with Multiple Ecthing Steps
Application:
12/052,195 →
Method of Manufacturing a Semiconductor Device
Application:
12/051,193 →
Semiconductor Device and Method for Manufacturing the Same
Application:
12/049,592 →
Semiconductor Device and Method of Manufacturing the Same
Application:
12/031,826 →
Photomask, Manufacturing Method Thereof, and Electronic Device Manufacturing Method
Application:
12/018,495 →
Semiconductor Device Having a Contact Plug Connecting to a Silicide Film Formed on a Diffusion Region of a Flash Memory Cell.
Application:
12/013,709 →
Wiring Structure and Wiring Designing Method
Application:
11/972,944 →
Semiconductor Device, Method of Manufacturing the Same, and Method of Evaluating Semiconductor Device
Application:
12/003,100 →
Fabrication Process of a Semiconductor Device
Application:
11/939,064 →
Semiconductor Device and Method for Making the Same
Application:
11/853,195 →
Rapid Thermal Processing Apparatus and Method of Manufacture of Semiconductor Device
Application:
11/898,115 →
Fin-Type Semiconductor Device with Low Contact Resistance and Its Manufacture Method
Application:
11/896,826 →
Semiconductor Device Manufacturing Method, Data Generating Apparatus, Data Generating Method and Recording Medium Readable by Computer Recoded with Data Generating Program
Application:
11/844,541 →
Memory Cell Array, Method of Producing the Same, and Semiconductor Memory Device Using the Same
Application:
11/840,559 →
D/A Converter
Application:
11/890,437 →
Driver Ic for Display and Display Including Same
Application:
11/890,585 →
Semiconductor Device and Method of Manufacturing the Same
Application:
11/882,355 →
Semiconductor Device and Manufacturing Method Thereof
Application:
11/777,669 →
Semiconductor Memory Device and Semiconductor Device Group
Application:
11/802,812 →
Method of Manufacturing a Semicondutor Device Including Epitaxially Growing Semiconductor Epitaxial Layers on a Surface of Semiconductor Substrate
Application:
11/797,253 →
Method for Manufacturing Micro Structure
Application:
11/790,943 →
Semiconductor Device and Manufacturing Method of the Same
Application:
11/740,968 →
Semiconductor Device Having Symbol Pattern Utilized as Identification Sign
Application:
11/790,123 →
Semiconductor Device Fabricated by Selective Epitaxial Growth Method
Application:
11/717,205 →
Semiconductor Device Having Copper Wiring
Application:
11/714,886 →
FABRICATION METHOD OF SEMICONDUCTOR DEVICE HAVING A BARRIER LAYER CONTAINING Mn
Application:
11/654,688 →
Semiconductor Device and Method of Manufacturing the Same
Application:
11/604,694 →
Semiconductor Device and Method of Manufacturing the Same
Application:
11/589,084 →
Semiconductor Device Having a Multilayer Interconnection Structure, Fabrication Method Thereof, and Designing Method Thereof
Application:
11/584,645 →
Adhesive Layer Forming a Capacitor Dielectric Between Semiconductor Chips
Application:
11/508,289 →
Semiconductor Device Having Capacitor Capable of Reducing Additional Processes and Its Manufacture Method
Application:
11/505,945 →
Method of Manufacturing Semiconductor Device
Application:
11/463,924 →
Semiconductor Device and Production Method Thereof
Application:
11/471,732 →
Polishing Device and Polishing Method
Application:
11/447,254 →
Method and Apparatus of Fabricating Semiconductor Device
Application:
11/413,012 →
Method of Fabricating Semiconductor Device
Application:
11/411,043 →
Semiconductor Device and Manufacturing Method Thereof
Application:
11/362,530 →
Method of manufacturing semiconductor device suitable for forming wiring using damascene method
Application:
11/318,530 →
Field Effect Transistors with Different Gate Widths
Application:
11/236,509 →
Semiconductor Device and Production Method Thereof
Application:
11/229,745 →
Semiconductor Device Fabrication Method
Application:
11/220,865 →
Silicon Oxycarbide, Growth Method of Silicon Oxycarbide Layer, Semiconductor Device and Manufacture Method for Semiconductor Device
Application:
11/206,955 →
Semiconductor Device and Method for Fabricating the Same
Application:
11/205,991 →
Semiconductor Device with Integrated Flash Memory and Peripheral Circuit and Its Manufacture Method
Application:
11/201,212 →
Semiconductor Device and Method Capable of Scribing Chips with High Yield
Application:
11/200,126 →
P-Channel Mos Transistor, Semiconductor Integrated Circuit Device and Fabrication Process Thereof
Application:
11/188,142 →
Manufacturing Method for Semiconductor Device
Application:
11/182,851 →
P-Channel Mos Transistor and Fabrication Process Thereof
Application:
11/180,791 →
Semiconductor Device
Application:
11/168,548 →
Semiconductor Device with Suppressed Copper Migration
Application:
11/145,227 →
Method of Fabricating Semiconductor Device, and Semiconductor Device
Application:
11/135,467 →
Semiconductor Memory Device and Method for Writing to Semiconductor Memory Device
Application:
11/135,560 →
Semiconductor Integrated Circuit and Fabrication Process Thereof
Application:
11/132,325 →
Fin-Type Semiconductor Device with Low Contact Resistance and Its Manufacture Method
Application:
11/123,145 →
Exposure Equipment and Control Method of the Same
Application:
11/117,434 →
Semiconductor Device and Method of Manufacturing the Same
Application:
11/117,689 →
A P-Channel Mos Transistor and Fabrication Process Thereof
Application:
11/114,047 →
Semiconductor Device and Fabrication Method Thereof
Application:
11/114,111 →
Method for Correcting Pattern Data and Method for Manufacturing Semiconductor Device Using Same
Application:
11/102,689 →
Semiconductor Device Having Enhanced Breakdown Voltage
Application:
11/061,475 →
Semiconductor Device and Manufacturing Method of the Same
Application:
11/061,900 →
Semiconductor Device and Method of Manufacturing the Same
Application:
11/044,458 →
Rapid Thermal Processing Apparatus and Method of Manufacture of Semiconductor Device
Application:
11/032,087 →
Semiconductor Device and Method for Manufacturing Therefor
Application:
11/013,541 →
Semiconductor Device Having Copper Wiring
Application:
10/995,082 →
Semiconductor Memory Device and Semiconductor Device Group
Application:
10/988,530 →
Semiconductor Device Having a Multilayer Interconnection Structure, Fabrication Method Thereof, and Designing Method Thereof
Application:
10/939,594 →
Semiconductor Device Manufacture Method
Application:
10/838,218 →
Semiconductor Integrated Circuit
Application:
10/706,664 →
Method for Driving Display and Drive Circuit for Display
Application:
10/701,856 →
Semiconductor Device, Display Device, and Signal Transmission System
Application:
10/427,547 →
Dot-Inversion Data Driver for Liquid Crystal Display Device
Application:
09/824,345 →